JPS62259774A - Manufacture of polishing chip - Google Patents
Manufacture of polishing chipInfo
- Publication number
- JPS62259774A JPS62259774A JP8658186A JP8658186A JPS62259774A JP S62259774 A JPS62259774 A JP S62259774A JP 8658186 A JP8658186 A JP 8658186A JP 8658186 A JP8658186 A JP 8658186A JP S62259774 A JPS62259774 A JP S62259774A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- rope
- mixture
- chips
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 46
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 239000011256 inorganic filler Substances 0.000 claims abstract description 12
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 12
- 238000001816 cooling Methods 0.000 claims abstract description 5
- 239000008188 pellet Substances 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims description 7
- 229920001169 thermoplastic Polymers 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 10
- 239000011148 porous material Substances 0.000 abstract description 9
- 230000002093 peripheral effect Effects 0.000 abstract description 3
- 239000012815 thermoplastic material Substances 0.000 abstract 2
- 238000001125 extrusion Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 239000012766 organic filler Substances 0.000 abstract 1
- 239000004033 plastic Substances 0.000 description 10
- 229920003023 plastic Polymers 0.000 description 10
- 239000000843 powder Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- 238000005187 foaming Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- -1 polyethylene Polymers 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 241001474791 Proboscis Species 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は例えばバレル研磨等に用いられる研磨用チップ
に関するものであSo
〔発明の背景〕
スプーン、パチンコ玉等の金属製品の研磨、あるいはプ
ラスチック成形品のパリ取シ等にはこれら被処理物を研
磨用チップと共にバレルに充填し、該バレルを揺動もし
くは回転させて該被処理物を該研磨用チップによって研
磨するいわゆるバレル研磨が適用される。このようなバ
レル研磨は通常粗研磨と仕上げ研磨とが行われる。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a polishing tip used, for example, in barrel polishing, etc. [Background of the Invention] Polishing of metal products such as spoons and pachinko balls, or plastics. For deburring molded products, etc., so-called barrel polishing is applied, in which the object to be processed is filled into a barrel together with a polishing chip, and the barrel is oscillated or rotated to polish the object with the polishing chip. Ru. Such barrel polishing usually includes rough polishing and final polishing.
従来、この種の研磨用チップとしてはプラスチックと無
機充填材との混合物が材料として用いられていた(特開
昭51−147093号公報、特開昭55−15746
9号公報、特開昭59−129659号公報)。そして
粗研磨を行なうためには表面が粗大凹凸面である粗研磨
用チップを用い、仕上げ研磨を行なうためには表面が微
細凹凸面である仕上げ研磨用チップを用いるものであっ
た。このような方法では二段処理が必要となるからその
手間を省くために粗研磨用チップと仕上げ研磨用チップ
とを混合して用いることも行われている。Conventionally, a mixture of plastic and inorganic filler has been used as a material for this type of polishing tip (Japanese Patent Application Laid-open Nos. 51-147093 and 1982-15746).
No. 9, JP-A-59-129659). In order to carry out rough polishing, a rough polishing tip having a coarsely uneven surface is used, and in order to carry out final polishing, a final polishing tip having a finely uneven surface is used. Since such a method requires two-stage processing, in order to save time and effort, a mixture of rough polishing chips and final polishing chips is used.
更に該研磨用チップ内部に気孔を設けて研磨用チップの
比重を調節したり、被処理材に対する衝撃力を緩和して
被処理材表面の傷付きを解消したシすることが試みられ
ている(特公昭50−39870号公報、特開昭60−
242960号公報)。Furthermore, attempts have been made to adjust the specific gravity of the polishing chip by providing pores inside the polishing chip, and to reduce the impact force on the workpiece to eliminate scratches on the surface of the workpiece. Japanese Patent Publication No. 50-39870, Japanese Patent Publication No. 1986-
242960).
上記従来技術においては粗研磨用チップと仕上げ研磨用
チップとの二種類を作成する必要があり、壕だ粗研磨用
チップと仕上げ研磨用チップを混合する場合には使用後
にこれらを分離することが困難になるC−また研磨用チ
ップ内部に気孔を設けたものでは該気孔は研磨用チップ
内に閉鎖されているので気孔内に閉込められている空気
が完全弾性体挙動を示し、被処理物に対する衝繋力は緩
和されるが研磨用チップが被処理材に衝突すると上記空
気の完全弾性体挙動によって研磨材チップが被処理材面
でゴムマリ状にはずんでしまい、チップ内の無機充填材
が被処理材面に緊密に接触せず研磨効率が著るしく低下
する。しだがってこのような研磨用チップは例えばジー
パン等の衣類のような柔軟な被処理材をほぐす場合に用
いられる程度のものであった。In the above-mentioned conventional technology, it is necessary to create two types of chips, one for rough polishing and one for final polishing, and when mixing the chips for grooved rough polishing and the chips for final polishing, it is necessary to separate them after use. C-Also, in the polishing tip with pores, the pores are closed inside the polishing tip, so the air trapped in the pores behaves as a completely elastic body, and the object to be processed is However, when the abrasive chip collides with the material to be treated, the perfectly elastic behavior of the air causes the abrasive chip to bounce on the surface of the material to be treated like a rubber ball, and the inorganic filler inside the chip is It does not come into close contact with the surface of the material to be treated, resulting in a significant drop in polishing efficiency. Therefore, such abrasive chips have only been used for loosening soft materials to be treated, such as clothing such as jeans.
本発明は上記従来の問題点を解決する手段として、熱可
塑性プラスチックと、無機充填材と、揮発性物質との混
合物を押出機(1)にて加熱溶融して紐状に押出し、冷
却前もしくは冷却後において上記押出された紐状体を所
定長さに切断してペレット状とする研磨用チップの製造
方法を提供するものである。The present invention, as a means to solve the above-mentioned conventional problems, heat-melts a mixture of thermoplastic plastic, inorganic filler, and volatile substance in an extruder (1) and extrudes it into a string shape. The present invention provides a method for manufacturing a polishing chip in which the extruded string-like body is cut into predetermined lengths to form pellets after cooling.
本発明に用いられる熱可塑性プラスチックとはポリアミ
ド、ポリエチレン、ポリプロピレン、アクリロニトリル
−ブタジェン−スチレン樹脂、ポリ塩化ビニル等広範囲
にわたるが、被処理材の硬度等により該プラスチックの
種類は適轟に選択せられるべきである。The thermoplastic plastics used in the present invention include polyamide, polyethylene, polypropylene, acrylonitrile-butadiene-styrene resin, polyvinyl chloride, etc., but the type of plastic should be selected appropriately depending on the hardness of the material to be treated. It is.
本発明に用いられる無機充填材とは砥石粉、セラミック
粉、ガラス粉、金属粉、セラミック繊維。The inorganic fillers used in the present invention include grindstone powder, ceramic powder, glass powder, metal powder, and ceramic fiber.
ガラス繊維、金属繊維等の硬質な無機材料の粉状。Powdered hard inorganic materials such as glass fibers and metal fibers.
繊維状、あるいは鱗片状等の微小体である。It is a microscopic body that is fibrous or scaly.
本発明に用いられる揮発性物質としては水、ドルオール
、キジロール、酢酸エチル、酢酸ブチル。Volatile substances used in the present invention include water, doluol, quidylol, ethyl acetate, and butyl acetate.
メチルエチルケトン、メチルイソブチルケトン。Methyl ethyl ketone, methyl isobutyl ketone.
メタノール、エタノール、イングロバノール、ブタノー
ル、セロソルブアセテート、ブチルセロソルブ、トリク
ロロエタン、四塩化炭素、ミネラルスピリット等の有機
溶剤が用いられる。Organic solvents such as methanol, ethanol, inglobanol, butanol, cellosolve acetate, butyl cellosolve, trichloroethane, carbon tetrachloride, mineral spirit, etc. are used.
上記プラスチックと上記無機充填材との混合比率は被処
理物の硬度等によっても異なるが、通常プラスチック1
00重量部に対して無機充填材は30〜80重量部が混
合される。The mixing ratio of the above plastic and the above inorganic filler varies depending on the hardness of the material to be treated, etc., but it is usually plastic 1
00 parts by weight, the inorganic filler is mixed in an amount of 30 to 80 parts by weight.
上記プラスチックと上記無機充填材との混合物に添加さ
れる揮発性物質の添加量は該揮発性物質の沸点、所望の
発泡状態、プラスチックの種類等によって種々に調節さ
れるが、一般に揮発性物質が水である場合にはプラスチ
ックに対して05〜2.5重鷲係、望ましくは1〜2重
量%とされる。The amount of the volatile substance added to the mixture of the plastic and the inorganic filler can be adjusted in various ways depending on the boiling point of the volatile substance, the desired foaming state, the type of plastic, etc. When water is used, the amount is 0.5 to 2.5% by weight, preferably 1 to 2% by weight, based on the plastic.
何となれば水の添加量が上記範囲以下では得られるチッ
プが低発泡状態となりクッション効果が充分でないし、
上記範囲以上では発泡が過度となり押出機から紐状に押
出すことに支障をきたす。If the amount of water added is less than the above range, the chips obtained will be in a low foaming state and the cushioning effect will not be sufficient.
If it exceeds the above range, foaming will be excessive and it will be difficult to extrude it into a string from an extruder.
本発明の作用は下記の通りである。 The effects of the present invention are as follows.
熱可塑性プラスチックと、無機充填材と、揮発性物質と
の混合物を押出機にて加熱溶融して紐状に押出すと揮発
性物質は該溶融混合物が押出機のダイスから押出された
直後に気化して押出された紐状体を発泡構造にするが、
該紐状体の周面、即ちダイス内壁との接触部にはスキン
層が形成され紐状体内の気孔は開口しておらず、スキン
層表面に微細なしわが形成されるにとどまる。該紐状体
を所定の長さに切断すればその切断面には紐状体内の気
孔が開口する。したがって本発明の製造方法によれば周
面に微細凹凸面を有し、切断面に粗大凹凸面を有する研
磨用チップが得られる。When a mixture of a thermoplastic plastic, an inorganic filler, and a volatile substance is heated and melted using an extruder and extruded into a string, the volatile substance is released into the air immediately after the molten mixture is extruded from the die of the extruder. The extruded string-like body is made into a foamed structure.
A skin layer is formed on the circumferential surface of the string-like body, that is, the contact portion with the inner wall of the die, and the pores in the string-like body are not open, and only fine wrinkles are formed on the surface of the skin layer. When the string-like body is cut to a predetermined length, pores in the string-like body are opened at the cut surface. Therefore, according to the manufacturing method of the present invention, a polishing chip having a finely uneven surface on the peripheral surface and a coarsely uneven surface on the cut surface can be obtained.
本発明の研磨用チップと被処理材とを混合する。The polishing tip of the present invention and the material to be treated are mixed.
該混合物を例えばバレル等に投入して揺動もしくは回転
すると、被処理材はまず研磨用チップの粗大凹凸面でチ
ップを構成するプラスチックおよび゛含有する無機充填
材により粗研磨され、その後微細凹凸面で仕上げ研磨さ
れる。このような研磨の工程中において、被処理材表面
に研磨用チップが衝突しその衝撃によう研磨用チップは
変形するがこの際気孔内の空気が開口部から外部に排除
される。したがって研磨用チップは完全弾性体挙動を示
さず被処理材表面でゴムマリ状にはずむことなく、良好
なりッション性を持って衝突し、研磨用チップ内の無機
充填材が緊密に被処理材表面に接触する。When the mixture is placed in, for example, a barrel and shaken or rotated, the material to be treated is first roughly polished by the coarsely uneven surface of the polishing chip by the plastic that constitutes the chip and the inorganic filler it contains, and then by the finely uneven surface. The finish is polished. During such a polishing process, the polishing tip collides with the surface of the material to be treated, and the polishing tip is deformed by the impact, but at this time, the air in the pores is expelled to the outside from the opening. Therefore, the abrasive tip does not behave as a perfectly elastic body and does not bounce like a rubber ball on the surface of the material to be treated, but it collides with good cushioning properties, and the inorganic filler inside the abrasive tip is tightly attached to the surface of the material to be treated. Contact.
したがって本発明においては一種類の研磨用チップによ
って粗研磨と仕上げ研磨とを同時に行なうことが出来、
まだ良好なりッション性によって被処理材表面を傷付け
ることなく効率よく研磨することが出来る。Therefore, in the present invention, rough polishing and final polishing can be performed simultaneously with one type of polishing tip.
Due to its good cushioning properties, it is possible to efficiently polish the surface of the treated material without damaging it.
ナイロン1250重量部と砥石粉50重量部、水1.5
重量部の混合物を第1図に示す押出機(1)のホッパー
(2)に投入してダイス(3)から紐状に押出し、押出
された紐状成形物(4)は水N(5)内の水(6)に投
入して冷却するが、該紐状成形物(4)はダイス(3)
から押出された直後で内部の水分が蒸発し発泡構造とな
る。該紐状成形物(4)は冷却後水(6)から取出され
、カッター(7)により切断されてペレット状のチップ
(8)となる。該チップ(8)は第2図および第3図に
示すように押出機(1)のダイス(3)と接融する周面
;て微細なしわ状の凹凸を有するスキン層1101が形
成され該スキン層(Ill)表面が微細凹凸面圓となり
、またカッターによる前後の切断面には発泡構造が露出
して気孔α■が開口し粗大凹凸面(6)となる。このよ
うな微細凹凸面α1)と粗大凹凸面t1→とを有する研
磨用チップ(8)を用いて研磨すると、粗研磨と仕上げ
研磨とを同時に行なうことが出来る。1250 parts by weight of nylon, 50 parts by weight of whetstone powder, 1.5 parts by weight of water
Part by weight of the mixture is put into the hopper (2) of the extruder (1) shown in Fig. 1 and extruded into a string from the die (3), and the extruded string-like molded product (4) contains water N (5). The string-like molded product (4) is put into the water (6) in the die (3) and cooled.
Immediately after being extruded, the moisture inside evaporates and forms a foamed structure. After cooling, the string-like molded product (4) is taken out from the water (6) and cut into pellet-like chips (8) by a cutter (7). As shown in FIGS. 2 and 3, the chip (8) has a peripheral surface that is fused with the die (3) of the extruder (1); a skin layer 1101 having fine wrinkle-like unevenness is formed thereon. The surface of the skin layer (Ill) becomes a finely uneven surface (6), and the foamed structure is exposed on the front and rear cut surfaces by the cutter, and the pores α■ are opened to form a coarsely uneven surface (6). When polishing is performed using a polishing chip (8) having such a finely uneven surface α1) and a coarsely uneven surface t1→, rough polishing and final polishing can be performed simultaneously.
上記実施例以外チップ(8)には帯電防止剤が塗布ある
いは含浸されるか、あるいはプラスチックに帯電防止剤
が練込まれていてもよい。上記のような帯電防止剤の添
加はチップ(8)に研磨粉が静電的に付着することを防
止するものである。In addition to the above embodiments, the chip (8) may be coated or impregnated with an antistatic agent, or the antistatic agent may be kneaded into plastic. Addition of the antistatic agent as described above prevents polishing powder from electrostatically adhering to the chip (8).
第1図〜第3図は本発明の一実施例を示すものであり、
第1図は製造工程図、第2図はテング側断面図、第3図
はチップ斜視図である。
図中 (1)・・・押出機
(4)・・・紐状成形物
(8)・・・チップ
特許出願人 アロン化成株式会社
才]図
計 2 図
″+3図1 to 3 show an embodiment of the present invention,
FIG. 1 is a manufacturing process diagram, FIG. 2 is a sectional side view of the proboscis, and FIG. 3 is a perspective view of the chip. In the figure (1)...Extruder (4)...String-like molded product (8)...Chip patent applicant Aron Kasei Co., Ltd.] Diagram 2 Diagram ''+3 Diagram
Claims (1)
との混合物を押出機にて加熱溶融して紐状に押出し、冷
却前もしくは冷却後において上記押出された紐状体を所
定長さに切断してペレット状とすることを特徴とする研
磨用チップの製造方法A mixture of a thermoplastic plastic, an inorganic filler, and a volatile substance is heated and melted in an extruder and extruded into a string, and the extruded string is cut into a predetermined length before or after cooling. A method for manufacturing a polishing chip, characterized in that the chip is made into a pellet.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8658186A JPS62259774A (en) | 1986-04-15 | 1986-04-15 | Manufacture of polishing chip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8658186A JPS62259774A (en) | 1986-04-15 | 1986-04-15 | Manufacture of polishing chip |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62259774A true JPS62259774A (en) | 1987-11-12 |
JPH0569665B2 JPH0569665B2 (en) | 1993-10-01 |
Family
ID=13890970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8658186A Granted JPS62259774A (en) | 1986-04-15 | 1986-04-15 | Manufacture of polishing chip |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62259774A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01182029A (en) * | 1988-01-14 | 1989-07-19 | Aron Kasei Co Ltd | Preparation of barrel polishing medium |
JP2001287165A (en) * | 2000-04-04 | 2001-10-16 | Tipton Mfg Corp | Barrel polishing media, manufacturing method therefor, and barrel polishing method |
JP2001322069A (en) * | 2000-05-12 | 2001-11-20 | Ujiden Chemical Industry Co Ltd | Polishing medium |
CN105437098A (en) * | 2015-12-18 | 2016-03-30 | 郑州磨料磨具磨削研究所有限公司 | Pellet die positioning device and abrasive disc abrasive material pellet die unloader |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495715A (en) * | 1972-05-13 | 1974-01-18 | ||
JPS5027949A (en) * | 1973-06-07 | 1975-03-22 | ||
JPS60242960A (en) * | 1984-05-17 | 1985-12-02 | Tipton Mfg Corp | Porous resin media and its manufacturing method |
-
1986
- 1986-04-15 JP JP8658186A patent/JPS62259774A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495715A (en) * | 1972-05-13 | 1974-01-18 | ||
JPS5027949A (en) * | 1973-06-07 | 1975-03-22 | ||
JPS60242960A (en) * | 1984-05-17 | 1985-12-02 | Tipton Mfg Corp | Porous resin media and its manufacturing method |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01182029A (en) * | 1988-01-14 | 1989-07-19 | Aron Kasei Co Ltd | Preparation of barrel polishing medium |
JP2001287165A (en) * | 2000-04-04 | 2001-10-16 | Tipton Mfg Corp | Barrel polishing media, manufacturing method therefor, and barrel polishing method |
JP2001322069A (en) * | 2000-05-12 | 2001-11-20 | Ujiden Chemical Industry Co Ltd | Polishing medium |
CN105437098A (en) * | 2015-12-18 | 2016-03-30 | 郑州磨料磨具磨削研究所有限公司 | Pellet die positioning device and abrasive disc abrasive material pellet die unloader |
Also Published As
Publication number | Publication date |
---|---|
JPH0569665B2 (en) | 1993-10-01 |
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