JPS6237386B2 - - Google Patents

Info

Publication number
JPS6237386B2
JPS6237386B2 JP21213683A JP21213683A JPS6237386B2 JP S6237386 B2 JPS6237386 B2 JP S6237386B2 JP 21213683 A JP21213683 A JP 21213683A JP 21213683 A JP21213683 A JP 21213683A JP S6237386 B2 JPS6237386 B2 JP S6237386B2
Authority
JP
Japan
Prior art keywords
chromium
layer
etching
photomask blank
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21213683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60103350A (ja
Inventor
Shigekazu Matsui
Kenichi Kagaya
Masao Ushida
Koichi Maruyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP58212136A priority Critical patent/JPS60103350A/ja
Publication of JPS60103350A publication Critical patent/JPS60103350A/ja
Publication of JPS6237386B2 publication Critical patent/JPS6237386B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58212136A 1983-11-11 1983-11-11 フオトマスクブランク Granted JPS60103350A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58212136A JPS60103350A (ja) 1983-11-11 1983-11-11 フオトマスクブランク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58212136A JPS60103350A (ja) 1983-11-11 1983-11-11 フオトマスクブランク

Publications (2)

Publication Number Publication Date
JPS60103350A JPS60103350A (ja) 1985-06-07
JPS6237386B2 true JPS6237386B2 (enEXAMPLES) 1987-08-12

Family

ID=16617483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58212136A Granted JPS60103350A (ja) 1983-11-11 1983-11-11 フオトマスクブランク

Country Status (1)

Country Link
JP (1) JPS60103350A (enEXAMPLES)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002244274A (ja) * 2001-02-13 2002-08-30 Shin Etsu Chem Co Ltd フォトマスクブランク、フォトマスク及びこれらの製造方法
JP2016188997A (ja) * 2015-03-27 2016-11-04 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63244037A (ja) * 1987-03-31 1988-10-11 Hoya Corp フオトマスクブランク

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002244274A (ja) * 2001-02-13 2002-08-30 Shin Etsu Chem Co Ltd フォトマスクブランク、フォトマスク及びこれらの製造方法
EP1241524A2 (en) 2001-02-13 2002-09-18 Shin-Etsu Chemical Co., Ltd. Photomask blank, Photomask and method of manufacture
US6733930B2 (en) 2001-02-13 2004-05-11 Shin-Etsu Chemical Co., Ltd Photomask blank, photomask and method of manufacture
JP2016188997A (ja) * 2015-03-27 2016-11-04 Hoya株式会社 フォトマスクブランク及びこれを用いたフォトマスクの製造方法、並びに表示装置の製造方法

Also Published As

Publication number Publication date
JPS60103350A (ja) 1985-06-07

Similar Documents

Publication Publication Date Title
US4363846A (en) Photomask and photomask blank
US4873163A (en) Photomask material
JPS6345092B2 (enEXAMPLES)
US3443944A (en) Method of depositing conductive patterns on a substrate
US4374912A (en) Photomask and photomask blank
JPS5851412B2 (ja) 半導体装置の微細加工方法
US4556608A (en) Photomask blank and photomask
JPH0255933B2 (enEXAMPLES)
JPH04246649A (ja) フォトマスクブランク及びその製造方法、並びにフォト　　　　　　　　　　　マスク及びその製造方法
EP0054736B1 (en) Photomask and photomask blank
JPS6227386B2 (enEXAMPLES)
JPS6237386B2 (enEXAMPLES)
JPS6227387B2 (enEXAMPLES)
JPS6230624B2 (enEXAMPLES)
JPH0466345B2 (enEXAMPLES)
JPS62218585A (ja) フオトマスクの製造方法
JPS63214755A (ja) フオトマスク
JP2991444B2 (ja) フォトマスクブランクおよびフォトマスク
JPH0458167B2 (enEXAMPLES)
JPH0463349A (ja) フォトマスクブランクおよびフォトマスク
JPS646449B2 (enEXAMPLES)
JPS61198156A (ja) 改良されたフオトマスクブランク
JPS6217744B2 (enEXAMPLES)
JPH0434436A (ja) フォトマスクブランク、フォトマスク及びその製造方法
JPH0366656B2 (enEXAMPLES)