JPS62280742A - フオトマスクブランクとフオトマスク - Google Patents

フオトマスクブランクとフオトマスク

Info

Publication number
JPS62280742A
JPS62280742A JP61124238A JP12423886A JPS62280742A JP S62280742 A JPS62280742 A JP S62280742A JP 61124238 A JP61124238 A JP 61124238A JP 12423886 A JP12423886 A JP 12423886A JP S62280742 A JPS62280742 A JP S62280742A
Authority
JP
Japan
Prior art keywords
light
chromium
etching
photomask
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61124238A
Other languages
English (en)
Japanese (ja)
Other versions
JPH042940B2 (enExample
Inventor
Masao Ushida
正男 牛田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP61124238A priority Critical patent/JPS62280742A/ja
Publication of JPS62280742A publication Critical patent/JPS62280742A/ja
Publication of JPH042940B2 publication Critical patent/JPH042940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61124238A 1986-05-29 1986-05-29 フオトマスクブランクとフオトマスク Granted JPS62280742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61124238A JPS62280742A (ja) 1986-05-29 1986-05-29 フオトマスクブランクとフオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61124238A JPS62280742A (ja) 1986-05-29 1986-05-29 フオトマスクブランクとフオトマスク

Publications (2)

Publication Number Publication Date
JPS62280742A true JPS62280742A (ja) 1987-12-05
JPH042940B2 JPH042940B2 (enExample) 1992-01-21

Family

ID=14880385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61124238A Granted JPS62280742A (ja) 1986-05-29 1986-05-29 フオトマスクブランクとフオトマスク

Country Status (1)

Country Link
JP (1) JPS62280742A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02264952A (ja) * 1989-04-05 1990-10-29 Toppan Printing Co Ltd フオトマスクブランクおよびフオトマスク
JP2014134667A (ja) * 2013-01-10 2014-07-24 Nikon Corp フォトマスク用基板およびフォトマスク

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02264952A (ja) * 1989-04-05 1990-10-29 Toppan Printing Co Ltd フオトマスクブランクおよびフオトマスク
JP2014134667A (ja) * 2013-01-10 2014-07-24 Nikon Corp フォトマスク用基板およびフォトマスク

Also Published As

Publication number Publication date
JPH042940B2 (enExample) 1992-01-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term