JPS6240301B2 - - Google Patents
Info
- Publication number
- JPS6240301B2 JPS6240301B2 JP54124425A JP12442579A JPS6240301B2 JP S6240301 B2 JPS6240301 B2 JP S6240301B2 JP 54124425 A JP54124425 A JP 54124425A JP 12442579 A JP12442579 A JP 12442579A JP S6240301 B2 JPS6240301 B2 JP S6240301B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- quartz tube
- core
- temperature
- cladding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 27
- 239000011521 glass Substances 0.000 claims description 25
- 239000010453 quartz Substances 0.000 claims description 25
- 238000010438 heat treatment Methods 0.000 claims description 16
- 238000004017 vitrification Methods 0.000 claims description 12
- 238000005229 chemical vapour deposition Methods 0.000 claims description 9
- 239000013307 optical fiber Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 25
- 239000007789 gas Substances 0.000 description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 17
- 238000005253 cladding Methods 0.000 description 16
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 229910003902 SiCl 4 Inorganic materials 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910005793 GeO 2 Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012320 chlorinating reagent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
Description
【発明の詳細な説明】
この発明は、光フアイバの製造方法に関し、特
に内付けCVD法によつて母材を製造する工程に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an optical fiber, and particularly to a process of manufacturing a base material by an internal CVD method.
発明の背景
内付けCVD法においては、「第１、第２図のよ
うに」石英管１０を、フアイバのジヤケツトとし
て使う。酸水素炎２０などにより石英管１０を、
高温で、長時間加熱するので、石英管内のOH基
がコア１４まで拡散して、OH基による吸収損失
を増大させる。BACKGROUND OF THE INVENTION In the internal CVD method, a quartz tube 10 (as shown in FIGS. 1 and 2) is used as a jacket for the fiber. The quartz tube 10 is heated using an oxyhydrogen flame 20, etc.
Since the tube is heated at a high temperature for a long time, the OH groups in the quartz tube diffuse to the core 14, increasing absorption loss due to the OH groups.
それを防ぐため、現在、石英管のジヤケツト１
０とコア１４との中間にクラツド１２を設けるこ
とが行なわれている。ただし、このクラツドが薄
いと、効果が十分でない。ところが、クラツドを
形成するための加熱は、石英管１０の外から行な
うので、クラツド１２の層が厚くなるにつれて、
内部表面への熱の伝導が不十分になる。そして酸
化反応も、透明ガラス化もうまくゆかなくなる。
内面に伝導する熱量を増すために、加熱温度を上
げると、石英管１０が軟化し、径が縮まる。する
と肉厚が厚くなつて、内部への熱伝導を悪くす
る。このようなわけで、クラツド１２を厚くする
のにも限度がある。 To prevent this, we are currently using quartz tube jacket 1.
A cladding 12 is provided between the core 14 and the core 14. However, if this cladding is thin, the effect will not be sufficient. However, since the heating to form the cladding is performed from outside the quartz tube 10, as the layer of the cladding 12 becomes thicker,
Insufficient heat transfer to internal surfaces. The oxidation reaction and the formation of transparent glass also fail.
When the heating temperature is raised to increase the amount of heat conducted to the inner surface, the quartz tube 10 softens and its diameter decreases. As a result, the wall thickness becomes thicker, which impairs heat conduction to the inside. For this reason, there is a limit to how thick the cladding 12 can be made.
特に1.6μｍ帯まで非常に低損失なSiO2クラツ
ド、GeO2−SiO2コアの単一モードフアイバの場
合は、クラツドの生成温度が非常に高い。そのた
め、クラツドのたい積をますます困難にする。 In particular, in the case of SiO 2 clad and GeO 2 -SiO 2 core single mode fibers which have extremely low loss up to the 1.6 μm band, the clad formation temperature is extremely high. This makes crud accumulation increasingly difficult.
そこで、初めからOH基の少ない石英管を使用
すればよいようにも思える。しかし、OH基の少
ない石英管は、粘性が大きく、そのため気泡を多
く含む。そのため、強度の面から、光フアイバの
ジヤケツトには不適当とされている。実用的な、
泡のない石英管は、120〜200ppmのOH基を含ん
でいる。このような石英管を使つて1.39μｍにお
けるOH基による損失を10dB／Km以下にするに
は、SiO2クラツドの場合、クラツド径／コア径
比を５以上にしなければならない。しかし、従来
の方法では不可能である。 Therefore, it seems like it would be better to use a quartz tube with fewer OH groups from the beginning. However, quartz tubes with few OH groups have high viscosity and therefore contain many bubbles. Therefore, from the viewpoint of strength, it is considered unsuitable for use in optical fiber jackets. practical,
A bubble-free quartz tube contains 120-200 ppm OH groups. In order to reduce the loss due to OH groups at 1.39 μm to 10 dB/Km or less using such a quartz tube, in the case of a SiO 2 clad, the clad diameter/core diameter ratio must be 5 or more. However, this is not possible using conventional methods.
ところで、石英管中でOH基の拡散する距離Ｌ
は、次式で表わされる（注）。 By the way, the distance L over which OH groups diffuse in a quartz tube is
is expressed by the following formula (Note).
Ｌ＝√4 (1)
ただし
Ｄ＝AexpＢ／ＲＴcm2sec-1
ｔ：加熱時間
Ｔ：加熱温度
Ｒ：気体定数
Ａ、Ｂ：定数
これから、Ｔを低くすれば、Ｌが小さくなるこ
とがわかる。 L=√4 (1) However, D=AexpB/RTcm 2 sec -1 t: Heating time T: Heating temperature R: Gas constant A, B: Constant It can be seen from this that if T is lowered, L becomes smaller.
加熱温度を低くするためには、フアイバを、
P2O3−PiO2クラツド、P2O5−B2O3−SiO2コアな
どの型にすればよいことは知られている。しか
し、このようにすると、屈折率が変化する。また
B2O3やP2O5による赤外吸収が起きて、フアイバ
の損失特性も変化する。 In order to lower the heating temperature, use fibers,
It is known that a type such as a P 2 O 3 −PiO 2 clad or a P 2 O 5 −B 2 O 3 −SiO 2 core may be used. However, doing so changes the refractive index. Also
Infrared absorption by B 2 O 3 and P 2 O 5 occurs, and the loss characteristics of the fiber also change.
発明の目的
内付けCVD法を行なう際に、原料ガスにCl2ガ
スを加えると、折出する合成ガラスの透明ガラス
化温度が低下し、またその低下の度合いは、Cl2
ガスの量にほぼ比例する（Cl2を多くすると、透
明ガラス化温度は下がる）ことがわかつた。Purpose of the invention When performing the internal CVD method, when Cl 2 gas is added to the raw material gas, the transparent vitrification temperature of the synthetic glass that is precipitated decreases, and the degree of the decrease is
It was found that the temperature is almost proportional to the amount of gas (as the amount of Cl 2 increases, the transparent vitrification temperature decreases).
この発明は、上記の新しい認識に基づいて、屈
折率や損失特性を変化させずに、加熱温度を下
げ、それによつて石英管内に含まれているOH基
の拡散距離を短くして、コアまで拡散するOH基
を少なくすることのできる光フアイバの製造方法
の提供を目的とする。 Based on the above new recognition, this invention lowers the heating temperature without changing the refractive index or loss characteristics, thereby shortening the diffusion distance of the OH groups contained in the quartz tube to the core. The object of the present invention is to provide a method for manufacturing an optical fiber that can reduce the amount of OH groups that diffuse.
発明の構成とその説明
出発石英管の内面に、内付けCVD法によつて
合成ガラス膜をたい積させて母材を製造するに際
して、前記合成ガラスの原料ガスに、Cl2ガスを
加えて供給し、前記合成ガスの透明化温度を低下
させることによつて、Cl2ガスを加えないときの
加熱温度よりも低い加熱温度で、内付けCVD法
を行なうこと、を特徴とする。Structure and Description of the Invention When manufacturing a base material by depositing a synthetic glass film on the inner surface of a starting quartz tube by an internal CVD method, Cl 2 gas is added and supplied to the raw material gas for the synthetic glass. , characterized in that the internal CVD method is performed at a heating temperature lower than the heating temperature when Cl 2 gas is not added by lowering the transparency temperature of the synthesis gas.
「第３図」は、SiO2クラツド用ガラスの透明
ガラス化温度と、Cl2の添加量との関係を示す。
ただしガラスの原料は、SiCl240c.c.／min、O2、
1000c.c.／min、He300c.c.／minで、これらは一定
である。 "Figure 3" shows the relationship between the transparent vitrification temperature of the glass for SiO 2 cladding and the amount of Cl 2 added.
However, the raw materials for glass are SiCl 2 40c.c./min, O 2 ,
1000c.c./min, He300c.c./min, which are constant.
通常、SiO2クラツド用ガラスの透明化は、
1600℃くらいで行なつているが、上記の目的を達
成するためには、この透明ガラス化温度を少なく
とも1500〜1550℃程度まで下げる必要がある。そ
のためには、「第３図」の場合についていえば、
SiCl440c.c.に対して200〜400c.c.／min程度のCl2を
加えなければならない。 Usually, the transparency of glass for SiO2 cladding is
Although it is carried out at about 1600°C, in order to achieve the above objective, it is necessary to lower the transparent vitrification temperature to at least about 1500 to 1550°C. To that end, in the case of "Figure 3",
Approximately 200 to 400 c.c./min of Cl 2 must be added to 40 c.c. of SiCl 4 .
上記のようにCl2の量を多くすると、透明ガラ
ス化温度の下がり方も大になるが、あまり大量の
Cl2を加えると、折出するガラスの中にCl2の泡が
できてしまう。しかし、Heガスをいつしよに加
えると、Heは拡散速度が大きいので、ガラス内
のすき間に入り込んでCl2ガスを追い出し、Cl2ガ
スがガラスの中に封じ込められるのを防ぐことが
できる。 As mentioned above, increasing the amount of Cl 2 will also reduce the transparent vitrification temperature, but if the amount is too large,
When Cl 2 is added, Cl 2 bubbles are formed in the precipitated glass. However, if He gas is added at any time, since He has a high diffusion rate, it can enter the gaps in the glass and drive out the Cl 2 gas, preventing the Cl 2 gas from being trapped inside the glass.
なお、従来、原料ガスの中に不純物として含ま
れる含水素化合物や、酸素ガス中の水分を塩素化
反応によつて除くために、原料ガスといつしよに
Cl2などの塩素化剤を送り込むという技術が公知
である（特開昭53−13618号）。しかし、その場合
に加えるCl2などの量はごく少量で、その程度で
は、透明ガラス化温度を下げるということにほと
んど寄与しない。 Conventionally, in order to remove hydrogen-containing compounds contained as impurities in the raw material gas and moisture in the oxygen gas through a chlorination reaction,
A technique of feeding a chlorinating agent such as Cl 2 is known (Japanese Patent Application Laid-open No. 13618/1983). However, the amount of Cl 2 etc. added in that case is very small, and this amount hardly contributes to lowering the transparent vitrification temperature.
上記のように、Cl2ガスを加えると透明ガラス
化温度が下がる。したがつて内付けCVD法にお
ける酸水炎２０などによる加熱も、従来の場合
（Cl2ガスを加えない）よりも低い温度で行なう。 As mentioned above, adding Cl2 gas lowers the transparent vitrification temperature. Therefore, heating using an acid water flame 20 or the like in the internal CVD method is also performed at a lower temperature than in the conventional case (without adding Cl 2 gas).
よつて石英管１０内に含まれているOH基の拡
散距離が従来より短かくなる。すなわち石英管内
面のごく近くにあるOH基だけが、たい積した合
成ガラス内に移行でき、それにより内側のOH基
は石英管の外まで出られないようになる。 Therefore, the diffusion distance of the OH groups contained in the quartz tube 10 becomes shorter than in the conventional case. In other words, only the OH groups located very close to the inner surface of the quartz tube can migrate into the accumulated synthetic glass, thereby preventing the OH groups inside from coming out of the quartz tube.
なお、Cl2ガスを添加しても、それは生成する
合成ガラス中にドープ剤としては入り込まないか
ら、屈折率に変化を与えない。 Note that even if Cl 2 gas is added, it does not enter the resulting synthetic glass as a dopant, so it does not change the refractive index.
実施例
出発石英管は外径18mm、内径16mm、長さ1000mm
の市販品。その中に、はじめ、クラツド用とし
て、SiCl440c.c.（毎分値、以下同じ）、O21000c.c.、
Cl2250c.c.、He300c.c.を送り込み、内付けCVD法に
よつて、クラツド用のガラス膜を、厚さ0.54mmた
い積させた。加熱温度は1530℃、加熱源のトラバ
ース速度は100mm／min、石英管の回転は60rpm
であつた。Example: The starting quartz tube has an outer diameter of 18 mm, an inner diameter of 16 mm, and a length of 1000 mm.
commercially available products. Among them, SiCl 4 40 c.c. (value per minute, same below), O 2 1000 c.c., for cladding.
250 c.c. of Cl 2 and 300 c.c. of He were fed, and a glass film for the cladding was deposited to a thickness of 0.54 mm using the internal CVD method. The heating temperature is 1530℃, the traverse speed of the heating source is 100mm/min, and the rotation of the quartz tube is 60rpm.
It was hot.
次いで、コア用として、SiCl410c.c.、GeCl43
c.c.、O2500c.c.、Cl250c.c.、He150c.c.を送り込み、
コ
ア用のガラス膜を、厚さ0.02mmにたい積させた。
加熱温度は1600℃、トラバース速度は100mm／
min、石英管の回転は60ppmであつた。 Next, for the core, SiCl 4 10c.c., GeCl 4 3
cc, O 2 500c.c., Cl 2 50c.c., He150c.c.
A glass film for the core was deposited to a thickness of 0.02 mm.
Heating temperature is 1600℃, traverse speed is 100mm/
min, the rotation of the quartz tube was 60 ppm.
それから1900℃でコラツプスし、外径10mm、ク
ラツド外径６mm、コア径1.2mmの母材を得、さら
にその上に外径20mm、内径16.6mmのジヤケツト管
をかぶせた。それを紡糸して、外径125μｍ、ク
ラツド外径50μｍ、コア径10μｍ、比屈折率差
0.20％、クラツド径／コア径比が５の、SiO2クラ
ツド、GeO2−SiO2コアの単一モード光フアイバ
を製造した。 It was then collapsed at 1900°C to obtain a base material with an outer diameter of 10 mm, a clad outer diameter of 6 mm, and a core diameter of 1.2 mm, and a jacket tube with an outer diameter of 20 mm and an inner diameter of 16.6 mm was placed on top of this. It is spun into a yarn with an outer diameter of 125 μm, a cladding outer diameter of 50 μm, a core diameter of 10 μm, and a relative refractive index difference.
A SiO 2 clad, GeO 2 -SiO 2 core single mode optical fiber with a cladding diameter/core diameter ratio of 0.20% and a cladding diameter/core diameter ratio of 5 was fabricated.
その損失波長特性を「第４図」のＡ（実線）に
示した。波長1.39μｍにおけるOH基による吸収
損失は8dB／Kmであつた。 The loss wavelength characteristic is shown in A (solid line) in "Figure 4". The absorption loss due to OH groups at a wavelength of 1.39 μm was 8 dB/Km.
また、本発明品と対比するため、Cl2を添加し
ない従来の方法で、上記と同種の光フアイバを作
つた。 In addition, in order to compare with the product of the present invention, an optical fiber of the same type as above was made using a conventional method without adding Cl 2 .
すなわち、はじめ、SiCl440c.c.、O21000c.c.を送
り込んで、クラツド用ガラス膜を、たい積させ
た。ただしそのときの加熱温度は1600℃で、上記
の1530℃では透明ガラス化がうまくゆかなかつ
た。またクラツドガラス膜の厚さは0.3mm程度が
限度であつた。なおそれ以上に厚くするためには
加熱温度を1650℃くらいまで上昇させなければな
らず、またそうすると石英管が軟化し、収縮す
る。 That is, first, 40 c.c. of SiCl 4 and 1000 c.c. of O 2 were fed to deposit a glass film for the cladding. However, the heating temperature at that time was 1,600°C, and transparent vitrification was not successful at the above-mentioned temperature of 1,530°C. Furthermore, the thickness of the clad glass film was limited to about 0.3 mm. In order to make it thicker than that, the heating temperature must be raised to about 1,650°C, and this will cause the quartz tube to soften and shrink.
次に、SiCl410c.c.、GeCl43c.c.、O2500c.c.を送り
込み、加熱温度1650℃で、コア用ガラス膜を厚さ
0.02mmにたい積。それから、1900℃でコラツプス
して、外径9.4mm、クラツド外径4.5mm、コア径1.1
mmの母材を得、その上にさらに外径18、内径15mm
のジヤケツト管をかぶせそれを紡糸して、外径
125μｍ、クラツド外径41mm、コア径10mm、比屈
折率差0.20％、クラツド径／コア径比が4.1の単
一モード光フアイバを作つた。 Next, SiCl 4 10c.c., GeCl 4 3c.c., and O 2 500c.c. are fed into the core glass film at a heating temperature of 1650°C.
Accumulated to 0.02mm. Then, it was collapsed at 1900℃, with an outer diameter of 9.4 mm, a clad outer diameter of 4.5 mm, and a core diameter of 1.1 mm.
Obtain a base material of mm, and then add an outer diameter of 18 mm and an inner diameter of 15 mm.
Cover the jacket tube and spin it to determine the outer diameter.
A single mode optical fiber was fabricated with a diameter of 125 μm, a clad outer diameter of 41 mm, a core diameter of 10 mm, a relative refractive index difference of 0.20%, and a clad diameter/core diameter ratio of 4.1.
その損失波長特性を「第４図」のＢ（点線）に
示した。波長1.39μｍにおけるOH基による吸収
損は17dB／Kmであつた。 The loss wavelength characteristic is shown in B (dotted line) in "Figure 4". The absorption loss due to OH groups at a wavelength of 1.39 μm was 17 dB/Km.
発明の効果
(1) Cl2ガスを加えて透明ガラス化温度を低下さ
せるので、OH基の拡散距離が短くなる。Effects of the invention (1) Since the transparent vitrification temperature is lowered by adding Cl 2 gas, the diffusion distance of OH groups becomes shorter.
(2) 上記のように、SiO2クラツド用ガラスの場
合でも、透明ガラス化温度を出発石英管の軟化
温度以下まで下げることができる。したがつて
出発石英管の軟化による縮径と、それによる肉
厚増大が起らず、クラツド用ガラスをより厚く
さい積することができるようになる。(2) As mentioned above, even in the case of glass for SiO 2 cladding, the transparent vitrification temperature can be lowered to below the softening temperature of the starting quartz tube. Therefore, the diameter of the starting quartz tube does not decrease due to softening, and the wall thickness does not increase due to this, and the glass for the cladding can be laminated thicker.
(3) 上記の(1)と(2)とがあいまつて、出発石英管か
らコアへ拡散するOH基の量を減少させること
ができ、OH基による吸収損失の少ない光フア
イバを製造することができる。(3) By combining (1) and (2) above, it is possible to reduce the amount of OH groups diffusing from the starting quartz tube to the core, and it is possible to manufacture an optical fiber with less absorption loss due to OH groups. can.
(注)
T.Bell et al.Phy.Chem.Glass ３ No.５（1964）
P.141(Note) T.Bell et al.Phy.Chem.Glass 3 No.5 (1964)
P.141
第１図は内付けCVD法の一般的説明図で、そ
の−の拡大断面を第２図に示す。第３図以下
は本発明に係り、第３図はガラス化温度とCl2ガ
ス添加量との関係、第４図は損失波長特性を示
す。
１０：出発石英管、１２：クラツド用ガラス
膜、１４：コア用ガラス膜。
FIG. 1 is a general explanatory diagram of the internal CVD method, and FIG. 2 shows an enlarged cross-section of -. Figure 3 and subsequent figures relate to the present invention; Figure 3 shows the relationship between the vitrification temperature and the amount of Cl 2 gas added, and Figure 4 shows the loss wavelength characteristics. 10: Starting quartz tube, 12: Glass film for cladding, 14: Glass film for core.
Claims (1)
て合成ガラス膜をたい積させて、母材を製造する
に際し、 前記合成ガラスの原料ガスに、Cl2ガスを加え
て、前記合成ガラスの透明ガラス化温度を低下さ
せることによつて、Cl2ガスを加えないときの加
熱温度よりも低い加熱温度で、前記内付けCVD
法を行なうこと、 を特徴とする光フアイバの製造方法。[Claims] 1. When producing a base material by depositing a synthetic glass film on the inner surface of the starting quartz tube by an internal CVD method, Cl 2 gas is added to the raw material gas for the synthetic glass. , by lowering the transparent vitrification temperature of the synthetic glass, the internal CVD can be heated at a lower heating temperature than when no Cl2 gas is added.
1. A method for manufacturing an optical fiber, comprising: carrying out a method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12442579A JPS5650138A (en) | 1979-09-27 | 1979-09-27 | Manufacture of optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12442579A JPS5650138A (en) | 1979-09-27 | 1979-09-27 | Manufacture of optical fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5650138A JPS5650138A (en) | 1981-05-07 |
| JPS6240301B2 true JPS6240301B2 (en) | 1987-08-27 |
Family
ID=14885160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12442579A Granted JPS5650138A (en) | 1979-09-27 | 1979-09-27 | Manufacture of optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5650138A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| US11532112B2 (en) | 2017-05-16 | 2022-12-20 | Apple Inc. | Emoji recording and sending |
| US11682182B2 (en) | 2018-05-07 | 2023-06-20 | Apple Inc. | Avatar creation user interface |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100837792B1 (en) * | 2006-01-25 | 2008-06-13 | 주식회사 옵토매직 | Optical Fiber Manufacturing Method for Optical Amplifier |
| KR100800813B1 (en) * | 2006-03-10 | 2008-02-01 | 엘에스전선 주식회사 | Method of manufacturing optical fiber preform, Optical fiber preform and Optical fiber manufactured using the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5313618A (en) * | 1976-07-26 | 1978-02-07 | Nippon Telegraph & Telephone | Process for preparing dehydrated glass |
-
1979
- 1979-09-27 JP JP12442579A patent/JPS5650138A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5313618A (en) * | 1976-07-26 | 1978-02-07 | Nippon Telegraph & Telephone | Process for preparing dehydrated glass |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11481988B2 (en) | 2010-04-07 | 2022-10-25 | Apple Inc. | Avatar editing environment |
| US11532112B2 (en) | 2017-05-16 | 2022-12-20 | Apple Inc. | Emoji recording and sending |
| US11682182B2 (en) | 2018-05-07 | 2023-06-20 | Apple Inc. | Avatar creation user interface |
| US11722764B2 (en) | 2018-05-07 | 2023-08-08 | Apple Inc. | Creative camera |
| US11442414B2 (en) | 2020-05-11 | 2022-09-13 | Apple Inc. | User interfaces related to time |
| US11714536B2 (en) | 2021-05-21 | 2023-08-01 | Apple Inc. | Avatar sticker editor user interfaces |
| US11776190B2 (en) | 2021-06-04 | 2023-10-03 | Apple Inc. | Techniques for managing an avatar on a lock screen |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5650138A (en) | 1981-05-07 |
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