JPS6245496A - Reflection type mask for laser - Google Patents

Reflection type mask for laser

Info

Publication number
JPS6245496A
JPS6245496A JP60185449A JP18544985A JPS6245496A JP S6245496 A JPS6245496 A JP S6245496A JP 60185449 A JP60185449 A JP 60185449A JP 18544985 A JP18544985 A JP 18544985A JP S6245496 A JPS6245496 A JP S6245496A
Authority
JP
Japan
Prior art keywords
laser
reflection
reflective
mask
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60185449A
Other languages
Japanese (ja)
Inventor
Koichi Hiratsuka
平塚 宏一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60185449A priority Critical patent/JPS6245496A/en
Publication of JPS6245496A publication Critical patent/JPS6245496A/en
Pending legal-status Critical Current

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  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To execute marking without line disconnection by providing a reflection surface having the shape of a character or figure on one surface of a substrate having laser light transmittability and covering the inside and circumference thereof with a light scattering surface or antireflection surface. CONSTITUTION:A reflection type mask 5 has the reflection surface 1 formed by subjected one surface of the substrate 4 having the laser light transmittability to reflection coating having the shape of the character or figure and the light scattering surfaces or the antireflection surfaces 2, 3 subjected to antireflection coating. The pulse laser light emitted from a TEA-CO2 laser light source 6 is reflected only in the part of the marking pattern by the mask 5 and is imaged to the surface 8 to be worked by a condenser lens 7. The marking without the line disconnection is thus made possible.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、文字、数字、商標などを高速かつ効果的にマ
ーキングする装置に関し、特に発振器としてTEA  
Co2レーザを用いたレーザマーカのマスクに関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a device for quickly and effectively marking characters, numbers, trademarks, etc.
This invention relates to a laser marker mask using a Co2 laser.

従来の技術 従来のTEA Cotレーザマーカに使用されるマスク
は、第2図(a)に示すように、その基板14が文字、
数字、商標などの形状をした透過開口11と反射面12
および13から構成されている。そしてこのマスク15
はレーザマーカの一部として第2図(b)に示すように
使用される。TEA Co、レーザ光源6から発射され
たパルスレーザ光は反射鏡17で反射され、この透過形
マスク15を照射する。透過開口11を通過した光は、
集光レンズ7によって被加工面8に結像される。透過開
口以外に照射された光は反射面12あるいは13によっ
て反射され、透過開口11の形状が被加工面8にマーキ
ングされる。
2. Description of the Related Art A mask used in a conventional TEA Cot laser marker has a substrate 14 with characters, as shown in FIG. 2(a).
Transmissive aperture 11 and reflective surface 12 in the shape of numbers, trademarks, etc.
and 13. And this mask 15
is used as a part of a laser marker as shown in FIG. 2(b). A pulsed laser beam emitted from a TEA Co laser light source 6 is reflected by a reflecting mirror 17 and irradiates this transmission type mask 15 . The light passing through the transmission aperture 11 is
An image is formed on the surface to be processed 8 by the condensing lens 7 . The light irradiated onto areas other than the transmission aperture is reflected by the reflection surface 12 or 13, and the shape of the transmission aperture 11 is marked on the surface 8 to be processed.

発明が解決しようとする問題点 上述した従来のTEA CO,レーザマーカ用マスクは
、Alなどの金属板で透過開口と反射面が構成され、透
過開口11の形状は文字や数字であるが、O,Aなどの
場合完全な切抜きを行うと内部反射面13が脱落してし
まうので、外部反射面12との間に結合部16を設けな
ければならない。結合部16を設けると、被加工面8に
マーキングされた文字には線切れを生じ品質を低下させ
る。
Problems to be Solved by the Invention In the conventional TEA CO and laser marker masks described above, the transmission aperture and the reflection surface are made of a metal plate such as Al, and the shape of the transmission aperture 11 is a letter or a number. In cases such as A, if the internal reflective surface 13 is completely cut out, it will fall off, so a connecting portion 16 must be provided between the internal reflective surface 13 and the external reflective surface 12. When the connecting portion 16 is provided, the characters marked on the surface to be processed 8 will have line breakage, which will degrade the quality.

問題点を解決するための手段 本発明のレーザ用反射形マスクは、レーザ光に対して透
過性のある基板上に、文字−や数字などの形状をした反
射コーティングを施した反射面を設け、その内部および
周囲は光散乱面または反射防止コーティングを施した反
射防止面で覆っである。
Means for Solving the Problems The laser reflective mask of the present invention includes a reflective surface coated with a reflective coating in the shape of letters or numbers on a substrate that is transparent to laser light. Its interior and surroundings are covered with a light-scattering surface or an anti-reflection surface with an anti-reflection coating.

作用 本発明によるレーザ用反射形マスクは、これにレーザ光
を照射し、その反射光によって加工を行えば、線切ハ、
のないマーキングが可能になる。
Function: The laser reflective mask according to the present invention can cut lines by irradiating it with laser light and processing it using the reflected light.
It becomes possible to make markings without markings.

実施例 次に本発明について図面を参照して説明する。Example Next, the present invention will be explained with reference to the drawings.

第1図(a)は本発明の実施例の斜視図である。本発明
によるレーザ用反射形マスク5は、SiあるいはGeな
ど透過性材料で作られた基板4の片面上に、光学薄膜に
よる反射コーティングが施された反射面1と、光散乱面
または光学薄膜による反射防止コーティングが施された
反射防止面2および3が設けられている。反射面1は文
字や数字などの形状をしており、反射防止面のうち2は
外部反射防止面、3は内部反射防止面である。外部反射
防止面2と内部反射防止面3との間をつなぐ結合部(第
2図(a)の16に相当するもの)は不必要である。従
って文字の線切れは生じない。
FIG. 1(a) is a perspective view of an embodiment of the present invention. A laser reflective mask 5 according to the present invention has a reflective surface 1 coated with an optical thin film on one side of a substrate 4 made of a transparent material such as Si or Ge, and a reflective surface 1 coated with a light scattering surface or an optical thin film. Anti-reflective surfaces 2 and 3 are provided with anti-reflective coatings. The reflective surfaces 1 are shaped like letters or numbers, and two of the antireflection surfaces are external antireflection surfaces and three are internal antireflection surfaces. A coupling portion (corresponding to 16 in FIG. 2(a)) connecting the outer antireflection surface 2 and the inner antireflection surface 3 is unnecessary. Therefore, line breaks in characters do not occur.

このレーザ用反射形マスクの使用例を第1図(b)に示
す。TEACO,レーザ光源6から発射されたパルスレ
ーザ光は本発明による反射形マスク5によってマーキン
グパターンの部分のλが反射され5集光レンズ7によっ
て被加工面8に結像され、線切れのないマーキングが行
われる。
An example of the use of this laser reflective mask is shown in FIG. 1(b). The pulsed laser beam emitted from the TEACO laser light source 6 is reflected by the reflective mask 5 according to the present invention at a portion of the marking pattern λ, and is imaged onto the workpiece surface 8 by the condenser lens 7, resulting in marking without line breakage. will be held.

以上はTEA Co、レーザによる場合であるが、反射
形マスク5の基板4の材質をガラスにすればYAGレー
ザ等にも適用可能である。
The above is a case using TEA Co and a laser, but if the material of the substrate 4 of the reflective mask 5 is glass, it can also be applied to a YAG laser or the like.

発明の効果 以上に説明したように、本発明によれば、基板の片面に
文字などの形状をした反射面とその内部および周囲に光
散乱面または反射防止面を設けたので、A、B、Oなど
の丸抜き文字を線切れなくマーキングすることを可能に
し、マーキングパターンの品質を向上させる効果がある
Effects of the Invention As explained above, according to the present invention, a reflective surface in the shape of letters or the like is provided on one side of the substrate, and a light scattering surface or an antireflection surface is provided inside and around the reflective surface. It is possible to mark round characters such as O without line breakage, and has the effect of improving the quality of the marking pattern.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)は本発明の実施例の斜視図、第1図fb)
はこれを使ったレーザマーカの構成図、第2図(a)は
従来例のレーザマーカ用マスクの斜視図、第2図fb)
はこれを使ったレーザマーカの構成図である。 1・・・・・・反射面、2・・・・・・外部反射防止(
寸たけ光散乱)面、3・・・・・・内部反射防止(また
は光散乱)面、4・・・・・・基板、5・・・・・・レ
ーザ用反射形マスク、6・・・・・・レーザ光源、7・
・・・・・集光レンズ、8・・・・・・被加工面。 −か沫勺 (d) 壬 1 図
Fig. 1(a) is a perspective view of an embodiment of the present invention, Fig. 1fb)
is a configuration diagram of a laser marker using this, Figure 2 (a) is a perspective view of a conventional laser marker mask, Figure 2 (fb)
is a configuration diagram of a laser marker using this. 1... Reflective surface, 2... External reflection prevention (
3...Internal reflection prevention (or light scattering) surface, 4...Substrate, 5...Reflective mask for laser, 6... ...Laser light source, 7.
... Condensing lens, 8... Surface to be processed. -Kasha (d) 壬 1 Figure

Claims (1)

【特許請求の範囲】[Claims] 基板の片面上に、マーキングしようとする文字や数字な
どの形状を有する反射コーティングを施した反射面と、
その内部および周囲に光散乱面または反射防止コーティ
ングを施した反射防止面とを具備していることを特徴と
するレーザ用反射形マスク。
A reflective surface coated with a reflective coating having the shape of letters, numbers, etc. to be marked on one side of the board;
1. A reflective laser mask characterized by comprising a light-scattering surface or an anti-reflection surface coated with an anti-reflection coating inside and around the mask.
JP60185449A 1985-08-23 1985-08-23 Reflection type mask for laser Pending JPS6245496A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60185449A JPS6245496A (en) 1985-08-23 1985-08-23 Reflection type mask for laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60185449A JPS6245496A (en) 1985-08-23 1985-08-23 Reflection type mask for laser

Publications (1)

Publication Number Publication Date
JPS6245496A true JPS6245496A (en) 1987-02-27

Family

ID=16170989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60185449A Pending JPS6245496A (en) 1985-08-23 1985-08-23 Reflection type mask for laser

Country Status (1)

Country Link
JP (1) JPS6245496A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5716507A (en) * 1994-12-13 1998-02-10 Nippondenso Co., Ltd. Oxygen sensor element
US8057950B2 (en) 2005-05-20 2011-11-15 Shinko Electric Industries Co., Ltd. Solid oxide fuel cell and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5716507A (en) * 1994-12-13 1998-02-10 Nippondenso Co., Ltd. Oxygen sensor element
US8057950B2 (en) 2005-05-20 2011-11-15 Shinko Electric Industries Co., Ltd. Solid oxide fuel cell and method of manufacturing the same

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