JPS6249231U - - Google Patents
Info
- Publication number
- JPS6249231U JPS6249231U JP14114985U JP14114985U JPS6249231U JP S6249231 U JPS6249231 U JP S6249231U JP 14114985 U JP14114985 U JP 14114985U JP 14114985 U JP14114985 U JP 14114985U JP S6249231 U JPS6249231 U JP S6249231U
- Authority
- JP
- Japan
- Prior art keywords
- outlet
- inert gas
- constant temperature
- gas inlet
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Packages (AREA)
Description
第1図は従来のこの種槽の例を示す略線的斜視
図、第2図は本考案の一実施例を示す斜視図、第
3図は小容器の例を示す斜視図、第4図及び第5
図は使用状態の例を示す図である。 2……引き出し、7……扉、8……小容器、1
0……恒温槽、15,16……不活性ガスの導入
口及び排出口、25……入口、26……出口。
図、第2図は本考案の一実施例を示す斜視図、第
3図は小容器の例を示す斜視図、第4図及び第5
図は使用状態の例を示す図である。 2……引き出し、7……扉、8……小容器、1
0……恒温槽、15,16……不活性ガスの導入
口及び排出口、25……入口、26……出口。
Claims (1)
- 不活性ガスの導入口と排出口とを具備した出し
入れ自由の複数の小容器で構成されたことを特徴
とする恒温槽。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14114985U JPS6249231U (ja) | 1985-09-14 | 1985-09-14 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14114985U JPS6249231U (ja) | 1985-09-14 | 1985-09-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6249231U true JPS6249231U (ja) | 1987-03-26 |
Family
ID=31048669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14114985U Pending JPS6249231U (ja) | 1985-09-14 | 1985-09-14 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6249231U (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS485323U (ja) * | 1972-04-25 | 1973-01-22 | ||
JPS5691436A (en) * | 1979-12-26 | 1981-07-24 | Fujitsu Ltd | Method for heating semiconductor substrate |
JPS5691425A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Resist heat treatment device |
JPS5726433A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Bake of photoresist or the like and apparatus therefor |
-
1985
- 1985-09-14 JP JP14114985U patent/JPS6249231U/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS485323U (ja) * | 1972-04-25 | 1973-01-22 | ||
JPS5691425A (en) * | 1979-12-25 | 1981-07-24 | Seiko Epson Corp | Resist heat treatment device |
JPS5691436A (en) * | 1979-12-26 | 1981-07-24 | Fujitsu Ltd | Method for heating semiconductor substrate |
JPS5726433A (en) * | 1980-07-23 | 1982-02-12 | Hitachi Ltd | Bake of photoresist or the like and apparatus therefor |