JPS6226113B2 - - Google Patents

Info

Publication number
JPS6226113B2
JPS6226113B2 JP17072279A JP17072279A JPS6226113B2 JP S6226113 B2 JPS6226113 B2 JP S6226113B2 JP 17072279 A JP17072279 A JP 17072279A JP 17072279 A JP17072279 A JP 17072279A JP S6226113 B2 JPS6226113 B2 JP S6226113B2
Authority
JP
Japan
Prior art keywords
bubble
conductor layer
magnetic domain
magnetic field
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17072279A
Other languages
Japanese (ja)
Other versions
JPS5694570A (en
Inventor
Haruo Urai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP17072279A priority Critical patent/JPS5694570A/en
Publication of JPS5694570A publication Critical patent/JPS5694570A/en
Publication of JPS6226113B2 publication Critical patent/JPS6226113B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は電流アクセス型バブル磁区素子に関す
る。更に詳しく述べればバブル材料上に設けられ
た孔明き導体層に電流パルス列を通じることによ
つてバブル磁区を転送する方式のバブル磁区素子
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a current access type bubble magnetic domain device. More specifically, the present invention relates to a bubble magnetic domain element in which a bubble magnetic domain is transferred by passing a current pulse train through a perforated conductor layer provided on a bubble material.

バブル磁区を情報の坦体として用いる記憶素子
において、バブル磁区の転送方式は、パーマロイ
の如き軟磁性膜でできたシエブロン型やY―型を
呈したパタンを、外部より印加する面内回転磁界
によつて順次磁化することによつて生じる磁極に
バブル磁区を引きつけて転送させる、いわゆるフ
イールドアクセス方式が一般的であつた。
In a storage device that uses bubble magnetic domains as information carriers, the bubble magnetic domain transfer method involves applying a chevron-shaped or Y-shaped pattern made of a soft magnetic film such as permalloy to an externally applied in-plane rotating magnetic field. Therefore, the so-called field access method, in which bubble magnetic domains are attracted to magnetic poles generated by sequential magnetization and transferred, has been common.

しかし乍らこのフイールドアクセス方式は、情
報記憶密度を大きくするためにバブル磁区径を小
さくするに従つて、円筒磁区転送に必要な面内回
転磁界が急激に大きくなり、消費電力が増大する
とともに面内回転磁界発生用コイル等に印加する
電圧が増大し、高速転送に適さなくなるという大
きな欠点を持つていることはよく知られている。
更に、バブル磁区径が小さくなるにつれて、パー
マロイパタン形成に必要な最小寸法が小さくな
り、2μm径以下のバブル磁区を用いる素子の製
造は非常に困難となる。
However, with this field access method, as the bubble domain diameter is reduced to increase information storage density, the in-plane rotating magnetic field required for cylindrical domain transfer increases rapidly, resulting in increased power consumption and It is well known that this method has a major drawback in that the voltage applied to the inner rotating magnetic field generating coil increases, making it unsuitable for high-speed transfer.
Furthermore, as the diameter of the bubble magnetic domain becomes smaller, the minimum dimension necessary for forming a permalloy pattern becomes smaller, and it becomes extremely difficult to manufacture an element using a bubble magnetic domain with a diameter of 2 μm or less.

この様な従来のフイールドアクセス型バブル磁
区素子の欠点を克服するバブル磁区転送方式とし
て、電流アクセス方式をもつバブル磁区素子がエ
イ・エイツチ・ボベツク(A.H.Bobeck)によつ
て1979年8月にザ・ベル・システム・テクニカ
ル・ジヤーナル(The Bell System Technical
Journal)第58巻第6号第1453頁〜1540頁に発表
された。
As a bubble domain transfer method that overcomes the drawbacks of the conventional field access type bubble domain device, a bubble domain device with a current access method was developed by AH Bobeck in August 1979 at The Bell.・The Bell System Technical Journal
Journal), Vol. 58, No. 6, pp. 1453-1540.

この電流アクセス型バブル磁区素子の本質は、
バブル材料上に設けられた導体層に矩形或いは長
円状の貫通孔列を作り、この導体層に電流を通じ
たときその孔周囲に生じる電流分布によるバイア
ス磁界分布を用いてバブル磁区の駆動を行うこと
にある。このため面内回転磁界が不要で高速アク
セスに適したバブル磁区駆動方式である。
The essence of this current access type bubble magnetic domain element is
A rectangular or elliptical through-hole array is created in a conductor layer provided on the bubble material, and when current is passed through the conductor layer, a bias magnetic field distribution generated around the hole is used to drive the bubble magnetic domain. There is a particular thing. Therefore, the bubble domain drive method does not require an in-plane rotating magnetic field and is suitable for high-speed access.

電流アクセス型バブル磁区転送方式には、前記
文献に述べられている様に、単一の導体層を用い
る方式と、二層の導体層を用いる方式とがある。
そのいずれの方式においても、バブル磁区素子の
動作特性を悪化させる要因がある。即ち、バブル
磁区駆動用導体層に駆動電流を通じたときに、導
体層の電流に平行な周近傍に大きなバイアス磁界
成分が発生し、バブル素子動作バイアス磁界マー
ジンが導体層周辺部で非常に低下する現象であ
る。このため導体層の中央部の限られた狭い領域
しかバブル磁区転送に使えない。換言すれば、こ
の電流アクセス型バブル磁区素子のチツプ面積の
観点からの使用効率が良くないことにつながる。
As described in the above-mentioned literature, the current access type bubble magnetic domain transfer method includes a method using a single conductor layer and a method using two conductor layers.
In either method, there are factors that deteriorate the operating characteristics of the bubble magnetic domain element. That is, when a drive current is passed through the conductor layer for driving a bubble magnetic domain, a large bias magnetic field component is generated near the circumference parallel to the current in the conductor layer, and the bubble element operating bias magnetic field margin is extremely reduced in the periphery of the conductor layer. It is a phenomenon. For this reason, only a narrow area in the center of the conductor layer can be used for bubble domain transfer. In other words, this current access type bubble magnetic domain element is not very efficient in terms of chip area.

本発明の目的は上記の如き欠点を取り除いた電
流アクセス型バブル磁区素子を提供することにあ
る。
SUMMARY OF THE INVENTION An object of the present invention is to provide a current access type bubble magnetic domain element which eliminates the above-mentioned drawbacks.

すなわち、本発明は、バブル磁区駆動用導体層
の周辺部から生じる大きなバイアス磁界成分を軽
減する磁界補償用導体層を有する電流アクセス型
バブル磁区素子である。
That is, the present invention is a current access type bubble magnetic domain element having a magnetic field compensation conductor layer that reduces a large bias magnetic field component generated from the peripheral portion of the bubble magnetic domain driving conductor layer.

次に図面を用いて本発明を従来例と比較しつつ
詳細に説明する。
Next, the present invention will be explained in detail while comparing it with a conventional example using the drawings.

第1図Aは上記引用文献に述べられている従来
の電流アクセス型バブル磁区素子を示すものであ
る。
FIG. 1A shows a conventional current access type bubble magnetic domain element described in the above cited document.

基板材料2上にバブル磁区を保持しうるバブル
材料1が成長されており、その上に第一層目のバ
ブル磁区駆動用導体層31が設けられ、さらにそ
の上に絶縁層(図では省略)を介して第二層目の
バブル磁区駆動用導体層32が設けられている。
導体層31,32には長円形の孔パタン30が設
けられている。41,42はそれぞれ第一層目、
第二層目に流す電流で、J1,J2はそれぞれの電流
密度を表わす。11はバブル磁区で、バブル材料
1中の矢印は磁化方向を表わしている。
A bubble material 1 capable of holding a bubble magnetic domain is grown on a substrate material 2, on which a first bubble magnetic domain driving conductor layer 31 is provided, and further on top of that is an insulating layer (not shown). A second bubble magnetic domain driving conductor layer 32 is provided through the bubble magnetic domain drive layer.
An oval hole pattern 30 is provided in the conductor layers 31 and 32. 41 and 42 are the first layer, respectively.
In the current flowing through the second layer, J 1 and J 2 represent the respective current densities. 11 is a bubble magnetic domain, and the arrow in the bubble material 1 represents the magnetization direction.

導体層31についてみると、電流41(J1=1
mA/μm)により第1図Bに示すバイアス磁界
成分10を発生する。導体層31の周辺部では第
1図Bで判る様に極めて大きな磁界成分をもつて
いる。このバイアス磁界成分は導体層の中心近傍
5を除くと大きな値である。
Regarding the conductor layer 31, the current 41 (J 1 = 1
mA/μm) to generate the bias magnetic field component 10 shown in FIG. 1B. The periphery of the conductor layer 31 has an extremely large magnetic field component, as seen in FIG. 1B. This bias magnetic field component has a large value except in the vicinity 5 of the center of the conductor layer.

2μm径のバブル磁区の場合、バブル磁区が存
在するバイアス磁界マージンは40〜50エルステツ
ド(Oe)程度で、10%程度の駆動バイアスマー
ジンの減少に抑える必要があるため電流による磁
界は±4〜5エルステツド以下でなければならな
い。通常駆動電流密度J1は約4mA/μmである
ので第1図Bのバイアス磁界成分Hgの値が±1
エルステツド以下の領域が実際の素子として利用
出来るだけである。本例の場合領域5は導体層3
1の幅の約30%にすぎない。
In the case of a bubble magnetic domain with a diameter of 2 μm, the bias magnetic field margin where the bubble magnetic domain exists is about 40 to 50 oersteds (Oe), and it is necessary to suppress the reduction in the drive bias margin to about 10%, so the magnetic field due to the current is ±4 to 50 Oe. Must be less than or equal to Ersted. Since the normal drive current density J 1 is approximately 4 mA/μm, the value of the bias magnetic field component Hg in Figure 1B is ±1
Only the region below Oersted can be used as an actual device. In this example, region 5 is conductor layer 3
It is only about 30% of the width of 1.

以上の事情は第二層目の導体層32についても
全く同じである。
The above situation is exactly the same for the second conductor layer 32.

本発明によればこの素子として利用可能なバブ
ル素子の導体領域を増大することが容易に実現出
来る。
According to the present invention, it is possible to easily increase the conductor area of a bubble element that can be used as this element.

次に図面の実施例を用いて本発明を説明する。
以下の説明においてはバブル磁区駆動用導体層中
の貫通孔の描写は省略している。
Next, the present invention will be explained using examples shown in the drawings.
In the following description, depiction of through holes in the bubble magnetic domain driving conductor layer is omitted.

第2図A及びBは本発明の実施例を角度を変え
て示したものである。本発明による電流アクセス
型バブル磁区素子の構成は次の通りである。基板
材料2上に育成されたバブル材料1とその上に設
けられたバブル磁区駆動用導体層31をもつバブ
ルチツプを、前記バブル磁区駆動用導体層31と
実質的に同じ幅をもつ磁界補償用導体層35を有
する支持基板6上に適当な絶縁間隙36を介して
前記バブルチツプをバブル磁区駆動用導体層31
と磁界補償用導体層35が重なり合う様に装着す
る。支持基板6上の磁界補償用導体層35は電流
の取り出し口端子に相当する第1の部分38と電
流の取り入れ口端子37を有する第2の部分に分
けられていて、第1の部分及び第2の部分は電気
的に絶縁されている。バブル磁区駆動用導体層3
1と磁界補償用導体層35は、電流端子のある部
分とは反対側の端部において、フエイス・ダウ
ン・ボンデイング等の手法により電気的に接続さ
れている。部分38は導体部40を介してバブル
磁区駆動用導体層31に接続されている。
FIGS. 2A and 2B show an embodiment of the invention from different angles. The structure of the current access type bubble magnetic domain element according to the present invention is as follows. A bubble chip having a bubble material 1 grown on a substrate material 2 and a bubble magnetic domain driving conductor layer 31 provided thereon is connected to a magnetic field compensating conductor having substantially the same width as the bubble magnetic domain driving conductor layer 31. The bubble chip is placed on a support substrate 6 having a layer 35 with an appropriate insulating gap 36 therebetween.
and the magnetic field compensation conductor layer 35 are attached so that they overlap. The magnetic field compensation conductor layer 35 on the support substrate 6 is divided into a first part 38 corresponding to a current outlet terminal and a second part having a current inlet terminal 37. Part 2 is electrically insulated. Bubble magnetic domain drive conductor layer 3
1 and the magnetic field compensation conductor layer 35 are electrically connected to each other by a technique such as face-down bonding at the end opposite to the portion where the current terminal is located. The portion 38 is connected to the bubble domain driving conductor layer 31 via a conductor portion 40 .

本実施例を用いれば、電流端子37,38を介
してバブル磁区駆動電流を通じたとき、バブル磁
区駆動用導体層31に流れる電流41と磁界補償
用導体層35に流れる電流43は互に方向が逆で
大きさが等しいため、バブル材料1の部分に生じ
る不要なバイアス磁界成分はバブル磁区駆動用導
体層31と磁界補償用導体層35からの磁界成分
が打消し合つて実質的に存在しなくなる。即ち、
この様な構成をとるバブル磁区素子においては、
バブル磁区駆動用導体層のあるバブルチツプのほ
ぼ全域に亘つてバブル磁区駆動に対して有効な領
域が得られる。
If this embodiment is used, when a bubble magnetic domain drive current is passed through the current terminals 37 and 38, the current 41 flowing through the bubble magnetic domain drive conductor layer 31 and the current 43 flowing through the magnetic field compensation conductor layer 35 are in different directions. On the other hand, since the magnitudes are the same, the unnecessary bias magnetic field component generated in the bubble material 1 part substantially disappears because the magnetic field components from the bubble magnetic domain drive conductor layer 31 and the magnetic field compensation conductor layer 35 cancel each other out. . That is,
In a bubble magnetic domain element with such a configuration,
A region effective for driving the bubble magnetic domain can be obtained over almost the entire area of the bubble chip where the conductor layer for driving the bubble magnetic domain is located.

更に本実施例を用いれば、バブルチツプ上にバ
イアス磁界補償用導体層をバブル磁区駆動用導体
層に重ねて配線する必要がなくバブルチツプ製作
が非常に簡単になる利点が得られる。
Furthermore, if this embodiment is used, there is no need to wire the bias magnetic field compensating conductor layer over the bubble magnetic domain driving conductor layer on the bubble chip, making the manufacturing of the bubble chip extremely simple.

本発明の実施例においては、説明の簡略化のた
めにバブル磁区駆動用導体層が一層の場合につい
て説明してきた。しかしバブル磁区駆動用導体層
の数が複数であれば、それに対応して磁界補償用
導体層も複層にすれば良いことは言うまでもな
い。
In the embodiments of the present invention, the case where the bubble magnetic domain driving conductor layer is one layer has been described to simplify the explanation. However, if the number of bubble magnetic domain drive conductor layers is plural, it goes without saying that the magnetic field compensation conductor layers may also be multilayered correspondingly.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図Aは従来例を示す斜視図、第1図Bは従
来例磁界分布を示す図である。 1はバブル材料、11はバブル磁区、2は基板
材料、31,32はバブル駆動用導体層、30は
導体層に設けられた孔パタン、41,42はバブ
ル駆動用電流、10は導体層から発生するバイア
ス磁界成分の分布、5はバブル磁区転送に重大な
影響を及ぼさないバイアス磁界成分をもつ範囲で
ある。 第2図A及びBは本発明の実施例を異つた角度
から示した斜視図である。 6はバブルチツプ支持基板、35はバイアス磁
界成分補償用導体層、36は電気的絶縁間隙、3
7,38は電流端部、34,40は電気的接触部
分、41,43は電流方向を示す。
FIG. 1A is a perspective view showing a conventional example, and FIG. 1B is a diagram showing a magnetic field distribution in the conventional example. 1 is a bubble material, 11 is a bubble magnetic domain, 2 is a substrate material, 31 and 32 are conductor layers for driving bubbles, 30 is a hole pattern provided in the conductor layer, 41 and 42 are currents for driving bubbles, and 10 is from the conductor layer Distribution 5 of the generated bias magnetic field components is a range having bias magnetic field components that do not have a significant effect on bubble domain transfer. FIGS. 2A and 2B are perspective views showing an embodiment of the invention from different angles. 6 is a bubble chip support substrate, 35 is a conductor layer for bias magnetic field component compensation, 36 is an electrical insulation gap, 3
7 and 38 are current ends, 34 and 40 are electrical contact portions, and 41 and 43 are current directions.

Claims (1)

【特許請求の範囲】 1 バブル磁区を保持し得るバブル材料と該バブ
ル材料上に設けられたバブル磁区駆動電流を流す
少くとも一層のバブル磁区駆動用導体層をもつバ
ブルチツプを、前記バブル磁区駆動用導体層と実
質的に同じ幅をもつ磁界補償用導体層を有する支
持基板上に、絶縁間隙を介してバブル磁区駆動用
導体層と磁界補償用導体層が実質的に重なり合う
様に装着して成り、両導体層に逆方向の電流を通
すことを特徴とする電流アクセス型バブル磁区素
子。 2 バブル磁区駆動用導体層と磁界補償用導体層
は対向した一端部で電気的に接触を保つている特
許請求の範囲第1項に記載の電流アクセス型バブ
ル磁区素子。
[Scope of Claims] 1. A bubble chip having a bubble material capable of holding a bubble magnetic domain and at least one bubble magnetic domain driving conductor layer provided on the bubble material through which a bubble magnetic domain driving current flows, is used for driving the bubble magnetic domain. A conductor layer for driving a bubble magnetic domain and a conductor layer for magnetic field compensation are mounted on a supporting substrate having a conductor layer for magnetic field compensation having substantially the same width as the conductor layer so as to substantially overlap each other with an insulating gap in between. , a current access type bubble magnetic domain element characterized by passing current in opposite directions through both conductor layers. 2. The current access type bubble magnetic domain element according to claim 1, wherein the bubble magnetic domain drive conductor layer and the magnetic field compensation conductor layer maintain electrical contact at one opposing end.
JP17072279A 1979-12-27 1979-12-27 Bubble magnetic domain element of current access type Granted JPS5694570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17072279A JPS5694570A (en) 1979-12-27 1979-12-27 Bubble magnetic domain element of current access type

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17072279A JPS5694570A (en) 1979-12-27 1979-12-27 Bubble magnetic domain element of current access type

Publications (2)

Publication Number Publication Date
JPS5694570A JPS5694570A (en) 1981-07-31
JPS6226113B2 true JPS6226113B2 (en) 1987-06-06

Family

ID=15910172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17072279A Granted JPS5694570A (en) 1979-12-27 1979-12-27 Bubble magnetic domain element of current access type

Country Status (1)

Country Link
JP (1) JPS5694570A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56114190A (en) * 1980-02-15 1981-09-08 Nec Corp Current access type bubble magnetic-domain element
JPS5829189A (en) * 1981-08-13 1983-02-21 Nec Corp Unilayer conductor type current driving magnetic bubble element
JPS5857690A (en) * 1981-10-02 1983-04-05 Nec Corp Current driven magnetic bubble element of single layer conductor type

Also Published As

Publication number Publication date
JPS5694570A (en) 1981-07-31

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