JPS62277390A - Cephalosporanic acid derivative - Google Patents
Cephalosporanic acid derivativeInfo
- Publication number
- JPS62277390A JPS62277390A JP61006806A JP680686A JPS62277390A JP S62277390 A JPS62277390 A JP S62277390A JP 61006806 A JP61006806 A JP 61006806A JP 680686 A JP680686 A JP 680686A JP S62277390 A JPS62277390 A JP S62277390A
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- substituted
- formula
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- YGBFLZPYDUKSPT-MRVPVSSYSA-N cephalosporanic acid Chemical class S1CC(COC(=O)C)=C(C(O)=O)N2C(=O)C[C@H]21 YGBFLZPYDUKSPT-MRVPVSSYSA-N 0.000 title claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 14
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 7
- 125000002252 acyl group Chemical group 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 6
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 4
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 8
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 7
- 125000004055 thiomethyl group Chemical group [H]SC([H])([H])* 0.000 claims description 7
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 125000005042 acyloxymethyl group Chemical group 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 239000001301 oxygen Chemical group 0.000 claims description 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 abstract description 43
- -1 (substituted) carboxyl Chemical group 0.000 abstract description 32
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 abstract description 12
- 238000006243 chemical reaction Methods 0.000 abstract description 11
- 229930186147 Cephalosporin Natural products 0.000 abstract description 5
- 229940124587 cephalosporin Drugs 0.000 abstract description 5
- 150000001780 cephalosporins Chemical class 0.000 abstract description 5
- 229960005361 cefaclor Drugs 0.000 abstract description 3
- ZHRDJBQJJRPNOP-UHFFFAOYSA-N 2-pyridin-4-ylethanethioyl chloride;hydrochloride Chemical compound Cl.ClC(=S)CC1=CC=NC=C1 ZHRDJBQJJRPNOP-UHFFFAOYSA-N 0.000 abstract description 2
- HSHGZXNAXBPPDL-HZGVNTEJSA-N 7beta-aminocephalosporanic acid Chemical compound S1CC(COC(=O)C)=C(C([O-])=O)N2C(=O)[C@@H]([NH3+])[C@@H]12 HSHGZXNAXBPPDL-HZGVNTEJSA-N 0.000 abstract description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 abstract description 2
- RZYHXKLKJRGJGP-UHFFFAOYSA-N 2,2,2-trifluoro-n,n-bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)N([Si](C)(C)C)C(=O)C(F)(F)F RZYHXKLKJRGJGP-UHFFFAOYSA-N 0.000 abstract 1
- 230000003115 biocidal effect Effects 0.000 abstract 1
- QYIYFLOTGYLRGG-GPCCPHFNSA-N cefaclor Chemical compound C1([C@H](C(=O)N[C@@H]2C(N3C(=C(Cl)CS[C@@H]32)C(O)=O)=O)N)=CC=CC=C1 QYIYFLOTGYLRGG-GPCCPHFNSA-N 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- 239000002253 acid Substances 0.000 description 21
- 238000003756 stirring Methods 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000000243 solution Substances 0.000 description 12
- 150000002148 esters Chemical class 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- SNBUBQHDYVFSQF-HIFRSBDPSA-N cefmetazole Chemical compound S([C@@H]1[C@@](C(N1C=1C(O)=O)=O)(NC(=O)CSCC#N)OC)CC=1CSC1=NN=NN1C SNBUBQHDYVFSQF-HIFRSBDPSA-N 0.000 description 6
- 229960003585 cefmetazole Drugs 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000003242 anti bacterial agent Substances 0.000 description 4
- 229940088710 antibiotic agent Drugs 0.000 description 4
- 125000004185 ester group Chemical group 0.000 description 4
- 239000000543 intermediate Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- WKJGTOYAEQDNIA-IOOZKYRYSA-N (6r,7r)-7-[[(2r)-2-amino-2-phenylacetyl]amino]-3-chloro-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid;hydrate Chemical compound O.C1([C@H](C(=O)N[C@@H]2C(N3C(=C(Cl)CS[C@@H]32)C(O)=O)=O)N)=CC=CC=C1 WKJGTOYAEQDNIA-IOOZKYRYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- NVYVHAPFRUEAJN-UHFFFAOYSA-N anisole;2,2,2-trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.COC1=CC=CC=C1 NVYVHAPFRUEAJN-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 229960004841 cefadroxil Drugs 0.000 description 3
- NBFNMSULHIODTC-CYJZLJNKSA-N cefadroxil monohydrate Chemical compound O.C1([C@@H](N)C(=O)N[C@H]2[C@@H]3N(C2=O)C(=C(CS3)C)C(O)=O)=CC=C(O)C=C1 NBFNMSULHIODTC-CYJZLJNKSA-N 0.000 description 3
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- FTVLMFQEYACZNP-UHFFFAOYSA-N trimethylsilyl trifluoromethanesulfonate Chemical compound C[Si](C)(C)OS(=O)(=O)C(F)(F)F FTVLMFQEYACZNP-UHFFFAOYSA-N 0.000 description 3
- DYCLHZPOADTVKK-UHFFFAOYSA-N 2-(2-azaniumyl-1,3-thiazol-4-yl)acetate Chemical compound NC1=NC(CC(O)=O)=CS1 DYCLHZPOADTVKK-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical class NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- PGUPJAPHYIEKLT-UHFFFAOYSA-N 2-pyridin-4-ylsulfanylacetic acid Chemical compound OC(=O)CSC1=CC=NC=C1 PGUPJAPHYIEKLT-UHFFFAOYSA-N 0.000 description 2
- XQXPVVBIMDBYFF-UHFFFAOYSA-N 4-hydroxyphenylacetic acid Chemical compound OC(=O)CC1=CC=C(O)C=C1 XQXPVVBIMDBYFF-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- ZGUNAGUHMKGQNY-ZETCQYMHSA-N L-alpha-phenylglycine zwitterion Chemical group OC(=O)[C@@H](N)C1=CC=CC=C1 ZGUNAGUHMKGQNY-ZETCQYMHSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 150000001555 benzenes Chemical class 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical class NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- SIOVKLKJSOKLIF-UHFFFAOYSA-N bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)OC(C)=N[Si](C)(C)C SIOVKLKJSOKLIF-UHFFFAOYSA-N 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical group C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- NIDNOXCRFUCAKQ-UMRXKNAASA-N (1s,2r,3s,4r)-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1[C@H]2C=C[C@@H]1[C@H](C(=O)O)[C@@H]2C(O)=O NIDNOXCRFUCAKQ-UMRXKNAASA-N 0.000 description 1
- MASDFXZJIDNRTR-UHFFFAOYSA-N 1,3-bis(trimethylsilyl)urea Chemical compound C[Si](C)(C)NC(=O)N[Si](C)(C)C MASDFXZJIDNRTR-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- NRKYWOKHZRQRJR-UHFFFAOYSA-N 2,2,2-trifluoroacetamide Chemical compound NC(=O)C(F)(F)F NRKYWOKHZRQRJR-UHFFFAOYSA-N 0.000 description 1
- QIJIUJYANDSEKG-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-amine Chemical compound CC(C)(C)CC(C)(C)N QIJIUJYANDSEKG-UHFFFAOYSA-N 0.000 description 1
- NSORSORRXHLKQV-UHFFFAOYSA-N 2-(4-methylphenyl)sulfonyloxyacetic acid Chemical compound CC1=CC=C(S(=O)(=O)OCC(O)=O)C=C1 NSORSORRXHLKQV-UHFFFAOYSA-N 0.000 description 1
- KKLMJYDGZSAIQX-UHFFFAOYSA-N 2-(n-hydroxyanilino)acetic acid Chemical compound OC(=O)CN(O)C1=CC=CC=C1 KKLMJYDGZSAIQX-UHFFFAOYSA-N 0.000 description 1
- SGRBRAQXECVTBV-UHFFFAOYSA-N 2-methyl-n-propan-2-ylbutan-2-amine Chemical compound CCC(C)(C)NC(C)C SGRBRAQXECVTBV-UHFFFAOYSA-N 0.000 description 1
- LJCWONGJFPCTTL-UHFFFAOYSA-N 4-hydroxyphenylglycine Chemical compound OC(=O)C(N)C1=CC=C(O)C=C1 LJCWONGJFPCTTL-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- UQLLWWBDSUHNEB-CZUORRHYSA-N Cefaprin Chemical compound N([C@H]1[C@@H]2N(C1=O)C(=C(CS2)COC(=O)C)C(O)=O)C(=O)CSC1=CC=NC=C1 UQLLWWBDSUHNEB-CZUORRHYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- JWCSIUVGFCSJCK-CAVRMKNVSA-N Disodium Moxalactam Chemical compound N([C@]1(OC)C(N2C(=C(CSC=3N(N=NN=3)C)CO[C@@H]21)C(O)=O)=O)C(=O)C(C(O)=O)C1=CC=C(O)C=C1 JWCSIUVGFCSJCK-CAVRMKNVSA-N 0.000 description 1
- SVYKKECYCPFKGB-UHFFFAOYSA-N N,N-dimethylcyclohexylamine Chemical compound CN(C)C1CCCCC1 SVYKKECYCPFKGB-UHFFFAOYSA-N 0.000 description 1
- XCOBLONWWXQEBS-KPKJPENVSA-N N,O-bis(trimethylsilyl)trifluoroacetamide Chemical compound C[Si](C)(C)O\C(C(F)(F)F)=N\[Si](C)(C)C XCOBLONWWXQEBS-KPKJPENVSA-N 0.000 description 1
- JOOMLFKONHCLCJ-UHFFFAOYSA-N N-(trimethylsilyl)diethylamine Chemical compound CCN(CC)[Si](C)(C)C JOOMLFKONHCLCJ-UHFFFAOYSA-N 0.000 description 1
- HTLZVHNRZJPSMI-UHFFFAOYSA-N N-ethylpiperidine Chemical class CCN1CCCCC1 HTLZVHNRZJPSMI-UHFFFAOYSA-N 0.000 description 1
- MSPCIZMDDUQPGJ-UHFFFAOYSA-N N-methyl-N-(trimethylsilyl)trifluoroacetamide Chemical compound C[Si](C)(C)N(C)C(=O)C(F)(F)F MSPCIZMDDUQPGJ-UHFFFAOYSA-N 0.000 description 1
- YKFRUJSEPGHZFJ-UHFFFAOYSA-N N-trimethylsilylimidazole Chemical compound C[Si](C)(C)N1C=CN=C1 YKFRUJSEPGHZFJ-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229960004350 cefapirin Drugs 0.000 description 1
- MLYYVTUWGNIJIB-BXKDBHETSA-N cefazolin Chemical compound S1C(C)=NN=C1SCC1=C(C(O)=O)N2C(=O)[C@@H](NC(=O)CN3N=NN=C3)[C@H]2SC1 MLYYVTUWGNIJIB-BXKDBHETSA-N 0.000 description 1
- 229960001139 cefazolin Drugs 0.000 description 1
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 description 1
- BJLJNLUARMMMLW-UHFFFAOYSA-N chloro-(3-chloropropyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCCCl BJLJNLUARMMMLW-UHFFFAOYSA-N 0.000 description 1
- VGQOKOYKFDUPPJ-UHFFFAOYSA-N chloro-[2-[chloro(dimethyl)silyl]ethyl]-dimethylsilane Chemical compound C[Si](C)(Cl)CC[Si](C)(C)Cl VGQOKOYKFDUPPJ-UHFFFAOYSA-N 0.000 description 1
- DBKNGKYVNBJWHL-UHFFFAOYSA-N chloro-dimethyl-octylsilane Chemical compound CCCCCCCC[Si](C)(C)Cl DBKNGKYVNBJWHL-UHFFFAOYSA-N 0.000 description 1
- KWYZNESIGBQHJK-UHFFFAOYSA-N chloro-dimethyl-phenylsilane Chemical compound C[Si](C)(Cl)C1=CC=CC=C1 KWYZNESIGBQHJK-UHFFFAOYSA-N 0.000 description 1
- HXVPUKPVLPTVCQ-UHFFFAOYSA-N chloro-dimethyl-propylsilane Chemical compound CCC[Si](C)(C)Cl HXVPUKPVLPTVCQ-UHFFFAOYSA-N 0.000 description 1
- IRJSTSBNAVWQLX-UHFFFAOYSA-N chloro-methyl-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[SiH](C)Cl IRJSTSBNAVWQLX-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- GCSJLQSCSDMKTP-UHFFFAOYSA-N ethenyl(trimethyl)silane Chemical compound C[Si](C)(C)C=C GCSJLQSCSDMKTP-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Substances C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 1
- 229960000433 latamoxef Drugs 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- KAHVZNKZQFSBFW-UHFFFAOYSA-N n-methyl-n-trimethylsilylmethanamine Chemical compound CN(C)[Si](C)(C)C KAHVZNKZQFSBFW-UHFFFAOYSA-N 0.000 description 1
- LWFWUJCJKPUZLV-UHFFFAOYSA-N n-trimethylsilylacetamide Chemical compound CC(=O)N[Si](C)(C)C LWFWUJCJKPUZLV-UHFFFAOYSA-N 0.000 description 1
- IPJPAQIHUIKFLV-UHFFFAOYSA-N n-trimethylsilylaniline Chemical compound C[Si](C)(C)NC1=CC=CC=C1 IPJPAQIHUIKFLV-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- MHYGQXWCZAYSLJ-UHFFFAOYSA-N tert-butyl-chloro-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](Cl)(C(C)(C)C)C1=CC=CC=C1 MHYGQXWCZAYSLJ-UHFFFAOYSA-N 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- JSQJUDVTRRCSRU-UHFFFAOYSA-N tributyl(chloro)silane Chemical compound CCCC[Si](Cl)(CCCC)CCCC JSQJUDVTRRCSRU-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- SIOVKLKJSOKLIF-HJWRWDBZSA-N trimethylsilyl (1z)-n-trimethylsilylethanimidate Chemical compound C[Si](C)(C)OC(/C)=N\[Si](C)(C)C SIOVKLKJSOKLIF-HJWRWDBZSA-N 0.000 description 1
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 description 1
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical compound C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 description 1
- 238000006227 trimethylsilylation reaction Methods 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
Landscapes
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Cephalosporin Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、セファロスポリン系抗生物質又はその医学的
に許容される塩を製造する際の中間体原料物質として有
効に使用される下記式(1):1
(但し、Xは硫黄、酸素、 so又は502fr、表わ
し、R1は水素又は低級アルコキシ基を表わし、R2は
水素、アシル基、置換アシル基、シリル基又は置換シリ
ル基を表わし、R3はカルボキシル基。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to the following formula (1 ): 1 (wherein, carboxyl group.
置換カルボキシル基又はカルボキシル基の塩を表わし、
R4は水素、ハロゲン原子、ヒドロキシメチル基、低級
アルキル基、低級アルコキシ基。Represents a substituted carboxyl group or a salt of a carboxyl group,
R4 is hydrogen, a halogen atom, a hydroxymethyl group, a lower alkyl group, or a lower alkoxy group.
ピリジルオキシメチル基、アシルオキシメチル基、アリ
ルオキシメチル基、アリールオキシメチル基又は置換基
を有するか或いは有しない複素環チオメチル基を表わす
。〕
で示される新規なセファロスポラン酸誘導体に関する。It represents a pyridyloxymethyl group, an acyloxymethyl group, an allyloxymethyl group, an aryloxymethyl group, or a heterocyclic thiomethyl group with or without a substituent. ] The present invention relates to a novel cephalosporanic acid derivative shown in the following.
従来の技術及びその問題点
従来、下記式(2)
で示される3−クロロ−7−D−(2−フェニルグリシ
ナミド)−3−セフェム−4−カルメン酸(セファクロ
ール)、下記式(3)
で示される7−〔D−α−アミノ−α−(p−ヒドロキ
シフェニル)アセトアミドツー3−メチル−3−セフェ
ム−4−カルメン酸(セファドロキシル)、下記式(4
)
で示される7β−シアノメチルチオアセタミド−7α−
メトキシ−3−((1−メチル−IH−テトラゾール−
5−イル)チオ〕メチルー3セフェムー4−カルゲン酸
(セフメタゾール)等が優れた抗菌作用を示し、セファ
ロスポリン系抗生物質として有用であることが知られて
いる。Conventional techniques and their problems Conventionally, 3-chloro-7-D-(2-phenylglycinamide)-3-cephem-4-carmenic acid (cefachlor) represented by the following formula (2); 3) 7-[D-α-amino-α-(p-hydroxyphenyl)acetamido-3-methyl-3-cephem-4-carmenic acid (cefadroxil) represented by the following formula (4
) 7β-cyanomethylthioacetamide-7α-
Methoxy-3-((1-methyl-IH-tetrazole-
It is known that 5-yl)thio]methyl-3cephemu-4-cargenic acid (cefmetazole) and the like exhibit excellent antibacterial activity and are useful as cephalosporin antibiotics.
このため、上記式(2) 、 (3) 、 (4)等の
化合物″f製造する方法として種々の提案がなされてい
るが、式(2) 、 (3) 、 (4)等の化合物を
よシ高収率かつ高純度で得るための方法や中間体の開発
が更に望まれている。For this reason, various proposals have been made as methods for producing compounds such as the above formulas (2), (3), and (4). It is further desired to develop methods and intermediates that can be obtained with high yield and high purity.
発明の概要
本発明者らは、上記事情に鑑み、式(2) 、 (3)
、 (4)等の化合物を効率よく製造することにつき
鋭意研究を行なった結果、例えば後述する式(5) 、
(7) 、 (9) 。Summary of the invention In view of the above circumstances, the present inventors have developed formulas (2) and (3).
, (4) etc. As a result of intensive research into efficiently producing compounds such as, for example, formula (5) described later,
(7), (9).
α0 、R5,fi3)、(15)、(16)、αl、
(21,(21,H,U、fi等の前記(1)式で示さ
れる新規化合物にアシル化剤を反応させ、次いでこれを
加水分解することなどによシ、前記式(2) 、 (3
) 、 (4)等の化合物が高収率かつ高純度で得られ
ることを見い出した。従って、このように式(1)の新
規化合物全中間体として経由することにより、式(2)
、 (3) 、 (4)で示される化合物等を効率良
く合成し得ることを知見し、本発明をなすに至ったもの
である。α0, R5, fi3), (15), (16), αl,
(21, (21, H, U, fi, etc.) by reacting an acylating agent with an acylating agent and then hydrolyzing this, the above formula (2), ( 3
), (4) and the like can be obtained in high yield and purity. Therefore, by passing the new compound of formula (1) as all intermediates in this way, formula (2)
, (3), and (4) can be efficiently synthesized, leading to the present invention.
以下、本発明につき更に詳しく説明する。The present invention will be explained in more detail below.
発明の構成
本発明Vζ係る新規セファロスイラン酸誘導体は、上述
した(1)式、即ち
(但し、Xは硫黄、酸素、 SO又はSO□を表わし、
R1は水素又は低級アルコキシ基を表わし、R2は水素
、アシル基、置換アシル基、シリル基又は置換シリル基
を表わし、R3はカルビキシル基。Structure of the Invention The novel cephalosylanic acid derivative according to the present invention Vζ has the above-mentioned formula (1), that is, (where X represents sulfur, oxygen, SO or SO□,
R1 represents hydrogen or a lower alkoxy group, R2 represents hydrogen, an acyl group, a substituted acyl group, a silyl group, or a substituted silyl group, and R3 represents a carbyxyl group.
置換カルボキシル基又はカルメキシル基の塩を表わし、
R4は水素、ハロダン原子、とドロキシメチル基、低級
アルキル基、低級アルコキシ基。represents a substituted carboxyl group or a salt of a carmexyl group,
R4 is hydrogen, a halodane atom, a droxymethyl group, a lower alkyl group, or a lower alkoxy group.
ピリジルオキシメチル基、アシルオキシメチル基、アリ
ルオキシメチル基、アリールオキシメチル基又は置換基
を有するか或いは有しない複素環チオメチル基を表わす
。)
で示されるものである。It represents a pyridyloxymethyl group, an acyloxymethyl group, an allyloxymethyl group, an aryloxymethyl group, or a heterocyclic thiomethyl group with or without a substituent. ).
なお、ここで低級アルコキシ基としては炭素数1〜5、
特に1〜3のもの等が挙げられる。In addition, here, the lower alkoxy group has 1 to 5 carbon atoms,
In particular, those from 1 to 3 can be mentioned.
置換アシル基としては、フェニルグリシン、p−ヒドロ
キシフェニルグリシン、シアノメチルチオ酢酸、(2−
アミノチアゾール−4−イル)酢酸、テトラゾリル酢酸
、4−ピリジルチオ酢酸若しくは2−カル?キシ−2−
(p−ヒドロキシフェニル)酢酸又はこれらのそのカル
ボキシル基における反応性誘導体などのアシル化剤を反
応させた場合に得られる基等が挙げられる。Substituted acyl groups include phenylglycine, p-hydroxyphenylglycine, cyanomethylthioacetic acid, (2-
aminothiazol-4-yl)acetic acid, tetrazolylacetic acid, 4-pyridylthioacetic acid or 2-cal? Ki-2-
Examples include groups obtained when reacting with an acylating agent such as (p-hydroxyphenyl)acetic acid or its reactive derivatives at the carboxyl group.
置換シリル基としては、トリメチルクロロシラン、トリ
エチルクロロシラン、プロピルジメチルクロロシラン、
インブチルジメチルクロロシラン、オクチルジメチルク
ロロシラン、オクタデシルメチルクロロシラン、トリプ
ロビルクロロシラン、トリブチルクロロシラン、tar
t−グチルジメチルクロロシラン、tert−ブチルジ
フェニルクロロシラン、トリフェニルクロロシラン、フ
ェニルジメチルクロロシラン、り00メチルジメチルク
ロロシラン、3−クロロプロピルジメチルクロロシラン
、1,2−ビス(ジメチルクロロシリル)エタン、1.
1,3.3−テトラメチル−1,3−ジクロロシラン、
1.3−)クロロテトライソープロピルジシロキサン、
ヘキサメチルジシラデン、1,3−ジビニル−1,1,
3,3−テトラメチルジシラデン、1,1,3.3−テ
トラメチルジシラデン、1,3−ビス(クロロメチル)
1.1,3.3−テトラメチルジシラデン、トリメチ
ルシリルジメチルアミン、トリメチルシリルジエチルア
ミン、アニリノトリメチルシラン、ビス(、ジメチルア
ミノ)ジメチルシラン、ビス(ジメチルアミン)メチル
シラン、トリメチルシリルイミダゾール、N、O−ビス
(トリメチルシリル)アセタミド、N、O−ビス(トリ
メチルシリル)トリフルオロアセタミド、N、N’−ビ
ス(トリメチルシリル)ウレア、N−トリメチルシリル
アセタミド、N−メチル−N−)ジメチルシリルアセタ
ミド、N−メチル−N−(トリメチルシリル)トリーフ
ルオロアセタミド、トリメチルシリルトリフルオロメタ
ンスルフォネート、tert−ブチルジメチルシリル−
トリフルオロメタンスルフォネート、N、0−ビス(ト
リメチルシリル)−スルフォネート、トリメチルヨード
シラン、アリールトリメチルシラン、ビニルトリメチル
シラン、エチニルトリメチルシランなとのシリル化剤を
反応させた場合に得られる基等が挙げられる。Substituted silyl groups include trimethylchlorosilane, triethylchlorosilane, propyldimethylchlorosilane,
Inbutyldimethylchlorosilane, octyldimethylchlorosilane, octadecylmethylchlorosilane, triprobylchlorosilane, tributylchlorosilane, tar
t-Gtylddimethylchlorosilane, tert-butyldiphenylchlorosilane, triphenylchlorosilane, phenyldimethylchlorosilane, RI00methyldimethylchlorosilane, 3-chloropropyldimethylchlorosilane, 1,2-bis(dimethylchlorosilyl)ethane, 1.
1,3.3-tetramethyl-1,3-dichlorosilane,
1.3-) chlorotetraisopropyldisiloxane,
Hexamethyldisiladene, 1,3-divinyl-1,1,
3,3-tetramethyldisiladene, 1,1,3.3-tetramethyldisiladene, 1,3-bis(chloromethyl)
1.1,3.3-tetramethyldisiladene, trimethylsilyldimethylamine, trimethylsilyldiethylamine, anilinotrimethylsilane, bis(,dimethylamino)dimethylsilane, bis(dimethylamine)methylsilane, trimethylsilylimidazole, N,O-bis( trimethylsilyl)acetamide, N,O-bis(trimethylsilyl)trifluoroacetamide, N,N'-bis(trimethylsilyl)urea, N-trimethylsilylacetamide, N-methyl-N-)dimethylsilylacetamide, N- Methyl-N-(trimethylsilyl)trifluoroacetamide, trimethylsilyltrifluoromethanesulfonate, tert-butyldimethylsilyl-
Examples include groups obtained when a silylating agent is reacted with trifluoromethanesulfonate, N,0-bis(trimethylsilyl)-sulfonate, trimethyliodosilane, aryltrimethylsilane, vinyltrimethylsilane, and ethynyltrimethylsilane. It will be done.
置換カルボキシル基としては、その水素原子がベンズヒ
ドリル基、ベンジル基、p−メトキシベンジル基のよう
なベンゼン核に置換基金有するか有しないフェニル置換
メチル基、tsrt−ブチル基、jert−アミル基の
ようなtert低級ア低級アルキイ基ノルオキシメチル
基、メトキシメチル基のようなアルコキシメチル基、フ
ェナシル基、p−ロムフェナシル基のようなベンゼン核
に置換基を有するか有しないフェナシル基、トリクミル
エチル基のようなポリへロrノエチル基、或いは上述し
たと同様のシリル基といった保画基で置換されたものな
どを挙げることができる。Substituted carboxyl groups include phenyl-substituted methyl groups, tsrt-butyl groups, jert-amyl groups, whose hydrogen atoms have or do not have a substituent group on the benzene nucleus, such as benzhydryl group, benzyl group, p-methoxybenzyl group. tert lower a-lower alkyl group, alkoxymethyl group such as noroxymethyl group, methoxymethyl group, phenacyl group with or without a substituent on the benzene nucleus such as p-romphenacil group, tricumylethyl group, etc. Examples include those substituted with an image-retaining group such as a polyhero-noethyl group, or a silyl group similar to the above-mentioned silyl group.
カルボキシル基の塩としては、ナトリウム、カリウム、
リチウム等のアルカリ金属塩、或いはツメチルベンノル
アミン、ノエチルベンノルアミン、ジメチルシクロヘキ
シルアミン、ソエチルシクロヘキシルアミン、ノイソプ
ロビルアミン、ノルクロヘキシルアミン、tert−ブ
チルアミン、tert−オクチルアミン、メチルビイリ
ジン、エチルピペリジン、ベンジルアミン、2−アミノ
エタノール、ジェタノールアミンなどのアミン塩といっ
た付加塩等が挙げられる。Carboxyl group salts include sodium, potassium,
Alkali metal salts such as lithium, or trimethylbenolamine, noethylbenolamine, dimethylcyclohexylamine, soethylcyclohexylamine, noisoprobylamine, norchlorhexylamine, tert-butylamine, tert-octylamine, methylbiyridine, Examples include addition salts such as amine salts of ethylpiperidine, benzylamine, 2-aminoethanol, jetanolamine, and the like.
ハロダン原子としては、CL r Br r F等を挙
げることができる。Examples of the halodane atom include CL r Br r F and the like.
低級アルキル基としては、炭素数1〜5、特に1〜3の
ものが挙げられる。Examples of the lower alkyl group include those having 1 to 5 carbon atoms, particularly 1 to 3 carbon atoms.
アシルオキシメチル基としては、カルバモイルオキシメ
チル基、アセトオキシメチル基等が挙げられる。Examples of the acyloxymethyl group include a carbamoyloxymethyl group and an acetoxymethyl group.
アリールオキシメチル基としては、ベンゾイルオキシメ
チル基等を挙げることができる。Examples of the aryloxymethyl group include a benzoyloxymethyl group.
置換基全有するか有しない複素環チオメチル基としてハ
、 2− (1,3,5−トリアゾロ)チオメチル、5
−メチル−1,3,4−チアノアゾリル−2−チオメチ
ル、(1−メチル−IH−テトラゾール−5−イル)チ
オメチル、(1,2,3−トリアゾール−5−イル)チ
オメチル、(1−(2−ツメチルアミノエチル)−1H
−テトラゾール)−5−イル)〕チオメチルなどの硫黄
又は窒素原子を含有する単環式の5又は6員環チオメチ
ル基等が挙げられる。As a heterocyclic thiomethyl group with or without all substituents, 2-(1,3,5-triazolo)thiomethyl, 5
-Methyl-1,3,4-thianoazolyl-2-thiomethyl, (1-methyl-IH-tetrazol-5-yl)thiomethyl, (1,2,3-triazol-5-yl)thiomethyl, (1-(2 -trimethylaminoethyl)-1H
-tetrazol)-5-yl)] monocyclic 5- or 6-membered thiomethyl group containing a sulfur or nitrogen atom, such as thiomethyl.
上述した(1)式で示される本発明化合物は、前記(2
) 、 (3) 、 (4)式の化合物等の種々のセフ
ァロスポリン系抗生物質を製造する際の中間体原料物質
として好適に使用される。The compound of the present invention represented by the above-mentioned formula (1) has the above-mentioned (2)
), (3), (4) It is suitably used as an intermediate raw material in the production of various cephalosporin antibiotics such as compounds of formulas.
この場合、(1)式の化合物と下記のアシル化剤等とを
反応させることなどにより、種々のセファロスポリン系
抗生物質を得ることができる。例えば、下記式(5)
で示される本発明7− (N−トリメチルシリルアミノ
)セファロスポラン酸トリメチルシリルエステルと、下
記式(6)
で示される4−ピリジルチオ酢酸又はそのカルブキシル
基における反応性誘導体とを反応させることKより、セ
ファピリンを得ることができる。In this case, various cephalosporin antibiotics can be obtained by reacting the compound of formula (1) with the following acylating agent and the like. For example, the 7-(N-trimethylsilylamino)cephalosporanic acid trimethylsilyl ester of the present invention represented by the following formula (5) is reacted with 4-pyridylthioacetic acid or its reactive derivative at the carboxylic group represented by the following formula (6). Cephapirin can be obtained by making K.
下記式(7)
%式%)
で示される本発明化合物と、下記式(8)で示されるテ
トラゾリル酢酸又はそのカルブキシル基における反応性
誘導体とを反応させることにより、セファゾリンを得る
ことができる。Cefazolin can be obtained by reacting the compound of the present invention represented by the following formula (7) with tetrazolylacetic acid or its reactive derivative in the carboxyl group represented by the following formula (8).
下記式(9)
で示される本発明化合物又は下記式αQで示される本発
明化合物と、下記式α埠で示される(2−アミノチアゾ
ール−4−イル〕酢酸又はそのカルブキシル基における
反応性誘導体とを反応させることにより、塩酸セ7オチ
アムを得ることができる。The present invention compound represented by the following formula (9) or the present invention compound represented by the following formula αQ, and (2-aminothiazol-4-yl)acetic acid represented by the following formula α or a reactive derivative thereof in the carboxyl group. By reacting, ce7othium hydrochloride can be obtained.
下記式(6)
で示される本発明化合物又は下記式(6)COOCR(
C6H5)2H
で示てれる本発明化合物と、下記式α→で示されるp−
ヒドロキシフェニルグリシン又はそのカルブキシル基に
おける反応性誘導体とを反応させることにより、セファ
トリジンを得、次いでこれを特定の条件下でプロピレン
グリコールと反応させることにより、セファトリジンプ
ロピレングリコールを得ることができる。The compound of the present invention represented by the following formula (6) or the following formula (6) COOCR (
The compound of the present invention represented by C6H5)2H and p- represented by the following formula α→
Cefatridine can be obtained by reacting with hydroxyphenylglycine or a reactive derivative thereof at the carbuxyl group, which can then be reacted with propylene glycol under certain conditions to obtain cefatridine propylene glycol.
下記式α→ coos t (CH3) 。The following formula α→ coos t (CH3).
で示される本発明化合物又は下記式αQで示される本発
明化合物と、下記式(ロ)八n2
で示されるフェニルグリシン又はそのカルブキシル基に
おける反応性誘導体とを反応させることにより、前記(
2)式のセファクロールを得ることができる。The above (
2) Cefaclor of formula can be obtained.
なお、この場合フェニルグリシンのカルブキシル基にお
ける反応性誘導体として下記(18m)〜(18X)式
に示す新規化合物等を挙げることができ、これら(18
m)〜(18K)式の新規化合物等と式(1)の本発明
化合物とを反応させることによシ、セファクロールを良
好に製造し得る。なお、下記(18m)〜(18:E)
式の化合物において、NH2基は必要に応じて適宜保護
されるものである。In this case, new compounds shown in the following formulas (18m) to (18X) can be mentioned as reactive derivatives of the carboxyl group of phenylglycine, and these (18
Cefaclor can be favorably produced by reacting the novel compounds of formulas m) to (18K) with the compound of the present invention of formula (1). In addition, the following (18m) ~ (18:E)
In the compound of the formula, the NH2 group is appropriately protected as necessary.
即ち、上記誘導体として、活性アミドとしては、H’
Co2Me
H
等の新規化合物が挙げられ、活性エステルとしては、。That is, as the above derivative, as the active amide, H'
Examples of active esters include novel compounds such as Co2Me H.
Rヨ 等の新規化合物を挙げることができる。Ryo New compounds such as
下記式α9
coos i(CHs )s
で示される本発明化合物又は下記式(7)で示される本
発明化合物と、下記式(Jl)で示されるp−ヒドロキ
シフェニルグリンン又はそのカル?キシル基における反
応性誘導体とを反応させることにより、前記(3)式の
セファドロキシルを得ることができる。The present invention compound represented by the following formula α9coos i (CHs)s or the present invention compound represented by the following formula (7), and p-hydroxyphenylgrine represented by the following formula (Jl) or its cal? By reacting the xyl group with a reactive derivative, cefadroxil of the formula (3) can be obtained.
なお、この場合p−ヒドロキシフェニルグリシンのカル
ブキシル基における反応性誘導体としては下記(22a
)〜(22K )式に示す新規化合物等を挙げることが
でき、これら(22a)〜(22X)式の新規化合物等
と式(1)の本発明化合物とを反応させることにより、
セファドロキシルを良好に製造し得る。In this case, the following (22a
) to (22K), and by reacting these novel compounds of formulas (22a) to (22X) with the compound of the present invention of formula (1),
Cefadroxil can be produced successfully.
なお、下記(22m)〜(22K)式の化合物において
、NH2基は必要に応じて適宜保護されるものである。In addition, in the compounds of the following formulas (22m) to (22K), the NH2 group is appropriately protected as necessary.
即ち、上記誘導体として、活性アミドとしては、HしL
J2M1!
H
RN H2
等の新規化合物が挙げられ、活性エステルとしては、
U 劇i2
等の新規化合物を挙げることができる。That is, as the above derivative, as the active amide, H and L
J2M1! Examples of the active ester include novel compounds such as H RN H2, and active esters include novel compounds such as U i2.
下記式り OCR。The following ceremony OCR.
・・・・・・@
で示される本発明化合物又は下記式(ハ)・・・・・・
(財)
で水堰れる本発明化合物と、下記式四
NCCH25CH2COOH・・・・・・ (ホ)で示
されるシアノメチルチオ酢酸又はそのカル?キシル基に
おける反応性誘導体とを反応させることにより、前記(
4)式のセフメタゾールを得ることができる。...The compound of the present invention represented by @ or the following formula (c)...
(Incorporated) and the compound of the present invention, which is water-weird with the following formula 4NCCH25CH2COOH... (e) Cyanomethylthioacetic acid or its carcinol? By reacting with a reactive derivative in the xyl group, the above (
4) Cefmetazole of formula can be obtained.
ここで、(1)式のシアノメチルチオ酢酸は、例えばト
シルグリコール酸とシアノメチルチオナトリウム又はシ
アノメチルチオリチウム等とを反応させることにより製
造することができる(下記反応武人参照〕。Here, the cyanomethylthioacetic acid of the formula (1) can be produced, for example, by reacting tosylglycolic acid with sodium cyanomethylthiothio, cyanomethylthiolithium, or the like (see reaction section below).
→NCCH25CH2COOH・・・・・・囚(但し、
Mは水素又はナトリウム、リチウム等のアルカリ金属を
表わす。〕
なお、この場合シアノメチルチオ酢酸のカルブキシル基
における反応性誘導体としては下記(26m)〜(26
)C)式に示す新規化合物等を挙げることができ、これ
らC26&)〜(26X)式の新規化合物等と式(1)
の本発明化合物とを反応させることにより、セフメタゾ
ールを良好に製造し得る。→NCCH25CH2COOH... Prisoner (However,
M represents hydrogen or an alkali metal such as sodium or lithium. ] In this case, the following (26m) to (26
)C) New compounds shown in formula (1) can be mentioned, and these new compounds of formula (26&) to (26X) and formula (1) can be mentioned.
By reacting with the compound of the present invention, cefmetazole can be successfully produced.
即ち、上記誘導体として、活性アミドとしては、HCo
□Me
ph ph
NCCH2SCH2CON (J
””” (lbm〕又−7
等の新規化合物が挙げられ、活性エステルとしては、
OCCH28CH2CN
0=CCH2SCH2CN
等の新規化合物を挙げることができる。That is, as the above derivative, as the active amide, HCo
□Me ph ph NCCH2SCH2CON (J
Examples of active esters include novel compounds such as """ (lbm) or -7, and active esters include novel compounds such as OCCH28CH2CN 0=CCH2SCH2CN.
下記式勾 OCR。The following formula OCR.
・・・・・・ (財)
で示される本発明化合物又は下記式弼
・・・・・・(ハ)
で示される本発明化合物と、下記式翰
で示される2−カル〆キシ−2−(p−ヒドロキシフェ
ニル〕酢酸又はそのカルブキシル基における反応性誘導
体とを反応させることにより、ラタモキセフを得ること
ができる、
更に、その他同様にして種々のセファロスポリン系抗生
物質を得ることができるものである。・・・・・・ The compound of the present invention represented by (Foundation) or the compound of the present invention represented by the following formula (c) and 2-cartoxy-2- represented by the following formula Latamoxef can be obtained by reacting it with (p-hydroxyphenyl)acetic acid or its reactive derivative in the carboxylic group, and various other cephalosporin antibiotics can also be obtained in the same manner. be.
発明の詳細
な説明したように、本発明に係る前記(1)式の新規七
ファロスポラン酸誘導体は、(2) 、 (3) s
(4)式の化合物等を製造する際の中間体として有効に
使用され、これら(2) 、 (3) ? (4)式の
化合物等を効高良く得ることができる。As described in detail of the invention, the novel hepphalosporanic acid derivative of the formula (1) according to the present invention has the following compounds: (2), (3) s
It is effectively used as an intermediate in the production of compounds of formula (4), etc., and these (2), (3)? The compound of formula (4) etc. can be obtained with high efficiency.
次に実施例を示し、本発明を更に具体的に説明する。EXAMPLES Next, the present invention will be explained in more detail with reference to Examples.
〔実施例1〕
7−アミノセファロスポラン酸2.7211を無水塩化
メチレン501dK懸濁し、ビス(トリメチルシリル)
トリフルオロアセトアミド5.148.9Y加え、室温
下30分間攪拌する。次KO’に冷却し、4−ピリジル
チオ酢酸クロライド塩酸塩2.6881を加え、同温度
にて30分間攪拌後、室温で2時間攪拌する。その後減
圧下溶媒を留去し、メタノール104と水50Mの混液
を加え、冷却攪拌下トリエチルアミンを加えてPH3,
1に調整し結析する。結晶を戸数し、アセトンで洗った
後減圧乾燥し、7−(4−ピリジルチオアセトアミド“
〕セファロスポラン酸4.OIFを得る。収率94.8
%〔実施例2〕
α−ジフェニルメトキシカルデニルーα−p−ヒドロキ
シフェニル酢W11.27.Fを無水塩化メチレン15
11Llにとかし Qoにてトリエチルアミン0.41
5dと塩化オキサリル0.2551dとを加えて15分
間攪拌する。[Example 1] 2.7211 of 7-aminocephalosporanic acid was suspended in 501 dK of anhydrous methylene chloride, and bis(trimethylsilyl)
Add 5.148.9Y of trifluoroacetamide and stir at room temperature for 30 minutes. Next, the mixture was cooled to KO', 2.6881 of 4-pyridylthioacetic acid chloride hydrochloride was added, and the mixture was stirred at the same temperature for 30 minutes and then at room temperature for 2 hours. After that, the solvent was distilled off under reduced pressure, a mixture of methanol 104 and water 50M was added, and while cooling and stirring, triethylamine was added and the pH was adjusted to 3.
Adjust to 1 and analyze. The crystals were separated, washed with acetone, and dried under reduced pressure to obtain 7-(4-pyridylthioacetamide).
] Cephalosporanic acid 4. Obtain OIF. Yield 94.8
% [Example 2] α-diphenylmethoxycardenyl-α-p-hydroxyphenyl vinegar W11.27. F is anhydrous methylene chloride 15
Dissolve in 11 Ll Triethylamine 0.41 at Qo
5d and 0.2551d of oxalyl chloride are added and stirred for 15 minutes.
7β−アミノ−7α−メトキシ−3−(1−メチルテト
ラゾール−5−イル)チオメチル−5−オキサゾチア−
3−セフェム−4−カルボン酸ベンズヒドリルエステル
0.509.Fを含む無水塩化メチレン20rILl溶
液にビス(トリメチルシリル)アセトアミド0.407
.9を加え室温下撹拌する。7β-amino-7α-methoxy-3-(1-methyltetrazol-5-yl)thiomethyl-5-oxazothia-
3-cephem-4-carboxylic acid benzhydryl ester 0.509. Bis(trimethylsilyl)acetamide 0.407 in anhydrous methylene chloride 20rILl solution containing F
.. 9 and stir at room temperature.
30分後O″として冷却しながら前記反応液を滴下し、
同温度で約30分間攪拌後室温で2時間攪拌してから反
応液を減圧下留去する。残留物に酢酸エチル40m/を
加え、炭酸す) IJウム水醇液、水、希塩酸、水およ
び飽和食塩水で順次洗い、硫酸マグネシウムで乾燥した
のち減圧濃縮する。残留物をシリカデルクロマトグラフ
で精製し、7β−(α−ノフェニルメトキシ力ルデニル
ーα−p−ヒドロキシフェニルアセトアミド)−7α−
メトキシ−3−(1−メチルテトラゾール−5−イル)
チオメチル−1−オキサゾチア−3−セフェム−4−カ
ルゲン酸ベンズヒドリルエステル0.7011を得る。After 30 minutes, the reaction solution was added dropwise while cooling to O'',
After stirring at the same temperature for about 30 minutes and then stirring at room temperature for 2 hours, the reaction solution was distilled off under reduced pressure. Add 40ml of ethyl acetate to the residue and add carbonate.) Wash sequentially with an aqueous solution of IJum, water, dilute hydrochloric acid, water and saturated brine, dry over magnesium sulfate, and concentrate under reduced pressure. The residue was purified by silica del chromatography to give 7β-(α-nophenylmethoxyrudenyl-α-p-hydroxyphenylacetamide)-7α-
Methoxy-3-(1-methyltetrazol-5-yl)
Thiomethyl-1-oxazothia-3-cephem-4-cargenic acid benzhydryl ester 0.7011 is obtained.
収率82.4チ 〔実施例3〕 下記式… OCR。Yield: 82.4 [Example 3] The formula below... OCR.
・・・・・・(イ)
で示される本発明化合物7β−アミノ−7α−メトキシ
−3−(1)I−テトラゾール−5−イル)チオメチル
−3−セフェム−4−カルピン酸ベンズヒドリルエステ
ルを無水の塩化メチレンに溶解し、これに水冷下或いは
室温了知おいてアミン及びトリメチルシリルトリフルオ
ロメタンスルホネートを加えて反応させることにより、
前記(ハ)式の本発明化合物を得る。......(a) The present compound 7β-amino-7α-methoxy-3-(1)I-tetrazol-5-yl)thiomethyl-3-cephem-4-carpinic acid benzhydryl ester is By dissolving it in anhydrous methylene chloride and reacting it with amine and trimethylsilyltrifluoromethanesulfonate under water cooling or at room temperature,
The compound of the present invention of formula (c) is obtained.
次に、上記反応により生成する(ハ)式の化合物をNM
Rにより確認した。即ち、上記■式の化合物を塩化メチ
レイに溶解し、これに水冷下においてジイソプロビルエ
チルアミン及びトリメチルシリルトリフルオロメタンス
ルホネートを加えて攪拌した後、反応液をNMRにより
測定した結果、及び7−アミノ基がトリメチルシリル化
されたピークが0.196 ppmに確認された。Next, the compound of formula (c) produced by the above reaction is NM
Confirmed by R. That is, the compound of the above formula (1) was dissolved in methylene chloride, diisopropylethylamine and trimethylsilyltrifluoromethanesulfonate were added thereto under water cooling, and after stirring, the reaction solution was measured by NMR, and the 7-amino group was A trimethylsilylation peak was observed at 0.196 ppm.
〔実施例4〕
7β−アミノ−7α−メトキシ−3−(IH−テトラゾ
ール−5−イル)チオメチル−3−セフェム−4−カル
ゲン酸ベンズヒドリルエステル0.81’を塩化メチレ
ン3211L/に尋解し、氷冷攪拌下、エチル・ジイソ
プロピルアミ70.251及びトリメチルシリルトリフ
ルオロメタンスルホ+−)0.361を加え、室温で1
時間攪拌するうこの溶液を再び氷冷し、トリエチルアミ
ン0.22ゴを加え、次にシアンメチルチオアセチルN
、N −ビス〔2−オキソ−3−オキサゾリジニリルホ
スホロジアミデイ)0.69811を加える。室温で攪
拌すると反応が終了する。[Example 4] 0.81' of 7β-amino-7α-methoxy-3-(IH-tetrazol-5-yl)thiomethyl-3-cephem-4-cargenic acid benzhydryl ester was dissolved in 3211 L of methylene chloride. , 70.251 of ethyl diisopropylamide and 0.361 of trimethylsilyltrifluoromethanesulfo+-) were added under ice-cooling and stirring, and 1 was added at room temperature.
The solution was stirred for an hour, cooled again on ice, 0.22 g of triethylamine was added, and then cyanmethylthioacetyl N
, N-bis[2-oxo-3-oxazolidinylphosphorodiamidi) 0.69811 is added. Stirring at room temperature completes the reaction.
反応液を水で1回、硫酸水素カリウム水溶液で2回、再
び水で1回洗浄後、無水硫酸マグネシウムで乾燥し、次
いで溶媒を留去すると7β−シアンメチルチオアセトア
ミド−7α−メトキシ−3−(1−メチル−IH−テト
ラゾール−5−イルコチオメチル−3−セフェム−4−
カルゲン酸ペンズキドリルエステルが得うレル。The reaction solution was washed once with water, twice with an aqueous potassium hydrogen sulfate solution, and once again with water, dried over anhydrous magnesium sulfate, and then the solvent was distilled off to give 7β-cyanmethylthioacetamide-7α-methoxy-3-( 1-Methyl-IH-tetrazol-5-ylcothiomethyl-3-cephem-4-
Calgenic acid pendzquidryl ester is obtained.
この7β−シアノメチルチオアセトアミド−7α−メト
キシ−3−(1−メチル−IH−テトラソール−5−イ
ル)チオメチル−3−セフェム−4−カルゲン酸ベンズ
ヒドリルエステルのエステル基をトリフルオロ酢酸−ア
ニソールで脱離させ、7β−シアンメチルチオアセトア
ミド−7α−メトキシー3−(1−メチル−IH−テト
ラゾール−5−イル)チオメチル−3−セフェム−4−
カルゼン酸(セフメタゾール)を得る。The ester group of this 7β-cyanomethylthioacetamide-7α-methoxy-3-(1-methyl-IH-tetrasol-5-yl)thiomethyl-3-cephem-4-cargenic acid benzhydryl ester was added with trifluoroacetic acid-anisole. 7β-cyanmethylthioacetamide-7α-methoxy-3-(1-methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4-
Calzenic acid (cefmetazole) is obtained.
〔実施例5〕
7β−アミノ−7α−メトキシ−3−(1−メチル−I
H−テトラゾール−5−イル)チオメチル−3−セフェ
ム−4−カルゲン醪ベンズヒドリルエステル2.1gを
塩化メチレン80dに溶解し、水冷攪拌下、エチルジイ
ソプロビルアミン0.62y + ) ’Jメメチシリ
ルトリフルオロメタンスルホネー)0.89gを加え、
室温で1時間攪拌する。[Example 5] 7β-amino-7α-methoxy-3-(1-methyl-I
H-tetrazol-5-yl) thiomethyl-3-cephem-4-calgen benzhydryl ester (2.1 g) was dissolved in 80 d of methylene chloride, and under stirring under water cooling, 0.62 y of ethyldiisopropylamine + ) 'J memethi Add 0.89 g of silyl trifluoromethanesulfone,
Stir for 1 hour at room temperature.
次に冷却し、N、N−ダメチルアニリン2.42.9を
加え、続いてシアンメチルチオアセチルクロライド0.
72.9を加える。Then cool and add 2.42.9 of N,N-damethylaniline, followed by 0.42.9 of N,N-damethylaniline, followed by 0.95% of cyanmethylthioacetyl chloride.
Add 72.9.
同温度で1時間攪拌後、反応液をIN塩酸で2回、水で
1回、5チ炭酸水素す) IJウム水溶液で1回洗浄す
る。次いで、無水硫酸マグネシウムで乾燥した後、溶媒
を留去すると7β−シアノメチルチオアセトアミド−7
α−メトキシ−3−(1−メチル−IH−テトラゾール
−5−イルコチオメチル−3−セフェム−4−カルゲン
酸ベンズヒドリルエステルが得られる。この化合物のN
MHによる分析結果を下記に示す。After stirring at the same temperature for 1 hour, the reaction solution was washed twice with IN hydrochloric acid, once with water, and once with an aqueous solution of 5% hydrogen carbonate. Next, after drying over anhydrous magnesium sulfate, the solvent was distilled off to give 7β-cyanomethylthioacetamide-7.
α-methoxy-3-(1-methyl-IH-tetrazol-5-ylcothiomethyl-3-cephem-4-cargenic acid benzhydryl ester is obtained.
The analysis results by MH are shown below.
・核磁気共鳴ヌにクトル δppm (CDCl2)3
.40(4H,−重線、NCCH25CH2CO−)3
.45(3I(、−重線、−QC)I3)3.75(2
H,四重線、2位CH,)3.82(3)I、−重線、
テトラゾールN−OH,)4.30(2H,四重線、3
位CH25−)4.98(IH,−重線、6位H)
6.95(IH,−重線、 C00CHPh2)7.3
5(LH,−重線、 coocH(c6隻5〕2〕この
7β−シアノメチルチオアセトアミド−7α−メトキシ
−3−(1−メチル−IH−テトラソール−b−イル)
チオメチル−3−セフェム−4−カルゲン酸ジフェニル
メチルエステルのエステル基をトリフルオロ酢酸−アニ
ソールで脱離させ、7β−シアノメチルチオアセトアミ
ド−7α−メトキシ−3−(1−メチル−IH−テトラ
ゾール−5−イル)チオメチル−3−セフェム−4−カ
ルデン酸(セフメタゾール)を得る。この化合物の薦に
よる分析結果を下記に示す。・Nuclear magnetic resonance frequency δppm (CDCl2)3
.. 40(4H, - double line, NCCH25CH2CO-)3
.. 45(3I(,-double line,-QC)I3)3.75(2
H, quartet, 2nd position CH,) 3.82 (3) I, - doublet,
Tetrazole N-OH,) 4.30 (2H, quartet, 3
position CH25-) 4.98 (IH, - double line, 6th position H) 6.95 (IH, - double line, C00CHPh2) 7.3
5 (LH, - heavy line, coocH (c6 ships 5] 2) this 7β-cyanomethylthioacetamide-7α-methoxy-3-(1-methyl-IH-tetrasol-b-yl)
The ester group of thiomethyl-3-cephem-4-cargenic acid diphenylmethyl ester was removed with trifluoroacetic acid-anisole to give 7β-cyanomethylthioacetamide-7α-methoxy-3-(1-methyl-IH-tetrazole-5- yl)thiomethyl-3-cephem-4-caldenic acid (cefmetazole) is obtained. The analysis results for this compound are shown below.
・核磁気共鳴スにクトル δppm (重アセトン)3
.50(3H,−重線、7位OCR,)3.60(2H
,−重線、 NCCH25または一5cu2co )3
.5〜3.7C2H,四重線、2位I(2)3.70(
2H,−重線、 NCCH25または−5CI(2Co
)3.98(3H,−重線、 N−CH,)4.3〜
4.6(2H,四重線、3位 −CH2S−)5.10
(LH,−重線、6位H)
〔実施例6〕
7β−アミノ−7α−メトキシ−3−(1−メチル−I
H−テトラゾール−5−イルコチオメチル−3−セフェ
ム−4−カルデン酸Rンズヒドリルエステル0.84.
9を乾燥DMF 20 mに溶解し、水冷攪拌下、エチ
ルジインプロビルアミン0.25I、トリメチルシリル
トリプルオロメタンスルホネー)0.31を加え、室温
で1時間攪拌する。・Nuclear magnetic resonance spectrum δppm (heavy acetone) 3
.. 50 (3H, - double line, 7th position OCR,) 3.60 (2H
,-double line, NCCH25 or -5cu2co)3
.. 5-3.7C2H, quartet, 2nd position I (2) 3.70 (
2H, - heavy line, NCCH25 or -5CI (2Co
) 3.98 (3H, - double line, N-CH,) 4.3~
4.6 (2H, quartet, 3rd position -CH2S-)5.10
(LH, - double line, H at position 6) [Example 6] 7β-amino-7α-methoxy-3-(1-methyl-I
H-tetrazol-5-ylcothiomethyl-3-cephem-4-caldenic acid R-hydryl ester 0.84.
9 was dissolved in 20 m of dry DMF, and 0.25 I of ethyldiimprobylamine and 0.31 l of trimethylsilyl triple olomethane sulfone were added thereto under stirring while cooling with water, and the mixture was stirred at room temperature for 1 hour.
この溶液を再び氷冷し、3−(シアノメチルチオアセチ
ル) −1,3−チアゾリジン−2−チオ70.45N
を加え、1時間攪拌する。This solution was cooled on ice again, and 3-(cyanomethylthioacetyl)-1,3-thiazolidine-2-thio 70.45N
Add and stir for 1 hour.
反応液を水に加え、析出物をF取、乾燥すると7β−7
7ノメチルチオアセトアミドー7α−メトキシ−3−(
1−メチル−IH−テトラゾール−5−イル)チオメチ
ル−3−セフェム−4−カルゲン酸ベンズヒドリルエス
テルが得うレル。Add the reaction solution to water, collect the precipitate with F, and dry it to obtain 7β-7.
7-methylthioacetamide 7α-methoxy-3-(
1-Methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4-cargenic acid benzhydryl ester is obtained.
この7β−シアノメチルチオアセトアミド−7α−メト
キシ−3−(1−メチル−IH−テトラゾール−5−イ
ルコチオメチル−3−セフェム−4−カルボン酸ジフェ
ニルメチルエステルのエステル基をトリフルオロ酢酸−
アニソールで脱離させ、7β−シアノメチルチオアセト
アミド−7α−メトキシ−3−(1−メチル−IH−テ
トラゾール−5−イル)チオメチル−3−セフェム−4
−カルビン酸(セフメタゾール〕を得る。The ester group of this 7β-cyanomethylthioacetamide-7α-methoxy-3-(1-methyl-IH-tetrazol-5-ylcothiomethyl-3-cephem-4-carboxylic acid diphenylmethyl ester) was
Elimination with anisole gave 7β-cyanomethylthioacetamide-7α-methoxy-3-(1-methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4.
- Obtain carbic acid (cefmetazole).
〔実施例7〕
7−アミノ−3−クロロ−3−セフェム−4−カルゲン
酸ベンズヒドリルエステル0.4Iの乾燥アセトニトリ
ル15a/の懸濁液を室温で攪拌しながらビス(トリメ
チルシリル)アセトアミド0、407.9を加え、同温
度で30分間攪拌する。[Example 7] A suspension of 7-amino-3-chloro-3-cephem-4-cargenic acid benzhydryl ester 0.4I in dry acetonitrile 15a/1 was stirred at room temperature while bis(trimethylsilyl)acetamide 0.407 Add .9 and stir at the same temperature for 30 minutes.
この溶液にN−(フェニルグリシルアミドラ−イミダゾ
ール0.248.9を加え、室温で2時間攪拌する。反
応液を減圧下留去し、残留物に酢酸エチル301111
を加え、不溶物を戸去する。涙液を炭酸水素す) IJ
ウム水溶液、水、希塩酸、水、飽和食塩水で順次洗い、
硫酸マグネシウムで乾燥し念後、減圧下濃縮する。残留
物をシリカデルカラムクロマトグラフで精製し%7−〔
D−α−フェニルグリシルアミド〕−3−クロロ−3−
セフェム−4−カルゲン酸ペンズヒドリルエステルヲ高
収率で得る。Add 0.248.9 of N-(phenylglycylamido-imidazole) to this solution and stir at room temperature for 2 hours.The reaction solution was distilled off under reduced pressure, and the residue was 301111 ethyl acetate.
Add and remove insoluble matter. IJ
Wash sequentially with umum aqueous solution, water, dilute hydrochloric acid, water, and saturated saline,
After drying with magnesium sulfate, concentrate under reduced pressure. The residue was purified by silica del column chromatography to %7-[
D-α-phenylglycylamide]-3-chloro-3-
Cephem-4-cargenic acid penzhydryl ester is obtained in high yield.
次いで、この7−(D−α−フェニルグリシルアミド)
−3−クロロ−3−セフェム−4−カルメン酸ジフェニ
ルメチルエステルのエステル基ヲトリフルオロ酢酸−ア
二ソールで脱離させ7−(D−α−7エニルグリシルア
ミド)−3−クロロ−3−セフェム−4−カルビン酸(
セフ了クロール)を得る。Then, this 7-(D-α-phenylglycylamide)
The ester group of -3-chloro-3-cephem-4-carmenic acid diphenylmethyl ester was removed with trifluoroacetic acid-anisole and 7-(D-α-7enylglycylamide)-3-chloro-3- Cephem-4-carbic acid (
Obtain (Self End Crawl).
Claims (1)
R_4は水素又は低級アルコキシ基を表わし、R_2は
水素、アシル基、置換アシル基、シリル基又は置換シリ
ル基を表わし、R_3はカルボキシル基置換カルボキシ
ル基又はカルボキシル基の塩を表わし、R_4は水素、
ハロゲン原子、ヒドロキシメチル基、低級アルキル基、
低級アルコキシ基、ピリジルオキシメチル基、アシルオ
キシメチル基、アリルオキシメチル基、アリールオキシ
メチル基又は置換基を有するか或いは有しない複素環チ
オメチル基を表わす。) で示されるセファロスポラン酸誘導体。[Claims] 1. The following formula (1) ▲There are mathematical formulas, chemical formulas, tables, etc.▼...(1) (However, X represents sulfur, oxygen, SO or SO_2,
R_4 represents hydrogen or a lower alkoxy group, R_2 represents hydrogen, an acyl group, a substituted acyl group, a silyl group, or a substituted silyl group, R_3 represents a carboxyl group substituted with a carboxyl group or a salt of a carboxyl group, R_4 represents hydrogen,
halogen atom, hydroxymethyl group, lower alkyl group,
It represents a lower alkoxy group, a pyridyloxymethyl group, an acyloxymethyl group, an allyloxymethyl group, an aryloxymethyl group, or a heterocyclic thiomethyl group with or without a substituent. ) Cephalosporanic acid derivatives.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60-48134 | 1985-03-13 | ||
JP4813485 | 1985-03-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62277390A true JPS62277390A (en) | 1987-12-02 |
JPH0692416B2 JPH0692416B2 (en) | 1994-11-16 |
Family
ID=12794861
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61006806A Expired - Lifetime JPH0692416B2 (en) | 1985-03-13 | 1986-01-16 | Cefalosporanic acid derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0692416B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002510694A (en) * | 1998-04-02 | 2002-04-09 | バイオケミ・ゲゼルシヤフト・エム・ベー・ハー | Purification method of cephalosporin derivative |
CN102627660A (en) * | 2012-03-22 | 2012-08-08 | 刘全胜 | Cefmetazole aseptic powder and its preparation method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59152389A (en) * | 1983-02-16 | 1984-08-31 | Otsuka Chem Co Ltd | Preparation of sulfenimine derivative |
-
1986
- 1986-01-16 JP JP61006806A patent/JPH0692416B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59152389A (en) * | 1983-02-16 | 1984-08-31 | Otsuka Chem Co Ltd | Preparation of sulfenimine derivative |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002510694A (en) * | 1998-04-02 | 2002-04-09 | バイオケミ・ゲゼルシヤフト・エム・ベー・ハー | Purification method of cephalosporin derivative |
CN102627660A (en) * | 2012-03-22 | 2012-08-08 | 刘全胜 | Cefmetazole aseptic powder and its preparation method |
Also Published As
Publication number | Publication date |
---|---|
JPH0692416B2 (en) | 1994-11-16 |
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