JPS6226915B2 - - Google Patents
Info
- Publication number
- JPS6226915B2 JPS6226915B2 JP6723479A JP6723479A JPS6226915B2 JP S6226915 B2 JPS6226915 B2 JP S6226915B2 JP 6723479 A JP6723479 A JP 6723479A JP 6723479 A JP6723479 A JP 6723479A JP S6226915 B2 JPS6226915 B2 JP S6226915B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- glass
- metal film
- melting point
- low melting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 54
- 239000000758 substrate Substances 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 25
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 238000002844 melting Methods 0.000 claims description 17
- 230000008018 melting Effects 0.000 claims description 17
- 238000001259 photo etching Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 4
- 239000000155 melt Substances 0.000 claims description 3
- 238000005304 joining Methods 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
Description
【発明の詳細な説明】
本発明は、インクジエツト記録装置に用いるイ
ンクオンデイマンド型のインクジエツトヘツドの
製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an ink-on-demand type inkjet head used in an inkjet recording apparatus.
従来、インクオンデイマンド型のインクジエツ
トヘツド（以下ヘツドと略す。）は、第１図（断
面図）のごとく、一枚又は複数のガラス基板に、
インク流路の３面をフオトエツチング法等により
形成し、接着剤により接着していた。即ち、ガラ
ス基板Ａ１にインク流路３をフオトエツチングに
より形成し、ガラス基板Ｂ２を接合面１０に於い
て接着し、インク流路３を形成していた。 Conventionally, an ink-on-demand type ink jet head (hereinafter simply referred to as a head) has one or more glass substrates, as shown in FIG. 1 (cross-sectional view).
The three sides of the ink flow path were formed by photoetching or the like, and were bonded together with an adhesive. That is, the ink flow path 3 was formed on the glass substrate A1 by photoetching, and the glass substrate B2 was bonded to the bonding surface 10 to form the ink flow path 3.
接着剤による接合は、接着剤の量、塗布が安定
せず、インク流路３の断面積減少更にはつまりが
発生し、設計通りのインク流路を形成するのは非
常に困難であつた。又、接着剤の耐久性がないの
も大きな欠点であつた。 When bonding with an adhesive, the amount and application of the adhesive is unstable, the cross-sectional area of the ink flow path 3 is reduced, and clogging occurs, making it extremely difficult to form an ink flow path as designed. Another major drawback was that the adhesive lacked durability.
又、ガラス基板Ａ、Ｂ１，２を直接押しあて、
高温炉に入れてガラス基板Ａ、Ｂが溶融する状態
で接合面１０を接合する方法もあるが、接合面１
０が溶ける温度では、ガラス基板全体が溶け始め
るため、フオトエツチングで形成された面が当初
の形状を保てなくなるという問題があつた。 Also, by directly pressing the glass substrates A, B1, and 2,
There is also a method of joining the bonding surface 10 in a state where the glass substrates A and B are melted in a high-temperature furnace.
At a temperature where 0 melts, the entire glass substrate begins to melt, resulting in a problem that the surface formed by photoetching cannot maintain its original shape.
本発明は、以上の欠点を克服し、耐久性があ
り、しかもフオトエツチングにより形成された面
の通りガラス基板を接合したインクジエツトヘツ
ドを提供することを目的とする。 SUMMARY OF THE INVENTION An object of the present invention is to overcome the above-mentioned drawbacks and provide an inkjet head which is durable and has a glass substrate bonded to the surface formed by photo-etching.
本発明のインクオンデイマンド型のインクジエ
ツトヘツドの製造方法を第２図以下で説明する。 A method of manufacturing an ink-on-demand type ink jet head according to the present invention will be explained with reference to FIG. 2 and subsequent figures.
まず、ガラス基板Ａ１をフオトエツチング法に
よりインク流路３を形成する。接合面１０にフオ
トエツチング法等により、金属膜４を形成する。
金属膜４には、例えば鉛のようなガラスと混合す
ると、ガラスの融点が下がる金属を使用する。こ
の状態から炉に入れ、金属膜４の金属をガラス基
板Ａ１内に拡散させ、低融点ガラス層２０を生成
する。低融点ガラス層２０が生成した後、金属膜
４を取り去る。金属膜４が極薄い時は取り去る必
要はない。 First, the ink flow path 3 is formed on the glass substrate A1 by photoetching. A metal film 4 is formed on the bonding surface 10 by photoetching or the like.
For the metal film 4, a metal such as lead, which lowers the melting point of glass when mixed with glass, is used. In this state, the glass substrate A1 is placed in a furnace, and the metal of the metal film 4 is diffused into the glass substrate A1 to form a low melting point glass layer 20. After the low melting point glass layer 20 is formed, the metal film 4 is removed. When the metal film 4 is extremely thin, there is no need to remove it.
更に、ガラス基板Ｂ２にも第３図のごとく金属
膜４を接合面１０の形状に形成し、炉に入れて、
金属を拡散させ、ガラス基板Ａと同様に低融点ガ
ラス層２０を生成する。金属膜４を取り去る必要
があるかどうかは、ガラス基板Ａの場合と同様で
ある。 Furthermore, as shown in FIG. 3, a metal film 4 is formed on the glass substrate B2 in the shape of the bonding surface 10, and then placed in a furnace.
The metal is diffused to produce a low melting point glass layer 20 similarly to the glass substrate A. Whether or not it is necessary to remove the metal film 4 is the same as in the case of the glass substrate A.
ガラス基板Ａ１とガラス基板Ｂ２に低融点ガラ
ス層２０が生成した後、ガラス基板Ａ、Ｂ１，２
を接合面１０で合わせ、適度な圧力で押さえて、
低融点ガラス層２０が溶融し、しかもガラス基板
Ａ、Ｂ１，２の元の部分は溶融しない温度の炉に
入れて、接合面１０に於いて低融点ガラス層２０
を溶かす。低融点ガラス層２０は拡散により生成
できたもので、その深さはさほど深くなく、従つ
て、インク流路３の形状を変化させることなく接
合面１０は溶着する。その後徐冷してガラス基板
Ａ１とＢ２の接合は完了する。 After the low melting point glass layer 20 is formed on the glass substrate A1 and the glass substrate B2, the glass substrates A, B1, 2
Align the joint surfaces 10 and press with moderate pressure.
The low melting point glass layer 20 is placed in a furnace at a temperature where the low melting point glass layer 20 melts but the original parts of the glass substrates A, B1, and 2 do not melt, and the low melting point glass layer 20 is melted at the bonding surface 10.
dissolve. The low melting point glass layer 20 is produced by diffusion and is not very deep, so the bonding surface 10 is welded without changing the shape of the ink flow path 3. Thereafter, the glass substrates A1 and B2 are bonded together by slow cooling.
又、ガラス基板Ａ、Ｂの少くとも一方に金属膜
４を蒸着し、両ガラス基板Ａ、Ｂを押しつけ、炉
に入れて金属拡散と溶融を同一工程で行うと、工
数低減され、品質の安定化がさらに増加する。 In addition, if the metal film 4 is deposited on at least one of the glass substrates A and B, and both glass substrates A and B are pressed together and placed in a furnace to perform metal diffusion and melting in the same process, the number of man-hours can be reduced and the quality can be stabilized. will further increase.
なお以上のようにしてインク流路が形成される
が接合したガラス基板に、圧電素子等を接着し、
ノズルの端面を研摩し、インクタンクからのイン
クを受け入れる部分を作り、インクジエツトヘツ
ドとする。 Although the ink flow path is formed as described above, a piezoelectric element etc. is adhered to the bonded glass substrate.
The end face of the nozzle is polished to create a part that receives ink from the ink tank, and is used as an ink jet head.
また、以上の一実施例では、金属をエツチング
の後再融着して更にエツチングによりパターンを
形成したが、ガラスエツチングの前にフツ化水素
酸におかされない金属、たとえば金でマスキング
しておき、一度に金属膜パターンとインク流路パ
ターンを形成することもできる。即ち、第４図の
ごとく金属膜４の上に金の膜５を蒸着したのち、
フオトエツチング法により第４図のごとき断面形
状を得ることができる。その後の拡散接合方法は
同じである。 Further, in the above embodiment, a pattern was formed by etching the metal by re-fusing it after etching, but before etching the glass, it was masked with a metal that is not affected by hydrofluoric acid, such as gold. It is also possible to form the metal film pattern and the ink flow path pattern at the same time. That is, after depositing the gold film 5 on the metal film 4 as shown in FIG.
A cross-sectional shape as shown in FIG. 4 can be obtained by photoetching. The subsequent diffusion bonding method is the same.
以上述べた本発明のインクオンデイマンド型の
インクジエツトヘツドの製造方法によれば、接合
部がインクに侵されることなく耐久性がありなが
らフオトエツチングにより形成された溝が接合に
よつて変形することのないインクオンデイマンド
型のインクジエツトヘツドを製造できる。 According to the above-described method of manufacturing an ink-on-demand type ink jet head of the present invention, the grooves formed by photo-etching are deformed by the bonding, while the bonded portions are durable without being corroded by ink. It is possible to manufacture an ink-on-demand type ink jet head without any problem.
第１図は、従来のインクジエツトヘツドの製造
方法の説明図である。第２図、第３図、第４図
は、本発明によるインクジエツトヘツドの製造方
法の説明図である。
１……ガラス基板Ａ、２……ガラス基板Ｂ、３
……インク流路、４……金属膜、５……金の膜、
１０……接合面、２０……低融点ガラス層。
FIG. 1 is an explanatory diagram of a conventional method of manufacturing an ink jet head. FIGS. 2, 3, and 4 are explanatory diagrams of a method of manufacturing an ink jet head according to the present invention. 1...Glass substrate A, 2...Glass substrate B, 3
... Ink channel, 4 ... Metal film, 5 ... Gold film,
10... Bonding surface, 20... Low melting point glass layer.
Claims (1)
接合部分にインク流路を形成するインクオンデイ
マンド型のインクジエツトヘツドの製造方法にお
いて、前記一方のガラス基板Ａ１の他方のガラス
基板Ｂ２との対向面上に前記インク流路３に対応
した形状の溝をフオトエツチングにより形成する
と共に、突出形成された接合面１０上に鉛よりな
る金属膜４を形成する工程、 前記一方のガラス基板Ａ１を炉に入れ、前記金
属膜４の金属を前記一方のガラス基板Ａ１内に拡
散させ、前記突出形成された接合面１０上に低融
点ガラス層２０を形成する工程、 前記一方のガラス基板Ａ１の表面から前記金属
膜４を取り除く工程、 前記一方のガラス基板Ａ１上の前記低融点ガラ
ス層２０に対応して前記他方のガラス基板Ｂ２表
面に前記鉛よりなる金属膜４を形成し、炉に入れ
て前記金属膜４の金属の拡散により低融点ガラス
層２０を形成する工程、 前記他方のガラス基板Ｂ２の表面から前記金属
膜４を取り除く工程、 前記一方のガラス基板Ａ１と前記他方のガラス
基板Ｂ２とを重ね合わせ、前記一対のガラス基板
Ａ、Ｂ１，２自体は溶融しないが前記低融点ガラ
ス層２０が溶融する温度に調整された炉に入れ、
前記低融点ガラス層２０の溶融により前記一対の
ガラス基板Ａ、Ｂ１，２を接合する工程、 により前記一対のガラス基板Ａ、Ｂ１，２の接合
部分に前記インク流路３を形成することを特徴と
するインクオンデイマンド型のインクジエツトヘ
ツドの製造方法。[Scope of Claims] 1. A method for manufacturing an ink-on-demand type ink jet head in which a pair of glass substrates A, B1, and 2 are bonded to form an ink flow path in the bonded portion, wherein one of the glass substrates A1 A step of forming a groove having a shape corresponding to the ink flow path 3 by photoetching on the surface facing the other glass substrate B2, and forming a metal film 4 made of lead on the protruding bonding surface 10. , placing the one glass substrate A1 in a furnace, diffusing the metal of the metal film 4 into the one glass substrate A1, and forming a low melting point glass layer 20 on the protruding bonding surface 10; removing the metal film 4 from the surface of the one glass substrate A1; removing the metal film 4 made of lead on the surface of the other glass substrate B2 corresponding to the low melting point glass layer 20 on the one glass substrate A1; forming a low melting point glass layer 20 by dispersing the metal of the metal film 4 in a furnace; removing the metal film 4 from the surface of the other glass substrate B2; the one glass substrate A1 and the other glass substrate B2 are placed in a furnace adjusted to a temperature that does not melt the pair of glass substrates A, B1, 2 themselves but melts the low melting point glass layer 20,
The step of joining the pair of glass substrates A, B1, 2 by melting the low melting point glass layer 20 forms the ink flow path 3 at the joint portion of the pair of glass substrates A, B1, 2. A method of manufacturing an ink-on-demand type ink jet head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6723479A JPS55158985A (en) | 1979-05-30 | 1979-05-30 | Ink jet head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6723479A JPS55158985A (en) | 1979-05-30 | 1979-05-30 | Ink jet head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55158985A JPS55158985A (en) | 1980-12-10 |
| JPS6226915B2 true JPS6226915B2 (en) | 1987-06-11 |
Family
ID=13339012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6723479A Granted JPS55158985A (en) | 1979-05-30 | 1979-05-30 | Ink jet head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55158985A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05169666A (en) * | 1991-12-25 | 1993-07-09 | Rohm Co Ltd | Manufacturing ink jet print head |
| JP5328542B2 (en) * | 2009-07-27 | 2013-10-30 | キヤノン株式会社 | Recording element substrate, ink jet head, and manufacturing method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1012198A (en) * | 1974-07-19 | 1977-06-14 | Stephan B. Sears | Method and apparatus for recording with writing fluids and drop projection means therefor |
| US4096626A (en) * | 1976-12-27 | 1978-06-27 | International Business Machines Corporation | Method of making multi-layer photosensitive glass ceramic charge plate |
-
1979
- 1979-05-30 JP JP6723479A patent/JPS55158985A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55158985A (en) | 1980-12-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6620478B1 (en) | Circular disk containing microchannel/microcavity structures | |
| JPH03184865A (en) | Method for forming precision hole in silicon wafer | |
| JPS6226915B2 (en) | ||
| JP3247533B2 (en) | Manufacturing method of semiconductor gas rate sensor | |
| JP3133171B2 (en) | Method of manufacturing inkjet head | |
| JP3228028B2 (en) | Method of manufacturing ink jet recording head | |
| JPH0524204A (en) | Manufacture of ink jet recording head | |
| JP3154835B2 (en) | Method of manufacturing inkjet head | |
| JP3200881B2 (en) | Method of manufacturing inkjet head | |
| JPH01257064A (en) | Manufacture of thermal head | |
| JPH022212B2 (en) | ||
| JPS5838110B2 (en) | Manufacturing method of inkjet head | |
| JP2940225B2 (en) | Method of manufacturing ink jet recording head | |
| JPH0868917A (en) | Joining method of optical waveguide and optical fiber and optical waveguide type device | |
| JPS5924416A (en) | Magnetic head | |
| JPS59107414A (en) | Magnetic head | |
| JPS60230863A (en) | Preparation of on-demand type ink jet head | |
| JPH07230095A (en) | Liquid crystal display panel | |
| JPH081951A (en) | Manufacture of ink jet head | |
| JPH02301007A (en) | Manufacture of magnetic head core element body | |
| JPS5998858A (en) | Preparation of ink jet head | |
| JP2000294666A (en) | Semiconductor package jig and its use method | |
| JPH05325254A (en) | Substrate for optical information recording medium and its manufacture | |
| JPS60145508A (en) | Production for magnetic head | |
| JPS6138523B2 (en) |