JPS6239967U - - Google Patents

Info

Publication number
JPS6239967U
JPS6239967U JP1985132696U JP13269685U JPS6239967U JP S6239967 U JPS6239967 U JP S6239967U JP 1985132696 U JP1985132696 U JP 1985132696U JP 13269685 U JP13269685 U JP 13269685U JP S6239967 U JPS6239967 U JP S6239967U
Authority
JP
Japan
Prior art keywords
polishing
fixed table
semiconductor wafer
wafer
wheel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1985132696U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985132696U priority Critical patent/JPS6239967U/ja
Publication of JPS6239967U publication Critical patent/JPS6239967U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の実施例の正面図、第2図はそ
の平面図、第3図は本考案の動作を説明するため
の概略図、第4図は研磨時の固定テーブルと研磨
ヘツドとの関係を示す側面図、第5図は従来の研
磨装置の斜視図である。 1:ウエハ搬入装置本体、2:研磨装置本体、
3:ウエハ搬出装置本体、4:搬送装置。
Fig. 1 is a front view of an embodiment of the present invention, Fig. 2 is a plan view thereof, Fig. 3 is a schematic diagram for explaining the operation of the present invention, and Fig. 4 shows the fixed table and polishing head during polishing. FIG. 5 is a side view showing the relationship between the two, and FIG. 5 is a perspective view of a conventional polishing apparatus. 1: Wafer loading device main body, 2: Polishing device main body,
3: Wafer unloading device main body, 4: Transfer device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 研磨の種類を異にする複数の研磨用砥石と、各
研磨用砥石に対して研磨すべき半導体ウエハを固
定するとともに砥石に対して接近、上下、回転駆
動される固定テーブルと、待機位置および各固定
テーブル上にある半導体ウエハを次の研磨工程に
応じた固定テーブルおよびウエハ搬出位置に順次
吸着して搬送する搬送装置とを備えたことを特徴
とする半導体ウエハ用研磨装置。
A plurality of polishing wheels for different types of polishing, a fixed table that fixes the semiconductor wafer to be polished to each polishing wheel and is driven to approach, up and down, and rotate relative to the grinding wheel, and a standby position and each 1. A semiconductor wafer polishing apparatus, comprising a transfer device that sequentially suctions and transfers a semiconductor wafer on a fixed table to a fixed table and a wafer unloading position according to the next polishing process.
JP1985132696U 1985-08-29 1985-08-29 Pending JPS6239967U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985132696U JPS6239967U (en) 1985-08-29 1985-08-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985132696U JPS6239967U (en) 1985-08-29 1985-08-29

Publications (1)

Publication Number Publication Date
JPS6239967U true JPS6239967U (en) 1987-03-10

Family

ID=31032326

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985132696U Pending JPS6239967U (en) 1985-08-29 1985-08-29

Country Status (1)

Country Link
JP (1) JPS6239967U (en)

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