JPS623571U - - Google Patents
Info
- Publication number
- JPS623571U JPS623571U JP9282385U JP9282385U JPS623571U JP S623571 U JPS623571 U JP S623571U JP 9282385 U JP9282385 U JP 9282385U JP 9282385 U JP9282385 U JP 9282385U JP S623571 U JPS623571 U JP S623571U
- Authority
- JP
- Japan
- Prior art keywords
- target
- recess
- magnetron sputtering
- back surface
- sputtering device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9282385U JPS623571U (cs) | 1985-06-19 | 1985-06-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9282385U JPS623571U (cs) | 1985-06-19 | 1985-06-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS623571U true JPS623571U (cs) | 1987-01-10 |
Family
ID=30649961
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9282385U Pending JPS623571U (cs) | 1985-06-19 | 1985-06-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS623571U (cs) |
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1985
- 1985-06-19 JP JP9282385U patent/JPS623571U/ja active Pending