JPS6237330B2 - - Google Patents
Info
- Publication number
- JPS6237330B2 JPS6237330B2 JP11534782A JP11534782A JPS6237330B2 JP S6237330 B2 JPS6237330 B2 JP S6237330B2 JP 11534782 A JP11534782 A JP 11534782A JP 11534782 A JP11534782 A JP 11534782A JP S6237330 B2 JPS6237330 B2 JP S6237330B2
- Authority
- JP
- Japan
- Prior art keywords
- light receiving
- light source
- light
- sample
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 13
- 230000010287 polarization Effects 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 claims description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000000572 ellipsometry Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 2
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 1
- 238000001636 atomic emission spectroscopy Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectrometry And Color Measurement (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
【発明の詳細な説明】
この発明は偏光解析モニタの調整方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for adjusting an ellipsometric monitor.
近年膜厚モニタとして発光分光法や原子吸光
法、電圧変化法、反射率変化法或いは質量分析法
等に代つて偏光解析法（エリプソメトリー）が高
い測定精度を得ることができる観点から利用され
るようになつてきた。ところで従来の偏光解析装
置では光源部、受光部および試料ホルダは精密加
工された架台によつて一体的に構成されており、
光軸調整もその上で行なわれている。従つて偏光
解析装置を真空プロセスのモニタとして真空装置
に組み込む際に全体を一体化することやその調整
を行なうことも困難である。すなわち真空プロセ
ス装置に偏光解析装置を全体を一体化して組み込
むと、偏光解析装置は大がかりとなり、また測定
上正確さも悪くなる。さらに真空プロセス装置に
おいても偏光解析装置を組込むことを考慮して予
じめ設計しなければならず、場合によつては組み
込むことができない場合も生じ得る。従つて通常
の一体構成の偏光解析装置ではいずれにしても真
空プロセス装置にモニタとして組み込むことは実
質的に実用的ではない。 In recent years, ellipsometry has been used as a film thickness monitor instead of optical emission spectroscopy, atomic absorption spectrometry, voltage change method, reflectance change method, mass spectrometry, etc., because it can obtain high measurement accuracy. It has become like that. By the way, in conventional polarization analyzers, the light source section, light receiving section, and sample holder are integrally constructed using a precision-machined mount.
Optical axis adjustment is also performed on this basis. Therefore, when incorporating the polarization analyzer into a vacuum apparatus as a monitor of a vacuum process, it is difficult to integrate the entire system and to adjust it. That is, if the entire ellipsometry device is integrated into a vacuum process device, the ellipsometry device becomes large-scale, and the measurement accuracy also deteriorates. Furthermore, vacuum process equipment must be designed in advance with consideration for incorporating an ellipsometry device, and in some cases it may not be possible to incorporate it. Therefore, it is practically impractical to incorporate an ordinary integrated polarization analyzer as a monitor into a vacuum process device.
そこでこの発明は、モニタとして使用する偏光
解析装置を真空プロセス装置に容易に組み込むこ
とができるようにするため偏光解析装置のレーザ
光源部、受光部および試料ホルダを各々分離して
取り付け、その状態で光軸と入射角を簡便に調整
することのできる偏光解析モニタの調整方法を提
供することにある。 Therefore, in order to be able to easily incorporate a polarization analyzer used as a monitor into a vacuum process device, the present invention has been developed by attaching the laser light source section, light receiving section, and sample holder of the polarization analyzer separately, and leaving them in that state. It is an object of the present invention to provide a method for adjusting a polarization analysis monitor that allows easy adjustment of the optical axis and angle of incidence.
従つてこの発明による方法においては、試料に
対するレーザ光の要求された入射角（試料法線と
レーザ光線との成す角度）に一致した底角をもつ
二等辺三角柱のプリズムを用いて光軸、入射角の
調整を行なうことを特徴としている。 Therefore, in the method according to the present invention, an isosceles triangular prism having a base angle that matches the required angle of incidence of the laser beam on the sample (the angle between the sample normal and the laser beam) is used to adjust the optical axis and the incident angle. It is characterized by the ability to adjust the angle.
以下この発明を添附図面を参照してさらに説明
する。 The present invention will be further described below with reference to the accompanying drawings.
第１図にはこの発明の方法において使用される
精度よく加工された二等辺三角柱のプリズム１を
示し、このプリズム１の底角φ０は試料に対する
レーザ光線の入射角すなわちレーザ光法線とレー
ザ光線との成す角度φに等しくされる。 FIG. 1 shows a precisely machined isosceles triangular prism 1 used in the method of the present invention, and the base angle φ 0 of this prism 1 is the angle of incidence of the laser beam on the sample, that is, the laser beam normal and the laser beam normal. It is made equal to the angle φ formed with the light ray.
第２図はこの発明の方法の実施例を略示し、２
は試料、３は光源部、４は受光部を示し、試料２
は図示してない試料ホルダで支持される。また光
源部３および受光部４は光軸の向きを微調整でき
るように構成される。さらに光源部３および受光
部４の光軸上の前端にはそれぞれ光出射、入射口
を構成するピンホール３ａ，４ａが設けられる。 FIG. 2 schematically shows an embodiment of the method of the invention, 2
indicates the sample, 3 indicates the light source section, 4 indicates the light receiving section, and sample 2
is supported by a sample holder (not shown). Further, the light source section 3 and the light receiving section 4 are configured so that the direction of the optical axis can be finely adjusted. Furthermore, pinholes 3a and 4a are provided at the front ends of the light source section 3 and the light receiving section 4 on the optical axis, respectively, constituting light exit and entrance ports.
このような構成において調整は次のようにして
行なわれる。 In such a configuration, adjustment is performed as follows.
最初に、光源部３からのレーザ光線がプリズム
１の入射面１ａで反射して光源部３へ向つて戻り
再び光源部３のピンホール３ａを通り抜けるよう
に、光源部３およびプリズム１の向きを調整す
る。これによりレーザ光線の入射角φは要求され
た入射角すなわち底角φ０に一致する。次に、光
源部３からプリズム１の入射面１ａに入射し、試
料２の表面で反射し、受光部４に到達するレーザ
光線が受光部４のピンホール４ａを通り、そして
端面が光軸と垂直となるように受光部４の前部に
設けられた受光部４の光軸と垂直であるような反
射面をもつ素子（この素子は第３図に示すように
受光部４の検光子であつてもよいし、あるいは第
４図に示すように調整用のために特別に受光部４
に取り付けられた調整用ミラー５であつてもよ
い）の表面で反射し、再び試料面で反射して光源
部３のピンホール３ａを通り抜けるように受光部
４を調整する。この場合、受光部の調整は、受光
部４のピンホール４ａの中心にレーザ光が入るよ
うに、受光部４の光軸に垂直な平面内で第５図に
示すように上下左右に受光部４を移動させ、また
受光部４からの反射光が入射光と同じ線上を戻る
ように第６図に示すように受光部４の光軸の傾き
を調整することによつて行われ得る。この結果、
受光部側の光軸も試料面に対してφ０（＝φ）の
角度を成すことになり、しかも光源部３および受
光部の両光軸は試料面上で一致する。このように
して偏光解析モニタの各々分離して構成された光
源部、受光部および試料ホルダの相対位置関係を
簡単かつ容易に設定することができる。 First, the light source section 3 and the prism 1 are oriented so that the laser beam from the light source section 3 is reflected by the entrance surface 1a of the prism 1, returns to the light source section 3, and passes through the pinhole 3a of the light source section 3 again. adjust. The angle of incidence φ of the laser beam thus corresponds to the required angle of incidence, ie base angle φ 0 . Next, the laser beam enters the entrance surface 1a of the prism 1 from the light source section 3, is reflected on the surface of the sample 2, and reaches the light receiving section 4. The laser beam passes through the pinhole 4a of the light receiving section 4, and the end surface is aligned with the optical axis. An element with a reflective surface perpendicular to the optical axis of the light receiving part 4, which is provided in the front part of the light receiving part 4 so as to be perpendicular to the light receiving part 4 (this element is an analyzer of the light receiving part 4 as shown in Fig. 3). Alternatively, as shown in FIG.
The light receiving section 4 is adjusted so that the light is reflected on the surface of the adjustment mirror 5 (which may be an adjustment mirror 5 attached to the light source), is reflected again on the sample surface, and passes through the pinhole 3a of the light source section 3. In this case, the light receiving section is adjusted so that the laser beam enters the center of the pinhole 4a of the light receiving section 4, so that the light receiving section is placed vertically, horizontally, and vertically within a plane perpendicular to the optical axis of the light receiving section 4, as shown in FIG. 4 and by adjusting the inclination of the optical axis of the light receiving section 4 as shown in FIG. 6 so that the reflected light from the light receiving section 4 returns on the same line as the incident light. As a result,
The optical axis on the light receiving section side also forms an angle of φ 0 (=φ) with respect to the sample surface, and both optical axes of the light source section 3 and the light receiving section coincide on the sample surface. In this way, the relative positional relationship of the separately configured light source section, light receiving section, and sample holder of the polarization analysis monitor can be easily and easily set.
従つてこの発明の方法によれば、特殊なプリズ
ムを使用するだけで光軸および入射角の調整を容
易に行なうことができるので、本体装置の改造も
レーザ光線を入出させる覗窓を二つ設けるだけで
済み、どのような装置にも容易に組み込むことが
できる。 Therefore, according to the method of the present invention, the optical axis and angle of incidence can be easily adjusted simply by using a special prism, so that the main unit can be modified by providing two viewing windows for entering and exiting the laser beam. It can be easily integrated into any device.
このようにこの発明においては一体構成した偏
光解析装置を真空プロセス装置に組み込むことが
実際上不可能であつたり困難である場合でも、光
源部、受光部および試料ホルダを各々分離して取
付けることができるので、真空装置への組み込み
が可能となり、従つてこの発明はこの種の偏光解
析モニタの組立て作業において極めて有用なもの
である。 In this way, in this invention, even if it is practically impossible or difficult to incorporate an integrated polarization analyzer into a vacuum process device, the light source section, light receiving section, and sample holder can be installed separately. Therefore, the present invention is extremely useful in the assembly work of this type of polarization analysis monitor.
第１図はこの発明による方法において使用され
るプリズムを示す斜視図、第２図はこの発明によ
る方法を説明する概略線図、第３図は受光部の調
整に検光子からの反射光を利用する場合の装置の
構成を示す概略図、第４図は受光部の調整に調整
用ミラーからの反射光を利用する場合の装置の構
成を示す概略図、第５図は受光部の位置調整の仕
方を示す概略図、第６図は受光部の傾き調整の仕
方を示す概略図である。
図中、１：プリズム、２：試料、３：光源部、
４：受光部。
Fig. 1 is a perspective view showing a prism used in the method according to the present invention, Fig. 2 is a schematic diagram explaining the method according to the invention, and Fig. 3 uses reflected light from an analyzer to adjust the light receiving section. FIG. 4 is a schematic diagram showing the configuration of the device when the reflected light from the adjustment mirror is used to adjust the light receiving section, and FIG. 5 is a schematic diagram showing the configuration of the device when adjusting the position of the light receiving section. FIG. 6 is a schematic diagram showing how to adjust the inclination of the light receiving section. In the figure, 1: prism, 2: sample, 3: light source,
4: Light receiving section.
Claims (1)
ルダとが各々分離して真空プロセス装置に組込ま
れる偏光解析モニタにおいて、試料に対するレー
ザ光の要求された入射角に一致した底角をもつ二
等辺三角柱のプリズムを試料の上に置き、まず光
源部からのレーザ光が上記プリズムの入射面に入
射しそこでレーザ光の一部が反射して同じ軌道を
通つて光源部に戻るように光源部とプリズムとの
向きを調整し、そして上記プリズムを通過して試
料面に入射しそこで反射して受光部側へ到達する
レーザ光が受光部の光入射口の中心に入るように
受光部の光軸に垂直な平面内で受光部を移動さ
せ、さらに受光部の光入射口の中心に入つたレー
ザ光が、受光部の前部に備えられた検光子または
調整用ミラーからなる素子の表面で反射し再び試
料面で反射して上記軌道を通つて光源部に戻るよ
うに受光部の光軸の傾きを調整することを特徴と
する偏光解析モニタの調整方法。1. In a polarization analysis monitor in which a light source part, a light receiving part, and a sample holder holding a sample are separated and incorporated into a vacuum process equipment, two An equilateral triangular prism is placed on top of the sample, and the light source section is set so that the laser beam from the light source section first enters the entrance surface of the prism, and a portion of the laser beam is reflected there and returns to the light source section through the same trajectory. Adjust the direction of the prism and the laser beam that passes through the prism, enters the sample surface, is reflected there, and reaches the light receiving section. The light receiving part is moved in a plane perpendicular to the axis, and the laser beam that enters the center of the light entrance of the light receiving part is detected on the surface of an element consisting of an analyzer or adjustment mirror provided in the front of the light receiving part. 1. A method for adjusting a polarization analysis monitor, comprising adjusting the inclination of the optical axis of a light receiving section so that the light is reflected, reflected again from a sample surface, and returned to a light source section through the above-mentioned trajectory.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11534782A JPS597224A (en) | 1982-07-05 | 1982-07-05 | Adjusting method of polarization analyzing monitor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11534782A JPS597224A (en) | 1982-07-05 | 1982-07-05 | Adjusting method of polarization analyzing monitor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS597224A JPS597224A (en) | 1984-01-14 |
| JPS6237330B2 true JPS6237330B2 (en) | 1987-08-12 |
Family
ID=14660273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11534782A Granted JPS597224A (en) | 1982-07-05 | 1982-07-05 | Adjusting method of polarization analyzing monitor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS597224A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01112271A (en) * | 1987-07-04 | 1989-04-28 | Ricoh Co Ltd | Optical scanner for laser printer or the like |
| JPH0575123B2 (en) * | 1987-08-17 | 1993-10-19 | Oki Electric Ind Co Ltd |
-
1982
- 1982-07-05 JP JP11534782A patent/JPS597224A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01112271A (en) * | 1987-07-04 | 1989-04-28 | Ricoh Co Ltd | Optical scanner for laser printer or the like |
| JPH0575123B2 (en) * | 1987-08-17 | 1993-10-19 | Oki Electric Ind Co Ltd |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS597224A (en) | 1984-01-14 |
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