JPS6227371B2 - - Google Patents
Info
- Publication number
- JPS6227371B2 JPS6227371B2 JP56094238A JP9423881A JPS6227371B2 JP S6227371 B2 JPS6227371 B2 JP S6227371B2 JP 56094238 A JP56094238 A JP 56094238A JP 9423881 A JP9423881 A JP 9423881A JP S6227371 B2 JPS6227371 B2 JP S6227371B2
- Authority
- JP
- Japan
- Prior art keywords
- reflecting mirror
- light source
- reflector
- illuminated
- tubular light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 24
- 230000003287 optical effect Effects 0.000 claims description 22
- 238000005286 illumination Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 description 8
- 230000007423 decrease Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 108091008695 photoreceptors Proteins 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/54—Lamp housings; Illuminating means
- G03B27/542—Lamp housings; Illuminating means for copying cameras, reflex exposure lighting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Description
【発明の詳細な説明】
本発明は、スリツト露光式複写機において、原
稿の厚さに関係なく被照明部を効率良く照明する
スリツト露光用照明装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a slit exposure illumination device for efficiently illuminating an illuminated area regardless of the thickness of a document in a slit exposure copying machine.
スリツト露光方式複写機では、投影光学系が、
原稿面（以下ステージガラスと呼ぶ）上の被照明
部に置かれた原稿に対して垂直下方向に配置され
る構成となつている。そのため、被照明部に対す
る照明は一般に、被照明部の斜め下方向から行な
う必要がある。一般にスリツト露光式複写機の照
明光学系は、第１図に示すように、照明装置が管
状光源５、上部反射鏡６ａ、下部反射鏡６ｂおよ
び補助反射鏡７から構成され、ステージガラス１
上の原稿を照明し、ステージガラス１上の原稿は
投影レンズ２によりスリツト９を通して感光体３
上に投影される。このうち照明装置ではまず、ス
テージガラス１上でスリツト９に対応した被照明
部４から投影レンズ２に至る光路の片側に配置し
た管状光源５から出た光のうち、ステージガラス
１側の上部反射鏡６ａで反射した光は投影レンズ
２による光路をはさんで前記上部反射鏡６ａと反
対側に位置して対向する補助反射鏡７で反射し被
照明部４を照明する。一方、管状光源５よりステ
ージガラス１の反対側に位置する下部反射鏡６ｂ
からの反射光により被照明部４を直接に照明す
る。これら２つの方法により、左右斜下から被照
射部４を照射する方法が多いられている。第２図
は第１図に示すスリツト露光用照明装置によるス
テージガラス１面上の被照明部４の照度分布を示
したものである。ここで、曲線A1は、上部反射
鏡６ａによる照度分布であり、照度値のピークが
光路中心８上にあり、光路中心８からずれるに従
つて照度値は急激に低下する。また、曲線B1
は、下部反射鏡６ｂによる照度分布であり曲線
A1と同様に照度値のピークが光路中心８上にあ
り、光路中心からずれるに従つて照度値は急激に
低下する。曲線C1は、上部反射鏡６ａおよび下
部反射鏡６ｂを合成した照度分布を示したもので
あり、照度値のピークが光路中心８上にあり、光
路中心８と被照明部４端部との照度比が大きくな
る。そのため、管状光源５の発光部（フイラメン
ト）のわずかな位置ずれに対しても、被照明部４
内での照度分布は大きく変化し、スリツト９によ
る露光量の調整がしにくいという欠点をもつてい
た。 In a slit exposure type copier, the projection optical system is
It is arranged vertically downward with respect to the document placed on the illuminated portion on the document surface (hereinafter referred to as stage glass). Therefore, it is generally necessary to illuminate the illuminated part from diagonally below the illuminated part. Generally, in the illumination optical system of a slit exposure type copying machine, as shown in FIG.
The original on the stage glass 1 is illuminated, and the original on the stage glass 1 is passed through the slit 9 by the projection lens 2 and onto the photoreceptor 3.
projected on top. Among these, in the illumination device, first of all, among the light emitted from the tubular light source 5 disposed on one side of the optical path from the illuminated part 4 corresponding to the slit 9 to the projection lens 2 on the stage glass 1, the upper part of the light on the stage glass 1 side is reflected. The light reflected by the mirror 6a is reflected by an auxiliary reflecting mirror 7 located on the opposite side of the upper reflecting mirror 6a across the optical path of the projection lens 2, and illuminates the illuminated portion 4. On the other hand, a lower reflector 6b located on the opposite side of the stage glass 1 from the tubular light source 5
The illuminated portion 4 is directly illuminated by the reflected light from the light. Among these two methods, there are many methods in which the irradiated area 4 is irradiated from the left and right obliquely downward directions. FIG. 2 shows the illuminance distribution of the illuminated area 4 on the stage glass 1 surface by the illumination device for slit exposure shown in FIG. Here, the curve A1 is the illuminance distribution due to the upper reflecting mirror 6a, the peak of the illuminance value is on the optical path center 8, and the illuminance value decreases rapidly as it deviates from the optical path center 8. Also, curve B 1
is the illuminance distribution due to the lower reflector 6b and is a curve
Similar to A 1 , the peak of the illuminance value is on the optical path center 8, and the illuminance value rapidly decreases as it deviates from the optical path center. The curve C1 shows the illuminance distribution obtained by combining the upper reflecting mirror 6a and the lower reflecting mirror 6b, and the peak of the illuminance value is on the optical path center 8, and the peak of the illuminance value is on the optical path center 8 and the end of the illuminated part 4. The illuminance ratio increases. Therefore, even if the light emitting part (filament) of the tubular light source 5 shifts slightly, the illuminated part 4
The illuminance distribution within the lens varies greatly, and it is difficult to adjust the exposure amount using the slit 9.
これを改善する方法として、従来２つの方法が
考えられた。第１の方法は、第１図の補助反射鏡
７の取付角度を変えて、上部反射鏡６ａと下部反
射鏡６ｂそれぞれによる照度分布のピークを合致
しないようにするか、上部反射鏡６ａ、下部反射
鏡６ｂの焦点を固定のまま反射鏡の曲率を小さく
することによつて広い照度分布を持たせ、照度分
布の傾きをゆるやかにする方法である。この場合
は、被照明部４の外へもれる光が多くなり、照明
効率が低下する。第２の方法として、管状光源５
のバルブに拡散処理を施し、等価的に発光面を大
きくするか、あるいは、反射鏡に拡散性をもたせ
て照度分布を広げる方法がある。この場合も前記
と同じく被照明部４への照明効率が低下する。 Conventionally, two methods have been considered to improve this problem. The first method is to change the mounting angle of the auxiliary reflector 7 shown in FIG. This method provides a wide illuminance distribution by reducing the curvature of the reflecting mirror 6b while keeping its focal point fixed, and the slope of the illuminance distribution is made gentler. In this case, more light leaks out of the illuminated section 4, and illumination efficiency decreases. As a second method, the tubular light source 5
There are two methods: applying diffusion treatment to the bulb to equivalently enlarge the light-emitting surface, or giving the reflecting mirror diffusive properties to widen the illuminance distribution. In this case as well, the efficiency of illuminating the illuminated portion 4 decreases as described above.
また、厚物の原稿に対して照明する場合を考え
ると、原稿の厚さ分（約５mm）ステージガラス１
上方において上部反射鏡６ａ、下部反射鏡６ｂに
よる照度分布のピークが、それぞれ光路中心８か
ら別々に離れる方向へ移動するため、被照明部４
の外へもれる光がさらに多くなり、被照明部４へ
の照明効率が著しく低下する。そのため、厚物の
原稿の端部（ステージガラス１面の上方約５mm）
における光量が不足し、厚物原稿の原稿端付近が
黒く複写される欠点があつた。 In addition, when considering the case of illuminating a thick document, the stage glass 1 should be placed for the thickness of the document (approximately 5 mm).
In the upper part, the peaks of the illuminance distribution due to the upper reflector 6a and the lower reflector 6b move separately away from the optical path center 8, so that the illuminated part 4
Further, more light leaks out to the outside, and the efficiency of illuminating the illuminated area 4 is significantly reduced. Therefore, the edge of a thick document (approximately 5 mm above the stage glass surface)
There was a drawback that the amount of light was insufficient and the edges of thick originals were printed black.
この発明は上記の欠点を改善し、原稿の厚さに
かかわらず被照明部を効率良く照明し、露光量調
整スリツトによる露光量の調整がしやすいスリツ
ト露光用照明装置を提供することにある。 SUMMARY OF THE INVENTION An object of the present invention is to improve the above-mentioned drawbacks, and to provide an illumination device for slit exposure that efficiently illuminates the area to be illuminated regardless of the thickness of the document and allows easy adjustment of the exposure amount using an exposure adjustment slit.
第３図は、本発明の照明装置の構成の一例を示
したものであり、管状光源５、管状光源を一部包
囲した柱状主反射鏡１１、平板状補助反射鏡１２
で構成する。さらに柱状主反射鏡１１は、上部反
射鏡１１ａと下部反射鏡１１ｂとこれらを接続す
る背部反射鏡１１ｃから構成する。柱状主反射鏡
１１のステージガラス１側部分１１ａの形状は、
管状光源５の軸中心F1を焦点とし、上部反射鏡
１１ａからステージガラス１上の被照明部４に至
る途中に焦点F2を持つ楕円柱の一部である。第
３図では、上部反射鏡１１ａと補助反射鏡１２の
中間にF2があるが、F2は補助反射鏡１２と、被
照明部分４の中間にあつても同じである。 FIG. 3 shows an example of the configuration of the lighting device of the present invention, which includes a tubular light source 5, a columnar main reflecting mirror 11 that partially surrounds the tubular light source, and a flat auxiliary reflecting mirror 12.
Consists of. Further, the columnar main reflecting mirror 11 includes an upper reflecting mirror 11a, a lower reflecting mirror 11b, and a back reflecting mirror 11c connecting these. The shape of the stage glass 1 side portion 11a of the columnar main reflecting mirror 11 is as follows:
It is a part of an elliptical cylinder whose focal point is the axial center F 1 of the tubular light source 5 and which has a focal point F 2 on the way from the upper reflecting mirror 11a to the illuminated area 4 on the stage glass 1. In FIG. 3, F2 is located between the upper reflecting mirror 11a and the auxiliary reflecting mirror 12, but F2 is the same even if it is located between the auxiliary reflecting mirror 12 and the illuminated portion 4.
このようにすると、第３図に示すように上部反
射鏡１１ａのうち、最も管状光源５と距離の近い
部分で反射される光線１３は、光路中心８よりも
補助反射鏡１２側の被照明部４に到達する。一方
柱状主反射鏡１１のうち、管状光源５に対しステ
ージガラス１と反対側の反射鏡１１ｂの形状を、
光源の軸中心F1を焦点とする放物線柱反射鏡と
する。このようにすると、第３図に示すように下
部反射鏡１１ｂのうち、管状光源５に距離が最も
近い部分で反射される光線１４は、光路中心８よ
りも光源側の被照明部４に到達する。 In this way, as shown in FIG. 3, the light rays 13 reflected at the part of the upper reflector 11a that is closest to the tubular light source 5 are directed to the illuminated area closer to the auxiliary reflector 12 than the optical path center 8. Reach 4. On the other hand, among the columnar main reflecting mirrors 11, the shape of the reflecting mirror 11b on the side opposite to the stage glass 1 with respect to the tubular light source 5 is as follows.
Let it be a parabolic column reflector whose focal point is the axial center F 1 of the light source. In this way, as shown in FIG. 3, the light ray 14 reflected at the part of the lower reflecting mirror 11b that is closest to the tubular light source 5 reaches the illuminated part 4 on the light source side with respect to the optical path center 8. do.
また、補助反射鏡１２は平板状反射鏡であり、
上部反射鏡１１ａからの光線を被照明部４へ光束
分布を変えずに反射するものであり、背部反射鏡
１１ｃは上部反射鏡１１ａと下部反射鏡１１ｂと
を接続するものである。 Further, the auxiliary reflecting mirror 12 is a flat reflecting mirror,
The light beam from the upper reflecting mirror 11a is reflected to the illuminated part 4 without changing the luminous flux distribution, and the back reflecting mirror 11c connects the upper reflecting mirror 11a and the lower reflecting mirror 11b.
第４図は第３図に示すスリツト露光用照明装置
によるステージガラス１面上での管状光源５に対
し直角方向（第３図で示すａの矢印方向）の照度
分布である。曲線A2は、上部反射鏡１１ａによ
る照度分布であり、曲線B2は、下部反射鏡１１
ｂによる照度分布、曲線C2は両者の合成照度分
布である。 FIG. 4 shows the illuminance distribution in the direction perpendicular to the tubular light source 5 (in the direction of the arrow a in FIG. 3) on the surface of the stage glass by the illumination device for slit exposure shown in FIG. Curve A 2 is the illuminance distribution due to the upper reflector 11a, and curve B 2 is the illuminance distribution due to the lower reflector 11a.
The illuminance distribution according to b, and the curve C 2 are the combined illuminance distribution of both.
一般に光源より発散する光束は、距離の２乗に
比例して広がり、その光束が２次曲線柱反射鏡で
反射された場合、反射鏡の断面方向には、その２
次曲線の性質にそつて光束が変化し、反射鏡の軸
方向には、反射される前の状態を維持する性質が
ある。すなわち、上部反射鏡１１ａの場合、管状
光源５の軸中心F1から出た光は、上部反射鏡１
１ａに達するまで、距離の２乗に比例して発散
し、反射後は断面方向には、楕円焦点に向つて収
束し、軸方向には反射前と同様に発散する。その
結果、上部反射鏡１１ａによる照度は、管状光源
５の軸中心F1と上部反射鏡１１ａまでの距離
と、上部反射鏡１１ａから被照明部４面上までの
距離で決まるが、上部反射鏡１１ａから被照明部
４面上までの距離は、各光路の距離とも大きな差
はなく、また、この部分では、距離の１乗程度に
比例して照度が低下するので、結局ステージガラ
ス１面上の照度は主に、管状光源５の軸中心F1
から、上部反射鏡１１ａまでの距離で決まること
になる。すなわち、この距離が短いほど、ステー
ジガラス１面上での照度が高くなる。そのため、
上部反射鏡１１ａによる照度分布は、管状光源５
と上部反射鏡１１ａとの距離が最も短い光線によ
り最大値を生じ、第４図の曲線A2のようにな
る。実際には管状光源５が完全な線光源でないた
め、少し広がつた分布となる。また、下部反射鏡
１１ｂによる照度分布も同様にして、光路中心８
より光源側に最大照度を持つ第４図の曲線B2の
ようになる。第４図の曲線C2は、曲線A2とB2の
合成照度分布である。 In general, the light beam that diverges from a light source spreads in proportion to the square of the distance, and when that light beam is reflected by a quadratic curved column reflector, its 2
The light flux changes according to the properties of the following curve, and the axial direction of the reflecting mirror has the property of maintaining the state before being reflected. That is, in the case of the upper reflecting mirror 11a, the light emitted from the axial center F1 of the tubular light source 5 is reflected by the upper reflecting mirror 1.
Until it reaches 1a, it diverges in proportion to the square of the distance, and after reflection it converges toward the elliptical focal point in the cross-sectional direction, and diverges in the axial direction as before reflection. As a result, the illumination intensity by the upper reflector 11a is determined by the distance between the axial center F1 of the tubular light source 5 and the upper reflector 11a, and the distance from the upper reflector 11a to the 4th surface of the illuminated part. The distance from 11a to the 4th surface of the illuminated part is not significantly different from the distance of each optical path, and the illuminance in this part decreases in proportion to the first power of the distance. The illumination intensity is mainly at the axial center F 1 of the tubular light source 5
It is determined by the distance from to the upper reflecting mirror 11a. That is, the shorter this distance is, the higher the illuminance on one surface of the stage glass becomes. Therefore,
The illuminance distribution by the upper reflecting mirror 11a is the same as that of the tubular light source 5.
The maximum value is produced by the ray having the shortest distance between the ray and the upper reflecting mirror 11a, as shown by curve A 2 in FIG. Actually, since the tubular light source 5 is not a perfect linear light source, the distribution is slightly spread out. Similarly, the illuminance distribution by the lower reflector 11b is
The curve becomes like curve B2 in Fig. 4, which has the maximum illuminance closer to the light source side. Curve C 2 in FIG. 4 is a composite illuminance distribution of curves A 2 and B 2 .
このように、光源の位置および上部反射鏡１１
ａおよび下部反射鏡１１ｂの２次曲線形状を選択
すれば、被照明部４内において効率良く、平坦な
照度分布を実現することができる。さらに、上部
反射鏡１１ａおよび下部反射鏡１１ｂの各々によ
る被照明部４内における照射光量の比率を等しく
できる。 In this way, the position of the light source and the upper reflector 11
By selecting the quadratic curve shape of a and the lower reflecting mirror 11b, it is possible to efficiently realize a flat illuminance distribution within the illuminated portion 4. Furthermore, the ratio of the amount of light irradiated within the illuminated portion 4 by each of the upper reflecting mirror 11a and the lower reflecting mirror 11b can be made equal.
以上のようにして得られた照度分布C2は、被
照明部４内においてほぼ均一であるため、露光量
調整スリツト９に対して照度分布がずれても、被
照明部４の方が一般に大きいので、感光ドラム３
に対する露光量の変化は小さくなる。また、露光
量調整スリツト９により、露光量調整する場合、
露光量が線形に変化するため調整しやすくなる。 The illuminance distribution C 2 obtained as above is almost uniform within the illuminated area 4, so even if the illuminance distribution deviates from the exposure adjustment slit 9, the illuminance distribution C 2 is generally larger in the illuminated area 4. Therefore, photosensitive drum 3
The change in exposure amount will be small. In addition, when adjusting the exposure amount using the exposure amount adjustment slit 9,
The exposure amount changes linearly, making it easier to adjust.
第５図は第３図に示す照明装置におけるステー
ジガラス１面上方約５mm（厚物原稿の厚さに相当
する部分で第３図においてｂで示す位置）におけ
る照度分布である。第５図の曲線A2′は、上部反
射鏡１１ａによる照度分布であり、補助反射鏡１
２側から照射されるため、ステージガラス１面上
の照度分布第４図の曲線A2よりも全体的に光源
側にずれる。しかし、ステージガラス１面上での
照度値のピークは補助反射鏡１２側にあるため、
照射光の大部分は被照明部４を照明することがで
きる。また、第５図の曲線B2′は、下部反射鏡１
１ｂの反射光による照度分布であり、ステージガ
ラス１面上の照度分布に比べ、補助反射鏡１２側
にずれる。しかし、ステージガラス１面上での照
度値のピークが光源側に設定しているため、上部
反射鏡１１ａの場合と同様に照射光の大部分は、
被照明部４を照明することができ、照度のピーク
値が被照明部４の中心に近づく。また、これら上
部反射鏡１１ａおよび下部反射鏡１１ｂにより、
被照明部４の左右より等しい光量で効率良く照明
することができ、厚物の原稿を複写する場合、そ
の原稿の端部および側部が、被照明部４内を通過
するとき必ず左右照明光のどちらかによつてより
効率良く照明されることになる。 FIG. 5 shows the illuminance distribution at about 5 mm above the surface of the stage glass (corresponding to the thickness of a thick document, the position indicated by b in FIG. 3) in the illumination device shown in FIG. The curve A 2 ′ in FIG. 5 is the illuminance distribution due to the upper reflector 11a, and
Since the illuminance is irradiated from the second side, the illuminance distribution on the stage glass 1 is generally shifted toward the light source side from the curve A2 in FIG. 4. However, since the peak of the illuminance value on the stage glass 1 side is on the auxiliary reflector 12 side,
Most of the irradiated light can illuminate the illuminated section 4 . Also, the curve B 2 ' in Fig. 5 is the lower reflector 1.
This is the illuminance distribution due to the reflected light of 1b, which is shifted toward the auxiliary reflecting mirror 12 compared to the illuminance distribution on the stage glass 1 surface. However, since the peak of the illuminance value on the stage glass 1 surface is set on the light source side, most of the irradiated light is
The illuminated part 4 can be illuminated, and the peak value of illuminance approaches the center of the illuminated part 4. Moreover, with these upper reflector 11a and lower reflector 11b,
The left and right sides of the illuminated area 4 can be efficiently illuminated with the same amount of light, and when copying a thick document, when the edges and sides of the original pass through the illuminated area 4, the left and right illumination light is always emitted. Illumination will be more efficient with either of these methods.
上記実施例では、上部反射鏡１１ａおよび下部
反射鏡１１ｂを１つの２次曲線としたが、上反射
鏡１１ａおよび下反射鏡１１ｂは、上記形状と異
なる２次曲線柱反射鏡でもよいし、数個の相異な
る２次曲線柱反射鏡をつなげて構成しても同様の
結果が得られる。 In the above embodiment, the upper reflecting mirror 11a and the lower reflecting mirror 11b have one quadratic curve, but the upper reflecting mirror 11a and the lower reflecting mirror 11b may be quadratic curve columnar reflecting mirrors different from the above-mentioned shape. Similar results can be obtained by connecting different quadratic curved column reflecting mirrors.
本発明を用いた場合、以下に示す効果がある。 When the present invention is used, there are the following effects.
(i) 上部反射鏡および下部反射鏡の反射光による
照度分布のピーク位置をそれぞれ光路中心より
補助反射鏡側および光源側に設定するので、被
照明部内においてほぼ均一な照度分布を実現す
ることができ、露光量調整がしやすくすること
ができる。また、被照明部に置かれた原稿を効
率良く照明することができる。(i) Since the peak positions of the illuminance distribution due to the reflected light from the upper reflector and the lower reflector are set on the auxiliary reflector side and the light source side, respectively, from the center of the optical path, it is possible to achieve a nearly uniform illuminance distribution within the illuminated area. This makes it easier to adjust the exposure amount. Further, the document placed on the illuminated area can be efficiently illuminated.
(ii) 上記のように上部反射鏡および下部反射鏡を
構成するので、厚物の原稿などを複写した時に
照明効率を高くすることができ、かつ、被照明
部の左右斜下より均等に照明することができ、
厚物原稿の端部が黒く複写されることがなくな
る。(ii) By configuring the upper and lower reflectors as described above, it is possible to increase the illumination efficiency when copying thick originals, and to evenly illuminate the illuminated area from the left and right diagonally below. can,
The edges of thick originals are no longer copied in black.
第１図は従来のスリツト露光用照明装置および
それに係わる光学系の説明図、第２図は第１図に
示す照明装置によるステージガラス面上での照度
分布、第３図は本発明に係わる光学系の説明図、
第４図は本発明のステージガラス面上での照度分
布、第５図は本発明のステージガラス面上方約５
mmの位置における照度分布である。
１……ステージガラス、２……投影レンズ、３
……感光体、４……被照明部、５……管状光源、
６……柱状主反射鏡（うち６ａは上部反射鏡、６
ｂは下部反射鏡）、７……補助反射鏡、８……光
路中心、９……露光量調整スリツト、１１……柱
状主反射鏡（うち１１ａは上部反射鏡、１ｂは下
部反射鏡、１１ｃは背部反射鏡）、１２……補助
反射鏡、１３……上部反射鏡の光源側で反射され
る光線、１４……下部反射鏡の光源側で反射され
る光線、F1，F2……２次曲線の焦点（F1は管状
光源の軸中心も兼ねる）、A1，A2，A2′……上部
反射鏡による照度分布、B1，B2，B2′……下部反
射鏡による照度分布、C1，C2，C2′……上部反射
鏡および下部反射鏡による合成照度分布。
Fig. 1 is an explanatory diagram of a conventional illumination device for slit exposure and the optical system related thereto, Fig. 2 is an illuminance distribution on the stage glass surface by the illumination device shown in Fig. 1, and Fig. 3 is an illustration of the optical system according to the present invention. Diagram of the system,
FIG. 4 shows the illuminance distribution on the stage glass surface of the present invention, and FIG.
This is the illuminance distribution at the mm position. 1... Stage glass, 2... Projection lens, 3
... Photoreceptor, 4 ... Illuminated section, 5 ... Tubular light source,
6... Column main reflecting mirror (of which 6a is the upper reflecting mirror, 6
b is a lower reflector), 7... Auxiliary reflector, 8... Optical path center, 9... Exposure adjustment slit, 11... Columnar main reflector (of which 11a is an upper reflector, 1b is a lower reflector, 11c is the back reflector), 12... Auxiliary reflector, 13... Light rays reflected on the light source side of the upper reflector, 14... Light rays reflected on the light source side of the lower reflector, F 1 , F 2 ... Focal point of the quadratic curve (F 1 also serves as the axis center of the tubular light source), A 1 , A 2 , A 2 ′... illuminance distribution by the upper reflector, B 1 , B 2 , B 2 ′... the lower reflector Illuminance distribution by C 1 , C 2 , C 2 ′... Combined illuminance distribution by upper and lower reflectors.
Claims (1)
に至る光路の片側に位置する管状光源と、これを
一部包囲した柱状主反射鏡と、前記光路をはさみ
前記柱状主反射鏡と反対側に位置する平板状の補
助反射鏡とからなる照明装置において、柱状主反
射鏡のうち、管状光源を中心として被照明部と反
対側に位置する下部反射鏡が前記管状光源を焦点
とする二次曲線形状を持つ反射鏡であり下部反射
鏡からの反射光が、被照明部において最大照度を
生ずる位置を被照明部の光路中心よりも光源側と
なるごとく直接照明するとともに、前記柱状主反
射鏡のうち、管状光源を中心として被照明部側に
ある上部反射鏡が前記管状光源を第一焦点とし前
記ステージガラスよりも下方に第二焦点を有する
楕円形状を持つ反射鏡であり上部反射鏡からの反
射光が前記補助反射鏡を介して被照明部で最大照
度を生じる位置を前記光路中心よりも補助反射鏡
側となるごとく照明するように柱状主反射鏡およ
び補助反射鏡を構成したことを特徴とするスリツ
ト露光用照明装置。 ２ 上部反射鏡および下部反射鏡からの反射光の
うち、管状光源と反射鏡との距離が最小となる上
部反射鏡および下部反射鏡の部分で反射したそれ
ぞれの光が、最大照度位置を照明するようにした
特許請求の範囲第１項記載のスリツト露光用照明
装置。[Scope of Claims] 1. A tubular light source located on one side of the optical path from the illuminated part on the stage glass to the projection lens, a columnar main reflecting mirror partially surrounding the tubular light source, and the columnar main reflecting mirror sandwiching the optical path. In an illumination device comprising a flat plate-shaped auxiliary reflecting mirror located on the opposite side, a lower reflecting mirror of the columnar main reflecting mirror located on the opposite side of the illuminated area with the tubular light source as the center focuses the tubular light source. It is a reflecting mirror having a quadratic curve shape, and the reflected light from the lower reflecting mirror directly illuminates the position where maximum illuminance occurs in the illuminated part so that it is closer to the light source than the center of the optical path of the illuminated part, and Among the main reflecting mirrors, the upper reflecting mirror located on the illuminated part side with the tubular light source as the center is an elliptical reflecting mirror with the tubular light source as the first focal point and a second focal point below the stage glass. The columnar main reflecting mirror and the auxiliary reflecting mirror are configured so that the reflected light from the reflecting mirror illuminates the position where maximum illuminance occurs in the illuminated area via the auxiliary reflecting mirror so that it is closer to the auxiliary reflecting mirror than the center of the optical path. A lighting device for slit exposure characterized by the following features. 2 Among the reflected lights from the upper reflector and the lower reflector, each light reflected at the portion of the upper reflector and the lower reflector where the distance between the tubular light source and the reflector is the minimum illuminates the position of maximum illumination. An illumination device for slit exposure according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9423881A JPS57208572A (en) | 1981-06-17 | 1981-06-17 | Luminaire for slit exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9423881A JPS57208572A (en) | 1981-06-17 | 1981-06-17 | Luminaire for slit exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57208572A JPS57208572A (en) | 1982-12-21 |
| JPS6227371B2 true JPS6227371B2 (en) | 1987-06-15 |
Family
ID=14104721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9423881A Granted JPS57208572A (en) | 1981-06-17 | 1981-06-17 | Luminaire for slit exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57208572A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63137277A (en) * | 1986-11-28 | 1988-06-09 | Konica Corp | Cleaning device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5061223A (en) * | 1973-09-29 | 1975-05-26 | ||
| JPS5123724A (en) * | 1974-08-06 | 1976-02-25 | Ricoh Kk | Fukushakitoniokeru suritsutoshomeisochi |
| JPS55120052A (en) * | 1979-03-09 | 1980-09-16 | Canon Inc | Slit lighting device |
-
1981
- 1981-06-17 JP JP9423881A patent/JPS57208572A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5061223A (en) * | 1973-09-29 | 1975-05-26 | ||
| JPS5123724A (en) * | 1974-08-06 | 1976-02-25 | Ricoh Kk | Fukushakitoniokeru suritsutoshomeisochi |
| JPS55120052A (en) * | 1979-03-09 | 1980-09-16 | Canon Inc | Slit lighting device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63137277A (en) * | 1986-11-28 | 1988-06-09 | Konica Corp | Cleaning device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57208572A (en) | 1982-12-21 |
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