JPS6261136B2 - - Google Patents
Info
- Publication number
- JPS6261136B2 JPS6261136B2 JP53091178A JP9117878A JPS6261136B2 JP S6261136 B2 JPS6261136 B2 JP S6261136B2 JP 53091178 A JP53091178 A JP 53091178A JP 9117878 A JP9117878 A JP 9117878A JP S6261136 B2 JPS6261136 B2 JP S6261136B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- acrylate
- vinyl
- group
- methacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007639 printing Methods 0.000 claims description 33
- 229920005989 resin Polymers 0.000 claims description 28
- 239000011347 resin Substances 0.000 claims description 28
- 239000000839 emulsion Substances 0.000 claims description 21
- 150000008049 diazo compounds Chemical class 0.000 claims description 20
- 230000005660 hydrophilic surface Effects 0.000 claims description 6
- -1 polyethylene Polymers 0.000 description 44
- 239000010410 layer Substances 0.000 description 30
- 239000000178 monomer Substances 0.000 description 19
- 238000000576 coating method Methods 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 15
- 238000011282 treatment Methods 0.000 description 15
- 229910052782 aluminium Inorganic materials 0.000 description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 14
- 239000004793 Polystyrene Substances 0.000 description 13
- 239000007864 aqueous solution Substances 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 239000004816 latex Substances 0.000 description 12
- 229920000126 latex Polymers 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 230000002209 hydrophobic effect Effects 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 239000004115 Sodium Silicate Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 5
- 229910052911 sodium silicate Inorganic materials 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 235000021317 phosphate Nutrition 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 125000000542 sulfonic acid group Chemical group 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- 206010012442 Dermatitis contact Diseases 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 239000007859 condensation product Substances 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 150000002825 nitriles Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229920005862 polyol Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- BATOPAZDIZEVQF-MQQKCMAXSA-N (E,E)-2,4-hexadienal Chemical compound C\C=C\C=C\C=O BATOPAZDIZEVQF-MQQKCMAXSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N 1-Heptene Chemical compound CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 2
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 2
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000007824 aliphatic compounds Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 229920001727 cellulose butyrate Polymers 0.000 description 2
- 229920006218 cellulose propionate Polymers 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 238000010556 emulsion polymerization method Methods 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 2
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- BATOPAZDIZEVQF-UHFFFAOYSA-N sorbic aldehyde Natural products CC=CC=CC=O BATOPAZDIZEVQF-UHFFFAOYSA-N 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 150000008054 sulfonate salts Chemical class 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 150000003673 urethanes Chemical class 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- HNISBYCBIMPXKH-UHFFFAOYSA-N (1,1-dichloro-2-ethoxyethyl) prop-2-enoate Chemical compound CCOCC(Cl)(Cl)OC(=O)C=C HNISBYCBIMPXKH-UHFFFAOYSA-N 0.000 description 1
- TZTBGPOKQFYJOV-UHFFFAOYSA-N (1,1-diethoxy-8-methyl-1-phenoxynonan-2-yl) hydrogen sulfate Chemical compound CCOC(C(CCCCCC(C)C)OS(=O)(=O)O)(OCC)OC1=CC=CC=C1 TZTBGPOKQFYJOV-UHFFFAOYSA-N 0.000 description 1
- GBVJQAULALBKDU-UHFFFAOYSA-N (1-bromo-2-methoxyethyl) prop-2-enoate Chemical compound COCC(Br)OC(=O)C=C GBVJQAULALBKDU-UHFFFAOYSA-N 0.000 description 1
- NGDOLKDENPCYIS-UHFFFAOYSA-N (2-chlorocyclohexyl) prop-2-enoate Chemical compound ClC1CCCCC1OC(=O)C=C NGDOLKDENPCYIS-UHFFFAOYSA-N 0.000 description 1
- MRIKSZXJKCQQFT-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) prop-2-enoate Chemical compound OCC(C)(C)COC(=O)C=C MRIKSZXJKCQQFT-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- MPUZDPBYKVEHNH-BQYQJAHWSA-N (e)-2-methyl-3-phenylprop-2-enamide Chemical compound NC(=O)C(/C)=C/C1=CC=CC=C1 MPUZDPBYKVEHNH-BQYQJAHWSA-N 0.000 description 1
- IQBLWPLYPNOTJC-FPLPWBNLSA-N (z)-4-(2-ethylhexoxy)-4-oxobut-2-enoic acid Chemical compound CCCCC(CC)COC(=O)\C=C/C(O)=O IQBLWPLYPNOTJC-FPLPWBNLSA-N 0.000 description 1
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1 -dodecene Natural products CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 1
- SVHAMPNLOLKSFU-UHFFFAOYSA-N 1,2,2-trichloroethenylbenzene Chemical compound ClC(Cl)=C(Cl)C1=CC=CC=C1 SVHAMPNLOLKSFU-UHFFFAOYSA-N 0.000 description 1
- AGOFZVAQMFVJEQ-UHFFFAOYSA-N 1,2,3,4,5-pentachloro-6-ethenylbenzene Chemical compound ClC1=C(Cl)C(Cl)=C(C=C)C(Cl)=C1Cl AGOFZVAQMFVJEQ-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- DWCNNQOORRREID-UHFFFAOYSA-N 1,2-dichloroethane;methanol Chemical compound OC.ClCCCl DWCNNQOORRREID-UHFFFAOYSA-N 0.000 description 1
- HNKNCTHACSPOPO-UHFFFAOYSA-N 1-(azepan-1-yl)prop-2-en-1-one Chemical compound C=CC(=O)N1CCCCCC1 HNKNCTHACSPOPO-UHFFFAOYSA-N 0.000 description 1
- KXJGSNRAQWDDJT-UHFFFAOYSA-N 1-acetyl-5-bromo-2h-indol-3-one Chemical compound BrC1=CC=C2N(C(=O)C)CC(=O)C2=C1 KXJGSNRAQWDDJT-UHFFFAOYSA-N 0.000 description 1
- XPXMCUKPGZUFGR-UHFFFAOYSA-N 1-chloro-2-(1,2,2-trichloroethenyl)benzene Chemical compound ClC(Cl)=C(Cl)C1=CC=CC=C1Cl XPXMCUKPGZUFGR-UHFFFAOYSA-N 0.000 description 1
- DNJRKFKAFWSXSE-UHFFFAOYSA-N 1-chloro-2-ethenoxyethane Chemical compound ClCCOC=C DNJRKFKAFWSXSE-UHFFFAOYSA-N 0.000 description 1
- HWCLMKDWXUGDKL-UHFFFAOYSA-N 1-ethenoxy-2-ethoxyethane Chemical compound CCOCCOC=C HWCLMKDWXUGDKL-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- NSOAQRMLVFRWIT-UHFFFAOYSA-N 1-ethenoxydecane Chemical compound CCCCCCCCCCOC=C NSOAQRMLVFRWIT-UHFFFAOYSA-N 0.000 description 1
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- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- POSICDHOUBKJKP-UHFFFAOYSA-N prop-2-enoxybenzene Chemical compound C=CCOC1=CC=CC=C1 POSICDHOUBKJKP-UHFFFAOYSA-N 0.000 description 1
- IBGXDQCATAOYOE-UHFFFAOYSA-N prop-2-enoyloxymethanesulfonic acid Chemical compound OS(=O)(=O)COC(=O)C=C IBGXDQCATAOYOE-UHFFFAOYSA-N 0.000 description 1
- CYFIHPJVHCCGTF-UHFFFAOYSA-N prop-2-enyl 2-hydroxypropanoate Chemical compound CC(O)C(=O)OCC=C CYFIHPJVHCCGTF-UHFFFAOYSA-N 0.000 description 1
- AXLMPTNTPOWPLT-UHFFFAOYSA-N prop-2-enyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC=C AXLMPTNTPOWPLT-UHFFFAOYSA-N 0.000 description 1
- ZQMAPKVSTSACQB-UHFFFAOYSA-N prop-2-enyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCC=C ZQMAPKVSTSACQB-UHFFFAOYSA-N 0.000 description 1
- HAFZJTKIBGEQKT-UHFFFAOYSA-N prop-2-enyl hexadecanoate Chemical compound CCCCCCCCCCCCCCCC(=O)OCC=C HAFZJTKIBGEQKT-UHFFFAOYSA-N 0.000 description 1
- HPCIWDZYMSZAEZ-UHFFFAOYSA-N prop-2-enyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC=C HPCIWDZYMSZAEZ-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035936 sexual power Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 1
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- HSVFKFNNMLUVEY-UHFFFAOYSA-N sulfuryl diazide Chemical class [N-]=[N+]=NS(=O)(=O)N=[N+]=[N-] HSVFKFNNMLUVEY-UHFFFAOYSA-N 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- GPRLSGONYQIRFK-MNYXATJNSA-N triton Chemical compound [3H+] GPRLSGONYQIRFK-MNYXATJNSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
本発明は感光性平版印刷版の製造方法に関し、
特に、インキ受容性層を水媒体で塗布する感光性
平版印刷版の製造方法に関するものである。
感光物に重クロム酸塩を使い、卵白、アルブミ
ン、ポリビニルアルコール等の水溶性コロイド物
質を組合せた初期の感光性平版印刷版の塗布溶媒
は必然的に水が使われていたが、得られた画像は
親水性であり、そのままでは油性インキを受付け
ない。そのため、露光後、現像前に脂肪性インキ
を全面塗布してから未露光域を除去するサーフエ
ス版(ザ グラフイツク アーツ テクニカル
フアウンデーシヨン(The Graphic Arts
Technical Foundation).,Inc.発行の ザ リソ
グラフアーズ マニユアル(The Lithographers
Manual) の第10章第26ページ、No.6に記載の
サーフエス プレート(Surface Plates)参
照)、未露光域を除去した後、疎水性樹脂を有機
溶媒から塗布し、乾燥後、画像露光により形成さ
れたレジストを剥離する平凹版(ザ リソグラフ
アーズ マニユアル(The Lithographers
Manual) 第10章第28ページ、No.7のデイープ
エツチ プレート(Deep Etch Plates参照。)
等、画像域を親油性に換えるための後処理が必要
であり、そのための工夫がなされている。その後
の技術的進歩は疎水性感光物の使用を可能にし
た。この技術は露光、現像のみで直接疎水性画像
を得ることを可能にし、同時に安定性も改良され
た。特に高湿度条件下での安定性が飛躍的に向上
したためマスプロダクトされるに至り、プレセン
シタイズド平版印刷版(以下、PS版と呼ぶ)と
して、急速に普及した。
この種のPS版の代表的なものは、感光性ジア
ゾ化合物と樹脂との混合物からなる感光層を支持
体上に設けたものであつて、後者の樹脂は、当該
PS版を画像露光および現像して得られる平版印
刷版の画像部(水を反撥して印刷インクを受容す
る領域)がより高い感脂性(印刷インクを受容す
る性能。)をもつようにする為と共に、当該平版
印刷版がより多くの印刷物を与える様にする為に
用いられるものである。所で、感光層は適当な溶
媒から塗布される関係上、この樹脂も有機溶剤可
溶性のものでなければならず、しかもその有機溶
剤が感光性ジアゾ化合物をも溶解し得るものでな
ければならない。また、この樹脂は、感光性ジア
ゾ化合物と混合された場合に、その感光性ジアゾ
化合物の安定性を阻害するものであつてはならな
い。しかし乍ら、これらのすべての要求を満足す
るような樹脂は、現実には見い出すことが困難で
あり、例えば画像部の感脂性の向上が充分達成さ
れない様な樹脂、あるいは感光性ジアゾ化合物の
安定性を幾分悪くするような樹脂を使用している
のが現実である。
一方、特公昭37―11558号公報には、支持体上
に順に感光性ジアゾ化合物の層および疎水性、溶
媒軟化性、現像液透過性かつ活性光線透過性の樹
脂層を設けたPS版が開示されている。しかし、
このような構成のPS版においても樹脂層に使用
される樹脂に制限がある上に、樹脂層を透過する
ような現像液でなければならないので、使用し得
る現像液も特別な組成のものとなつてしまう。
更に、上記のいづれの態様においても、塗布溶
媒として有機溶剤を使用しなければならない為、
有機溶媒の毒性、爆発性等の問題を考慮しなけれ
ばならず、製造設備などに多大の投資を必要とし
た。
他方、特開昭52―2520号公報には、重合体エマ
ルジヨンに水溶性ジアゾ化合物を加えたものを支
持体上に塗布して感光層を設けたPS版が開示さ
れており、この場合には有機溶媒を使用すること
なくPS版を製造することができる。しかし乍
ら、このPS版は湿気の影響を受け易く、従つ
て、貯蔵安定性(保存後のPS版が製造直後のPS
版の性能を維持している性質)が悪かつた。
従つて、本発明の目的は、貯蔵安定性の優れた
感光性平版印刷版を提供することである。
本発明の他の目的は、感脂性の高い画像部を有
する平版印刷版が得られる感光性平版印刷版を提
供することである。
本発明の他の目的は、特別な組成の現像液では
ない通常の現像液で現像することができ、しかも
感脂性の高い画像部を有する平版印刷版が得られ
る感光性平版印刷版を提供することである。
本発明の別の目的は、感脂性の高い画像部を与
える感光性平版印刷版の塗布層を水媒体から塗布
することができる感光性平版印刷版の製造方法を
提供することである。
上記の諸目的は(a)親水性表面を持つ支持体と、
(2)該親水性表面に塗布された感光性ジアゾ化合物
の層と(3)該感光性ジアゾ化合物の層と接するイン
キ受容性層からなり、該インキ受容性層を親油性
樹脂の水媒体エマルジヨンから塗布した感光性平
版印刷版により達成された。
本発明に使用される支持体は、寸度的に安定な
板状物である。かかる寸度的に安定な板状物とし
ては、従来印刷版の支持体として使用されたもの
が含まれ、それらは本発明に好適に使用すること
ができる。かかる支持体としては、紙、プラスチ
ツクス(例えばポリエチレン、ポリプロピレン、
ポリスチレンなど)がラミネートされた紙、例え
ばアルミニウム(アルミニウム合金も含む。)、亜
鉛、銅などのような金属の板、例えば二酢酸セル
ロース、三酢酸セルロース、プロピオン酸セルロ
ース、酪酸セルロース、酢酸酪酸セルロース、硝
酸セルロース、ポリエチレンテレフタレート、ポ
リエチレン、ポリスチレン、ポリプロピレン、ポ
リカーボネート、ポリビニルアセタールなどのよ
うなプラスチツクのフイルム、上記の如き金属が
ラミネートもしくは蒸着された紙もしくはプラス
チツクフイルムなどが含まれる。これらの支持体
のうち、アルミニウム板は寸度的に著しく安定で
あり、しかも安価であるので特に好ましい。更
に、特公昭48―18327号公報に記されているよう
なポリエチレンテレフタレートフイルム上にアル
ミニウムシートが結合された複合体シートも好ま
しい。
支持体の表面は親水性でなければならない。本
発明において、親水性表面とは印刷板を平版印刷
機に取付け、標準的な条件で印刷を行つた際、湿
し水で表面が濡れて、インキを反撥する表面のこ
とを意味する。
かかる親水性表面を設けるには、種々の方法が
ある。
例えばプラスチツクの表面を有する支持体の場
合には、化学的処理、放電処理、火焔処理、紫外
線処理、高周波処理、グロー放電処理、活性プラ
ズマ処理、レーザー処理などの所謂表面処理方法
(たとえば米国特許第2764520号、3497407号
3145242号、3376208号、3072483号、3475193号、
3360448号、英国特許第788365号明細書など)と
一旦これらの表面処理後、該プラスチツクに下塗
層を塗布する方法とがある。
塗布方法としても色々工夫が行われており一層
としてプラスチツクによく接着し、かつ溶解性の
よい疎水性の樹脂層を塗布し、二層として親水性
の樹脂層を塗布する重層法と同一重合体中に疎水
基と親水基を含有する樹脂層を塗布する単層法と
がある。
また金属、特にアルミニウムの表面を有する支
持体の場合には、砂目立て処理、珪酸ソーダ、弗
化ジルコニウム酸カリウム、燐酸塩等の水溶液へ
の浸漬処理、あるいは陽極酸化処理などの表面処
理がなされていることが好ましい。また、米国特
許第2714066号明細書に記載されている如く、砂
目立てしたのちに珪酸ナトリウム水溶液に浸漬処
理されたアルミニウム板、特公昭47―5125号公報
に記載されているようにアルミニウム板を陽極酸
化処理したのちに、アルカリ金属珪酸塩の水溶液
に浸漬処理したものも好適に使用される。上記陽
極酸化処理は、例えば、燐酸、クロム酸、硫酸、
硼酸等の無機酸、若しくは、蓚酸、スルフアミン
酸等の有機酸またはこれらの塩の水溶液又は非水
溶液の単独又は二種以上を組み合わせた電解液中
でアルミニウム板を陽極として電流を流すことに
より実施される。
また、米国特許第3658662号明細書に記載され
ているようなシリケート電着も有効である。
更には特公昭46―27481号公報、特開昭52―
58602号公報、特開昭52―30503号公報に開示され
ているような電解グレインを施した支持体と、上
記陽極酸化処理及び珪酸ソーダ処理を組合せた表
面処理も有用である。これらの親水化処理は、支
持体の表面を親水性とするために施される以外
に、その上に設けられる感光性組成物との有害な
反応を防ぐため、更には、感光層との密着性の向
上等のために施されるものである。
本発明で使用される感光性ジアゾ化合物として
は米国特許第2063631号及び同第2667415号の各明
細書に開示されているジアゾニウム塩とアルドー
ルやアセタールのような反応性カルボニル基を含
有する有機縮合剤との反応生成物であるジフエニ
ルアミン―P―ジアゾニウム塩とフオルムアルデ
ヒドとの縮合生成物(所謂感光性ジアゾ樹脂)が
好適に用いられる。この他の有用な縮合ジアゾ化
合物は特公昭49―48001号、同49―45322号、同49
―45323号の各公報等に開示されている。これら
の型の感光性ジアゾ化合物は通常水溶性無機塩の
形で得られ、従つて水溶液から塗布することがで
きる。又、これらの水溶液ジアゾ化合物を特公昭
47―1167号公報に開示された方法により1個又は
それ以上のフエノール性水酸基、スルホン酸基又
はその両者を有する芳香族又は脂肪族化合物と反
応させ、その反応生成物である実質的に水不溶性
の感光性ジアゾ樹脂を使用することもできる。
フエノール性水酸基を有する反応物の例として
は、ヒドロキシベンゾフエノン、4,4―ビス
(4′―ヒドロキシフエニル)ペンタン酸、レゾル
シノール、又はジレゾルシノールのようなジフエ
ノール酸であつて、これらは更に置換基を有して
いてもよい。ヒドロキシベンゾフエノンには2,
4―ジヒドロキシベンゾフエノン、2―ヒドロキ
シ―4―メトキシベンゾフエノン、2,2′―ジヒ
ドロキシ―4,4′―ジメトキシベンゾフエノン又
は2,2′,4,4′―テトラヒドロキシベンゾフエ
ノンが含まれる。好ましいスルホン酸としては、
例えばベンゼン、トルエン、キシレン、ナフタリ
ン、フエノール、ナフトールおよびベンゾフエノ
ン等のスルホン酸のような芳香族スルホン酸、又
はそれ等の可溶性塩類、例えば、アンモニウム及
びアルカリ金属塩が例示できる。スルホン酸基含
有化合物は、一般に低級アルキル、ニトロ基、ハ
ロ基、及び/又はもう一つのスルホン酸基で置換
されていてもよい。このような化合物の好ましい
ものとしては、ベンゼンスルホン酸、トルエンス
ルホン酸、ナフタリンスルホン酸、2,5―ジメ
チルベンゼンスルホン酸、ベンゼンスルホン酸ナ
トリウム、ナフタリン―2―スルホン酸、1―ナ
フトール―2(又は4)―スルホン酸、2,4―
ジニトロ―1―ナフトール―7―スルホン酸、2
―ヒドロキシ―4―メトキシベンゾフエノン―5
―スルホン酸、m―(P′―アニリノフエニルア
ゾ)ベンゼンスルホン酸ナトリウム、アリザリン
スルホン酸、0―トルイジン―m―スルホン酸及
びエタンスルホン酸等があげられる。アルコール
のスルホン酸エステルとその塩類も又有用であ
る。このような化合物は通常アニオン性界面活性
剤として容易に入手できる。その例としてはラウ
リルサルフエート、アルキルアリールサルフエー
ト、P―ノニルフエニルサルフエート、2―フエ
ニルエチルサルフエート、イソオクチルフエノキ
シジエトキシエチルサルフエート等のアンモニウ
ム又はアルカリ金属塩があげられる。
これ等の実質的に水不溶性の感光性ジアゾ化合
物は水溶性の感光性ジアゾ化合物と前記の芳香族
又は脂肪族化合物の水溶液を好ましくはほぼ等量
となる量で混合することによつて沈澱として単離
される。得られた実質的に水不溶性の感光性ジア
ゾ化合物はメチルセロソルブ、ジメチルフオルム
アミド、メタノール―エチレンジクロライド又は
それらを混合した溶媒に溶かして塗布できる。塗
布の方式は水溶性の感光性ジアゾ化合物と同様特
に限定はなく、ローラーコート、グラビアコー
ト、デツプコート等の方式が使える。塗布量は約
1〜約500mg/m2の範囲で可能であるが、好まし
い範囲は10〜100mg/m2である。この感光性ジア
ゾ化合物の層の上に、これと接して設けられるイ
ンキ受容性層は、親油性樹脂の水媒体エマルシヨ
ンから塗布することにより設けられる。このエマ
ルシヨンは皮膜形成能を有し、得られた皮膜は強
靭で耐摩耗性であり、印刷インキを受容しやすい
疎水性表面を形成し、活性光線透過性で且つ、前
記感光性ジアゾ樹脂の活性光線による光分解領域
に於いて、該エマルシヨンから形成された皮膜の
支持体に対する接着力が、現像液中に於いて未露
光域より強く、画像露光を与えた版面を現像液中
でこすつたとき、露光域がそのまま残り、未露光
域がきれいに除去される性質を有するエマルシヨ
ンが望ましい。該エマルシヨンとしては親油性樹
脂のラテツクスが利用できる。
本発明に有用なラテツクスは下記A群から選ば
れたモノマーの単一重合体又は下記A群から選ば
れた2以上のモノマーの共重合体、或いはA群及
びB群より選ばれたそれぞれ少なくとも一種のモ
ノマーの共重合によつて得られるポリマーラテツ
クス、或いはそれらにC群の少なくとも一種のモ
ノマーを組合せたポリマーラテツクスである。
A群:下記一般式で表わされるモノマー
〔式中、
X:水素原子、メチル基又は―COOR1基
Y:水素原子、メチル基又は―
(CH2)oCOOR2ハロゲン、ニトリル、
Z:アリール基、―COOR3、―OR3、
The present invention relates to a method for producing a photosensitive lithographic printing plate,
In particular, the present invention relates to a method for producing a photosensitive lithographic printing plate in which an ink-receptive layer is coated with an aqueous medium. Early photosensitive lithographic printing plates, which used dichromate as a photosensitive material and combined water-soluble colloidal substances such as egg white, albumin, and polyvinyl alcohol, inevitably used water as the coating solvent, but The image is hydrophilic and will not accept oil-based ink as it is. For this reason, after exposure and before development, a greasy ink is applied to the entire surface and the unexposed areas are removed.
Foundation (The Graphic Arts)
Technical Foundation). The Lithographers Manual, published by , Inc.
After removing the unexposed area, a hydrophobic resin is applied from an organic solvent, and after drying, it is formed by image exposure. Plano-intaglio plate for stripping off resist (The Lithographers Manual)
Manual) Chapter 10, page 28, No. 7 Deep Etch Plates (see Deep Etch Plates)
etc., post-processing is required to make the image area lipophilic, and efforts have been made to do so. Subsequent technological advances made possible the use of hydrophobic photoreceptors. This technology made it possible to directly obtain hydrophobic images by simply exposing and developing, and at the same time, the stability was improved. In particular, its stability under high humidity conditions was dramatically improved, which led to it becoming a mass product, and it quickly became popular as a presensitized lithographic printing plate (hereinafter referred to as PS plate). A typical PS plate of this type has a photosensitive layer made of a mixture of a photosensitive diazo compound and a resin provided on a support, and the latter resin is
To ensure that the image area (area that repels water and accepts printing ink) of a lithographic printing plate obtained by image exposure and development of a PS plate has higher oil sensitivity (ability to accept printing ink). In addition, the lithographic printing plate is used to produce more printed matter. Since the photosensitive layer is coated from a suitable solvent, the resin must also be soluble in an organic solvent, and the organic solvent must also be capable of dissolving the photosensitive diazo compound. Moreover, this resin must not inhibit the stability of the photosensitive diazo compound when mixed with the photosensitive diazo compound. However, in reality, it is difficult to find a resin that satisfies all of these requirements. The reality is that resins are used that have somewhat poor properties. On the other hand, Japanese Patent Publication No. 37-11558 discloses a PS plate in which a photosensitive diazo compound layer and a hydrophobic, solvent-softening, developer-permeable, and actinic ray-transparent resin layer are sequentially provided on a support. has been done. but,
Even in PS plates with this structure, there are restrictions on the resin that can be used in the resin layer, and the developer must be able to pass through the resin layer, so the developer that can be used must also have a special composition. I get used to it. Furthermore, in any of the above embodiments, an organic solvent must be used as a coating solvent;
Issues such as the toxicity and explosiveness of organic solvents had to be taken into consideration, and a large amount of investment was required in manufacturing equipment. On the other hand, JP-A-52-2520 discloses a PS plate in which a photosensitive layer is provided by coating a polymer emulsion with a water-soluble diazo compound on a support. PS plates can be manufactured without using organic solvents. However, this PS plate is easily affected by moisture, and therefore its storage stability (PS plate after storage is different from PS plate immediately after manufacture).
The quality of maintaining the performance of the plate) was poor. Therefore, an object of the present invention is to provide a photosensitive lithographic printing plate with excellent storage stability. Another object of the present invention is to provide a photosensitive lithographic printing plate from which a lithographic printing plate having image areas with high oil sensitivity can be obtained. Another object of the present invention is to provide a photosensitive lithographic printing plate which can be developed with a normal developer rather than a developer with a special composition, and which can yield a lithographic printing plate having a highly oil-sensitive image area. That's true. Another object of the present invention is to provide a method for producing a photosensitive lithographic printing plate, in which a coating layer of the photosensitive lithographic printing plate giving a highly oil-sensitive image area can be coated from an aqueous medium. The above objects are: (a) a support having a hydrophilic surface;
(2) a layer of a photosensitive diazo compound coated on the hydrophilic surface; and (3) an ink receptive layer in contact with the layer of the photosensitive diazo compound, and the ink receptive layer is an aqueous emulsion of a lipophilic resin. This was achieved with a photosensitive lithographic printing plate coated from The support used in the present invention is a dimensionally stable plate. Such dimensionally stable plate-like materials include those conventionally used as supports for printing plates, and they can be suitably used in the present invention. Such supports include paper, plastics (e.g. polyethylene, polypropylene,
paper laminated with polystyrene (e.g., polystyrene), sheets of metal such as aluminum (including aluminum alloys), zinc, copper, etc., e.g., cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, Included are plastic films such as cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc., and paper or plastic films laminated or vapor-deposited with metals such as those mentioned above. Among these supports, aluminum plates are particularly preferred because they are extremely dimensionally stable and inexpensive. Furthermore, a composite sheet in which an aluminum sheet is bonded to a polyethylene terephthalate film as described in Japanese Patent Publication No. 18327/1984 is also preferred. The surface of the support must be hydrophilic. In the present invention, a hydrophilic surface refers to a surface that becomes wet with dampening water and repels ink when the printing plate is mounted on a lithographic printing machine and printed under standard conditions. There are various ways to provide such a hydrophilic surface. For example, in the case of supports with plastic surfaces, so-called surface treatment methods such as chemical treatment, electric discharge treatment, flame treatment, ultraviolet treatment, high frequency treatment, glow discharge treatment, active plasma treatment, laser treatment (for example, US Pat. No. 2764520, No. 3497407
No. 3145242, No. 3376208, No. 3072483, No. 3475193,
3360448, British Patent No. 788365, etc.) and a method in which a subbing layer is applied to the plastic after the surface treatment. A variety of coating methods have been developed, including the multilayer method in which a hydrophobic resin layer that adheres well to plastic and has good solubility is applied as one layer, and a hydrophilic resin layer is applied as a second layer using the same polymer. There is a single layer method in which a resin layer containing hydrophobic groups and hydrophilic groups is applied. In addition, in the case of a support having a metal surface, especially aluminum, surface treatments such as graining treatment, immersion treatment in an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate, etc., or anodization treatment are performed. Preferably. In addition, as described in U.S. Patent No. 2,714,066, an aluminum plate which has been grained and then immersed in a sodium silicate aqueous solution, and an aluminum plate as described in Japanese Patent Publication No. 47-5125, can be used as an anode. Those obtained by oxidation treatment and then immersion treatment in an aqueous solution of an alkali metal silicate are also suitably used. The above anodic oxidation treatment can be performed using, for example, phosphoric acid, chromic acid, sulfuric acid,
It is carried out by passing an electric current through an aluminum plate as an anode in an electrolytic solution consisting of an aqueous solution or a non-aqueous solution of an inorganic acid such as boric acid, an organic acid such as oxalic acid or sulfamic acid, or a salt thereof, or a combination of two or more thereof. Ru. Also effective is silicate electrodeposition as described in US Pat. No. 3,658,662. Furthermore, Japanese Patent Publication No. 1974-27481, Japanese Patent Application Publication No. 1972-
Also useful is a surface treatment that combines a support coated with electrolytic grains with the above-mentioned anodic oxidation treatment and sodium silicate treatment as disclosed in JP-A-58602 and JP-A-52-30503. These hydrophilic treatments are performed not only to make the surface of the support hydrophilic, but also to prevent harmful reactions with the photosensitive composition provided thereon, and to improve adhesion with the photosensitive layer. It is performed for purposes such as improving sexual performance. The photosensitive diazo compounds used in the present invention include diazonium salts disclosed in U.S. Pat. A condensation product (so-called photosensitive diazo resin) of diphenylamine-P-diazonium salt, which is a reaction product with formaldehyde, is preferably used. Other useful condensed diazo compounds are Japanese Patent Publication Nos. 49-48001, 49-45322, 49
- Disclosed in various publications such as No. 45323. These types of photosensitive diazo compounds are usually obtained in the form of water-soluble inorganic salts and can therefore be coated from aqueous solution. In addition, these aqueous diazo compounds were
A substantially water-insoluble reaction product obtained by reacting with an aromatic or aliphatic compound having one or more phenolic hydroxyl groups, sulfonic acid groups, or both by the method disclosed in Publication No. 47-1167. It is also possible to use photosensitive diazo resins. Examples of reactants having phenolic hydroxyl groups include diphenolic acids such as hydroxybenzophenone, 4,4-bis(4'-hydroxyphenyl)pentanoic acid, resorcinol, or diresorcinol, which may further include It may have a substituent. Hydroxybenzophenone has 2,
4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone or 2,2',4,4'-tetrahydroxybenzophenone is included. Preferred sulfonic acids include:
Examples include aromatic sulfonic acids such as sulfonic acids such as benzene, toluene, xylene, naphthalene, phenol, naphthol and benzophenone, or soluble salts thereof, such as ammonium and alkali metal salts. Sulfonic acid group-containing compounds may generally be substituted with lower alkyl, nitro groups, halo groups, and/or another sulfonic acid group. Preferred examples of such compounds include benzenesulfonic acid, toluenesulfonic acid, naphthalenesulfonic acid, 2,5-dimethylbenzenesulfonic acid, sodium benzenesulfonate, naphthalene-2-sulfonic acid, 1-naphthol-2 (or 4)-Sulfonic acid, 2,4-
Dinitro-1-naphthol-7-sulfonic acid, 2
-Hydroxy-4-methoxybenzophenone-5
-sulfonic acid, m-(P'-anilinophenylazo)benzenesulfonic acid sodium, alizarin sulfonic acid, 0-toluidine-m-sulfonic acid and ethanesulfonic acid. Sulfonic esters of alcohols and their salts are also useful. Such compounds are usually readily available as anionic surfactants. Examples include ammonium or alkali metal salts such as lauryl sulfate, alkylaryl sulfate, P-nonylphenyl sulfate, 2-phenylethyl sulfate, isooctylphenoxydiethoxyethyl sulfate. These substantially water-insoluble photosensitive diazo compounds can be precipitated by mixing a water-soluble photosensitive diazo compound and an aqueous solution of the aromatic or aliphatic compound, preferably in approximately equal amounts. isolated. The obtained substantially water-insoluble photosensitive diazo compound can be applied by dissolving it in a solvent such as methyl cellosolve, dimethyl formamide, methanol-ethylene dichloride, or a mixture thereof. As with the water-soluble photosensitive diazo compound, the coating method is not particularly limited, and methods such as roller coating, gravure coating, and dip coating can be used. Coating amounts can range from about 1 to about 500 mg/ m2 , with a preferred range of 10 to 100 mg/ m2 . The ink-receptive layer provided on and in contact with this layer of photosensitive diazo compound is provided by coating from an aqueous emulsion of a lipophilic resin. This emulsion has a film-forming ability, and the resulting film is tough and wear-resistant, forms a hydrophobic surface that easily accepts printing ink, is transparent to actinic rays, and is highly active of the photosensitive diazo resin. In the region of photolysis by light, the adhesion of the film formed from the emulsion to the support is stronger in the developer than in the unexposed region, and when the image-exposed plate is rubbed in the developer. It is desirable to use an emulsion that has the property that exposed areas remain intact and unexposed areas are removed cleanly. As the emulsion, a lipophilic resin latex can be used. The latex useful in the present invention is a homopolymer of monomers selected from the following Group A, a copolymer of two or more monomers selected from the following Group A, or at least one type of each of the monomers selected from Group A and Group B. These are polymer latexes obtained by copolymerization of monomers, or polymer latexes obtained by combining them with at least one monomer of group C. Group A: Monomers represented by the following general formula [In the formula, X: hydrogen atom, methyl group or -COOR 1 group Y: hydrogen atom, methyl group or -
(CH 2 ) o COOR 2 halogen, nitrile, Z: aryl group, -COOR 3 , -OR 3 ,
【式】―CONR3、ハロゲン、ニトリル
R1,R2,R3:これらは同じでも異つていても
よく、脂肪族基または芳香族基
n:0〜3の整数〕
B群:遊離のカルボン酸基、スルホン酸基、もし
くはリン酸基またはその塩を少くとも一つ有す
るエチレン系モノマー。
該カルボン酸のヒドロキシアルキルエステル或
いはアミド。
C群:シビニル系モノマー。
A群の一般式中、R1〜R3で代表される基のう
ち、脂肪族基は直接または分岐アルキル基(環状
のものも含む)および置換アルキル基を含む。ア
ルキル基の炭素数としては、1〜12が好ましい。
置換アルキル基の置換基としては、アリール
基、アリーロキシ基、ハロゲン原子、シアノ基、
アシル基、アルキルカルボニルオキシ基、アリー
ルカルボニルオキシ基、アミノ基(置換アミノ基
も含み、置換基としてはアルキル基、アリール基
など。置換基の数は1〜2である)、ヒドロキシ
基、アルコキシ基、ヘテロ環残基(ヘテロ原子と
しては、例えば酸素原子、窒素原子、硫黄原子な
ど。環の員数としては5〜6が好ましく、また環
は不飽和でも飽和でもよい。ヘテロ環には更に芳
香環が縮合していてもよい。)などを挙げること
ができる。
また、R1〜R3で代表される基のうち、アリー
ル基は、もちろん置換されたフエニル基やナフチ
ル基を含み、置換基としては、置換アルキル基に
関して先に挙げた置換基の他にアルキル基などを
挙げることができる。
A群のモノマーとしてはたとえばアクリル酸エ
ステル、メタクリル酸エステル、クロトン酸エス
テル、ビニルエステル、マレイン酸ジエステル、
フマル酸ジエステル、イタコン酸ジエステル、ス
チレン類などの単官能モノマーがあげられる。
更に、具体的なモノマーとしては、例えばメチ
ルアクリレート、エチルアクリレーート、n―プ
ロピルアクリレート、イソプロピルアクリレー
ト、n―ブチルアクリレート、イソブチルアクリ
レート、sec―ブチルアクリレート、アミルアク
リレート、ヘキシルアクリレート、2―エチルヘ
キシルアクリレート、オクチルアクリレート、
tert―オクチルアクリレート、2―フエノキシエ
チルアクリレート、2―クロロエチルアクリレー
ト、2―ブロモエチルアクリレート、4―クロロ
ブチルアクリレート、シアノエチルアクリレー
ト、2―アセトキシエチルアクリレート、ジメチ
ルアミノエチルアクリレート、ベンジルアクリレ
ート、メトキシベンジルアクリレート、2―クロ
ロシクロヘキシルアクリレート、シクロヘキシル
アクリレート、フルフリルアクリレート、テトラ
ヒドロフルフリルアクリレート、フエニルアクリ
レート、5―ヒドロキシペンチルアクリレート、
2,2―ジメチル―3―ヒドロキシプロピルアク
リレート、2―メトキシエチルアクリレート、3
―メトキシブチルアクリレート、2―エトキシエ
チルアクリレート、2―iso―プロポキシエチル
アクリレート、2―ブトキシエチルアクリレー
ト、2―(2―メトキシエトキシ)エチルアクリ
レート、2―(2―ブトキシエトキシ)エチルア
クリレート、ω―メトキシポリエチレングリコー
ルアクリレート(付加モル数n=9)、1―ブロ
モ―2―メトキシエチルアクリレート、1,1―
ジクロロ―2―エトキシエチルアクリレート、メ
チルメタクリレート、エチルメタクリレート、n
―プロピルメタクリレート、イソプロピルメタク
リレート、n―ブチルメタクリレート、イソブチ
ルメタクリレート、sec―ブチルメタクリレー
ト、アミルメタクリレート、ヘキシルメタクリレ
ート、シクロヘキシルメタクリレート、ベンジル
メタクリレート、クロロベンジルメタクリレー
ト、オクチルメタクリレート、N―エチル―N―
フエニルアミノエチルメタクリレート、2―(3
―フエニルプロピルオキシ)エチルメタクリレー
ト、ジメチルアミノフエノキシエチルメタクリレ
ート、フルフリルメタクリレート、テトラヒドロ
フルフリルメタクリレート、フエニルメタクリレ
ート、クレジルメタクリレート、ナフチルメタク
リレート、2―ヒドロキシエチルメタクリレー
ト、3―ヒドロキシプロピルメタクリレート、4
―ヒドロキシブチルメタクリレート、トリエチレ
ングリコールモノメタクリレート、ジプロピレン
グリコールモノメタクリレート、2―メトキシエ
チルメタクリレート、3―メトキシブチルメタク
リレート、2―アセトキシエチルメタクリレー
ト、アセトアセトキシエチルメタクリレート、2
―エトキシエチルメタクリレート、2―iso―プ
ロポキシエチルメタクリレート、2―ブトキシエ
チルメタクリレート、2―(2―メトキシエトキ
シ)エチルメタクリレート、2―(2―エトキシ
エトキシ)エチルメタクリレート、2―(2―ブ
トキシエトキシ)エチルメタクリレート、ω―メ
トキシポリエチレングリコールメタクリレート
(付加モル数n=6)、ビニルアセテート、ビニル
プロピオネート、ビニルブチレート、ビニルイソ
ブチレート、ビニルジメチルプロピオネート、ビ
ニルエチルブチレート、ビニルバレレート
(vinylvalerate)、ビニルカプロエート
(vinylcaproate)、ビニルクロルアセテート、ビ
ニルジクロルアセテート、ビニルメトキシアセテ
ート、ビニルブトキシアセテート、ビニルフエニ
ルアセテート、ビニルアセトアセテート、ビニル
ラクテート、ビニル―β―フエニルブチレート、
ビニルシクロヘキシルカルボキシレート、安息香
酸ビニル、サリチル酸ビニル、クロル安息香酸ビ
ニル、テトラクロル安息香酸ビニル、ナフトエ酸
ビニル、スチレン、メチルスチレン、ジメチルス
チレン、トリメチルスチレン、エチルスチレン、
ジエチルスチレン、イソプロピルスチレン、ブチ
ルスチレン、ヘキシルスチレン、シクロヘキシル
スチレン、デシルスチレン、ベンジルスチレン、
クロルメチルスチレン、トリフルオルメチルスチ
レン、エトキシメチルスチレン、アセトキシメチ
ルスチレン、メトキシスチレン、4―メトキシ―
3―メチルスチレン、ジメトキシスチレン、クロ
ルスチレン、ジクロルスチレン、トリクロルスチ
レン、テトラクロルスチレン、ペンタクロルスチ
レン、ブロムスチレン、ジブロムスチレン、ヨー
ドスチレン、フルオルスチレン、トリフルオルス
チレン、2―ブロム―4―トリフルオルメチルス
チレン、4―フルオル―3―トリフルオルメチル
スチレン、ビニル安息香酸メチルエステル、クロ
トン酸ブチル、クロトン酸ヘキシル、グリセリン
モノクロトネート、イタコン酸ジメチル、イタコ
ン酸ジエチル、イタコン酸ジブチル、マレイン酸
ジエチル、マレイン酸ジメチル、マレイン酸ジブ
チル、フマル酸ジエチル、フマル酸ジヘキシル、
フマル酸ジブチルメチルアクリルアミド、エチル
アクリルアミド、プロピルアクリルアミド、イソ
プロピルアクリルアミド、ブチルアクリルアミ
ド、tert―ブチルアクリルアミド、ヘプチルアク
リルアミド、tert―オクチルアクリルアミド、シ
クロヘキシルアクリルアミド、ベンジルアクリル
アミド、ヒドロキシメチルアクリルアミド、メト
キシエチルアクリルアミド、ジメチルアミノエチ
ルアクリルアミド、ヒドロキシエチルアクリルア
ミド、フエニルアクリルアミド、ヒドロキシフエ
ニルアクリルアミド、トリルアクリルアミド、ナ
フチルアクリルアミド、ジメチルアクリルアミ
ド、ジエチルアクリルアミド、ジブチルアクリル
アミド、ジイソブチルアクリルアミド、N―
(1,1―ジメチル―3―オキソブチル)アクリ
ルアミド、メチルベンジルアクリルアミド、ベン
ジルオキシエチルアクリルアミド、β―シアノエ
チルアクリルアミド、アクリロイルモルホリン、
N―メチル―N―アクリロイルピペラジン、N―
アクリロイルピペリジン、N―(1,1―ジメチ
ル―3―ヒドロキシブチル)アクリルアミド、N
―β―モルホリノエチルアクリルアミド、N―ア
クリロイルヘキサメチレンイミン、N―ヒドロキ
シエチル―N―メチルアクリルアミド、N―2―
アセトアミドエチル―N―アセチルアクリルアミ
ド、メチルメタクリルアミド、tert―ブチルメタ
クリルアミド、tert―オクチルメタクリルアミ
ド、ベンジルメタクリルアミド、シクロヘキシル
メタクリルアミド、フエニルメタクリルアミド、
ジメチルメタクリルアミド、ジエチルメタクリル
アミド、ジプロピルメタクリルアミド、ヒドロキ
シエチル―N―メチルメタクリルアミド、N―メ
チル―N―フエニルメタクリルアミド、N―エチ
ル―N―フエニルメタクリルアミド、メタクリル
ヒドラジンなど;
アリル化合物:たとえば、酢酸アリル、カプロ
ン酸アリル、カプリル酸アリル、ラウリン酸アリ
ル、パルミチン酸アリル、ステアリン酸アリル、
安息香酸アリル、アセト酢酸アリル、乳酸アリ
ル、アリルオキシエタノール、アリルブチルエー
テル、アリルフエニルエーテルなど;
ビニルエーテル類:たとえば、メチルビニルエ
ーテル、ブチルビニルエーテル、ヘキシルビニル
エーテル、オクチルビニルエーテル、デシルビニ
ルエーテル、エチルヘキシルビニルエーテル、メ
トキシエチルビニルエーテル、エトキシエチルビ
ニルエーテル、クロルエチルビニルエーテル、1
―メチル―2,2―ジメチルプロピルビニルエー
テル、2―エチルブチルビニルエーテル、ヒドロ
キシエチルビニルエーテル、ジエチレングリコー
ルビニルエーテル、ジメチルアミノエチルビニル
エーテルなど;
ビニルケトン類:例えば、メチルビニルケト
ン、フエニルビニルケトン、メトキシエチルビニ
ルケトンなど;
オレフイン類:例えば、ジシクロペンタジエ
ン、エチレン、プロピレン、1―ブテン、1―ペ
ンテン、1―ヘキセン、4―メチル―1―ペンテ
ン、1―ヘプテン、1―オクテン、1―デセン、
5―メチル―1―ノネン、5,5―ジメチル―1
―オクテン、4―メチル―1―ヘキセン、4,4
―ジメチル―1―ペンテン、5―メチル―1―ヘ
キセン、4―メチル―1―ヘプテン、5―メチル
―1―ヘプテン、4,4―ジメチル―1―ヘキセ
ン、5,5,6―トリメチル―1―ヘプテン、1
―ドデセンおよび1―オクタデセンなどの無置換
炭化水素、ブタジエン、イソプレン、クロロプレ
ン等のジエン化合物;
ビニル異節環化合物(複素原子としては例えば
窒素原子、酸素原子、硫黄原子など、また異節環
の員数としては例えば5〜6で、この環には更に
芳香環が結合していてもよい。):たとえば、N
―ビニルオキサゾリドン、ビニルピリジン、ビニ
ルピコリン、N―ビニルイミダゾール、N―ビニ
ル―2―メチルイミダゾール、N―ビニルトリア
ゾール、N―ビニル―3,5―ジメチルトリアゾ
ル、N―ビニルピロリドン、N―ビニル―3,5
―ジメチルピラゾール、N―ビニルカルバゾー
ル、ビニルチオフエン、N―ビニルサクシンイミ
ド、N―ビニルグルタルイミド、N―ビニルアジ
ピミド、N―ビニルピロリドン、N―ビニルピペ
リドン、N―ビニル―ε―カプロラクタム、N―
ビニル―2―ピリドン、など;
不飽和ニトリル類:例えばアクリロニトリル、
メタクロニトリルなど、ハロゲン化ビニル化合
物;塩化ビニル、塩化ビニリデン、臭化ビニル、
沃化ビニルなど。
B群のモノマーの具体例としては、たとえば次
の様な単官能モノマーがあげられる。
アクリル酸、メタクリル酸、イタコン酸、マレ
イン酸、イタコン酸モノアルキル(例えばイタコ
ン酸モノメチル、イタコン酸モノエチル、イタコ
ン酸モノブチルなど)、マレイン酸モノアルキル
(例えばマレイン酸モノメチル、マレイン酸モノ
エチル、マレイン酸モノブチル、マレイン酸モノ
オクチルなど)、シトラコン酸、スチレンスルホ
ン酸、ビニルベンジルスルホン酸、ビニルスルホ
ン酸、アクリロイルオキシアルキルスルホン酸、
(例えば、アクリロイルオキシメチルスルホン
酸、アクリロイルオキシエチルスルホン酸、アク
リロイルオキシプロピルスルホン酸、アクリロイ
ルオキシブチルスルホン酸など)、メタクリロイ
ルオキシアルキルスルホン酸(例えばメタクリロ
イルオキシメチルスルホン酸、メタクリロイルオ
キシエチルスルホン酸、メタクリロイルオキシプ
ロピルスルホン酸、メタクリロイルオキシブチル
スルホン酸など)、アクリルアミドアルキルスル
ホン酸(例えば2―アクリルアミド―2―メチル
エタンスルホン酸、2―アクリルアミド―2―メ
チルプロパンスルホン酸、2―アクリルアミド―
2―メチルブタンスルホン酸など)、メタクリル
アミドアルキルスルホン酸(例えば2―メタクリ
ルアミド―2―メチルエタンスルホン酸、2―メ
タクリルアミド―2―メチルプロパンスルホン
酸、2―メタクリルアミド―2―メチルブタンス
ルホン酸など)、アクリロイルオキシアルキルホ
スフエート(例えばアクリロイルオキシエチルホ
スフエート、3―アクリロイルオキシプロピルホ
スフエート、など)、メタクリロイルオキシアル
キルホスフエート(例えばメタクリロイルオキシ
エチルホスフエート、3―メタクリロイルオキシ
プロピルホスフエートなど)など。
また、前記の酸モノマー中のアルキル基として
は、例えば炭素数1〜8程度のものである。これ
らの酸はアルカリ金属イオン(好ましくはNa+、
K+)又はアンモニウムイオンの塩であつてもよ
い。
C群のモノマーの具体例としては、ポリオール
の不飽和エステル特にα―メチレンカルボン酸の
このようなエステル、例えばエチレンジ(メタ)
アクリレート、ジエチレングリコールジ(メタ)
アクリレート、グリセロールジ(メタ)アクリレ
ート、グリセロールトリ(メタ)アクリレート、
1,3―プロピレンジ(メタ)アクリレート、
1,4―シクロヘキサンジオール(メタ)アクリ
レート、1,4―ベンゼンジオールジ(メタ)ア
クリレート、ペンタエリスリトールテトラ(メ
タ)アクリレート、1,3―プロピレングリコー
ルジ(メタ)アクリレート、1,5―ペンタンジ
オールジ(メタ)アクリレート、トリメチロール
プロパントリ(メタ)アクリレート。不飽和アミ
ド、特にα―メチレンカルボン酸のアミド及び特
にα,ω―ジアミン及び酸素が中間に介在するω
―ジアミンのもの、例えばメチレンビス(メタ)
アクリルアミド、エチレンビス(メタ)アクリル
アミド、1,6―ヘキサメチレンビス(メタ)ア
クリルアミド及びジエチレントリアミントリス
(メタ)アクリルアミド、ジビニルサクシネー
ト、ジビニルアジペート、ジビニルフタレート、
ジビニルテレフタレート、ジビニルベンゼン―
1,3―ジスルホネート及びジビニルブタン―
1,4―ジスルホネートのようなビニルエステ
ル、ソルブアルデヒドすなわち2,4―ヘキサジ
エナールのような不飽和アルデヒド。
(メタ)アクリレート、(メタ)アクリルアミ
ドのような中性のα―メチレンカルボン酸ポリエ
ステル、ポリアミド及び(または)第1及び第2
アミノアルコール、アミノポリオールまたはポリ
アミノアルコールまたはポリオールのエステルア
ミド及び前記アルコールの類似誘導体、例えばβ
―メタクリルアミドエチル(メタ)アクリルアミ
ド、N―(β―ヒドロキシエチル)―β―(メタ
アクリルアミド)エチルアクリレート、N,N―
ビス(β―メタクリルオキシエチル)アクリルア
ミド、その他、ジビニルベンゼンやキシリレンジ
イソシアネートとヒドロキシエチル(メタ)アク
リレートからのウレタン化合物、例えば下記の化
学構造を有するようなウレタン化合物
のようなイソシアネートとヒドロキシアルキル化
合物からのウレタン化合物等が有用である。な
お、上記において、「(メタ)アクリレート」とは
「アクリレート」および「メタクリレート」の両
者を意味し、「(メタ)アクリルアミド」も同様の
事を意味する。ここで使用できるラテツクス重合
体は例えばプレパラテイブ メソツド オブ ポ
リマー ケミストリー インターサイエンス パ
ブリシヤーズ(Preparative Methods of
Polymer Chemistry,Interscience Publishers)
発行の216及び238ページに記載されている乳化重
合法に従つて合成することができる。一つの例と
しては次のとりである。1の三ツ口フラスコに
420mlの蒸留水を採り、メタ重亜硫酸カリウム
0.225gを添加し、撹拌して溶解したあと窒素パ
ージし、アクリロニトリ33.37g、塩化ビニリデ
ン145.3g、アクリル酸14.1g及びトリトン770
(界面活性剤)14.1gを添加し、過硫酸カリウム
0.45gを加えて、30℃の温度下に150r.p.mの回転
数で撹拌を行なつて反応させた。
ラテツクスの調製に於いて乳化重合法が利用で
きない樹脂、例えばホルマール樹脂又はブチラー
ル樹脂のようなアセタール樹脂、酢酸セルロー
ス、プロピオン酸セルロース、酪酸セルロース、
クロトン酸セルロースなどのセルロースエステ
ル、該エステル化合物とフタール酸、コハク酸、
セバチン酸、マレイン酸等のジカルボン酸との共
エステル化合物、メチルセルロース、エチルセル
ロース、プロピオセルロース、ブチルセルロー
ス、アリルセルロース、ベンジルセルロース、シ
クロヘキシルセルロース、シアノエチルセルロー
スなどのセルロースエーテル化合物、ポリエステ
ル、ポリアミド、ポリウレタンなどの縮合重合に
より生成する高分子化合物等も本発明に使用し得
る親油性樹脂として有用である。該化合物は特開
昭52―3653号公報に開示されている方法によりエ
マルジモンを調製することができる。
前記の共重合ラテツクスに於けるA群、B群、
C群の比率はラテツクスから塗布されたインキ受
容層の現像性、インキ受容性、耐刷性などの性能
を勘案して適宜に選択することができる。A群の
モノマー成分は主としてインキ受容性と耐刷性を
司どる。従つて、好ましいA群モノマー成分の量
は、対ラテツクスポリマー固形分で、20〜100重
量%が好ましく、特に60〜100重量%が好適であ
る。
B群モノマー成分の量はラテツクスポリマー固
形分の0〜25重量%が好ましく、特に0〜10重量
%が好適である。C群モノマー成分は0〜80重量
%が好ましく、特に0〜40重量%が好適である。
又、市販のエマルシヨン塗料、ラテツクス等を
利用することもできる。例えば、日本ペイント(株)
の酢酸ビニール樹脂エマルシヨン;ビニレツクス
5000、アクリル樹脂エマルシヨン;ビニレツクス
5000スーパー、アサヒペン(株)の水性塗料アサヒペ
ン、大日本塗料(株)のアクリル系エマルシヨン;ア
クローゼ#100、関西ペイント(株)の酢酸ビニール
エマルシヨン;ビニペイント、ヘキスト化成(株)の
酢酸ビニールエマルシヨン、アクリル樹脂エマル
シヨン;モビニール等が利用できる。但し、市販
のラテツクスを使用する場合は使われている乳化
安定剤の種類等により性能が左右されることを考
慮する必要がある。乳化重合法に依らない方法で
調製したラテツクスを含めてインキ受容性層を形
成するポリマーはポリマーの主鎖又は側鎖にヒド
ロキシル、アミノ、アミド、イミノ、イミド、ニ
トリロ、カルボキシル、スルホニル、スルホンオ
キシ、イソシアネート、ウレタン、アゾイミド、
アゾ、ヒドラジノ、カルバミド、カルバミル、エ
ポキシ、メルカプト、チオ及びスルホンアミド基
から選択される少なくとも1種の基を含むものが
好ましい。エマルシヨン中の親油性樹脂の粒子径
は特に制限はないが一般に約0.03〜10μの範囲内
に分布を持つものが使えるが、好ましくは0.05〜
5μ程度である。エマルシヨン粒子を形成するポ
リマーは高分子量のものからオリゴマー程度のも
の、分子量で約2000から約200000位のものまで使
うことができるしそれ等の混合系でもよい。又、
粒子を形成するポリマーは、それ自身架橋されて
いてもよいし、活性光線又は熱によつて硬化する
性質を有するものであつてもよい。エマルシヨン
の塗布量は0.1〜5g/m2の範囲が好ましが、よ
り好ましくは0.3〜3g/m2である。塗布方法
は、周知の方式、例えばデツプ塗布、ローラー塗
布、回転塗布、グラビア塗布などが利用できる。
塗布液濃度は塗布方式、塗布条件、塗布量から決
定されるところで当業者の選択にゆだねられる。
又、本発明のインキ受容性画像形成層にはその
他の種々の添加剤を加えることもできる。例えば
画像を可視化するための着色物質として、アクリ
ジン染料、シアニン染料、メロシアニン染料、ス
チリル染料、トリフエニルメタン染料などの染料
や有機顔料を加えることができる。
又、同様に露光による可視画像を得る目的とし
て光発色性物質あるいは光変色性物質を加えるこ
ともできる。例えば、芳香族アジド、カルボニル
アジド、スルホニルアジド、ポリハロメチル化合
物などとロイコ染料等との組合せがあげられる
が、その添加量は目的とする可視画像の度合によ
つて相異するが、概してインキ受容性層中の添加
比率は1〜5重量比程度で充分である。
更に、安定化剤、界面活性剤、可塑剤等も適宜
添加できる。該添加成分は、エマルシヨンの粒子
中に含まれてもよいし、粒子の外に含まれてもよ
い。
本発明の感光性平版印刷版は活性光線を通して
画像露光を与えた後、水、界面活性剤水溶液、有
機溶剤水溶液又はそれ等の混合液等に浸して脱脂
綿のような柔かい布か、ブラツシのようなもので
版面をこすると未露光域のインキ受容層が除去さ
れ、同時に感光性ジアゾ化合物も除去され親水層
が露呈される。一方露光領域はそのまま残る。そ
の表面は疎水性であり、そのままオフセツト印刷
機に取付け直ちに良質の印刷物を作ることができ
る。
上記現像剤として有用な界面活性剤は脂肪属塩
類、高級アルコール硫酸エステル塩類、脂肪属ア
ルコールリン酸エステル塩類、二塩基性脂肪酸エ
ステルのスルホン酸塩類、脂肪酸アミド、スルホ
ン酸塩類、アルキルアリールスルホン酸塩類、フ
オルムアルデヒド縮合のナフタリンスルホン酸塩
類等のアニオン界面活性剤、ポリオキシエチレン
アルキルエーテル類、ポリオキシエチレンアルキ
ルフエノールエーテル類、ポリオキシエチレンア
ルキルエステル類、ソルビタンアルキルエステル
類、ポリオキシプロピレンポリオキシエチレンエ
ーテル類等のノニオン型界面活性剤等である。
代表的な有機溶媒はエタノール、n―プロパノ
ール及びイソプロパノールのような低級アルコー
ル、ベンジルアルコール、酢酸ブチルのようなエ
ステル、メチルセロソルブのようなエーテル、シ
クロヘキサンやアセトンのようなケトン及びダウ
ケミカル(Dow Chemical)社より市販されて
いるダウアノール(Dowanol P―Mix.)(ポリプ
ロピレングリコールエーテル)を包含する。
使用し得るその他の現像剤は、特開昭53―
44202号、米国特許第3669660号、同出願第302994
号、同第303072号、303071号に記載のものであ
る。
本発明の感光性平版印刷版は、インク受容性層
を水性媒体の塗布液から塗布することができるに
も拘らず、貯蔵安定性の優れたものが得られる。
しかもインク受容性層を構成する親油性樹脂を広
範囲のものから選択できるので、感脂性の高い画
像部を有する平版印刷版を与える感光性平版印刷
版が容異に得られる。
以下、本発明を実施例に基づいて、更に詳細に
説明する。
実施例 1
特公昭42―5364号公報に記載された方法により
合成したP―ジアゾジフエニルアミンのパラフオ
ルムアルデヒド縮合生成物と2―オキシ―4―メ
トキシ―ベンゾフエノン―5―スルフオン酸の感
光性ジアゾ反応生性物をメチルセロソルブに溶解
して1重量パーセントの溶液を調製した。
一方、3S材アルミニウム板を80℃に保たれた
第三燐酸ナトリウムの10重量パーセント水溶液に
3分間浸漬して脱脂し、水洗した。次に、70重量
パーセントの硝酸溶液を用いてデスマツトし、水
洗後、70℃のJIS3号珪酸ナトリウムの2重量パー
セント溶液に1分間浸漬処理した。水洗、乾燥
後、上記調製溶液を塗布した。乾燥後、ヘキスト
化成(株)より発売されているモビニール50M(酢酸
ビニール重合物のラテツクス)を15倍の純水で稀
釈したラテツクスをホワイラー塗布機を用いて塗
布し、100℃、1分間乾燥した。このようにして
作つた印刷版材は常法により製版できた。例え
ば、30Amp.のカーボンアーク燈で70cmの距離か
ら1分間、ネガフイルムを通して露光した印刷版
材を水に浸漬した後、脱脂綿で版面を軽く擦ると
未露光域のみがきれいに剥離除去され、親水性支
持体表面が露呈した。一方露光域では何の脱落も
なかつた。版はそのままか又は、ガム液を施した
後、オフセツト印刷機に取付けて印刷した。欠陥
のない質の良い印刷物が得られた。
実施例 2
厚味0.2mmの2S材アルミニウム板を80℃に保た
れた第三燐酸ナトリウムの10重量パーセント水溶
液に30秒間浸漬して脱脂し、水洗後パミスをスラ
リー状としてアルミニウム板上に流しながらナイ
ロンブラツシでこすつて砂目立てをした。水洗
後、アルミン酸ナトリウム溶液に浸漬して洗滌
し、引続き硫酸水素ナトリウムの3重量パーセン
ト水溶液で洗滌した。このアルミニウム板を20重
量パーセント硫酸中で電流密度2A/dm2におい
て2分間陽極酸化し、次の工程で70℃の2.5重量
パーセント珪酸ナトリウム水溶液で1分間処理し
て陽極酸化アルミニウム板を作つた。
このアルミニウム板にP―ジアゾジフエニルア
ミンのパラフオルムアルデヒド縮合生成物である
フエアマウント ケミカル(Fairmont Chemical
Co.,)Newark,New Jerseyから市販されてい
るDiazoNo.4Lの2重量パーセント水溶液を塗布し
た。アルミニウム板は塗布液槽の中に浸漬された
後、2本のゴムローラーでニツプして過剰の液を
しぼつた後乾燥した。次にアサヒペン(株)製の青色
水性塗料アサヒペンを約15倍の純水で稀釈し、4
本リバースローラーコーターでジアゾ感光層の表
面に塗布した。
この様にして作られた感光性印刷版材はバーキ
ー フオト(Berky Photo Inc.,)社製のバーキ
ー オスコー(Berky Ascor)露光器により30秒
間画像模様露光を与えた。現像はn―プロピルア
ルコールの15〜20重量パーセントの水溶液を版面
に拡げ脱脂綿でこすつた。未露光域のみが剥離除
去され、露光域は青色の画像として残つた。
実施例 3
500mlのビーカーに1,2―ジクロルエタン300
gを採り、ポリビニルフオルマール(重合度約
800、酢酸ビニル残基10.5±1.5、ポリビニール残
基5.5±0.5、電気化学工業(株)製#100)の60gを
加えて撹拌溶解した。別に2の三ツ口フラスコ
に撹拌機と滴下ロートを取り付けたものを用意
し、700mlの純水を採り、10gのポリビニルアル
コール(日本合成(株)製GL―05、ケン化度86.5〜
89モル%、平均重合度500)と2gのラウリール
アルコール硫酸エステルナトリウム(活性純度75
〜80%)を加え撹拌下に溶解した。次いて回転数
を1000RPMに上昇し、先に調製したポリビニル
フオルマール溶液を滴下ロートから約50ml/分の
速度で滴下した。滴下終了後、室温で約10分間撹
拌を続け、引続いてフラスコを約80℃に加温し約
2時間この温度を保つて撹拌を続け、1,2―ジ
クロルエタンを除去した。
得られたエマルシヨンを2000mlの純水で稀釈
し、実施例1と同様の方法により作つた、ジアゾ
樹脂を塗布したプレートに回転塗布機を使つて塗
布した。100℃で1分間乾かしたあと、透明ネガ
フイルムを通して活線光線を照射した。引続い
て、n―プロピルアルコール25%、ラウリルアル
コール硫酸エステル1%、硫酸カリウム0.5%か
らなる現像液を版面に拡げ、毛布のような植毛布
でこすつた。未露光域のみ除去され、インキ受容
性画像を持つ平版印刷版が得られた。[Formula] - CONR 3 , halogen, nitrile R 1 , R 2 , R 3 : These may be the same or different, aliphatic group or aromatic group n: Integer from 0 to 3] Group B: Free An ethylene monomer having at least one carboxylic acid group, sulfonic acid group, phosphoric acid group, or a salt thereof. A hydroxyalkyl ester or amide of the carboxylic acid. Group C: Sivinyl monomers. Among the groups represented by R 1 to R 3 in the general formula of Group A, aliphatic groups include direct or branched alkyl groups (including cyclic ones) and substituted alkyl groups. The number of carbon atoms in the alkyl group is preferably 1 to 12. Substituents for the substituted alkyl group include aryl group, aryloxy group, halogen atom, cyano group,
Acyl group, alkylcarbonyloxy group, arylcarbonyloxy group, amino group (including substituted amino groups, substituents include alkyl group, aryl group, etc. The number of substituents is 1 to 2), hydroxy group, alkoxy group , heterocyclic residues (hetero atoms include, for example, oxygen atoms, nitrogen atoms, sulfur atoms, etc. The number of members in the ring is preferably 5 to 6, and the ring may be unsaturated or saturated. The heterocyclic ring may further include an aromatic ring. may be condensed.). Of the groups represented by R 1 to R 3 , the aryl group naturally includes substituted phenyl and naphthyl groups, and the substituents include alkyl Examples include groups. Group A monomers include, for example, acrylic esters, methacrylic esters, crotonic esters, vinyl esters, maleic diesters,
Examples include monofunctional monomers such as fumaric acid diester, itaconic acid diester, and styrenes. Furthermore, specific monomers include, for example, methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, sec-butyl acrylate, amyl acrylate, hexyl acrylate, and 2-ethylhexyl acrylate. , octyl acrylate,
tert-octyl acrylate, 2-phenoxyethyl acrylate, 2-chloroethyl acrylate, 2-bromoethyl acrylate, 4-chlorobutyl acrylate, cyanoethyl acrylate, 2-acetoxyethyl acrylate, dimethylaminoethyl acrylate, benzyl acrylate, methoxybenzyl Acrylate, 2-chlorocyclohexyl acrylate, cyclohexyl acrylate, furfuryl acrylate, tetrahydrofurfuryl acrylate, phenyl acrylate, 5-hydroxypentyl acrylate,
2,2-dimethyl-3-hydroxypropyl acrylate, 2-methoxyethyl acrylate, 3
-Methoxybutyl acrylate, 2-ethoxyethyl acrylate, 2-iso-propoxyethyl acrylate, 2-butoxyethyl acrylate, 2-(2-methoxyethoxy)ethyl acrylate, 2-(2-butoxyethoxy)ethyl acrylate, ω-methoxy Polyethylene glycol acrylate (number of moles added = 9), 1-bromo-2-methoxyethyl acrylate, 1,1-
Dichloro-2-ethoxyethyl acrylate, methyl methacrylate, ethyl methacrylate, n
-Propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, sec-butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, chlorobenzyl methacrylate, octyl methacrylate, N-ethyl-N-
Phenylaminoethyl methacrylate, 2-(3
-Phenylpropyloxy)ethyl methacrylate, dimethylaminophenoxyethyl methacrylate, furfuryl methacrylate, tetrahydrofurfuryl methacrylate, phenyl methacrylate, cresyl methacrylate, naphthyl methacrylate, 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, 4
-Hydroxybutyl methacrylate, triethylene glycol monomethacrylate, dipropylene glycol monomethacrylate, 2-methoxyethyl methacrylate, 3-methoxybutyl methacrylate, 2-acetoxyethyl methacrylate, acetoacetoxyethyl methacrylate, 2
-Ethoxyethyl methacrylate, 2-iso-propoxyethyl methacrylate, 2-butoxyethyl methacrylate, 2-(2-methoxyethoxy)ethyl methacrylate, 2-(2-ethoxyethoxy)ethyl methacrylate, 2-(2-butoxyethoxy)ethyl Methacrylate, ω-methoxypolyethylene glycol methacrylate (additional mole number n = 6), vinyl acetate, vinyl propionate, vinyl butyrate, vinyl isobutyrate, vinyl dimethyl propionate, vinyl ethyl butyrate, vinyl valerate ), vinylcaproate, vinyl chloroacetate, vinyl dichloroacetate, vinyl methoxy acetate, vinyl butoxy acetate, vinyl phenyl acetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenyl butyrate,
Vinyl cyclohexyl carboxylate, vinyl benzoate, vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate, vinyl naphthoate, styrene, methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene,
Diethylstyrene, isopropylstyrene, butylstyrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene,
Chloromethylstyrene, trifluoromethylstyrene, ethoxymethylstyrene, acetoxymethylstyrene, methoxystyrene, 4-methoxy-
3-methylstyrene, dimethoxystyrene, chlorstyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorstyrene, bromstyrene, dibromstyrene, iodostyrene, fluorostyrene, trifluorstyrene, 2-bromo-4- Trifluoromethylstyrene, 4-fluoro-3-trifluoromethylstyrene, vinylbenzoic acid methyl ester, butyl crotonate, hexyl crotonate, glycerin monocrotonate, dimethyl itaconate, diethyl itaconate, dibutyl itaconate, diethyl maleate , dimethyl maleate, dibutyl maleate, diethyl fumarate, dihexyl fumarate,
Dibutyl methyl acrylamide fumarate, ethyl acrylamide, propylacrylamide, isopropylacrylamide, butylacrylamide, tert-butylacrylamide, heptyl acrylamide, tert-octylacrylamide, cyclohexylacrylamide, benzylacrylamide, hydroxymethyl acrylamide, methoxyethylacrylamide, dimethylaminoethylacrylamide, Hydroxyethyl acrylamide, phenylacrylamide, hydroxyphenylacrylamide, tolylacrylamide, naphthylacrylamide, dimethylacrylamide, diethylacrylamide, dibutylacrylamide, diisobutylacrylamide, N-
(1,1-dimethyl-3-oxobutyl)acrylamide, methylbenzylacrylamide, benzyloxyethylacrylamide, β-cyanoethylacrylamide, acryloylmorpholine,
N-methyl-N-acryloylpiperazine, N-
Acryloylpiperidine, N-(1,1-dimethyl-3-hydroxybutyl)acrylamide, N
-β-morpholinoethyl acrylamide, N-acryloylhexamethyleneimine, N-hydroxyethyl-N-methylacrylamide, N-2-
Acetamide ethyl-N-acetylacrylamide, methylmethacrylamide, tert-butylmethacrylamide, tert-octylmethacrylamide, benzylmethacrylamide, cyclohexylmethacrylamide, phenylmethacrylamide,
Dimethylmethacrylamide, diethylmethacrylamide, dipropylmethacrylamide, hydroxyethyl-N-methylmethacrylamide, N-methyl-N-phenylmethacrylamide, N-ethyl-N-phenylmethacrylamide, methacrylhydrazine, etc.; Allyl compounds :For example, allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate,
Allyl benzoate, allyl acetoacetate, allyl lactate, allyloxyethanol, allyl butyl ether, allyl phenyl ether, etc. Vinyl ethers: For example, methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether , ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1
-Methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether, dimethylaminoethyl vinyl ether, etc.; Vinyl ketones: for example, methyl vinyl ketone, phenyl vinyl ketone, methoxyethyl vinyl ketone, etc.; Olefins: For example, dicyclopentadiene, ethylene, propylene, 1-butene, 1-pentene, 1-hexene, 4-methyl-1-pentene, 1-heptene, 1-octene, 1-decene,
5-methyl-1-nonene, 5,5-dimethyl-1
-Octene, 4-methyl-1-hexene, 4,4
-dimethyl-1-pentene, 5-methyl-1-hexene, 4-methyl-1-heptene, 5-methyl-1-heptene, 4,4-dimethyl-1-hexene, 5,5,6-trimethyl-1 -Heptene, 1
- unsubstituted hydrocarbons such as dodecene and 1-octadecene; diene compounds such as butadiene, isoprene, and chloroprene; (for example, 5 to 6, and an aromatic ring may be further bonded to this ring): For example, N
-Vinyloxazolidone, vinylpyridine, vinylpicoline, N-vinylimidazole, N-vinyl-2-methylimidazole, N-vinyltriazole, N-vinyl-3,5-dimethyltriazole, N-vinylpyrrolidone, N-vinyl- 3,5
-Dimethylpyrazole, N-vinylcarbazole, vinylthiophene, N-vinylsuccinimide, N-vinylglutarimide, N-vinyladipimide, N-vinylpyrrolidone, N-vinylpiperidone, N-vinyl-ε-caprolactam, N-
Vinyl-2-pyridone, etc.; Unsaturated nitriles: e.g. acrylonitrile,
Vinyl halide compounds such as methachronitrile; vinyl chloride, vinylidene chloride, vinyl bromide,
vinyl iodide, etc. Specific examples of Group B monomers include the following monofunctional monomers. Acrylic acid, methacrylic acid, itaconic acid, maleic acid, monoalkyl itaconate (e.g. monomethyl itaconate, monoethyl itaconate, monobutyl itaconate, etc.), monoalkyl maleate (e.g. monomethyl maleate, monoethyl maleate, monobutyl maleate, etc.) monooctyl maleate, etc.), citraconic acid, styrene sulfonic acid, vinylbenzyl sulfonic acid, vinyl sulfonic acid, acryloyloxyalkyl sulfonic acid,
(e.g., acryloyloxymethylsulfonic acid, acryloyloxyethylsulfonic acid, acryloyloxypropylsulfonic acid, acryloyloxybutylsulfonic acid, etc.), methacryloyloxyalkylsulfonic acid (e.g., methacryloyloxymethylsulfonic acid, methacryloyloxyethylsulfonic acid, methacryloyloxy propyl sulfonic acid, methacryloyloxybutyl sulfonic acid, etc.), acrylamide alkyl sulfonic acid (e.g. 2-acrylamido-2-methylethanesulfonic acid, 2-acrylamido-2-methylpropanesulfonic acid, 2-acrylamide-
2-methylbutanesulfonic acid, etc.), methacrylamide alkylsulfonic acid (e.g. 2-methacrylamido-2-methylethanesulfonic acid, 2-methacrylamido-2-methylpropanesulfonic acid, 2-methacrylamido-2-methylbutanesulfone) acids, etc.), acryloyloxyalkyl phosphates (e.g., acryloyloxyethyl phosphate, 3-acryloyloxypropyl phosphate, etc.), methacryloyloxyalkyl phosphates (e.g., methacryloyloxyethyl phosphate, 3-methacryloyloxypropyl phosphate, etc.) Such. Further, the alkyl group in the acid monomer has, for example, about 1 to 8 carbon atoms. These acids contain alkali metal ions (preferably Na + ,
K + ) or an ammonium ion salt. Specific examples of monomers of group C include unsaturated esters of polyols, in particular such esters of α-methylenecarboxylic acid, such as ethylene di(meth)
Acrylate, diethylene glycol di(meth)
Acrylate, glycerol di(meth)acrylate, glycerol tri(meth)acrylate,
1,3-propylene di(meth)acrylate,
1,4-cyclohexanediol (meth)acrylate, 1,4-benzenediol di(meth)acrylate, pentaerythritol tetra(meth)acrylate, 1,3-propylene glycol di(meth)acrylate, 1,5-pentanediol di(meth)acrylate (meth)acrylate, trimethylolpropane tri(meth)acrylate. Unsaturated amides, especially amides of α-methylenecarboxylic acid and especially α,ω-diamines and ω with intermediate oxygen
-Diamines, such as methylenebis(meth)
Acrylamide, ethylene bis(meth)acrylamide, 1,6-hexamethylene bis(meth)acrylamide and diethylenetriamine tris(meth)acrylamide, divinyl succinate, divinyl adipate, divinyl phthalate,
Divinyl terephthalate, divinylbenzene
1,3-disulfonate and divinylbutane-
Vinyl esters such as 1,4-disulfonate, unsaturated aldehydes such as sorbaldehyde or 2,4-hexadienal. (meth)acrylates, neutral α-methylene carboxylic acid polyesters such as (meth)acrylamide, polyamides and/or first and second
Amino alcohols, amino polyols or ester amides of polyamino alcohols or polyols and similar derivatives of said alcohols, such as β
-Methacrylamide ethyl (meth)acrylamide, N-(β-hydroxyethyl)-β-(methacrylamide)ethyl acrylate, N,N-
Bis(β-methacryloxyethyl)acrylamide, other urethane compounds derived from divinylbenzene, xylylene diisocyanate, and hydroxyethyl (meth)acrylate, such as those having the chemical structure below. Urethane compounds made from isocyanates and hydroxyalkyl compounds such as are useful. In addition, in the above, "(meth)acrylate" means both "acrylate" and "methacrylate", and "(meth)acrylamide" also means the same thing. Latex polymers that can be used here are manufactured by, for example, Preparative Methods of Polymer Chemistry Interscience Publishers.
Polymer Chemistry, Interscience Publishers)
It can be synthesized according to the emulsion polymerization method described on pages 216 and 238 of the publication. One example is the following. 1 in a three-necked flask
Take 420ml of distilled water and add potassium metabisulfite.
Add 0.225g, stir to dissolve, and then purge with nitrogen to add 33.37g of acrylonitrile, 145.3g of vinylidene chloride, 14.1g of acrylic acid, and Triton 770.
(Surfactant) Add 14.1g of potassium persulfate
0.45 g was added, and the mixture was stirred at a rotation speed of 150 rpm at a temperature of 30° C. to react. Resins for which emulsion polymerization methods cannot be used in the preparation of latex, such as formal resins or acetal resins such as butyral resins, cellulose acetate, cellulose propionate, cellulose butyrate,
Cellulose esters such as cellulose crotonate, the ester compounds and phthalic acid, succinic acid,
coester compounds with dicarboxylic acids such as sebacic acid and maleic acid, cellulose ether compounds such as methylcellulose, ethylcellulose, propiocellulose, butylcellulose, allylcellulose, benzylcellulose, cyclohexylcellulose, and cyanoethylcellulose, polyester, polyamide, polyurethane, etc. High molecular compounds produced by condensation polymerization are also useful as lipophilic resins that can be used in the present invention. Emuldimon can be prepared from this compound by the method disclosed in JP-A-52-3653. Group A, Group B in the above copolymer latex,
The ratio of group C can be appropriately selected in consideration of the developability, ink receptivity, printing durability, and other performances of the ink receptive layer coated from the latex. The monomer components of group A mainly control ink receptivity and printing durability. Therefore, the amount of the Group A monomer component is preferably 20 to 100% by weight, particularly preferably 60 to 100% by weight, based on the solid content of the latex polymer. The amount of the Group B monomer component is preferably 0 to 25% by weight, particularly preferably 0 to 10% by weight, based on the solid content of the latex polymer. The C group monomer component is preferably 0 to 80% by weight, particularly preferably 0 to 40% by weight. Furthermore, commercially available emulsion paints, latex, etc. can also be used. For example, Nippon Paint Co., Ltd.
vinyl acetate resin emulsion; vinylex
5000, acrylic resin emulsion; vinylex
5000 Super, water-based paint Asahipen from Asahipen Co., Ltd., acrylic emulsion from Dainippon Toyo Co., Ltd.; Acrose #100, vinyl acetate emulsion from Kansai Paint Co., Ltd.; Vinypaint, vinyl acetate emulsion from Hoechst Kasei Co., Ltd. Rousillon, acrylic resin emulsion; Movinyl, etc. can be used. However, when using commercially available latex, it is necessary to take into account that the performance is affected by the type of emulsion stabilizer used. Polymers forming the ink-receptive layer, including latexes prepared by methods that do not rely on emulsion polymerization, have hydroxyl, amino, amide, imino, imide, nitrilo, carboxyl, sulfonyl, sulfonoxy, Isocyanate, urethane, azoimide,
Those containing at least one group selected from azo, hydrazino, carbamide, carbamyl, epoxy, mercapto, thio, and sulfonamido groups are preferred. There are no particular restrictions on the particle size of the lipophilic resin in the emulsion, but particles with a distribution within the range of approximately 0.03 to 10μ can generally be used, but preferably 0.05 to 10μ.
It is about 5μ. The polymer forming the emulsion particles can range from high molecular weight to oligomeric polymers, from about 2,000 to about 200,000 in molecular weight, or may be a mixture of these polymers. or,
The polymer forming the particles may itself be crosslinked, or may have the property of being cured by actinic rays or heat. The coating amount of the emulsion is preferably in the range of 0.1 to 5 g/m 2 , more preferably 0.3 to 3 g/m 2 . As the coating method, well-known methods such as dip coating, roller coating, spin coating, and gravure coating can be used.
The concentration of the coating solution is determined from the coating method, coating conditions, and coating amount, and is left to the discretion of those skilled in the art. Various other additives can also be added to the ink-receptive imaging layer of the present invention. For example, dyes such as acridine dyes, cyanine dyes, merocyanine dyes, styryl dyes, triphenylmethane dyes, and organic pigments can be added as coloring substances for visualizing images. Similarly, a photochromic substance or a photochromic substance can be added for the purpose of obtaining a visible image by exposure. For example, combinations of aromatic azides, carbonyl azides, sulfonyl azides, polyhalomethyl compounds, etc. and leuco dyes, etc., can be used.The amount added varies depending on the degree of the desired visible image, but in general, the ink receptivity is An addition ratio of about 1 to 5 by weight in the layer is sufficient. Furthermore, stabilizers, surfactants, plasticizers, etc. can also be added as appropriate. The additive component may be contained within the particles of the emulsion or may be contained outside the particles. The photosensitive lithographic printing plate of the present invention is subjected to imagewise exposure through actinic rays, and then dipped in water, an aqueous surfactant solution, an aqueous organic solvent solution, or a mixture thereof, etc. When the plate surface is rubbed with a material, the ink-receiving layer in the unexposed area is removed, and at the same time, the photosensitive diazo compound is also removed and the hydrophilic layer is exposed. On the other hand, the exposed area remains intact. Its surface is hydrophobic, so it can be installed directly into an offset printing machine to immediately produce high-quality printed matter. Surfactants useful as the above developer include fatty acid salts, higher alcohol sulfate ester salts, fatty alcohol phosphate ester salts, sulfonate salts of dibasic fatty acid esters, fatty acid amides, sulfonate salts, and alkylaryl sulfonate salts. , anionic surfactants such as formaldehyde condensed naphthalene sulfonates, polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenol ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, polyoxypropylene polyoxyethylene These include nonionic surfactants such as ethers. Typical organic solvents are ethanol, lower alcohols such as n-propanol and isopropanol, benzyl alcohol, esters such as butyl acetate, ethers such as methyl cellosolve, ketones such as cyclohexane and acetone, and Dow Chemical. Dowanol P-Mix. (polypropylene glycol ether) commercially available from Co., Ltd. Other developers that can be used are those described in Japanese Patent Application Laid-open No. 1983-
44202, U.S. Patent No. 3669660, U.S. Patent No. 302994
No. 303072 and No. 303071. The photosensitive lithographic printing plate of the present invention has excellent storage stability even though the ink-receptive layer can be coated from an aqueous coating solution.
Moreover, since the lipophilic resin constituting the ink-receptive layer can be selected from a wide range of types, a photosensitive lithographic printing plate that provides a lithographic printing plate having an image area with high oil sensitivity can be obtained with excellent results. Hereinafter, the present invention will be explained in more detail based on examples. Example 1 Photosensitive diazo of paraformaldehyde condensation product of P-diazodiphenylamine and 2-oxy-4-methoxy-benzophenone-5-sulfonic acid synthesized by the method described in Japanese Patent Publication No. 42-5364 A 1 weight percent solution was prepared by dissolving the reaction products in methyl cellosolve. On the other hand, a 3S aluminum plate was degreased by immersing it in a 10% by weight aqueous solution of tribasic sodium phosphate kept at 80°C for 3 minutes, and then washed with water. Next, it was desmatted using a 70% by weight nitric acid solution, washed with water, and then immersed for 1 minute in a 2% by weight solution of JIS No. 3 sodium silicate at 70°C. After washing with water and drying, the above prepared solution was applied. After drying, latex made by diluting Movinyl 50M (vinyl acetate polymer latex) sold by Hoechst Kasei Co., Ltd. 15 times with pure water was applied using a whiler coating machine, and dried at 100°C for 1 minute. . The printing plate material thus produced could be plate-made by a conventional method. For example, by immersing a printing plate exposed through a negative film in water using a 30 Amp. carbon arc lamp from a distance of 70 cm for 1 minute, and then rubbing the plate surface lightly with absorbent cotton, only the unexposed areas can be peeled off and removed, making it hydrophilic. The support surface was exposed. On the other hand, there was no dropout in the exposed area. The plates were printed either as they were or after applying a gum solution and then mounted on an offset printing machine. Good quality prints with no defects were obtained. Example 2 A 2S aluminum plate with a thickness of 0.2 mm was degreased by immersing it in a 10% by weight aqueous solution of trisodium phosphate kept at 80°C for 30 seconds, and after washing with water, the pumice was made into a slurry and poured onto the aluminum plate. I sanded it by rubbing it with a nylon brush. After washing with water, it was washed by immersion in a sodium aluminate solution, and then washed with a 3 weight percent aqueous solution of sodium hydrogen sulfate. This aluminum plate was anodized in 20 weight percent sulfuric acid at a current density of 2 A/dm 2 for 2 minutes, and in the next step was treated with a 2.5 weight percent sodium silicate aqueous solution at 70° C. for 1 minute to produce an anodized aluminum plate. This aluminum plate was coated with Fairmont Chemical, a paraformaldehyde condensation product of P-diazodiphenylamine.
A 2 weight percent aqueous solution of Diazo No. 4L, commercially available from Co., Ltd., Newark, New Jersey, was applied. The aluminum plate was immersed in a bath of coating solution, then nipped with two rubber rollers to squeeze out excess solution, and then dried. Next, dilute Asahipen, a blue water-based paint manufactured by Asahipen Co., Ltd., with approximately 15 times pure water.
This reverse roller coater was used to coat the surface of the diazo photosensitive layer. The photosensitive printing plate material thus prepared was subjected to image pattern exposure for 30 seconds using a Berky Ascor exposure device manufactured by Berky Photo Inc.. For development, a 15 to 20 weight percent aqueous solution of n-propyl alcohol was spread on the printing plate and rubbed with absorbent cotton. Only the unexposed areas were peeled off, leaving the exposed areas as a blue image. Example 3 300ml of 1,2-dichloroethane in a 500ml beaker
g, and polyvinyl formal (polymerization degree of approx.
800, vinyl acetate residue 10.5±1.5, polyvinyl residue 5.5±0.5, #100 manufactured by Denki Kagaku Kogyo Co., Ltd.) were added and dissolved with stirring. Separately, prepare a three-neck flask (No. 2) equipped with a stirrer and a dropping funnel, take 700 ml of pure water, and add 10 g of polyvinyl alcohol (GL-05 manufactured by Nippon Gosei Co., Ltd., degree of saponification 86.5 ~
89 mol%, average degree of polymerization 500) and 2 g sodium lauryl alcohol sulfate (active purity 75).
~80%) was added and dissolved under stirring. Next, the rotation speed was increased to 1000 RPM, and the polyvinyl formal solution prepared earlier was dropped from the dropping funnel at a rate of about 50 ml/min. After the dropwise addition was completed, stirring was continued at room temperature for about 10 minutes, and then the flask was heated to about 80°C and stirred at this temperature for about 2 hours to remove 1,2-dichloroethane. The obtained emulsion was diluted with 2000 ml of pure water and applied to a plate coated with diazo resin prepared in the same manner as in Example 1 using a rotary coating machine. After drying at 100°C for 1 minute, live light was irradiated through a transparent negative film. Subsequently, a developer consisting of 25% n-propyl alcohol, 1% lauryl alcohol sulfate, and 0.5% potassium sulfate was spread on the printing plate and rubbed with a flocked cloth. Only the unexposed areas were removed, resulting in a lithographic printing plate with an ink-receptive image.
Claims (1)
上に設けられた感光性ジアゾ化合物の層および(c)
該感光性ジアゾ化合物の層と接するインキ受容性
層からなり、該インキ受容性層が親油性樹脂の水
媒体エマルジヨンから塗設されたものであること
を特徴とする感光性平版印刷版。1 (a) a support having a hydrophilic surface, (b) a layer of a photosensitive diazo compound provided on the hydrophilic surface, and (c)
A photosensitive lithographic printing plate comprising an ink receptive layer in contact with the photosensitive diazo compound layer, the ink receptive layer being coated from an aqueous emulsion of a lipophilic resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9117878A JPS5518621A (en) | 1978-07-26 | 1978-07-26 | Photosensitive lithographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9117878A JPS5518621A (en) | 1978-07-26 | 1978-07-26 | Photosensitive lithographic printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5518621A JPS5518621A (en) | 1980-02-08 |
JPS6261136B2 true JPS6261136B2 (en) | 1987-12-19 |
Family
ID=14019196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9117878A Granted JPS5518621A (en) | 1978-07-26 | 1978-07-26 | Photosensitive lithographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5518621A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6478948A (en) * | 1987-09-18 | 1989-03-24 | Nippon Denso Co | Power supply for car |
JPH07236235A (en) * | 1993-05-28 | 1995-09-05 | Japan Storage Battery Co Ltd | Dc power supply |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5096304A (en) * | 1973-12-27 | 1975-07-31 | ||
JPS522520A (en) * | 1975-06-19 | 1977-01-10 | Napp Systems Inc | Photosensitive composition |
JPS53145706A (en) * | 1977-05-19 | 1978-12-19 | Polychrome Corp | Lithographic printing plate capable of developing with water with double photosensitive layer |
JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
-
1978
- 1978-07-26 JP JP9117878A patent/JPS5518621A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5096304A (en) * | 1973-12-27 | 1975-07-31 | ||
JPS522520A (en) * | 1975-06-19 | 1977-01-10 | Napp Systems Inc | Photosensitive composition |
JPS53145706A (en) * | 1977-05-19 | 1978-12-19 | Polychrome Corp | Lithographic printing plate capable of developing with water with double photosensitive layer |
JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6478948A (en) * | 1987-09-18 | 1989-03-24 | Nippon Denso Co | Power supply for car |
JPH07236235A (en) * | 1993-05-28 | 1995-09-05 | Japan Storage Battery Co Ltd | Dc power supply |
Also Published As
Publication number | Publication date |
---|---|
JPS5518621A (en) | 1980-02-08 |
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