JPS6239821B2 - - Google Patents

Info

Publication number
JPS6239821B2
JPS6239821B2 JP56077396A JP7739681A JPS6239821B2 JP S6239821 B2 JPS6239821 B2 JP S6239821B2 JP 56077396 A JP56077396 A JP 56077396A JP 7739681 A JP7739681 A JP 7739681A JP S6239821 B2 JPS6239821 B2 JP S6239821B2
Authority
JP
Japan
Prior art keywords
wafer
wafers
opening
holder
stacking tool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56077396A
Other languages
Japanese (ja)
Other versions
JPS57192020A (en
Inventor
Masaaki Sadamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP7739681A priority Critical patent/JPS57192020A/en
Publication of JPS57192020A publication Critical patent/JPS57192020A/en
Publication of JPS6239821B2 publication Critical patent/JPS6239821B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6732Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Description

【発明の詳細な説明】 この発明は半導体ウエハの重ね合わせ具に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a device for stacking semiconductor wafers.

半導体ウエーハ(以下単に「ウエーハ」とい
う。)の保持具上での保持形態は一般にウエーハ
を互いに数mmの間隔をおいて並べる場合が多い
が、このウエーハの大量輸送時などには、収納容
器の小形化、収容スペースの節約のためにウエー
ハを互いに主面を接触させて重ね合わせて収容す
る場合が多い。
Semiconductor wafers (hereinafter simply referred to as "wafers") are generally held on a holder by arranging the wafers at intervals of several millimeters from each other. In order to downsize and save storage space, wafers are often stored one on top of the other with their main surfaces in contact with each other.

また、ウエーハに不純物を熱拡散する場合で
も、ウエーハをボート上に数mm間隔で並べるのが
普通であるが、アルミニウムAl、ガリウムGaな
どの拡散では密接して重ね合わせた状態でも可能
であり、その他の不純物拡散の場合でも適当な分
離剤、例えば、石英粉、炭化シリコン(SiC)粉
などをウエーハとウエーハとの間に散布しておく
ことによつて重ね合わせた状態で拡散が行なわれ
ている。このように不純物拡散でもウエーハを重
ね合わせた状態で行なえれば、拡散処理能力が通
常の3倍程度に増大し、それだけ製造コストが低
減される。
Furthermore, when thermally diffusing impurities into wafers, it is common to arrange the wafers on a boat at intervals of several millimeters, but when diffusing aluminum Al, gallium Ga, etc., it is possible to place the wafers closely stacked on top of each other. In the case of other impurity diffusion, diffusion can also be carried out while the wafers are overlapped by spreading an appropriate separation agent such as quartz powder or silicon carbide (SiC) powder between the wafers. There is. If impurity diffusion can be performed with the wafers stacked one on top of the other in this way, the diffusion processing capacity will be increased to about three times that of the usual one, and the manufacturing cost will be reduced accordingly.

第1図A〜Cは従来のウエーハのハンドリング
手法を説明するための斜視図で、第1図Aに示す
1はウエーハ保持具で、互いに対向する両側板1
aの内側面に平行なウエハ保持溝1bが多数くし
状に設けられ(以下くし形溝ともいう)、ウエー
ハ2を平行に保持できるようになつている。ま
た、このウエーハ保持具1は上端面に係合ピン1
cと係合穴1dとを1対ずつ有しており、同一構
成の他のウエーハ保持具と、互いの開口部10を
重ね合わせるときの係合に便な構造になつてい
る。第1図Cに示す3は拡散ボートで、第1図B
に示すようにウエーハ2をピンセツト4で1枚ず
つウエーハ保持具1から拡散ポート3に載置し
て、ウエーハスタツク2aを形成し、その両端に
それぞれブロツク3aおよび3bを置いて保持す
るようになつている。なお3cは拡散ボート3を
拡散炉に出し入れする際の引掛け孔である。
1A to 1C are perspective views for explaining a conventional wafer handling method, and 1 shown in FIG. 1A is a wafer holder, and both side plates 1 facing each other are
A large number of parallel wafer holding grooves 1b are provided in the shape of a comb (hereinafter also referred to as comb-shaped grooves), so that the wafer 2 can be held in parallel. This wafer holder 1 also has an engaging pin 1 on the upper end surface.
It has one pair of engagement holes 1d and one pair of engagement holes 1d, and has a structure that facilitates engagement with other wafer holders having the same configuration when their openings 10 are overlapped. 3 shown in Figure 1C is a diffusion boat, and Figure 1B
As shown in the figure, the wafers 2 are placed one by one from the wafer holder 1 into the diffusion port 3 using tweezers 4 to form a wafer stack 2a, and blocks 3a and 3b are placed at each end of the wafer stack 2a to hold the stack. It's summery. Note that 3c is a hook hole for loading and unloading the diffusion boat 3 into and out of the diffusion furnace.

従来はこの第1図A〜Cに示すように、ウエー
ハ2をウエーハ保持具1に入れて拡散のための前
処理をしたのち、ピンセツト4で1枚ずつ拡散ボ
ート3に重ね合わせて載置していた。通常、拡散
炉の均熱ゾーンは500乃至600mmあるので、この均
熱ゾーンを満たすウエーハ2の収納量はウエーハ
2の厚さを200μmとすると、およそ2000枚近く
の量となり、ウエーハを逐一ハンドリングする労
力は極めて大きいと言える。
Conventionally, as shown in FIGS. 1A to 1C, wafers 2 are placed in a wafer holder 1 and pretreated for diffusion, and then placed on a diffusion boat 3 one by one using tweezers 4. was. Normally, the soaking zone of a diffusion furnace is 500 to 600 mm, so the amount of wafers 2 stored to fill this soaking zone is approximately 2,000, assuming the thickness of the wafers 2 is 200 μm, and the wafers must be handled one by one. It can be said that the effort is extremely large.

この発明は以上のような点に鑑みてなされたも
ので、ウエハを一括して重ね合わせて拡散ボート
への移しかえを効率よく行なうことのできる半導
体ウエハの重ね合わせ装置を提供することを目的
としている。
This invention was made in view of the above points, and an object of the present invention is to provide a semiconductor wafer stacking device that can stack wafers in bulk and transfer them to a diffusion boat efficiently. There is.

第2図Aはこの発明の一実施例による半導体ウ
エハの重ね合わせ装置のウエハ重ね合わせ具を示
す斜視図、第2図BはそのB−B面での断面
図である。この実施例のウエハの重ね合わせ具5
はくし形溝を有しない左右側板5aおよび5bと
前後端板5cおよび5dとで枠形に構成され、上
部はウエーハ2を自由に挿入できる開口部50が
形成され、下部は左右側板5aおよび5bが内面
側へ突出してウエハ保持用凸部51a,51bが
形成され、収納したウエーハ2が脱落しないよう
になつている。また、上部開口部50の四隅には
係合ピン5eおよび係合穴5fが設けられてお
り、第1図のウエーハ保持具1と係合出来るよう
になつている。更に、前後端板5c,5dの少な
くともその一方〔この例では5c〕には開口部5
0側からスリツト5gが設けられており、大形の
ピンセツトを通せるようになつている。
FIG. 2A is a perspective view showing a wafer stacking tool of a semiconductor wafer stacking apparatus according to an embodiment of the present invention, and FIG. 2B is a sectional view taken along the plane B--B. Wafer stacking tool 5 of this embodiment
The left and right side plates 5a and 5b, which do not have wedge-shaped grooves, and the front and rear end plates 5c and 5d form a frame shape, and the upper part has an opening 50 into which the wafer 2 can be freely inserted, and the lower part has the left and right side plates 5a and 5b. Wafer holding convex portions 51a and 51b are formed to protrude toward the inner surface to prevent the stored wafer 2 from falling off. Further, engagement pins 5e and engagement holes 5f are provided at the four corners of the upper opening 50, so that the upper opening 50 can be engaged with the wafer holder 1 shown in FIG. Furthermore, an opening 5 is provided in at least one of the front and rear end plates 5c and 5d [5c in this example].
A slit 5g is provided from the 0 side so that a large tweezers can be passed through it.

第3図は、この実施例を用いてウエーハ2を一
度に重ね合わせる過程を示す一部破断側面図であ
る。即ち、ウエーハ2はあらかじめウエーハ保持
具1に1枚ずつ分離して平行に保持されて拡散前
処理がされる。次に、この実施例のウエーハ重ね
合わせ具5の開口部50と前記ウエーハ保持具1
の開口部10とをそれぞれの係合ピンと係合穴と
を係合させて合わせ、これをウエーハ2が水平に
なるように倒置する。しかる後、ウエーハ保持具
1の底部からプツシヤ6で図示矢印方向にウエー
ハ2を全てウエーハ重ね合わせ具5の方へ押しや
るとウエーハ2は一括してウエーハ重ね合わせ具
5に積み重ねられる。
FIG. 3 is a partially cutaway side view showing the process of stacking the wafers 2 at once using this embodiment. That is, the wafers 2 are separated one by one and held in parallel in the wafer holder 1 in advance, and are subjected to a pre-diffusion treatment. Next, the opening 50 of the wafer stacking tool 5 of this embodiment and the wafer holder 1 will be described.
The openings 10 of the wafer 2 are aligned by engaging the respective engagement pins and the engagement holes, and the wafer 2 is inverted so that it becomes horizontal. Thereafter, when all the wafers 2 are pushed from the bottom of the wafer holder 1 toward the wafer stacking tool 5 in the direction of the arrow shown in the figure using the pusher 6, the wafers 2 are stacked on the wafer stacking tool 5 all at once.

この場合、ウエーハ重ね合わせ具5はテフロン
のような比較的柔らかい合成樹脂で作ることがウ
エーハ2相互の衝撃を軽減するのに都合が良く、
かつウエーハ保持具1のウエーハ2の配列ピツチ
が狭く収納量が多いほど衝撃力が少ないので好ま
しい。実際にはウエーハ2の平行配列ピツチは
3/16インチ(約5mm)以下であれば殆んど問題
ない。望ましくは、ウエーハ2の配列ピツチは
3/32インチ(約2.5mm)以下で、ウエーハ2の
収納量は25枚以上50枚位が良好である。また、こ
の実施例の他の使用形態としては、ウエーハ重ね
合わせ具5を倒置してウエーハ保持具1の上に載
せ、ウエーハ保持具1の下方からプツシヤ6で突
きあげて、ウエーハ2をウエーハ重ね合わせ具5
側に移行せしめ、しかるのちに、ウエーハ重ね合
わせ具5をウエーハ2が水平になるように立て直
しても良い。
In this case, it is convenient for the wafer stacking tool 5 to be made of a relatively soft synthetic resin such as Teflon to reduce the impact between the wafers 2.
In addition, the smaller the arrangement pitch of the wafers 2 in the wafer holder 1 and the larger the storage capacity, the smaller the impact force, which is preferable. Actually, there is almost no problem if the parallel arrangement pitch of the wafers 2 is 3/16 inch (approximately 5 mm) or less. Preferably, the arrangement pitch of the wafers 2 is 3/32 inch (approximately 2.5 mm) or less, and the storage capacity of the wafers 2 is preferably 25 or more and about 50 wafers. In addition, as another usage form of this embodiment, the wafer stacking tool 5 is placed upside down on the wafer holder 1, and the wafer holder 1 is pushed up from below with the pusher 6 to stack the wafers 2. Matching tool 5
The wafers 2 may be moved to the side, and then the wafer stacking tool 5 may be repositioned so that the wafers 2 are horizontal.

第4図AおよびBはこの実施例のウエーハ重ね
合わせ具から拡散ボートへ移す手順を示す斜視図
で、第3図について説明したようにして、ウエー
ハ重ね合わせ具5内に積み重ねられたウエーハス
タツク2aを第4図Aに示すように大形ピンセツ
ト7でスリツト5gを介して挟む。このとき、大
形ピンセツト7でウエーハスタツク2aの中央部
を挟持することが肝心で、中央部を挟めばウエー
ハスタツク2aが崩れることはない。つづいて、
第4図Bに示すように、拡散ボート3にウエーハ
スタツク2aをそのまま載置することによつて所
望の移しかえ操作は完了する。
4A and 4B are perspective views showing the procedure for transferring the wafers from the wafer stacking tool 5 to the diffusion boat in this embodiment, in which the wafer stacks stacked in the wafer stacking tool 5 are stacked in the wafer stacking tool 5 in the manner described with reference to FIG. 2a is held between large tweezers 7 through a slit 5g as shown in FIG. 4A. At this time, it is important to hold the center of the wafer stack 2a with the large tweezers 7, and if the center is held, the wafer stack 2a will not collapse. Continuing,
As shown in FIG. 4B, the desired transfer operation is completed by placing the wafer stack 2a on the diffusion boat 3 as it is.

上述のようにこの発明になる半導体ウエハの重
ね合わせ装置では、ウエハをウエハ保持溝を有す
る保持具から溝を有しない重ね合わせ具に移し替
えてウエハの重ね合わせを行なうようにしたの
で、両者を係合させた上で、ウエハ保持具の底部
から一括してウエハを押し出してウエハ重ね合わ
せ具に移し替えることができ、大量輸送、大量一
括処理などのためのウエハのスタツク化が容易
で、用具を単純堅牢で安価なものとし、ウエハの
ハンドリング経費を低減することが可能となる。
As described above, in the semiconductor wafer stacking apparatus according to the present invention, the wafers are stacked by transferring the wafers from the holder having the wafer holding groove to the stacking tool having no grooves, so that the wafers are stacked. Once engaged, the wafers can be pushed out in batches from the bottom of the wafer holder and transferred to the wafer stacking tool, making it easy to stack wafers for mass transportation, bulk processing, etc. This makes it possible to make the wafer simple, robust, and inexpensive, thereby reducing wafer handling costs.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図A〜Cは従来のウエーハのハンドリング
手法を説明するための斜視図、第2図Aはこの発
明の一実施例を示す斜視図、第2図BはそのB
−B面での断面図、第3図はこの実施例を用い
てウエーハを一度に重ね合わせる過程を示す一部
破断側面図、第4図AおよびBはこの実施例のウ
エーハ重ね合わせ具から拡散ボートへ移す手順を
示す斜視図である。 図において、1はウエーハ(ウエハ保持溝)保
持具、1aは第1の左右両側板、1bはくし形
溝、1cは第1の係合ピン、1dは第1の係合
穴、2はウエーハ、10は開口、5はウエーハ重
ね合わせ具、5aは第2の左側板、5bは第2の
右側板、5cは第2の前端板、5dは第2の後端
板、5eは第2の係合ピン、5fは第2の係合
孔、5gはスリツト50は開口、51a,51b
はウエハ保持用凸部である。なお、図中同一符号
は同一または相当部分を示す。
1A to 1C are perspective views for explaining a conventional wafer handling method, FIG. 2A is a perspective view showing an embodiment of the present invention, and FIG.
3 is a partially cutaway side view showing the process of stacking wafers at once using this embodiment, and Figures 4 A and B are diffusion from the wafer stacking tool of this embodiment. FIG. 3 is a perspective view showing a procedure for transferring to a boat. In the figure, 1 is a wafer (wafer holding groove) holder, 1a is a first left and right side plate, 1b is a comb-shaped groove, 1c is a first engagement pin, 1d is a first engagement hole, 2 is a wafer, 10 is an opening, 5 is a wafer stacking tool, 5a is a second left side plate, 5b is a second right side plate, 5c is a second front end plate, 5d is a second rear end plate, and 5e is a second engagement plate. Dowel pin, 5f is second engagement hole, 5g is slit 50 is opening, 51a, 51b
is a convex portion for holding a wafer. Note that the same reference numerals in the figures indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】 1 相対向する前後両端板と内側面に所定ピツチ
のウエハ保持溝を有する相対向する左右両側板と
により構成された枠形体からなり、上面にウエハ
を挿入するための開口を、下面にプツシヤでウエ
ハを押し出すための上記上面開口より小さい開口
を有するウエハ保持具と、 相対向する前後両端板とウエハ保持溝を有さな
い相対向する左右両側板とにより構成された枠形
体からなり、上面に上記ウエハ保持具の上面開口
と同形状の開口を有し、下面近傍の上記左右両側
板の内側面にウエハ保持用凸部を有し、かつ上記
前後両端板の少なくとも一方にピンセツト挿入用
のスリツトを有するウエハ重ね合わせ具とを備
え、 ウエハを上記ウエハ保持具から上記ウエハ重ね
合わせ具に移し替え重ね合わせることができるよ
うにしたことを特徴とする半導体ウエハの重ね合
わせ装置。
[Scope of Claims] 1. Consisting of a frame-shaped body constituted by opposite front and rear end plates and opposite left and right side plates having wafer holding grooves at a predetermined pitch on the inner surfaces, and an opening in the upper surface for inserting a wafer. A frame consisting of a wafer holder having a lower opening smaller than the upper opening for pushing out the wafer with a pusher, opposing front and rear end plates, and opposing left and right side plates having no wafer holding grooves. having an opening in the same shape as the top opening of the wafer holder on the upper surface, a wafer holding convex portion on the inner surfaces of the left and right side plates near the lower surface, and at least one of the front and rear end plates. A semiconductor wafer stacking device comprising: a wafer stacking tool having a slit for inserting tweezers; and a wafer stacking tool having a slit for inserting a tweezers, and wafers can be transferred and stacked from the wafer holder to the wafer stacking tool. .
JP7739681A 1981-05-20 1981-05-20 Stacking tool for thin plate body Granted JPS57192020A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7739681A JPS57192020A (en) 1981-05-20 1981-05-20 Stacking tool for thin plate body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7739681A JPS57192020A (en) 1981-05-20 1981-05-20 Stacking tool for thin plate body

Publications (2)

Publication Number Publication Date
JPS57192020A JPS57192020A (en) 1982-11-26
JPS6239821B2 true JPS6239821B2 (en) 1987-08-25

Family

ID=13632727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7739681A Granted JPS57192020A (en) 1981-05-20 1981-05-20 Stacking tool for thin plate body

Country Status (1)

Country Link
JP (1) JPS57192020A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261406U (en) * 1988-10-31 1990-05-08

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60106136A (en) * 1983-11-14 1985-06-11 Mitsubishi Electric Corp Washing device for thin-plate type body
JP2006286446A (en) * 2005-04-01 2006-10-19 Matsushita Electric Ind Co Ltd Flexible cable, manufacturing method of flexible cable, forming method of flexible cable, and fixing method of component mounted on flexible cable
ITUD20070202A1 (en) * 2007-10-24 2009-04-25 Baccini S P A CONTAINER FOR STORAGE OF PLATES FOR ELECTRONIC CIRCUITS AND ITS PROCEDURE

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53129974A (en) * 1977-04-20 1978-11-13 Hitachi Ltd Palte form object transfer device
JPS5640656B2 (en) * 1973-12-11 1981-09-22

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5832266Y2 (en) * 1979-09-05 1983-07-18 三菱電機株式会社 Thin plate stand-up tool

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5640656B2 (en) * 1973-12-11 1981-09-22
JPS53129974A (en) * 1977-04-20 1978-11-13 Hitachi Ltd Palte form object transfer device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261406U (en) * 1988-10-31 1990-05-08

Also Published As

Publication number Publication date
JPS57192020A (en) 1982-11-26

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