JPH0261028B2 - - Google Patents
Info
- Publication number
- JPH0261028B2 JPH0261028B2 JP12261380A JP12261380A JPH0261028B2 JP H0261028 B2 JPH0261028 B2 JP H0261028B2 JP 12261380 A JP12261380 A JP 12261380A JP 12261380 A JP12261380 A JP 12261380A JP H0261028 B2 JPH0261028 B2 JP H0261028B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- light source
- slit
- cylindrical lens
- stage glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005286 illumination Methods 0.000 claims description 17
- 239000011521 glass Substances 0.000 claims description 13
- 238000009827 uniform distribution Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000011358 absorbing material Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/54—Lamp housings; Illuminating means
- G03B27/542—Lamp housings; Illuminating means for copying cameras, reflex exposure lighting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure Or Original Feeding In Electrophotography (AREA)
- Optical Systems Of Projection Type Copiers (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、電子写真複写機の原稿面を照明する
照明装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an illumination device for illuminating a document surface of an electrophotographic copying machine.
従来の技術
一般に電子写真複写機などのスリツト露光用照
明装置は次のような条件を満たすことが必要であ
る。2. Description of the Related Art In general, a lighting device for slit exposure such as an electrophotographic copying machine must satisfy the following conditions.
１ スリツト面に対して高い照明効率を有するこ
と。1. Must have high illumination efficiency for the slit surface.
２ 光源の取付位置のずれや、電球フイラメント
の偏軸などによる原稿面照度および照度分布へ
の影響が少ないこと。2. There is little effect on the illuminance on the document surface and illuminance distribution due to misalignment of the light source installation position or eccentric axis of the light bulb filament.
３ 露光系のスリツト位置が多少ずれても、露光
量が変わらないこと。3. Even if the slit position of the exposure system shifts slightly, the amount of exposure should not change.
４ 小形であること。4. Must be small.
これらの条件は相反する性質であり、全てを満
足させることは難しい。 These conditions are contradictory and it is difficult to satisfy all of them.
従来の電子写真複写機などでスリツト露光する
場合、ステージガラス面とほぼ垂直の下方向から
原稿面像を取り出すため、原稿面の照明はステー
ジガラスを通し、斜め下方向から行なう必要があ
る。 When performing slit exposure using a conventional electrophotographic copying machine, the image of the document surface is taken out from below, almost perpendicular to the stage glass surface, so the document surface must be illuminated diagonally from below through the stage glass surface.
このような照明の一方法として、実開昭54−
173745号公報や特開昭53−24830号公報などのよ
うに、光源と反射鏡および反射鏡からの光を集光
するシリンドリカルレンズを組合わせた照明装置
が提案されている。 As one method of such lighting,
BACKGROUND ART Illumination devices that combine a light source, a reflecting mirror, and a cylindrical lens that condenses light from the reflecting mirror have been proposed, such as in Japanese Patent Application Laid-open No. 173745 and Japanese Patent Application Laid-Open No. 53-24830.
第３図は、上記シリンドリカルレンズを用いた
照明装置の例を示すもので、図中の２は管形光源
１を一部包囲した溝形放物面鏡、４は管形光源１
からの直射光Ｄおよび溝形放物面鏡２からの反射
光Ｒをそれぞれ集光して、ステージガラス３を通
してスリツト被照明部Ｐおよびスリツト幅Ｗを照
明するシリンドリカルレンズをそれぞれ示す。 FIG. 3 shows an example of a lighting device using the above-mentioned cylindrical lens. In the figure, 2 is a groove-shaped parabolic mirror partially surrounding the tube-shaped light source 1, and 4 is a tube-shaped light source 1.
A cylindrical lens is shown that collects the direct light D from the channel-shaped parabolic mirror 2 and the reflected light R from the groove-shaped parabolic mirror 2, and illuminates the slit illuminated portion P and the slit width W through the stage glass 3.
管形光源１は溝形放物面鏡２の焦点F7に配置
されている。このため、シリンドリカルレンズ４
へは溝形放物面鏡２を介して平行光Ｒが入射す
る。 The tube-shaped light source 1 is arranged at the focal point F 7 of the channel-shaped parabolic mirror 2. For this reason, the cylindrical lens 4
Parallel light R is incident on the groove-shaped parabolic mirror 2.
ここでシリンドリカルレンズ４の焦点F8がス
リツト被照明部Ｐより遠くなるようにシリンドリ
カルレンズ４を配置すると、シリンドリカルレン
ズ４に入射した平行光Ｒはレンズ通過後R′とな
り、Ｐ点を通つてF8に集光される。 If the cylindrical lens 4 is arranged so that the focal point F8 of the cylindrical lens 4 is further away from the illuminated part P of the cylindrical lens 4, the parallel light R incident on the cylindrical lens 4 becomes R' after passing through the lens, and passes through point P to F. The light is focused on 8 .
一方、シリンドリカルレンズ４へは溝形放物面
鏡２からの平行光Ｒのほかに、管形光源１からの
直射光Ｄが入射する。この直射光Ｄはシリンドリ
カルレンズ４へ入射したのち、D′となつてF8よ
り離れた位置に集光するか、または集光せずに拡
がつていく。 On the other hand, in addition to the parallel light R from the groove-shaped parabolic mirror 2, direct light D from the tubular light source 1 enters the cylindrical lens 4. After this direct light D enters the cylindrical lens 4, it becomes D' and is focused at a position farther than F8 , or it spreads out without being focused.
第４図は上記の照明装置によるＰ点でのスリツ
ト幅Ｗ方向の照度分布を示したものである。図中
の実線Ｇは溝形放物面鏡２からの平行光成分を、
また点線Ｈは管形光源１からの直射光成分をそれ
ぞれ示し、ＧとＨとを合成したものが一点鎖線Ｉ
である。 FIG. 4 shows the illuminance distribution in the slit width W direction at point P by the above illumination device. The solid line G in the figure represents the parallel light component from the groove-shaped parabolic mirror 2,
Further, dotted lines H indicate the direct light components from the tubular light source 1, and the combination of G and H is the dotted line I.
It is.
発明が解決しようとする問題点
従来の照明装置では、第４図に示すように、そ
の照度分布が図中の理想分布に近づいているとは
いえ、まだ、スリツト幅Ｗにおいて中央部の照度
が高く、両端部の照度が低いという、いわゆる山
形の照度分布になる。Problems to be Solved by the Invention In the conventional illumination device, as shown in Fig. 4, although the illuminance distribution approaches the ideal distribution in the figure, the illuminance at the center of the slit width W still remains low. This results in a so-called mountain-shaped illuminance distribution in which the illuminance is high and the illuminance is low at both ends.
このような照度分布では、所要のスリツト幅
（第４図ではＷに相当）に対して、スリツト位置
がずれると、露光量の変化を生じ、照明装置のバ
ラツキの原因になる。 In such an illuminance distribution, if the slit position deviates from the required slit width (corresponding to W in FIG. 4), the exposure amount will change, causing variations in the illumination device.
上記スリツト位置のずれの要因としては、管形
光源１の設置位置が、溝形反射鏡２の焦点F7と
合致しないこと（光源の設置位置のバラツキ）
や、画像を投影する光学系（図示せず）の光軸
が、スリツト位置からずれることなどが考えられ
る。 The cause of the deviation in the slit position is that the installation position of the tubular light source 1 does not match the focal point F 7 of the groove-shaped reflector 2 (variation in the installation position of the light source).
Or, the optical axis of the optical system (not shown) that projects the image may be shifted from the slit position.
問題点を解消するための手段
本発明は、前記従来の問題点を解決するため
に、シリンドリカルレンズの断面において、中央
部分に曲率半径の小さい領域を複数箇所設け、そ
こを通過する光をステージガラスより上側で複数
箇所に集光させるとともに、両端部分を中央部分
より大きな曲率半径として、そこを通過する光を
前記、複数箇所に集光させた間に集光させるもの
である。Means for Solving the Problems In order to solve the above-mentioned conventional problems, the present invention provides a plurality of regions with a small radius of curvature at the center in the cross section of the cylindrical lens, and the light passing through the regions is directed to the stage glass. The light is focused at a plurality of locations on the upper side, and both end portions have a larger radius of curvature than the center portion, so that the light passing therethrough is focused between the plurality of locations.
作 用
上記手段により、管形光源からの光がスリツト
幅Ｗに対してほぼ平坦に照射され、これによりス
リツトや光源の設定位置のずれによるスリツト露
光面の照度むらを防止することができる。Effect: With the above means, the light from the tubular light source is irradiated almost flatly with respect to the slit width W, thereby making it possible to prevent uneven illuminance on the slit exposure surface due to deviations in the set positions of the slit and the light source.
実 施 例
第１図は本発明の一実施例を示すもので、図中
の６は管形光源５を一部包囲した溝形放物面鏡、
８は管形光源５からの直射光Ｄおよび溝形放物面
鏡６からの反射光Ｒをそれぞれ集光して、ステー
ジガラス７を通して、スリツト被照明部Ｐおよび
スリツト幅Ｗを照明する、シリンドリカルレンズ
をそれぞれ示す。Embodiment FIG. 1 shows an embodiment of the present invention, in which reference numeral 6 denotes a groove-shaped parabolic mirror that partially surrounds the tube-shaped light source 5;
Reference numeral 8 denotes a cylindrical light source which collects the direct light D from the tubular light source 5 and the reflected light R from the groove-shaped parabolic mirror 6, and illuminates the slit illuminated portion P and the slit width W through the stage glass 7. Each lens is shown.
ここで、シリンドリカルレンズ８は、図中の
d10，d11の部分と、r10，r11の部分で曲率半径が
異なつており、d10，d11に比べてr10，r11の曲率
半径を大きくしてある。そして、d10部分の焦点
がF10，d11部分の焦点がF11に、またr10とr11部分
の焦点がF10とF11の間、すなわちF9になつてい
る。 Here, the cylindrical lens 8 is
The radius of curvature is different between the portions d 10 and d 11 and the portions r 10 and r 11 , and the radius of curvature of r 10 and r 11 is made larger than that of d 10 and d 11 . The focus of the d10 portion is F10 , the focus of the d11 portion is F11 , and the focus of the r10 and r11 portions is between F10 and F11 , that is, F9 .
以下にその動作を説明すると、管形光源５から
の直射光のうちd10を通過する光は焦点F10に集光
する。同様にd11を通過する光は焦点F11に集光す
る。 The operation will be explained below. Of the direct light from the tubular light source 5, the light passing through d10 is focused on the focal point F10 . Similarly, light passing through d 11 is focused on focal point F 11 .
一方、溝形放物面鏡６からの反射光（平行光）
のうち、r10とr11を通過した光は焦点F9に集光す
る。 On the other hand, reflected light from the groove-shaped parabolic mirror 6 (parallel light)
Of these, the light that has passed through r 10 and r 11 is focused on focal point F 9 .
このように、シリンドリカルレンズ８を通過し
た光は、ステージガラス７の上面にあるＰ点よ
り、それぞれ遠くに集光してスリツト幅Ｗが照明
される。この時、Ｐ点でのスリツト幅Ｗ方向の照
度分布は第２図のように、ほぼ理想分布に近い、
いわゆる台形の照度分布になる。 In this way, the light that has passed through the cylindrical lens 8 is focused at a distance from the point P on the upper surface of the stage glass 7, and the slit width W is illuminated. At this time, the illuminance distribution in the slit width W direction at point P is almost an ideal distribution, as shown in Figure 2.
This results in a so-called trapezoidal illuminance distribution.
図中の実線Ｊは溝形放物面鏡７からの平行光成
分を、また点線K10は管形光源１からの直射光成
分のうちd10部分によるものを、同じく点線K11は
d11部分によるものをそれぞれ示し、Ｊ，K10，
K11を合成したものが一点鎖線Ｌである。 In the figure, the solid line J represents the parallel light component from the groove-shaped parabolic mirror 7, the dotted line K10 represents the d10 portion of the direct light component from the tubular light source 1, and the dotted line K11 represents the parallel light component from the channel-shaped parabolic mirror 7 .
d 11 parts are shown respectively, J, K 10 ,
The one-dot chain line L is the compound of K 11 .
このようにして、集束点F10およびF11をスリツ
ト幅Ｗの両端に位置させてスリツト幅両端の照度
を持ち上げることにより、第２図に示すような矩
形の理想分布に近似した配光を得ることができ
る。 In this way, by positioning the focusing points F10 and F11 at both ends of the slit width W and increasing the illuminance at both ends of the slit width, a light distribution that approximates the ideal rectangular distribution as shown in Figure 2 can be obtained. be able to.
第２図において、シリンドリカルレンズ８によ
り、スリツト幅Ｗより若干広い範囲を平坦に照明
することによつて、スリツト位置のずれや、管形
光源５の設定位置のずれなどにも十分対応するこ
とができる。 In FIG. 2, by flatly illuminating an area slightly wider than the slit width W using the cylindrical lens 8, it is possible to sufficiently cope with deviations in the slit position and the setting position of the tubular light source 5. can.
また、シリンドリカルレンズ８を赤外線吸収材
料で構成したり、レンズ表面に赤外線反射コーデ
イングを施すことによつて、ステージガラス７の
照明装置による温度上昇を防止することができ
る。 Furthermore, by forming the cylindrical lens 8 with an infrared absorbing material or applying infrared reflective coating to the lens surface, it is possible to prevent the temperature of the stage glass 7 from increasing due to the illumination device.
発明の効果
一般に電子写真複写機などの照明光学系におい
て、光源発光部の位置ずれや輝きの不均一性、反
射鏡の製造上のばらつきや鏡面性、照明装置の取
付誤差などによつて、原稿面照度および照度分布
が大きく変動するため、最適に設計された照明装
置であつても適正な照明特性を得るのに製造時何
らかの調整が必要である。Effects of the Invention In general, in illumination optical systems such as electrophotographic copying machines, originals may be affected by misalignment of the light source, uneven brightness, manufacturing variations and specularity of the reflecting mirror, installation errors of the illumination device, etc. Since surface illuminance and illuminance distribution vary widely, even an optimally designed illumination device requires some adjustment during manufacturing to obtain appropriate illumination characteristics.
本発明の照明装置は、放物面を形成する反射鏡
と、２種類以上の曲率半径を有するシリンドリカ
ルレンズを組合わせ、スリツト露光面の断面方向
において、ステージガラス面より上の位置にそれ
ぞれの焦点を定めることによつて、スリツト露光
面の断面方向の照度分布を均一（平坦）にし、か
つ高照度にすることができる。 The illumination device of the present invention combines a reflecting mirror forming a paraboloid and a cylindrical lens having two or more types of radii of curvature, and each focal point is positioned above the stage glass surface in the cross-sectional direction of the slit exposure surface. By determining , the illuminance distribution in the cross-sectional direction of the slit exposure surface can be made uniform (flat) and the illuminance can be made high.
また、この照明装置はスリツト幅Ｗよりやや広
い範囲の原稿面に集中して光を照射するため、光
源発光部（電球フイラメント）の偏軸や反射鏡に
対する光源の取付位置のずれや露光系のスリツト
位置の機械的なずれが多少あつても原稿面照度分
布はあまり変化せず、ほぼ一定の露光量を得るこ
とができるなどの利点がある。 In addition, since this illumination device irradiates light in a concentrated manner onto the document surface in a range slightly wider than the slit width W, it is also possible to prevent the eccentric axis of the light source emitting part (bulb filament), the misalignment of the mounting position of the light source with respect to the reflecting mirror, and the exposure system. Even if there is some mechanical deviation in the slit position, the illuminance distribution on the document surface does not change much, and there are advantages in that a substantially constant amount of exposure can be obtained.
また本発明の実施例に対してシリンドリカルレ
ンズを赤外線吸収材料によつて構成したり、レン
ズ表面に赤外線反射コーテイングを施すことによ
つて、スリツト露光面およびステージガラス面に
おける光源からの熱による温度上昇を防止するこ
とができる。 Furthermore, in the embodiments of the present invention, by constructing the cylindrical lens with an infrared absorbing material or applying an infrared reflective coating to the lens surface, the temperature increase due to heat from the light source on the slit exposure surface and the stage glass surface can be prevented. can be prevented.
第１図は本発明による実施例のスリツト露光用
照明装置の構成図、第２図はそのスリツト幅方向
の原稿面照度分布の特性図、第３図は従来例の照
明装置の構成図、第４図はその照明装置における
スリツト幅方向の原稿面照度分布の特性図であ
る。
５……管形光源、６……溝形放物面鏡、７……
ステージガラス、８……シリンドリカルレンズ。
FIG. 1 is a block diagram of an illumination device for slit exposure according to an embodiment of the present invention, FIG. 2 is a characteristic diagram of illuminance distribution on the document surface in the slit width direction, and FIG. 3 is a block diagram of a conventional illumination device. FIG. 4 is a characteristic diagram of the illuminance distribution on the document surface in the slit width direction in the illumination device. 5...Tubular light source, 6...Slotted parabolic mirror, 7...
Stage glass, 8...Cylindrical lens.
Claims (1)
焦点に配置した光源と、前記光源からの直射光お
よび反射鏡からの反射光を集光してステージガラ
ス上のスリツト露光面を照射するシリンドリカル
レンズとから構成し、前記シリンドリカルレンズ
はその断面において、中央部分に曲率半径の小さ
い領域を複数箇所設け、これを通過する光をステ
ージガラスより上側で複数箇所に集光させるとと
もに、両端部分を中央部分より大きい曲率半径に
して、これを通過する光をステージガラスより上
側で、かつ前記中央部分での集光位置の間に集光
させ、前記スリツト露光面の幅より若干広い範囲
において、照度分布を均一にすることを特徴とす
る電子写真複写機の照明装置。1. A reflecting mirror forming a parabolic cross section, a light source placed at the focal point of the reflecting mirror, and direct light from the light source and reflected light from the reflecting mirror being condensed to illuminate the slit exposure surface on the stage glass. In its cross section, the cylindrical lens has a plurality of areas with a small radius of curvature in the center, and the light passing through the area is focused on multiple areas above the stage glass. The radius of curvature is larger than that of the central part, and the light passing through this is focused above the stage glass and between the condensing positions in the central part, and the illuminance is increased in an area slightly wider than the width of the slit exposure surface. An illumination device for an electrophotographic copying machine characterized by uniform distribution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12261380A JPS5746266A (en) | 1980-09-03 | 1980-09-03 | Illuminating equipment for electronic copying machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12261380A JPS5746266A (en) | 1980-09-03 | 1980-09-03 | Illuminating equipment for electronic copying machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5746266A JPS5746266A (en) | 1982-03-16 |
| JPH0261028B2 true JPH0261028B2 (en) | 1990-12-18 |
Family
ID=14840276
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12261380A Granted JPS5746266A (en) | 1980-09-03 | 1980-09-03 | Illuminating equipment for electronic copying machine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5746266A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6145238A (en) * | 1984-08-09 | 1986-03-05 | Fuji Xerox Co Ltd | Slit exposing device |
| JPS61169814A (en) * | 1985-01-23 | 1986-07-31 | Matsushita Graphic Commun Syst Inc | Recording device |
| JPS62163042A (en) * | 1986-01-14 | 1987-07-18 | Ricoh Co Ltd | Flash lighting device |
-
1980
- 1980-09-03 JP JP12261380A patent/JPS5746266A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5746266A (en) | 1982-03-16 |
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