JPS6235476B2 - - Google Patents
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- Publication number
- JPS6235476B2 JPS6235476B2 JP54001172A JP117279A JPS6235476B2 JP S6235476 B2 JPS6235476 B2 JP S6235476B2 JP 54001172 A JP54001172 A JP 54001172A JP 117279 A JP117279 A JP 117279A JP S6235476 B2 JPS6235476 B2 JP S6235476B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plating bath
- bath
- magnetic
- sheets
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 238000007772 electroless plating Methods 0.000 claims description 9
- 229910021645 metal ion Inorganic materials 0.000 claims description 6
- 239000008139 complexing agent Substances 0.000 claims description 5
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 4
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 4
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 4
- 229940049920 malate Drugs 0.000 claims description 4
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 4
- 229910001453 nickel ion Inorganic materials 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 239000003638 chemical reducing agent Substances 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 claims description 3
- 238000007747 plating Methods 0.000 description 66
- 230000000052 comparative effect Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 8
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 7
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 7
- 235000011130 ammonium sulphate Nutrition 0.000 description 7
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 5
- 229940044175 cobalt sulfate Drugs 0.000 description 5
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 3
- 241000080590 Niso Species 0.000 description 3
- 229910001096 P alloy Inorganic materials 0.000 description 3
- IGOJDKCIHXGPTI-UHFFFAOYSA-N [P].[Co].[Ni] Chemical compound [P].[Co].[Ni] IGOJDKCIHXGPTI-UHFFFAOYSA-N 0.000 description 3
- WPUMTJGUQUYPIV-JIZZDEOASA-L disodium (S)-malate Chemical compound [Na+].[Na+].[O-]C(=O)[C@@H](O)CC([O-])=O WPUMTJGUQUYPIV-JIZZDEOASA-L 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 235000019265 sodium DL-malate Nutrition 0.000 description 3
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 3
- 239000001394 sodium malate Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- DEDOPGXGGQYYMW-UHFFFAOYSA-N molinate Chemical compound CCSC(=O)N1CCCCCC1 DEDOPGXGGQYYMW-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229940074404 sodium succinate Drugs 0.000 description 2
- ZDQYSKICYIVCPN-UHFFFAOYSA-L sodium succinate (anhydrous) Chemical compound [Na+].[Na+].[O-]C(=O)CCC([O-])=O ZDQYSKICYIVCPN-UHFFFAOYSA-L 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- -1 etc. Chemical compound 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- PRWXGRGLHYDWPS-UHFFFAOYSA-L sodium malonate Chemical compound [Na+].[Na+].[O-]C(=O)CC([O-])=O PRWXGRGLHYDWPS-UHFFFAOYSA-L 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は磁気デイスク、磁気ドラム等の磁気記
録体に用いられる磁気記憶媒体（磁性膜）を作製
する無電解メツキ浴に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electroless plating bath for producing magnetic storage media (magnetic films) used in magnetic recording bodies such as magnetic disks and magnetic drums.
近年、高密度磁気記録体として、記憶媒体がメ
ツキ法により作製されたメツキ磁気デイスク、メ
ツキ磁気ドラム等が用いられ始めた。磁気記録装
置は記録再生ヘツドおよび記憶媒体の主構成部か
ら構成され、要求される記録密度、記録再生速度
等により使用されるヘツドの性能および記憶媒体
の磁気特性が決定される。記録密度および出力は
同一ヘツドを用いる場合、記憶媒体の磁気特性―
保持力（Hc）、残留磁束密度（Br）と膜厚（δ）
により決まり、次の様な関係がある。 In recent years, plating magnetic disks, plating magnetic drums, etc., in which storage media are manufactured by a plating method, have begun to be used as high-density magnetic recording bodies. A magnetic recording device consists of the main components of a recording/reproducing head and a storage medium, and the performance of the head used and the magnetic properties of the storage medium are determined by the required recording density, recording/reproducing speed, etc. When using the same head, the recording density and output will vary depending on the magnetic properties of the storage medium.
Coercive force (Hc), residual magnetic flux density (Br) and film thickness (δ)
It is determined by the following relationship.
（記録密度）∝（Hc／Br・δ）1/2 (1)
（出 力）∝（Br・δ・Hc）1/2 (2)
従つて要求される記録密度及び出力に適する磁
性膜を安定に得るためには、磁性膜のHc、Br及
びδを一定の許容されうる範囲内に保つ必要があ
る。 (Recording density)∝(Hc/Br・δ) 1/2 (1) (Output)∝(Br・δ・Hc) 1/2 (2) Therefore, a magnetic film suitable for the required recording density and output must be selected. In order to obtain a stable magnetic film, it is necessary to maintain Hc, Br, and δ of the magnetic film within certain allowable ranges.
ところが従来の無電解メツキ浴を用いて磁性膜
を作成する場合、Hcの値がメツキ浴のPHに依存
して変化するという性質があり、且つHcおよび
メツキ速度はメツキ日数の経過（すなわちメツキ
浴の昇温、降温の繰り返し回数）とともに著しく
変化する現象がみられる。このため個々のメツキ
ごとに磁性膜のHc、δの値にバラツキが生じや
すく再現性に問題があり、Hc、δの値が許容さ
れる範囲（実用上の許容範囲としてはHcに関し
ては±５％、δまたはメツキ速度に関して±６
％）の磁性膜は一定のメツキ浴から極く限られた
少ない数量しか得ることができないという欠点が
あつた。 However, when creating a magnetic film using a conventional electroless plating bath, there is a property that the value of Hc changes depending on the pH of the plating bath, and Hc and the plating speed change over the number of days of plating (i.e., as the plating bath changes). There is a phenomenon that changes markedly with the number of repetitions of temperature rise and temperature fall. For this reason, the values of Hc and δ of the magnetic film tend to vary for each individual plating, causing problems in reproducibility. %, δ or plating speed ±6
%) magnetic films had the disadvantage that only a limited number of small quantities could be obtained from a given plating bath.
本発明の目的は、これらの欠点を改善して所要
の特性を有する磁性膜を多量に得られる無電解メ
ツキ浴を提供することにある。 An object of the present invention is to provide an electroless plating bath that can improve these drawbacks and produce a large amount of magnetic film having the desired properties.
本発明による無電解メツキ浴は、コバルトイオ
ン、ニツケルイオン、これら金属イオンの還元
剤、PH緩衝剤、PH調節剤及び金属錯化剤を含む水
溶液であり、従来の無電解メツキ浴に使用されて
いる金属錯化剤の酒石酸塩、マロン酸塩、リンゴ
酸塩等のかわりに、コバルトイオンおよびニツケ
ルイオンに対して効果的な錯化能力を有するコハ
ク酸塩およびリンゴ酸塩が同時に加えられている
ことを特徴としている。これによりメツキ浴の遊
離金属イオンが適切に調節され、メツキ皮膜の組
成が一定に保たれかつメツキ日数によるHcおよ
びメツキ速度の変化が減少される。 The electroless plating bath according to the present invention is an aqueous solution containing cobalt ions, nickel ions, a reducing agent for these metal ions, a PH buffer, a PH regulator, and a metal complexing agent, and is not used in conventional electroless plating baths. Instead of metal complexing agents such as tartrate, malonate, malate, etc., succinate and malate, which have effective complexing ability for cobalt ions and nickel ions, are added at the same time. It is characterized by As a result, the free metal ions in the plating bath are appropriately controlled, the composition of the plating film is kept constant, and changes in Hc and plating rate due to the number of days of plating are reduced.
以下、本発明による無電解メツキ浴の特長を比
較例および実施例により説明する。 Hereinafter, the features of the electroless plating bath according to the present invention will be explained using comparative examples and examples.
比較例
非磁性基板上に非磁性Ni―ｐ層をメツキし、
その上に下記のメツキ浴組成およびメツキ条件に
てコバルト―ニツケル―リン合金磁性膜を形成し
た。Comparative example: Plating a non-magnetic Ni-p layer on a non-magnetic substrate,
A cobalt-nickel-phosphorus alloy magnetic film was formed thereon using the following plating bath composition and plating conditions.
メツキ浴組成
硫酸コバルト（CoSO4・7H2O） 0.065mol／
硫酸ニツケル（NiSO4・7H2O） 0.035mol／
次亜リン酸ナトリウム（NaH2PO2・H2O）
0.2 mol／
硫酸アンモニウム（（NH4）2SO4）0.5 mol／
マロン酸ナトリウム（CH2（COONa）2）
0.9 mol／
リンゴ酸ナトリウム（C2H3OH（COONa）2）
0.3 mol／
メツキ条件
メツキ浴のPH8.5〜9.2（25℃の時）NH4OHで
PH調節
メツキ浴の温度80℃
Ｖ／Ａ＝50cm（Ｖ＝メツキ液の量、Ａ＝基板の
面積）
メツキ時間 20秒
メツキ浴のPHを8.4から9.2まで変化させてHcの
値のPH依存性を調べた結果を第１図に示す。Plating bath composition Cobalt sulfate (CoSO 4・7H 2 O) 0.065mol/ Nickel sulfate (NiSO 4・7H 2 O) 0.035mol/ Sodium hypophosphite (NaH 2 PO 2・H 2 O)
0.2 mol/ ammonium sulfate ((NH 4 ) 2 SO 4 ) 0.5 mol/ sodium malonate (CH 2 (COONa) 2 )
0.9 mol/ Sodium malate (C 2 H 3 OH (COONa) 2 )
0.3 mol/ Plating conditions: PH8.5 to 9.2 of plating bath (at 25℃) with NH 4 OH
PH adjustment Temperature of plating bath 80℃ V/A = 50cm (V = amount of plating liquid, A = area of substrate) Plating time 20 seconds PH dependence of Hc value by changing PH of plating bath from 8.4 to 9.2 The results of the investigation are shown in Figure 1.
第１図は横軸にメツキ浴のPHをとり、縦軸にメ
ツキされた磁性膜のHcをとつたものである。メ
ツキ浴のPHが8.4から9.0まで増加する間にHcは
80Oeから730Oeまで増加し、更に浴のPHが9.0か
ら9.2まで増加するとHcは逆に730Oeから670Oe
まで減少している。Hcの値にPH依存性があつ
て、特にHcが250〜500Oe付近の変化が大きい。
この様に、従来の無電解メツキ浴では250〜
500Oe付近のHcの値に関してメツキ浴のPH依存
性が大きいため個々のメツキごとにHcの値にバ
ラツキが生じやすく、この様な範囲のHcの値を
再現性良く得ることは困難であつた。 In Figure 1, the horizontal axis represents the pH of the plating bath, and the vertical axis represents the Hc of the plated magnetic film. While the pH of the Metsuki bath increases from 8.4 to 9.0, Hc
When the pH of the bath increases from 80Oe to 730Oe and further increases from 9.0 to 9.2, Hc increases from 730Oe to 670Oe.
has decreased to. The Hc value has a PH dependence, and the change is particularly large when Hc is around 250 to 500 Oe.
In this way, conventional electroless plating baths have a
Since Hc values around 500 Oe are highly dependent on the pH of the plating bath, variations in Hc values are likely to occur for each individual plating, and it has been difficult to obtain Hc values in such a range with good reproducibility.
メツキ浴の寿命に関しては次の様にして検討を
行つた。非磁性基板（20mm×10mm×3.3mm）に非
磁性Ni―ｐ層をメツキした後、浴のPHを8.8とし
浴の温度を80℃に昇温したメツキ浴（300c.c.）に
20秒間浸漬して次々にメツキを繰り返した。１日
目のメツキ枚数が25枚に達すると浴の温度を室温
まで降温し、２日目に再び浴の温度を80℃に昇温
し26枚目から50枚目まで25枚メツキを行い以下同
様にしてメツキ枚数の合計が125枚に達するまで
１日25枚の割りで繰り返した場合のメツキ枚数25
枚ごとのHcおよびメツキ速度の変化を第２図に
示す。これによるとメツキ開始時のHcの値は
410Oeであり、メツキ枚数が増加するに従つて
Hcの値は増加し75枚メツキが終了した時点での
Hcの値は450Oeとなり、更にメツキ枚数が増加
するとHcの値は更に増加を続ける。またメツキ
速度は、メツキ開始時は約1490Å／minである
が、メツキ枚数が増加するにしたがつて減少し75
枚メツキが終了した時点では約1310Å／min程度
となり、更にメツキ枚数が増加するとメツキ速度
は更に減少する。 The lifespan of the plating bath was investigated as follows. After plating a non-magnetic Ni-P layer on a non-magnetic substrate (20 mm x 10 mm x 3.3 mm), it was placed in a plating bath (300 c.c.) with a bath pH of 8.8 and a bath temperature of 80°C.
Dip for 20 seconds and repeat plating one after another. When the number of sheets plated on the first day reaches 25, the temperature of the bath is lowered to room temperature, and on the second day, the temperature of the bath is raised again to 80℃, and 25 sheets are plated from the 26th sheet to the 50th sheet. If you repeat the same process at 25 sheets per day until the total number of sheets reaches 125, the number of sheets to be plated is 25.
Figure 2 shows the changes in Hc and plating speed for each sheet. According to this, the value of Hc at the start of metsuki is
410Oe, and as the number of plated sheets increases
The value of Hc increases and when the plating of 75 sheets is completed,
The Hc value is 450 Oe, and as the number of plated sheets increases, the Hc value continues to increase. Furthermore, the plating speed is approximately 1490 Å/min at the start of plating, but decreases as the number of sheets plated increases75
When plating is completed, the plating speed is approximately 1310 Å/min, and as the number of sheets to be plated further increases, the plating speed further decreases.
以上の結果と磁気記憶媒体として実用上許容さ
れうるHcの変化量（±20Oe）およびδの変化量
（±30Å）を考慮すれば、前記のメツキ浴から実
用上使用されうる磁性膜が作成できる数量はメツ
キ枚数75枚程度でしかないことわかる。 Considering the above results and the amount of change in Hc (±20 Oe) and change in δ (±30 Å) that are practically acceptable for magnetic storage media, it is possible to create a magnetic film that can be used practically from the plating bath described above. It can be seen that the quantity is only about 75 pieces.
実施例 １
下記の組成のメツキ浴を用いて比較例と同様な
方法でコバルト―ニツケル―リン合金磁性膜を形
成した。Example 1 A cobalt-nickel-phosphorus alloy magnetic film was formed in the same manner as in the comparative example using a plating bath having the following composition.
メツキ浴組成
硫酸コバルト（CoSO4・7H2O） 0.06mol／
硫酸ニツケル（NiSO4・7H2O） 0.04mol／
次亜リン酸ナトリウム（NaH2PO2・H2O）
0.2 mol／
硫酸アンモニウム（（NH4）2SO4）
０ mol／
リンゴ酸ナトリウム（C2H3OH（COONa）2）
0.4 mol／
コハク酸ナトリウム（Na2C4H4O4・6H2O）
0.5 mol／
比較例と同様にHcの値のPH依存性を調べた結
果を第３図に示す。メツキ浴のPHが8.6から9.2の
範囲ではHcの値はほぼ350Oeであり、HcのPH依
存性は殆んどない。Plating bath composition Cobalt sulfate (CoSO 4・7H 2 O) 0.06mol/ Nickel sulfate (NiSO 4・7H 2 O) 0.04mol/ Sodium hypophosphite (NaH 2 PO 2・H 2 O)
0.2 mol/ ammonium sulfate ((NH 4 ) 2 SO 4 )
0 mol/ Sodium malate (C 2 H 3 OH (COONa) 2 )
0.4 mol/ Sodium succinate (Na 2 C 4 H 4 O 4・6H 2 O)
0.5 mol/ Figure 3 shows the results of investigating the PH dependence of the Hc value in the same manner as in the comparative example. When the PH of the plating bath is in the range of 8.6 to 9.2, the Hc value is approximately 350 Oe, and there is almost no PH dependence of Hc.
比較例と同様の手順でメツキ浴の寿命の検討を
行つたが、本実施例では浴のPHを9.0とした。そ
の結果を第４図に示す。メツキ開始時のHcは
350Oeであり、メツキ枚数が増加するにつれて
Hcの値は増加するが、175枚メツキが終了した時
点でもHcの値は385Oeに達するのみで、これは
尚許容範囲内の値を保つている。 The life of the plating bath was investigated using the same procedure as in the comparative example, but in this example, the pH of the bath was 9.0. The results are shown in FIG. Hc at the start of metsuki is
350Oe, and as the number of plated sheets increases
Although the Hc value increases, even after plating 175 sheets, the Hc value only reaches 385 Oe, which is still within the allowable range.
またメツキ速度は、メツキ開始時は1500Å／
minで、メツキ枚数が増加するに従つて減少する
が、175枚メツキが終了した時点でも1340Å／
min程度でこれも尚許容範囲内の値を保つてい
る。 Also, the plating speed is 1500Å/
min, it decreases as the number of plated sheets increases, but even when 175 sheets have been plated, it is still 1340Å/
This value is still within the allowable range at about min.
以上の結果から、実施例１のメツキ浴を用いて
実用上使用されうる磁性膜が作成できる数量はメ
ツキ枚数175枚程度であることがわかる。即ち比
較例のメツキ浴にくらべて浴寿命は２倍以上に増
加している。 From the above results, it can be seen that the number of practically usable magnetic films that can be produced using the plating bath of Example 1 is about 175 sheets. That is, the bath life is more than doubled compared to the plating bath of the comparative example.
なお本実施例で用いたメツキ浴組成においてPH
緩衝剤の硫酸アンモニウムを加えるとメツキ浴の
PH変化が緩和され、得られるメツキ膜のHcの値
が増加するが、硫酸アンモニウム濃度を0.3mol／
以上にするとメツキ枚数によりメツキ速度が著
しく低下する。本発明によるメツキ浴ではこの様
な傾向があるため硫酸アンモニウム濃度を０〜
0.2mol／の範囲とするのが好ましい。 In addition, in the plating bath composition used in this example, the PH
When ammonium sulfate is added as a buffer, the plating bath becomes
The pH change is alleviated and the Hc value of the resulting plated film increases, but the ammonium sulfate concentration is reduced to 0.3 mol/
If the number of sheets is more than that, the plating speed will decrease significantly depending on the number of sheets to be plated. Since the plating bath according to the present invention has this tendency, the ammonium sulfate concentration should be set at 0 to 0.
It is preferably in the range of 0.2 mol/.
実施例 ２
下記の組成のメツキ浴を用いて、比較例と同様
な方法で、コバルト―ニツケル―リン合金磁性膜
を形成した。Example 2 A cobalt-nickel-phosphorus alloy magnetic film was formed in the same manner as in the comparative example using a plating bath having the following composition.
硫酸コバルト（CoSO4・7H2O） 0.07mol／
硫酸ニツケル（NiSO4・7H2O） 0.03mol／
次亜リン酸ナトリウム（NaH2PO2・H2O）
0.2 mol／
硫酸アンモニウム（（NH4）2SO4）0.1 mol／
リンゴ酸ナトリウム（C2H3OH（COONa）2）
0.3 mol／
コハク酸ナトリウム（Na2C4H4O4・6H2O）
0.6 mol／
実施例１の場合よりもHcを増加させるために
硫酸アンモニウム濃度を0.1mol／とし、メツキ
浴のコバルトの比率を増加しそれに伴つて錯化剤
の組成をかえている。比較例と同様の手順でHc
のPH依存性およびメツキ浴の寿命の検討を行つた
結果を第５図および第６図に示す。ただしメツキ
浴の寿命の検討は浴のPHを9.0として行つた。本
実施例でも実施例１と同様に比較例にくらべて
HcのPH依存性ははるかに小さく、メツキ浴の寿
命は２倍以上に増加することがわかつた。 Cobalt sulfate (CoSO 4・7H 2 O) 0.07mol/ Nickel sulfate (NiSO 4・7H 2 O) 0.03mol/ Sodium hypophosphite (NaH 2 PO 2・H 2 O)
0.2 mol/ ammonium sulfate ((NH 4 ) 2 SO 4 ) 0.1 mol/ sodium malate (C 2 H 3 OH (COONa) 2 )
0.3 mol/ Sodium succinate (Na 2 C 4 H 4 O 4・6H 2 O)
0.6 mol/ In order to increase Hc more than in Example 1, the ammonium sulfate concentration was set to 0.1 mol/, the proportion of cobalt in the plating bath was increased, and the composition of the complexing agent was changed accordingly. Hc using the same procedure as the comparative example
Figures 5 and 6 show the results of an investigation of the pH dependence of and the life of the plating bath. However, the life of the plating bath was investigated with the bath pH set at 9.0. In this example, as well as in Example 1, compared to the comparative example,
It was found that the pH dependence of Hc was much smaller, and the life of the plating bath was more than doubled.
以上、実施例１および２で示された様に本発明
によれば、コバルトイオン、ニツケルイオン、こ
れら金属イオンの還元剤、PH緩衝剤、PH調節剤を
含む水溶液に前記金属イオンの錯化剤としてコハ
ク酸塩およびリンゴ酸塩を同時に含む無電解メツ
キ浴を用いることにより一定の特性を有する磁気
記憶媒体を多量に得ることができる。 As described above in Examples 1 and 2, according to the present invention, a complexing agent for the metal ions is added to an aqueous solution containing cobalt ions, nickel ions, reducing agents for these metal ions, a PH buffer, and a PH regulator. By using an electroless plating bath containing succinate and malate at the same time, magnetic storage media with certain properties can be obtained in large quantities.
尚、実施例においては、硫酸コバルト濃度が
0.06mol／、硫酸ニツケル濃度が0.04mol／の
メツキ浴及び硫酸コバルト濃度が0.07mol／、
硫酸ニツケル濃度が0.03mol／のメツキ浴の２
種類の浴の場合についてだけ述べたが、コバルト
濃度／ニツケル濃度の値が９から0.3の範囲でか
つ全金属濃度が0.03mol／から0.3mol／の範
囲のメツキ浴については各濃度に応じて錯化剤濃
度を変えることにより本発明の目的は達せられ
る。 In addition, in the examples, the cobalt sulfate concentration is
0.06mol/, plating bath with nickel sulfate concentration of 0.04mol/, and cobalt sulfate concentration of 0.07mol/,
2 of plating bath with nickel sulfate concentration of 0.03 mol/
Although we have only described the case of different types of baths, for plating baths where the cobalt concentration/nickel concentration value is in the range of 9 to 0.3 and the total metal concentration is in the range of 0.03 mol/ to 0.3 mol/, complexes will vary according to each concentration. The objectives of the present invention can be achieved by varying the concentration of the curing agent.
第１図は、比較例で用いたメツキ浴における浴
のPHとHcの関係を示す図、第２図はメツキ枚数
によるHcおよびメツキ速度の変化を示す図、第
３図および第４図は実施例１のメツキ浴を用いた
時の浴のPHとHcの関係およびメツキ枚数による
Hc、メツキ速度の変化を各々示す図、第５図お
よび第６図は実施例２のメツキ浴を用いた時の浴
のPHとHcの関係及びメツキ枚数によるHc、メツ
キ速度の変化を各々示す図である。
Figure 1 is a diagram showing the relationship between bath PH and Hc in the plating bath used in the comparative example, Figure 2 is a diagram showing changes in Hc and plating speed depending on the number of sheets to be plated, and Figures 3 and 4 are diagrams showing the relationship between bath PH and Hc in the plating bath used in the comparative example. Depends on the relationship between PH and Hc of the bath when using the plating bath of Example 1 and the number of plating sheets.
Figures 5 and 6 show the relationship between bath PH and Hc when the plating bath of Example 2 is used, and the changes in Hc and plating speed depending on the number of sheets plated. It is a diagram.
Claims (1)
属イオンの還元剤、PH緩衝剤、PH調節剤を含む水
溶液に前記金属イオンの錯化剤としてコハク酸
塩、及びリンゴ酸塩を含むことを特徴とする磁気
記録体に用いられる磁気記録媒体（磁性膜）を作
製するための無電解メツキ浴。1. Magnetic recording characterized in that an aqueous solution containing cobalt ions, nickel ions, a reducing agent for these metal ions, a PH buffer, and a PH regulator contains succinate and malate as complexing agents for the metal ions. Electroless plating bath for producing magnetic recording media (magnetic films) used in bodies.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP117279A JPS5594468A (en) | 1979-01-08 | 1979-01-08 | Nonelectrolytic plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP117279A JPS5594468A (en) | 1979-01-08 | 1979-01-08 | Nonelectrolytic plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5594468A JPS5594468A (en) | 1980-07-17 |
| JPS6235476B2 true JPS6235476B2 (en) | 1987-08-01 |
Family
ID=11494005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP117279A Granted JPS5594468A (en) | 1979-01-08 | 1979-01-08 | Nonelectrolytic plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5594468A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61204837A (en) * | 1985-03-08 | 1986-09-10 | Nippon Light Metal Co Ltd | Production of magnetic recording medium |
| CA2160701A1 (en) * | 1993-05-20 | 1994-12-08 | David Alan Wilson | Succinic acid derivative degradable chelants, uses and compositions thereof |
-
1979
- 1979-01-08 JP JP117279A patent/JPS5594468A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5594468A (en) | 1980-07-17 |
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