JPS6254230B2 - - Google Patents

Info

Publication number
JPS6254230B2
JPS6254230B2 JP53137018A JP13701878A JPS6254230B2 JP S6254230 B2 JPS6254230 B2 JP S6254230B2 JP 53137018 A JP53137018 A JP 53137018A JP 13701878 A JP13701878 A JP 13701878A JP S6254230 B2 JPS6254230 B2 JP S6254230B2
Authority
JP
Japan
Prior art keywords
shadow mask
mask
center
cross
bridge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53137018A
Other languages
Japanese (ja)
Other versions
JPS5564347A (en
Inventor
Makoto Kudo
Yasuhisa Ootake
Yasushi Sengoku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP13701878A priority Critical patent/JPS5564347A/en
Publication of JPS5564347A publication Critical patent/JPS5564347A/en
Publication of JPS6254230B2 publication Critical patent/JPS6254230B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)

Description

【発明の詳細な説明】 この発明は例えばカラーテレビジヨン受像機に
使用して好適なカラー受像管用シヤドウマスクに
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a shadow mask for a color picture tube suitable for use in, for example, a color television receiver.

一般にシヤドウマスク式のカラー受像管は第1
図に示すように構成され、電子銃1を内蔵したネ
ツク2に漏斗状のフアンネル3が連接され、この
フアンネル3にはパネル4が接合されている。こ
のパネル4内面には螢光面5が形成され、この螢
光面5と所定間隔をおいてシヤドウマスク6が配
設され、このシヤドウマスク6はフレーム7に取
付けられ支持されている。このフレーム7は前記
パネル4内側壁に装着されている。そして動作時
には電子銃1から発射された電子ビームが偏向ヨ
ーク8により偏向され、螢光面5を走査して映像
を再現する。
Generally, the shadow mask type color picture tube is the
It is constructed as shown in the figure, and a funnel-shaped funnel 3 is connected to a net 2 containing an electron gun 1, and a panel 4 is joined to the funnel 3. A fluorescent surface 5 is formed on the inner surface of the panel 4, and a shadow mask 6 is disposed at a predetermined distance from the fluorescent surface 5, and the shadow mask 6 is attached to and supported by a frame 7. This frame 7 is attached to the inner wall of the panel 4. During operation, the electron beam emitted from the electron gun 1 is deflected by the deflection yoke 8 and scans the fluorescent surface 5 to reproduce an image.

ところで、上記のシヤドウマスク6は従来、第
2図に示すように1枚の薄い金属板からなり、多
数の矩形孔9がその長径が電子ビームの垂直走査
方向に向くように略一定間隔で穿設されている。
尚、第2図は螢光面5側からシヤドウマスク6を
見た正面図であり、矩形孔9は外側の大きい矩形
9aが螢光面5側の開口で、内側の細長い矩形9
bが電子銃1側の開口である。この第2図におけ
る矩形孔9の垂直方向ピツチを規定している遮蔽
部10をY−Y′線に沿つて切断した断面図が第
3図であり、いわゆるブリツヂ断面と称している
が、この断面形状は第4図a,bに示す如くシヤ
ドウマスクの中心部も周辺部も同じである。図
中、11は電子ビームである。尚、第3図では、
図の上方が螢光面5側であり、下方が電子銃1側
になつている。
By the way, the above-mentioned shadow mask 6 has conventionally been made of a single thin metal plate, as shown in FIG. 2, in which a large number of rectangular holes 9 are bored at approximately constant intervals so that their major axes face the vertical scanning direction of the electron beam. has been done.
Note that FIG. 2 is a front view of the shadow mask 6 seen from the fluorescent surface 5 side, and the rectangular hole 9 has a large rectangular hole 9a on the outside facing the fluorescent surface 5, and an elongated rectangular hole 9 on the inside.
b is the opening on the electron gun 1 side. FIG. 3 is a sectional view taken along the line Y-Y' of the shielding part 10 that defines the vertical pitch of the rectangular hole 9 in FIG. 2, and is called a bridge section. As shown in FIGS. 4a and 4b, the cross-sectional shape is the same at both the center and the periphery of the shadow mask. In the figure, 11 is an electron beam. In addition, in Figure 3,
The upper side of the figure is the fluorescent surface 5 side, and the lower side is the electron gun 1 side.

ところが上記のような従来のシヤドウマスクを
使用したカラー受像管には次のような欠点があ
る。即ち、電子銃1から射出された電子ビームは
矩形孔9を通過する際に遮蔽部10で遮蔽される
が、このとき第4図a及びbに示す如く電子ビー
ム11はマスク中心部においてはブリツヂ部1
2,13で遮蔽され、マスク周辺部ではブリツヂ
部14,15で遮蔽される。そしてマスク中心部
のブリツヂ部12,13は小側ブリツヂ16と大
側ブリツヂ17からのマスクエツチングによる合
致点で寸法は不安定であり、現状はスリツト巾の
バラツキに対し2倍ぐらいのばらつきを持つ。こ
の寸法バラツキは、電子ビームが矩形孔を通過す
る際に所望する電子ビーム形状を不均一にするた
め、螢光面5に達したときに画像のホワイトユニ
ホミテイの劣化をもたらす。
However, the color picture tube using the conventional shadow mask as described above has the following drawbacks. That is, the electron beam emitted from the electron gun 1 is blocked by the shielding part 10 when passing through the rectangular hole 9, but at this time, the electron beam 11 is blocked by a bridge at the center of the mask, as shown in FIGS. Part 1
2 and 13, and bridge portions 14 and 15 at the mask periphery. The bridge portions 12 and 13 at the center of the mask are the matching points formed by mask etching from the small bridge 16 and the large bridge 17, and their dimensions are unstable, and currently they vary by about twice as much as the variation in slit width. . This dimensional variation makes the desired shape of the electron beam non-uniform when the electron beam passes through the rectangular hole, resulting in deterioration of the white uniformity of the image when it reaches the fluorescent surface 5.

この発明は上記事情に鑑みなされたもので、シ
ヤドウマスクの中心部と周辺部でブリツジ断面形
状を異ならせることにより、カラー受像管の中心
部及び周辺部の画像のホワイトユニホミテイの向
上を図つたカラー受像管用シヤドウマスクを提供
することを目的とする。
This invention was made in view of the above circumstances, and is a color picture tube that improves the white uniformity of images in the center and periphery of a color picture tube by making the cross-sectional shape of the bridge different between the center and periphery of the shadow mask. The purpose of the present invention is to provide a shadow mask for a picture tube.

以下、図面を参照してこの発明の一実施例を詳
細に説明する。この発明のシヤドウマスクは、従
来例(第2図)と同様に1枚の金属板に略一定間
隔に多数の矩形孔9を長径が電子ビームの垂直走
査方向に向くように形成してなつている。そし
て、上記欠点を改善するために、矩形孔9の垂直
方向ピツチを規定している遮蔽部10の断面形状
が第5図a,bに示すように設定されている。即
ち、aはマスク中心部、bはマスク周辺部におけ
る遮蔽部10の断面形状であり、図の上方が螢光
面側、下方が電子銃側である。図から明らかなよ
うにマスク中心部とマスク周辺部では明らかに断
面形状が異なつており、マスクブリツヂの小側巾
18、大側巾19をマスク中心部において小側巾
18>大側巾19とし、マスク周辺部において小
側巾20≒大側巾21に設定されている。
Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings. The shadow mask of the present invention, like the conventional example (FIG. 2), has a large number of rectangular holes 9 formed at approximately regular intervals in a single metal plate, with the major axis facing the vertical scanning direction of the electron beam. . In order to improve the above drawback, the cross-sectional shape of the shielding part 10 defining the vertical pitch of the rectangular hole 9 is set as shown in FIGS. 5a and 5b. That is, a is the cross-sectional shape of the shielding part 10 at the center of the mask, and b is the cross-sectional shape of the shielding part 10 at the periphery of the mask, with the upper side of the figure being the fluorescent surface side and the lower side being the electron gun side. As is clear from the figure, the cross-sectional shapes are clearly different between the center of the mask and the peripheral area of the mask, and the small width 18 and large width 19 of the mask bridge are set such that small width 18 > large width 19 at the center of the mask. The small side width 20≒large side width 21 is set in the peripheral portion of the mask.

次に上記構成のこの発明のシヤドウマスクの製
造方法を説明する。第6図a,bに示すように、
マスク中心部において小側ネガ原版22に比し大
側ネガ原版23の方がブリツヂ巾24が小とな
り、マスク周辺部においてブリツヂ巾25が略同
一となる。小ネガ原版22,26及び大ネガ原版
23,27を一対のネガ原版とし、写真餌刻法を
用い例えば厚み0.15mmの鋼板に感光液を塗布し、
前記大小のネガ原版を介してプリントを行ない、
次いで現像、乾燥、バーニング処理し、最終的に
エツチング液で腐蝕を行なう。
Next, a method for manufacturing the shadow mask of the present invention having the above structure will be explained. As shown in Figure 6a and b,
The bridge width 24 of the large negative original 23 is smaller than that of the small negative original 22 at the center of the mask, and the bridge width 25 is approximately the same at the periphery of the mask. The small negative master plates 22, 26 and the large negative master plates 23, 27 are used as a pair of negative master plates, and a photosensitive liquid is applied to a steel plate with a thickness of 0.15 mm, for example, using a photographic bait engraving method.
Printing is performed through the negative master plates of the above-mentioned sizes,
The film is then developed, dried, burned, and finally etched with an etching solution.

この発明のシヤドウマスクは上記説明及び図示
のように構成され、多数の矩形孔の垂直方向ピツ
チを規定している遮蔽部10の断面形状がマスク
中心部と周辺部とで異なつているため、次のよう
な優れた効果を有している。即ち、マスク中心部
においては小側巾18の方が大側巾19より寸法
が大きいため、マスクエツチング時の合致点は小
側巾18に近ずきブリツヂ巾バラツキは安定し、
この結果、電子ビームが矩形孔を通過した際の形
状が安定するので、受像管の中心部画像のホワイ
トユニホミテイーが向上する。又、マスク周辺部
に近ずくに従つて小側巾20と大側巾21の寸法
が略同一となるため、ブリツヂ断面積も大きくな
り、引張り強度が増加する。この結果、マスクプ
レス成形時にスプリングバツクによる辺落ち量を
極力抑えることになり、受像管の周辺部における
ホワイトユニホミテイーも著しく向上する。
The shadow mask of the present invention is constructed as described above and shown in the drawings, and the cross-sectional shape of the shielding part 10 that defines the vertical pitch of the many rectangular holes is different between the center part and the peripheral part of the mask. It has such excellent effects. That is, in the center of the mask, the small width 18 is larger than the large width 19, so the matching point during mask etching approaches the small width 18, and the bridge width variations are stabilized.
As a result, the shape of the electron beam when it passes through the rectangular hole is stabilized, so that the white uniformity of the image at the center of the picture tube is improved. Moreover, since the dimensions of the small width 20 and the large width 21 become approximately the same as they approach the peripheral portion of the mask, the cross-sectional area of the bridge also increases and the tensile strength increases. As a result, the amount of edge drop due to spring back during mask press molding is suppressed to the utmost, and white uniformity in the peripheral area of the picture tube is also significantly improved.

尚、マスク周辺部のブリツヂ強度を更に増大す
る必要のある場合は、マスク中心部のブリツヂ巾
寸法により5〜20mμ寸法を大きくすると、より
一層ブリツヂ強度が増加する。
Incidentally, if it is necessary to further increase the bridge strength at the periphery of the mask, the bridge width at the center of the mask can be increased by 5 to 20 m.mu. to further increase the bridge strength.

以上説明したようにこの発明によれば、実用的
価値大なるカラー受像管用シヤドウマスクを提供
することができる。
As explained above, according to the present invention, it is possible to provide a shadow mask for a color picture tube that has great practical value.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は一般に使用されているカラー受像管を
示す断面図、第2図は従来のシヤドウマスクの要
部を示す正面図、第3図は第2図のシヤドウマス
クにおける遮蔽部の断面図、第4図a,bはそれ
ぞれ従来のシヤドウマスクの中心部と周辺部にお
ける遮蔽部断面形状と電子ビームとの関係を示す
断面図、第5図a,bはこの発明の一実施例に係
るシヤドウマスクの中心部と周辺部における遮蔽
部の断面形状を示す断面図、第6図a,bは同じ
く製造方法を示す正面図である。 9……矩形孔、10……遮蔽部。
Fig. 1 is a sectional view showing a generally used color picture tube, Fig. 2 is a front view showing the main parts of a conventional shadow mask, Fig. 3 is a sectional view of the shielding part in the shadow mask shown in Fig. 2, and Fig. 4 is a sectional view showing the main parts of a conventional shadow mask. Figures a and b are cross-sectional views showing the relationship between the cross-sectional shape of the shielding part and the electron beam in the central and peripheral parts of a conventional shadow mask, respectively, and Figures a and b are the central part of a shadow mask according to an embodiment of the present invention. FIGS. 6A and 6B are front views showing the same manufacturing method. 9... Rectangular hole, 10... Shielding part.

Claims (1)

【特許請求の範囲】[Claims] 1 1枚の金属板に略一定間隔に多数の矩形孔を
長径が電子ビームの垂直走査方向に向くように形
成したシヤドウマスクにおいて、前記多数の矩形
孔の垂直方向ピツチを規定している遮蔽部の断面
形状がシヤドウマスク中心部と周辺部で異なつて
おり、この断面部の最大幅部の位置が、シヤドウ
マスク中心部では小孔側に位置し、周辺部ではシ
ヤドウマスク板厚のほぼ中央に位置することを特
徴とするカラー受像管用シヤドウマスク。
1. In a shadow mask in which a large number of rectangular holes are formed at approximately constant intervals in a single metal plate so that the major axis faces the vertical scanning direction of the electron beam, the shielding part that defines the vertical pitch of the large number of rectangular holes is The cross-sectional shape is different between the center and periphery of the shadow mask, and the maximum width of this cross-section is located on the small hole side in the center of the shadow mask, and approximately at the center of the thickness of the shadow mask in the periphery. Features a shadow mask for color picture tubes.
JP13701878A 1978-11-07 1978-11-07 Shadow mask for color image pick-up tube Granted JPS5564347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13701878A JPS5564347A (en) 1978-11-07 1978-11-07 Shadow mask for color image pick-up tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13701878A JPS5564347A (en) 1978-11-07 1978-11-07 Shadow mask for color image pick-up tube

Publications (2)

Publication Number Publication Date
JPS5564347A JPS5564347A (en) 1980-05-15
JPS6254230B2 true JPS6254230B2 (en) 1987-11-13

Family

ID=15188896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13701878A Granted JPS5564347A (en) 1978-11-07 1978-11-07 Shadow mask for color image pick-up tube

Country Status (1)

Country Link
JP (1) JPS5564347A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1220275A3 (en) 2000-12-28 2007-06-06 Kabushiki Kaisha Toshiba Shadow mask and color cathode ray tube

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222474A (en) * 1975-08-13 1977-02-19 Matsushita Electronics Corp Shadow mask for color picture tube
JPS5278362A (en) * 1975-11-20 1977-07-01 Matsushita Electronics Corp Shadow mask for color picture tube
JPS5310961A (en) * 1976-07-19 1978-01-31 Hitachi Ltd Color picture tube

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52116155U (en) * 1976-02-28 1977-09-03

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222474A (en) * 1975-08-13 1977-02-19 Matsushita Electronics Corp Shadow mask for color picture tube
JPS5278362A (en) * 1975-11-20 1977-07-01 Matsushita Electronics Corp Shadow mask for color picture tube
JPS5310961A (en) * 1976-07-19 1978-01-31 Hitachi Ltd Color picture tube

Also Published As

Publication number Publication date
JPS5564347A (en) 1980-05-15

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