JPS6260662B2 - - Google Patents
Info
- Publication number
- JPS6260662B2 JPS6260662B2 JP55056901A JP5690180A JPS6260662B2 JP S6260662 B2 JPS6260662 B2 JP S6260662B2 JP 55056901 A JP55056901 A JP 55056901A JP 5690180 A JP5690180 A JP 5690180A JP S6260662 B2 JPS6260662 B2 JP S6260662B2
- Authority
- JP
- Japan
- Prior art keywords
- gate
- sensor
- source
- reference electrode
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005259 measurement Methods 0.000 claims description 13
- 230000001419 dependent effect Effects 0.000 claims description 5
- 230000005669 field effect Effects 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 description 15
- 239000007788 liquid Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical class N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4148—Integrated circuits therefor, e.g. fabricated by CMOS processing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electrochemistry (AREA)
- Molecular Biology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Description
【発明の詳細な説明】
この発明はゲート絶縁形電界効果トランジスタ
(以下、FETと略称する。)を用いたイオンセン
サ用測定回路に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a measurement circuit for an ion sensor using an insulated gate field effect transistor (hereinafter abbreviated as FET).
従来、この種のイオンセンサとしてたとえば第
1図に示す構造のものが知られている。同図にお
いて、1はp形のシリコン基板であり、この基板
1上にn形の共通ドレイン2、比較電極ソース3
およびセンサソース4が形成され、さらに測定液
の電位を一定に保持するために必要な基準電極5
が金の蒸着によつて形成されている。6,7,
8,9,10は共通ドレイン層2、比較電極ソー
ス3、センサソース4、基準電極層5およびシリ
コン基板1の各電極部であり、11はセンサゲー
ト部、12は比較電極ゲート部で、第2図にその
横断面が示されている。 Conventionally, as this type of ion sensor, one having a structure shown in FIG. 1, for example, is known. In the figure, 1 is a p-type silicon substrate, on which an n-type common drain 2 and a comparison electrode source 3 are provided.
and a sensor source 4 are formed, and a reference electrode 5 necessary to keep the potential of the measurement liquid constant
is formed by vapor deposition of gold. 6,7,
8, 9, and 10 are the common drain layer 2, the comparison electrode source 3, the sensor source 4, the reference electrode layer 5, and each electrode part of the silicon substrate 1; 11 is the sensor gate part; 12 is the comparison electrode gate part; Figure 2 shows its cross section.
この第2図から明らかなように、各ゲート部1
1,12にはシリコン基板1上に形成された窒化
シリコン層13と酸化シリコン層14との2層構
造を有し、センサゲート部11にはたとえばイオ
ン感応層15が、また比較電極ゲート部12には
疎水性有機膜16が被覆されている。 As is clear from FIG. 2, each gate section 1
1 and 12 have a two-layer structure of a silicon nitride layer 13 and a silicon oxide layer 14 formed on a silicon substrate 1, the sensor gate part 11 has an ion sensitive layer 15, and the comparison electrode gate part 12 has a two-layer structure. is coated with a hydrophobic organic film 16.
上記構成のイオンセンサは第3図の等価回路で
示すように容器17内の被検液18内に浸漬さ
れ、共通ドレイン2は定圧電源19に接続され、
比較電極ソース3とセンサソース4は差動増巾器
20,21にそれぞれ接続されて、両者の出力の
差が減算回路22で求められ、この減算回路22
の出力が被検液18のイオン濃度に対応する。 The ion sensor with the above configuration is immersed in the test liquid 18 in the container 17, as shown in the equivalent circuit of FIG. 3, and the common drain 2 is connected to the constant pressure power source 19.
The comparison electrode source 3 and the sensor source 4 are connected to differential amplifiers 20 and 21, respectively, and the difference between their outputs is determined by a subtraction circuit 22.
The output corresponds to the ion concentration of the test liquid 18.
上記測定にあたり、定電流装置23,24によ
り各ソース3,4に流れるソース・ドレイン電流
を一定に保持している。すなわち、一定のドレイ
ン電圧Vdと、各ソース・ドレイン電流Id3,Id4に
よつて作動させて、出力Vg3,Vg4を得る。この
出力Vg3,Vg4は各ゲート3,4の各ゲート電位
Eg3,Eg4と、基準電極5の界面電位Epで表わ
すと、
Vg3=Eg3−Ep ……(1)
Vg4=Eg4−Ep ……(2)
となる。 In the above measurement, the source/drain current flowing through each source 3, 4 is kept constant by constant current devices 23, 24. That is, by operating with a constant drain voltage Vd and respective source-drain currents Id 3 and Id 4 , outputs V g3 and V g4 are obtained. These outputs V g3 and V g4 are expressed by the gate potentials E g3 and E g4 of each gate 3 and 4 and the interface potential E p of the reference electrode 5, as follows: V g3 = E g3 − E p ……(1) V g4 = E g4 - E p ...(2).
この各電位Eg3,Eg4,Epはそれぞれ温度に
依存する成分を有するけれども、両出力Vg3,V
g4の差出力ΔVは、
ΔV=Vg3−Vg4=Eg3−Eg4 ……(3)
となり、基準電極5の界面電位Epに関する項が
消去される。 Although each of these potentials E g3 , E g4 , and E p has a component that depends on temperature, both outputs V g3 , V
The difference output ΔV of g4 becomes ΔV=V g3 −V g4 =E g3 −E g4 (3), and the term related to the interface potential E p of the reference electrode 5 is eliminated.
しかし、各ゲート電位Eg3,Eg4が温度に依存
し、その温度依存特性が各FETごとに異なるた
め、被検液18の正確なイオン測定が不可能であ
る。 However, since each of the gate potentials E g3 and E g4 depends on temperature, and the temperature dependence characteristics differ for each FET, accurate ion measurement of the test liquid 18 is impossible.
この発明は上記欠点を改善するためになされた
もので、センサゲートと比較電極ゲートにおける
ゲート電位の温度依存特性を消去して被検液の正
確なイオン測定が可能なイオンセンサ用測定回路
を提供することを目的とする。 This invention was made to improve the above-mentioned drawbacks, and provides a measurement circuit for an ion sensor that is capable of accurately measuring ions in a sample liquid by eliminating the temperature-dependent characteristics of the gate potential at the sensor gate and the comparison electrode gate. The purpose is to
以下、この発明の実施例を図面にしたがつて説
明する。 Embodiments of the present invention will be described below with reference to the drawings.
第4図はこの発明に係るイオンセンサ用測定回
路の一例を示す電気回路図で、同図中、第3図と
同一部分には同一番号が付されており、各ゲート
3,4に流れるソース・ドレイン電流Id3,Id4
を制御する電流制御器25,26が設けられ、そ
の電流値は電流計27,28に表示される。ま
た、第5図は各ゲート3,4におけるソース・ド
レイン電流Id(Id3,Id4)に対する各ゲート電
位Eg3,Eg4の温度依存特性∂Eg3/∂T,∂Eg
4/∂Tを示す図である。 FIG. 4 is an electric circuit diagram showing an example of the measurement circuit for an ion sensor according to the present invention. In the figure, the same parts as in FIG.・Drain current I d3 , I d4
Current controllers 25 and 26 are provided to control the current, and the current values are displayed on ammeters 27 and 28. Moreover, FIG. 5 shows the temperature dependence characteristics of each gate potential E g3 , E g4 with respect to the source-drain current I d (I d3 , I d4 ) in each gate 3, 4 ∂E g3 /∂T, ∂E g
FIG. 4 is a diagram showing 4 /∂T.
いま、電流制御器25,26を操作して、セン
サゲート3のソース・ドレイン電流Id3を第5図
のa1点における電流値に設定し、また比較電極ゲ
ート4のソース・ドレイン電流Id4を第5図のb1
点における電流値に設定すると、各ゲート電位E
g3,Eg4の温度依存特性∂Eg3/∂Tおよび∂Eg
4/∂Tが零となる。 Now, operate the current controllers 25 and 26 to set the source-drain current I d3 of the sensor gate 3 to the current value at point a in FIG. 5 , and set the source-drain current I d4 of the comparison electrode gate 4 b 1 in Figure 5
When set to the current value at the point, each gate potential E
Temperature dependent characteristics of g3 , E g4 ∂E g3 /∂T and ∂E g
4 /∂T becomes zero.
あるいは、上記電流Id3を第5図のa2点におけ
る電流値に設定し、また上記電流Id4を第5図の
b2点における電流値に設定した場合、各ゲート電
位Eg3,Eg4の温度依存特性∂Eg3/∂T,∂Eg
4/∂Tはともに零とならないけれども、その各
温度依存特性の値Cが等しくなるため、(3)式で示
す差出力ΔVにはこの温度依存特性値Cが消去さ
れる。したがつて、被検液18の測定に際し、温
度に左右されず正確なイオン測定が可能である。 Alternatively, the above current I d3 is set to the current value at 2 points a in Fig. 5, and the above current I d4 is set to the current value at 2 points a in Fig.
b When the current value is set at two points, the temperature dependence characteristics of each gate potential E g3 , E g4 ∂E g3 /∂T, ∂E g
Although neither 4 /∂T becomes zero, the value C of each temperature-dependent characteristic becomes equal, so this temperature-dependent characteristic value C is eliminated from the difference output ΔV shown by equation (3). Therefore, when measuring the test liquid 18, accurate ion measurement is possible regardless of temperature.
ところで、上記各ソース・ドレイン電流Id3,
Id4は第5図におけるa1,b1点の値が低すぎると
ノイズが入りやすく、つまり信号対雑音比(SN
比)が悪くなり、高すぎると生体のイオン測定に
おいて危険性、発熱、電池寿命などに支障をきた
すから、5μA〜1mAであることが好ましい。
とくに、生体中で長時間安定に使用するには、20
μA〜600μAが最適である。また、第5図の
a2,b2点の値に設定して測定する場合には、C点
の値が極端に大きくならなければよく、通常
5mV/℃であればよい。 By the way, each of the above source/drain currents I d3 ,
If the value of I d4 at point a 1 and b 1 in Fig. 5 is too low, noise will easily enter, that is, the signal-to-noise ratio (SN
If it is too high, it will cause danger in biological ion measurement, heat generation, and shorten battery life, so it is preferably 5 μA to 1 mA.
In particular, for long-term stable use in vivo, 20
μA to 600 μA is optimal. Also, in Figure 5
When measuring by setting the values at two points a 2 and b, the value at point C does not need to be extremely large;
It is sufficient if it is 5mV/℃.
この発明は以上詳述したように、センサゲート
と比較電極ゲートにおけるゲート電位の温度依存
特性を消去して、被検液やガスの正確な測定が可
能なイオンセンサ用測定回路を提供することがで
きる。 As described in detail above, the present invention provides a measurement circuit for an ion sensor that can eliminate the temperature dependence characteristics of the gate potential at the sensor gate and the reference electrode gate, and can accurately measure the sample liquid or gas. can.
第1図はイオンセンサの一例を示す平面図、第
2図は第1図のA―A線に沿う断面図、第3図は
従来のイオンセンサ用測定回路の一例を示す回路
図、第4図はこの発明に係るイオンセンサ用測定
回路の一例を示す電気回路図、第5図は第4図の
作動を説明するための特性図である。
2……共通ドレイン、3……比較電極ソース、
4……センサソース、5……基準電極、11……
センサゲート、12……比較電極ゲート、22…
…減算回路、25,26……電流制御器。
FIG. 1 is a plan view showing an example of an ion sensor, FIG. 2 is a sectional view taken along the line AA in FIG. 1, FIG. 3 is a circuit diagram showing an example of a conventional measurement circuit for an ion sensor, and FIG. The figure is an electric circuit diagram showing an example of the measurement circuit for an ion sensor according to the present invention, and FIG. 5 is a characteristic diagram for explaining the operation of FIG. 4. 2... Common drain, 3... Reference electrode source,
4...Sensor source, 5...Reference electrode, 11...
Sensor gate, 12... Comparison electrode gate, 22...
...Subtraction circuit, 25, 26...Current controller.
Claims (1)
ンサゲート、比較電極ゲートおよび基準電極をも
つたイオンセンサと、上記各ゲートのゲート電位
と基準電極の界面電位の差出力を取り出す減算回
路とを備えたイオンセンサ用測定回路において、
上記センサの各ソースに流れるソース・ドレイン
電流を制御する電流制御器を設け、上記基準電極
に対するセンサの温度依存特性と、上記基準電極
に対する比較電極の温度依存特性とが等しくなる
ように上記電流制御器を操作してその温度依存特
性を消去し得るように構成したことを特徴とする
イオンセンサ用測定回路。1. An ion sensor comprising an ion sensor having a sensor gate of an insulated gate field effect transistor structure, a comparison electrode gate, and a reference electrode, and a subtraction circuit for extracting the difference output between the gate potential of each gate and the interface potential of the reference electrode. In the measurement circuit for
A current controller is provided to control the source-drain current flowing through each source of the sensor, and the current is controlled so that the temperature dependence characteristic of the sensor with respect to the reference electrode is equal to the temperature dependence characteristic of the comparison electrode with respect to the reference electrode. 1. A measurement circuit for an ion sensor, characterized in that it is configured such that its temperature dependent characteristics can be erased by operating the device.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5690180A JPS56153247A (en) | 1980-04-28 | 1980-04-28 | Measuring circuit for ion sensor |
GB8112795A GB2077439B (en) | 1980-04-28 | 1981-04-24 | Compensating temperature-dependent characteristic changes in ion-sensitive fet transducers |
US06/257,605 US4385274A (en) | 1980-04-28 | 1981-04-27 | Method and device for compensating temperature-dependent characteristic change in ion-sensitive FET transducer |
DE19813116884 DE3116884A1 (en) | 1980-04-28 | 1981-04-28 | METHOD AND CIRCUIT FOR MEASURING ION ACTIVITY IN LIQUIDS |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5690180A JPS56153247A (en) | 1980-04-28 | 1980-04-28 | Measuring circuit for ion sensor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56153247A JPS56153247A (en) | 1981-11-27 |
JPS6260662B2 true JPS6260662B2 (en) | 1987-12-17 |
Family
ID=13040348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5690180A Granted JPS56153247A (en) | 1980-04-28 | 1980-04-28 | Measuring circuit for ion sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56153247A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0587062U (en) * | 1992-04-22 | 1993-11-22 | 松下電工株式会社 | Embedded hand wash |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59171852A (en) * | 1983-03-22 | 1984-09-28 | Nec Corp | Semiconductor ion sensor |
JPS6029657A (en) * | 1983-07-28 | 1985-02-15 | Mitsubishi Electric Corp | Glucose sensor |
DE3480430D1 (en) * | 1983-08-24 | 1989-12-14 | Cordis Europ | Apparatus for selectively measuring ions in a liquid |
JPS61153559A (en) * | 1984-12-27 | 1986-07-12 | Mitsubishi Electric Corp | Semiconductor enzyme sensor |
JPS636350U (en) * | 1986-06-25 | 1988-01-16 | ||
JP6506592B2 (en) * | 2015-04-01 | 2019-04-24 | 日立オートモティブシステムズ株式会社 | Sensor device |
-
1980
- 1980-04-28 JP JP5690180A patent/JPS56153247A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0587062U (en) * | 1992-04-22 | 1993-11-22 | 松下電工株式会社 | Embedded hand wash |
Also Published As
Publication number | Publication date |
---|---|
JPS56153247A (en) | 1981-11-27 |
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