JPS6249231U - - Google Patents

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Publication number
JPS6249231U
JPS6249231U JP14114985U JP14114985U JPS6249231U JP S6249231 U JPS6249231 U JP S6249231U JP 14114985 U JP14114985 U JP 14114985U JP 14114985 U JP14114985 U JP 14114985U JP S6249231 U JPS6249231 U JP S6249231U
Authority
JP
Japan
Prior art keywords
outlet
inert gas
constant temperature
gas inlet
utility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14114985U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14114985U priority Critical patent/JPS6249231U/ja
Publication of JPS6249231U publication Critical patent/JPS6249231U/ja
Pending legal-status Critical Current

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Description

【図面の簡単な説明】
第1図は従来のこの種槽の例を示す略線的斜視
図、第2図は本考案の一実施例を示す斜視図、第
3図は小容器の例を示す斜視図、第4図及び第5
図は使用状態の例を示す図である。 2……引き出し、7……扉、8……小容器、1
0……恒温槽、15,16……不活性ガスの導入
口及び排出口、25……入口、26……出口。

Claims (1)

    【実用新案登録請求の範囲】
  1. 不活性ガスの導入口と排出口とを具備した出し
    入れ自由の複数の小容器で構成されたことを特徴
    とする恒温槽。
JP14114985U 1985-09-14 1985-09-14 Pending JPS6249231U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14114985U JPS6249231U (ja) 1985-09-14 1985-09-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14114985U JPS6249231U (ja) 1985-09-14 1985-09-14

Publications (1)

Publication Number Publication Date
JPS6249231U true JPS6249231U (ja) 1987-03-26

Family

ID=31048669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14114985U Pending JPS6249231U (ja) 1985-09-14 1985-09-14

Country Status (1)

Country Link
JP (1) JPS6249231U (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS485323U (ja) * 1972-04-25 1973-01-22
JPS5691436A (en) * 1979-12-26 1981-07-24 Fujitsu Ltd Method for heating semiconductor substrate
JPS5691425A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Resist heat treatment device
JPS5726433A (en) * 1980-07-23 1982-02-12 Hitachi Ltd Bake of photoresist or the like and apparatus therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS485323U (ja) * 1972-04-25 1973-01-22
JPS5691425A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Resist heat treatment device
JPS5691436A (en) * 1979-12-26 1981-07-24 Fujitsu Ltd Method for heating semiconductor substrate
JPS5726433A (en) * 1980-07-23 1982-02-12 Hitachi Ltd Bake of photoresist or the like and apparatus therefor

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