JPS6265424A - Method for detecting end point of etching - Google Patents

Method for detecting end point of etching

Info

Publication number
JPS6265424A
JPS6265424A JP20426485A JP20426485A JPS6265424A JP S6265424 A JPS6265424 A JP S6265424A JP 20426485 A JP20426485 A JP 20426485A JP 20426485 A JP20426485 A JP 20426485A JP S6265424 A JPS6265424 A JP S6265424A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
time
spectral intensity
intensity waveform
end point
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20426485A
Inventor
Atsushi Ito
Tatsuo Moroi
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To contrive making the detection of the end point of etching easy by correcting a difference at the n + 1 time by comparing the spectral intensity waveform of the first time with that of the (n) time without making the correction every time while a specimen is being etched.
CONSTITUTION: An offset and a gain are adjusted manually at the start, a spectral intensity waveform is monitored and the end point of etching is judged. At the second time, the judgement is carried out under the same conditions of the first time and if the spectral intensity waveform for judging the end point is different from that of the first time, the deviation is computed by a computer 8, the data to a D/A converter 6 for offset and a programable gain amplifier 5 are altered and the spectral intensity waveform is corrected to be made the same with that of the first time. After the correction, the third time judgement is started. Then, the deviation of the third time is fed back for the fourth time, the (n) time is fed back to the n + 1 time and even if the spectral intensity waveform is changed, nearly equal spectral intensity waveform with that of the first time can be obtained.
COPYRIGHT: (C)1987,JPO&Japio
JP20426485A 1985-09-18 1985-09-18 Method for detecting end point of etching Pending JPS6265424A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20426485A JPS6265424A (en) 1985-09-18 1985-09-18 Method for detecting end point of etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20426485A JPS6265424A (en) 1985-09-18 1985-09-18 Method for detecting end point of etching

Publications (1)

Publication Number Publication Date
JPS6265424A true true JPS6265424A (en) 1987-03-24

Family

ID=16487583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20426485A Pending JPS6265424A (en) 1985-09-18 1985-09-18 Method for detecting end point of etching

Country Status (1)

Country Link
JP (1) JPS6265424A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63254732A (en) * 1987-04-13 1988-10-21 Hitachi Ltd Etching end point judgment system
JPH01235336A (en) * 1988-03-16 1989-09-20 Hitachi Ltd Etching end-point judgment apparatus
JPH01241127A (en) * 1988-03-23 1989-09-26 Hitachi Ltd Device for deciding end point of etching
US5118378A (en) * 1989-10-10 1992-06-02 Hitachi, Ltd. Apparatus for detecting an end point of etching
JP2002329230A (en) * 2001-04-27 2002-11-15 Oki Electric Ind Co Ltd Automatic transaction device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63254732A (en) * 1987-04-13 1988-10-21 Hitachi Ltd Etching end point judgment system
JPH01235336A (en) * 1988-03-16 1989-09-20 Hitachi Ltd Etching end-point judgment apparatus
JPH01241127A (en) * 1988-03-23 1989-09-26 Hitachi Ltd Device for deciding end point of etching
US5118378A (en) * 1989-10-10 1992-06-02 Hitachi, Ltd. Apparatus for detecting an end point of etching
JP2002329230A (en) * 2001-04-27 2002-11-15 Oki Electric Ind Co Ltd Automatic transaction device

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