JPS6267161U - - Google Patents
Info
- Publication number
- JPS6267161U JPS6267161U JP15819785U JP15819785U JPS6267161U JP S6267161 U JPS6267161 U JP S6267161U JP 15819785 U JP15819785 U JP 15819785U JP 15819785 U JP15819785 U JP 15819785U JP S6267161 U JPS6267161 U JP S6267161U
- Authority
- JP
- Japan
- Prior art keywords
- valve body
- valve
- passage
- rotor
- guide hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrically Driven Valve-Operating Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15819785U JPS6267161U (enrdf_load_stackoverflow) | 1985-10-15 | 1985-10-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15819785U JPS6267161U (enrdf_load_stackoverflow) | 1985-10-15 | 1985-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6267161U true JPS6267161U (enrdf_load_stackoverflow) | 1987-04-25 |
Family
ID=31081460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15819785U Pending JPS6267161U (enrdf_load_stackoverflow) | 1985-10-15 | 1985-10-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6267161U (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006070988A (ja) * | 2004-09-01 | 2006-03-16 | Fuji Koki Corp | 電動弁 |
| US7552521B2 (en) | 2004-12-08 | 2009-06-30 | Tokyo Electron Limited | Method and apparatus for improved baffle plate |
| US7560376B2 (en) | 2003-03-31 | 2009-07-14 | Tokyo Electron Limited | Method for adjoining adjacent coatings on a processing element |
| US7566379B2 (en) | 2002-09-30 | 2009-07-28 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| US7566368B2 (en) | 2002-09-30 | 2009-07-28 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate in a plasma processing system |
| US7601242B2 (en) | 2005-01-11 | 2009-10-13 | Tokyo Electron Limited | Plasma processing system and baffle assembly for use in plasma processing system |
| US8877002B2 (en) | 2002-11-28 | 2014-11-04 | Tokyo Electron Limited | Internal member of a plasma processing vessel |
-
1985
- 1985-10-15 JP JP15819785U patent/JPS6267161U/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7566379B2 (en) | 2002-09-30 | 2009-07-28 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| US7566368B2 (en) | 2002-09-30 | 2009-07-28 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate in a plasma processing system |
| US8877002B2 (en) | 2002-11-28 | 2014-11-04 | Tokyo Electron Limited | Internal member of a plasma processing vessel |
| US7560376B2 (en) | 2003-03-31 | 2009-07-14 | Tokyo Electron Limited | Method for adjoining adjacent coatings on a processing element |
| JP2006070988A (ja) * | 2004-09-01 | 2006-03-16 | Fuji Koki Corp | 電動弁 |
| US7552521B2 (en) | 2004-12-08 | 2009-06-30 | Tokyo Electron Limited | Method and apparatus for improved baffle plate |
| US7601242B2 (en) | 2005-01-11 | 2009-10-13 | Tokyo Electron Limited | Plasma processing system and baffle assembly for use in plasma processing system |