JPS6226024B2 - - Google Patents

Info

Publication number
JPS6226024B2
JPS6226024B2 JP3296081A JP3296081A JPS6226024B2 JP S6226024 B2 JPS6226024 B2 JP S6226024B2 JP 3296081 A JP3296081 A JP 3296081A JP 3296081 A JP3296081 A JP 3296081A JP S6226024 B2 JPS6226024 B2 JP S6226024B2
Authority
JP
Japan
Prior art keywords
plate
mount
attached
holder
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3296081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57146253A (en
Inventor
Hiromitsu Azumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP3296081A priority Critical patent/JPS57146253A/ja
Publication of JPS57146253A publication Critical patent/JPS57146253A/ja
Publication of JPS6226024B2 publication Critical patent/JPS6226024B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP3296081A 1981-03-05 1981-03-05 Block copy producing table Granted JPS57146253A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3296081A JPS57146253A (en) 1981-03-05 1981-03-05 Block copy producing table

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3296081A JPS57146253A (en) 1981-03-05 1981-03-05 Block copy producing table

Publications (2)

Publication Number Publication Date
JPS57146253A JPS57146253A (en) 1982-09-09
JPS6226024B2 true JPS6226024B2 (enrdf_load_stackoverflow) 1987-06-05

Family

ID=12373483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3296081A Granted JPS57146253A (en) 1981-03-05 1981-03-05 Block copy producing table

Country Status (1)

Country Link
JP (1) JPS57146253A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0353825U (enrdf_load_stackoverflow) * 1989-09-29 1991-05-24

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0353825U (enrdf_load_stackoverflow) * 1989-09-29 1991-05-24

Also Published As

Publication number Publication date
JPS57146253A (en) 1982-09-09

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