JPS6236009A - 熱分解型窒化硼素 - Google Patents
熱分解型窒化硼素Info
- Publication number
- JPS6236009A JPS6236009A JP17119985A JP17119985A JPS6236009A JP S6236009 A JPS6236009 A JP S6236009A JP 17119985 A JP17119985 A JP 17119985A JP 17119985 A JP17119985 A JP 17119985A JP S6236009 A JPS6236009 A JP S6236009A
- Authority
- JP
- Japan
- Prior art keywords
- boron nitride
- thermal decomposition
- crucible
- plane
- decomposition type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims abstract description 50
- 229910052582 BN Inorganic materials 0.000 title claims abstract description 38
- 238000005979 thermal decomposition reaction Methods 0.000 title abstract description 8
- 239000013078 crystal Substances 0.000 claims abstract description 27
- 238000002441 X-ray diffraction Methods 0.000 claims abstract description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 7
- 238000001771 vacuum deposition Methods 0.000 claims description 2
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 6
- 230000001788 irregular Effects 0.000 abstract 3
- 238000003475 lamination Methods 0.000 abstract 3
- 238000004299 exfoliation Methods 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910015844 BCl3 Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17119985A JPS6236009A (ja) | 1985-08-05 | 1985-08-05 | 熱分解型窒化硼素 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17119985A JPS6236009A (ja) | 1985-08-05 | 1985-08-05 | 熱分解型窒化硼素 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6236009A true JPS6236009A (ja) | 1987-02-17 |
| JPH044967B2 JPH044967B2 (enrdf_load_stackoverflow) | 1992-01-30 |
Family
ID=15918852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17119985A Granted JPS6236009A (ja) | 1985-08-05 | 1985-08-05 | 熱分解型窒化硼素 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6236009A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01153701A (ja) * | 1987-12-10 | 1989-06-15 | Kenichi Osa | 生理活性ヘミセルロースの製造方法 |
| US6831067B2 (en) | 2001-02-08 | 2004-12-14 | Amino Up Chemical Co., Ltd. | Substance having physiological property, method for producing the same and uses thereof |
| CN115323475A (zh) * | 2021-11-19 | 2022-11-11 | 北京大学 | 一种高指数晶面六方氮化硼薄膜的制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51109912A (enrdf_load_stackoverflow) * | 1975-02-27 | 1976-09-29 | Union Carbide Corp |
-
1985
- 1985-08-05 JP JP17119985A patent/JPS6236009A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51109912A (enrdf_load_stackoverflow) * | 1975-02-27 | 1976-09-29 | Union Carbide Corp |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01153701A (ja) * | 1987-12-10 | 1989-06-15 | Kenichi Osa | 生理活性ヘミセルロースの製造方法 |
| US6831067B2 (en) | 2001-02-08 | 2004-12-14 | Amino Up Chemical Co., Ltd. | Substance having physiological property, method for producing the same and uses thereof |
| US7169762B2 (en) | 2001-02-08 | 2007-01-30 | Amino Up Chemical Co., Ltd. | Substance having physiological property, method for producing the same and uses thereof |
| CN115323475A (zh) * | 2021-11-19 | 2022-11-11 | 北京大学 | 一种高指数晶面六方氮化硼薄膜的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH044967B2 (enrdf_load_stackoverflow) | 1992-01-30 |
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