JPS6241145U - - Google Patents

Info

Publication number
JPS6241145U
JPS6241145U JP1985132930U JP13293085U JPS6241145U JP S6241145 U JPS6241145 U JP S6241145U JP 1985132930 U JP1985132930 U JP 1985132930U JP 13293085 U JP13293085 U JP 13293085U JP S6241145 U JPS6241145 U JP S6241145U
Authority
JP
Japan
Prior art keywords
recognition symbol
convex portion
substrate
mirror
concavo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1985132930U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985132930U priority Critical patent/JPS6241145U/ja
Publication of JPS6241145U publication Critical patent/JPS6241145U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本考案の実施例による認識記号付き基
板を示す斜視図、第２図は同実施例による認識記
号付き基板の加工を示す斜視図、第３図ａは同実
施例による認識記号加工におけるレーザビームの
軌跡を示す図、第３図ｂは同図ａに基づいて形成
された凹凸部を示す図、及び第４図は同実施例に
よる認識記号付き基板の読み取り装置を示す斜視
図である。 １……基板、２……端面、１０……凹部、１１
……凸部。 FIG. 1 is a perspective view showing a board with a recognition symbol according to an embodiment of the present invention, FIG. 2 is a perspective view showing processing of a board with a recognition symbol according to the same embodiment, and FIG. 3a is a perspective view showing processing of a recognition symbol according to the same embodiment. FIG. 3B is a diagram showing the uneven portion formed based on FIG. 3A, and FIG. be. DESCRIPTION OF SYMBOLS 1... Substrate, 2... End surface, 10... Recessed part, 11
...Protrusion.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 鏡面状に研磨された基板の端面に認識記号を表
わす凹凸部を形成し、凹部が粗面であり、凸部が
鏡面であることを特徴とする認識記号付き基板で
ある。 A substrate with a recognition symbol is characterized in that a concavo-convex portion representing a recognition symbol is formed on the end face of a mirror-polished substrate, and the concave portion is a rough surface and the convex portion is a mirror surface.
JP1985132930U 1985-08-30 1985-08-30 Pending JPS6241145U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985132930U JPS6241145U (en) 1985-08-30 1985-08-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985132930U JPS6241145U (en) 1985-08-30 1985-08-30

Publications (1)

Publication Number Publication Date
JPS6241145U true JPS6241145U (en) 1987-03-12

Family

ID=31032774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985132930U Pending JPS6241145U (en) 1985-08-30 1985-08-30

Country Status (1)

Country Link
JP (1) JPS6241145U (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09129578A (en) * 1995-10-31 1997-05-16 Nec Corp Manufacturing device and method of semiconductor substrate
JP2002116533A (en) * 2000-10-11 2002-04-19 Dainippon Printing Co Ltd Blanks for photomask with area code, photomask with area code and method for producing photomask
JP2006309143A (en) * 2005-03-30 2006-11-09 Hoya Corp Manufacturing method of mask blank glass substrate, manufacturing method of mask blank, mask blank glass substrate, and mask blank
JP2007033857A (en) * 2005-07-27 2007-02-08 Hoya Corp Method for manufacturing glass substrate for mask blanks, glass substrate for mask blanks, method for manufacturing mask blanks, and mask blanks
US7226705B2 (en) 2001-09-28 2007-06-05 Hoya Corporation Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus
JP2011070214A (en) * 2005-03-30 2011-04-07 Hoya Corp Method for manufacturing mask blank glass substrate, method for manufacturing mask blank, mask blank glass substrate, and mask blank
JP2015089861A (en) * 2013-11-06 2015-05-11 日本電気硝子株式会社 Sheet glass and method of producing sheet glass

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58144829A (en) * 1982-02-22 1983-08-29 Hoya Corp Method for marking base used for photomask blank
JPS5915938A (en) * 1982-07-19 1984-01-27 Hoya Corp Substrate for photomask blank applied with marking

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58144829A (en) * 1982-02-22 1983-08-29 Hoya Corp Method for marking base used for photomask blank
JPS5915938A (en) * 1982-07-19 1984-01-27 Hoya Corp Substrate for photomask blank applied with marking

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09129578A (en) * 1995-10-31 1997-05-16 Nec Corp Manufacturing device and method of semiconductor substrate
JP2002116533A (en) * 2000-10-11 2002-04-19 Dainippon Printing Co Ltd Blanks for photomask with area code, photomask with area code and method for producing photomask
US7226705B2 (en) 2001-09-28 2007-06-05 Hoya Corporation Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus
JP2006309143A (en) * 2005-03-30 2006-11-09 Hoya Corp Manufacturing method of mask blank glass substrate, manufacturing method of mask blank, mask blank glass substrate, and mask blank
JP2011070214A (en) * 2005-03-30 2011-04-07 Hoya Corp Method for manufacturing mask blank glass substrate, method for manufacturing mask blank, mask blank glass substrate, and mask blank
KR101161452B1 (en) * 2005-03-30 2012-07-20 호야 가부시키가이샤 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
JP2012190044A (en) * 2005-03-30 2012-10-04 Hoya Corp Mask blanks and method for manufacturing mask blanks
KR101306392B1 (en) * 2005-03-30 2013-09-09 호야 가부시키가이샤 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
TWI463248B (en) * 2005-03-30 2014-12-01 Hoya Corp Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
JP2007033857A (en) * 2005-07-27 2007-02-08 Hoya Corp Method for manufacturing glass substrate for mask blanks, glass substrate for mask blanks, method for manufacturing mask blanks, and mask blanks
JP2015089861A (en) * 2013-11-06 2015-05-11 日本電気硝子株式会社 Sheet glass and method of producing sheet glass

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