JPS6240528Y2 - - Google Patents

Info

Publication number
JPS6240528Y2
JPS6240528Y2 JP14483682U JP14483682U JPS6240528Y2 JP S6240528 Y2 JPS6240528 Y2 JP S6240528Y2 JP 14483682 U JP14483682 U JP 14483682U JP 14483682 U JP14483682 U JP 14483682U JP S6240528 Y2 JPS6240528 Y2 JP S6240528Y2
Authority
JP
Japan
Prior art keywords
bead portion
effective surface
shadow mask
electron beam
distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14483682U
Other languages
Japanese (ja)
Other versions
JPS5949346U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14483682U priority Critical patent/JPS5949346U/en
Publication of JPS5949346U publication Critical patent/JPS5949346U/en
Application granted granted Critical
Publication of JPS6240528Y2 publication Critical patent/JPS6240528Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)

Description

【考案の詳細な説明】[Detailed explanation of the idea]

〔考案の技術分野〕 本考案はシヤドウマスク形カラー受像管に内装
されるシヤドウマスクに関するものである。 〔考案の技術的背景〕 シヤドウマスクは通常第1図及び第2図に示す
ような構造を有している。 即ち、シヤドウマスク1は図示しないフラツト
マスクをプレス成形して形成され、多数の電子ビ
ーム通過孔部2が穿設さた有効面3と、周縁面4
との間にビード部5が設けられ、周縁面4からは
スカート部6が形成されている。 そしてこのビード部5はプレス成形する時、有
効面3の変形を防ぎ、また形状を保持する強度を
保つために有効面3の外側全周に設けている。 〔背景技術の問題点〕 しかるに、このようなシヤドウマスクではシヤ
ドウマスク外周の大きさ、カラー受像管の偏向角
などの制約からビード部5と有効面3の境界との
距離を充分に取れない部分があり、この部分にビ
ード部5をプレス成形により形成するとシヤドウ
マスク1の部分的伸びによりこのビード部5に近
い有効面3の電子ビーム通過孔部2の変形が発生
し易く、結果としてシヤドウマスク1を不良にす
る問題点がある。 〔考案の目的〕 本考案は前述した問題点に鑑みなされたもので
あり、有効面とビード部の距離によつてビード部
の大きさを変えることによりプレス成形時に有効
面の電子ビーム通過孔部の変形をほぼなくすか、
または少なくすることが可能なシヤドウマスクを
提供することを目的としている。 〔考案の概要〕 即ち、本考案は多数の電子ビーム通過孔部が穿
設された有効面と周縁面との間にビード部を形成
してなるシヤドウマスクにおいて、ビード部の大
きさが有効面とビード部の距離の大きい位置では
大きく、有効面とビード部の距離が短かくなるに
従つて次第に小さくなされていることを特徴とす
るシヤドウマスクである。 〔考案の実施例〕 次に本考案の実施例を第3図及び第4図により
説明する。 即ちシヤドウマスク11は図示しないフラツト
マスクをプレス成形して形成され、多数の電子ビ
ーム通過孔部12が穿設された有効面13と、周
縁面14との間にビード部15が設けられ、周縁
面14からはスカート部16が設けられている。 このビード部15はプレス成形する時、有効面
13の変形を防ぎまた形状を保持する強度を保つ
ために有効面13の外側全周に設けられている。 ここまでは従来のシヤドウマスク1とほぼ同様
であるが、本実施例では有効面13との距離が長
いビード部15を大きくし、このビード部15
より有効面13に近いビード部15はビード
部15より小さく、有効面13の隅部のように
有効面13との距離が更に短かいビード部15
はビード部15より更に小さくなされているこ
とを特徴としている。このビード部15の大きさ
Bと、有効面13からの距離Aとの関係は、本考
案者らが14インチカラー受像管用のシヤドウマス
クで実験した結果表のような関係にすることによ
りビード部15形成時における電子ビーム通過孔
部12の変形を最小にすることができた。
[Technical Field of the Invention] The present invention relates to a shadow mask installed in a shadow mask type color picture tube. [Technical background of the invention] A shadow mask usually has a structure as shown in FIGS. 1 and 2. That is, the shadow mask 1 is formed by press-molding a flat mask (not shown), and includes an effective surface 3 in which a large number of electron beam passage holes 2 are formed, and a peripheral surface 4.
A bead portion 5 is provided between them, and a skirt portion 6 is formed from the peripheral edge surface 4 . The bead portion 5 is provided on the entire outer circumference of the effective surface 3 in order to prevent deformation of the effective surface 3 during press molding and maintain strength to maintain the shape. [Problems with the Background Art] However, in such a shadow mask, there are parts where it is not possible to maintain a sufficient distance between the bead portion 5 and the boundary between the effective surface 3 due to constraints such as the size of the outer periphery of the shadow mask and the deflection angle of the color picture tube. If the bead portion 5 is formed in this portion by press molding, the electron beam passage hole portion 2 on the effective surface 3 near the bead portion 5 is likely to be deformed due to partial elongation of the shadow mask 1, resulting in the shadow mask 1 being defective. There is a problem with this. [Purpose of the invention] The present invention was devised in view of the above-mentioned problems, and it is possible to improve the electron beam passage hole portion of the effective surface during press molding by changing the size of the bead portion depending on the distance between the effective surface and the bead portion. Almost eliminate the deformation of
The purpose of the present invention is to provide a shadow mask that can reduce the number of shadows. [Summary of the invention] That is, the present invention provides a shadow mask in which a bead portion is formed between an effective surface having a large number of electron beam passage holes and a peripheral surface, and the size of the bead portion is smaller than that of the effective surface. This shadow mask is characterized in that it is large at a position where the distance between the bead portion is large and gradually becomes smaller as the distance between the effective surface and the bead portion becomes shorter. [Embodiment of the invention] Next, an embodiment of the invention will be described with reference to FIGS. 3 and 4. That is, the shadow mask 11 is formed by press-molding a flat mask (not shown), and a bead portion 15 is provided between an effective surface 13 in which a large number of electron beam passage holes 12 are formed and a peripheral surface 14. A skirt portion 16 is provided from the bottom. This bead portion 15 is provided on the entire outer circumference of the effective surface 13 in order to prevent the effective surface 13 from being deformed during press molding and to maintain the strength to maintain the shape. Up to this point, it is almost the same as the conventional shadow mask 1, but in this embodiment, the bead portion 151 having a long distance from the effective surface 13 is enlarged.
The bead portion 15 2 which is closer to the effective surface 13 than the bead portion 15 1 is smaller than the bead portion 15 1 and has a shorter distance from the effective surface 13 like the corner of the effective surface 13 .
is characterized in that it is made smaller than the bead portion 152 . The relationship between the size B of the bead portion 15 and the distance A from the effective surface 13 is as shown in the table of results of experiments conducted by the present inventors using a shadow mask for a 14-inch color picture tube. Deformation of the electron beam passage hole 12 during formation could be minimized.

〔考案の効果〕[Effect of idea]

前述のように本考案によれば特にビード部と有
効面の距離が変化する角形の有効面、即ちフラツ
トフエースを有するシヤドウマスクにおいて、ビ
ード部のプレス成形時の有効面に対する影響を極
力おさえることが可能であり、その結果有効面の
電子ビーム通過孔部の変形を最小におさえること
が出来るため、精度の良いシヤドウマスクが得ら
れることになり、その工業的価値は極めて大であ
る。
As mentioned above, according to the present invention, it is possible to minimize the influence of the bead portion on the effective surface during press forming, especially in a shadow mask having a rectangular effective surface in which the distance between the bead portion and the effective surface changes, that is, a flat face. As a result, the deformation of the electron beam passage hole in the effective surface can be minimized, so a highly accurate shadow mask can be obtained, and its industrial value is extremely large.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は従来のシヤドウマスクを示
す図であり、第1図は平面図、第2図は第1図の
要部説明用断面図、第3図及び第4図は本考案の
シヤドウマスクの一実施例を示す図であり、第3
図は平面図、第4図は第3図の要部説明用断面図
である。 2,12……電子ビーム通過孔部、3,13…
…有効面、4,14……周縁面、5,15,15
,15,15……ビード部、6,16……
スカート部。
1 and 2 are diagrams showing a conventional shadow mask. FIG. 1 is a plan view, FIG. 2 is a cross-sectional view for explaining the main part of FIG. 1, and FIGS. 3 and 4 are views of a conventional shadow mask. It is a figure showing one example of the shadow mask, and the third
The figure is a plan view, and FIG. 4 is a cross-sectional view for explaining the main part of FIG. 3. 2, 12... Electron beam passing hole portion, 3, 13...
...Effective surface, 4, 14...Peripheral surface, 5, 15, 15
1 , 15 2 , 15 3 ...Bead part, 6, 16...
Skirt part.

Claims (1)

【実用新案登録請求の範囲】 (1) 多数の電子ビーム通過孔部が穿設された有効
面と周縁面との間にビード部を形成してなるシ
ヤドウマスクにおいて、前記ビード部の大きさ
が前記有効面と前記ビード部の距離が長い位置
では大きく、前記有効面と前記ビード部の距離
が短かくなるに従つて次第に小さくなされてい
ることを特徴とするシヤドウマスク。 (2) ビード部が有効面を取り囲むように設けられ
ていることを特徴とする実用新案登録請求の範
囲第1項記載のシヤドウマスク。 (3) 電子ビーム通過孔部がほぼ長4角形でブリツ
ジを介して長手方向に連設され、ビード部がこ
の長手方向に対してほぼ直交した方向にのみ設
けられていることを特徴とする実用新案登録請
求の範囲第1項記載のシヤドウマスク。
[Utility Model Claims] (1) A shadow mask having a bead portion formed between an effective surface having a large number of electron beam passing holes and a peripheral surface, the size of the bead portion being large where the distance between the effective surface and the bead portion is long and gradually becoming smaller as the distance between the effective surface and the bead portion becomes shorter. (2) A shadow mask as claimed in claim 1, characterized in that the bead portion is provided so as to surround the effective surface. (3) A shadow mask as claimed in claim 1, characterized in that the electron beam passing holes are approximately rectangular and connected in the longitudinal direction via bridges, and the bead portion is provided only in a direction approximately perpendicular to the longitudinal direction.
JP14483682U 1982-09-27 1982-09-27 shadow mask Granted JPS5949346U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14483682U JPS5949346U (en) 1982-09-27 1982-09-27 shadow mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14483682U JPS5949346U (en) 1982-09-27 1982-09-27 shadow mask

Publications (2)

Publication Number Publication Date
JPS5949346U JPS5949346U (en) 1984-04-02
JPS6240528Y2 true JPS6240528Y2 (en) 1987-10-16

Family

ID=30322873

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14483682U Granted JPS5949346U (en) 1982-09-27 1982-09-27 shadow mask

Country Status (1)

Country Link
JP (1) JPS5949346U (en)

Also Published As

Publication number Publication date
JPS5949346U (en) 1984-04-02

Similar Documents

Publication Publication Date Title
SU1713449A3 (en) Cathode ray tube
US3947718A (en) Shadow mask having elongated apertures concave to vertical center line and increasing in pitch along x-axis with distance from said line
JPS6031063B2 (en) color video tube
US3973965A (en) Making shadow mask with slit-shaped apertures for CRT
US4893054A (en) Shadow mask type color cathode ray tube
JPS6240528Y2 (en)
GB2160354A (en) Color picture tube shadow mask
US4665339A (en) Color picture tube having improved slit column pattern
US4300070A (en) Cathode-ray tube screen border improvement
US5189334A (en) Cathode ray tube having shadow mask
US5057737A (en) Color picture tube mask frame
JPS6034783B2 (en) cathode ray tube
CA1237466A (en) Color picture tube having improved line screen
CA1237465A (en) Color picture tube having improved shadow mask
JPH056741A (en) Shadow mask, shadow mask baking original plate, and its manufacture
JPS5998562U (en) color picture tube
KR890001955B1 (en) Slot of shadow mask
TW504724B (en) Shadow mask type color cathode ray tube
JPH03192635A (en) Color picture tube
KR910004061Y1 (en) Shadow mask of color cathode ray tube
JPH0286027A (en) Shadow mask forming pattern and manufacture thereof
KR830000807B1 (en) Cathode ray tube with improved screen
GB2238423A (en) Shadow mask for a cathode-ray tube
JPS608366Y2 (en) Color picture tube shadow mask
JPH0729566Y2 (en) Cathode ray tube