JPS6226024B2 - - Google Patents
Info
- Publication number
- JPS6226024B2 JPS6226024B2 JP3296081A JP3296081A JPS6226024B2 JP S6226024 B2 JPS6226024 B2 JP S6226024B2 JP 3296081 A JP3296081 A JP 3296081A JP 3296081 A JP3296081 A JP 3296081A JP S6226024 B2 JPS6226024 B2 JP S6226024B2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- mount
- attached
- holder
- mounting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 238000005452 bending Methods 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3296081A JPS57146253A (en) | 1981-03-05 | 1981-03-05 | Block copy producing table |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3296081A JPS57146253A (en) | 1981-03-05 | 1981-03-05 | Block copy producing table |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57146253A JPS57146253A (en) | 1982-09-09 |
| JPS6226024B2 true JPS6226024B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-06-05 |
Family
ID=12373483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3296081A Granted JPS57146253A (en) | 1981-03-05 | 1981-03-05 | Block copy producing table |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57146253A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0353825U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1989-09-29 | 1991-05-24 |
-
1981
- 1981-03-05 JP JP3296081A patent/JPS57146253A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0353825U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1989-09-29 | 1991-05-24 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57146253A (en) | 1982-09-09 |