JPS62250988A - Apparatus for making ultrapure water - Google Patents
Apparatus for making ultrapure waterInfo
- Publication number
- JPS62250988A JPS62250988A JP9210186A JP9210186A JPS62250988A JP S62250988 A JPS62250988 A JP S62250988A JP 9210186 A JP9210186 A JP 9210186A JP 9210186 A JP9210186 A JP 9210186A JP S62250988 A JPS62250988 A JP S62250988A
- Authority
- JP
- Japan
- Prior art keywords
- water
- ultrapure water
- line
- permeated
- ultrapure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 56
- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 55
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 73
- 238000004519 manufacturing process Methods 0.000 claims abstract description 16
- 238000001223 reverse osmosis Methods 0.000 claims abstract description 13
- 239000012528 membrane Substances 0.000 claims abstract description 11
- 230000003204 osmotic effect Effects 0.000 claims abstract description 4
- 238000001514 detection method Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract 1
- 230000000630 rising effect Effects 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 230000007423 decrease Effects 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 239000012466 permeate Substances 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 238000010612 desalination reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/38—Gas flow rate
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
【発明の詳細な説明】
（並業上の利用分野〕
本発明は超純水製造装置に係り、特に医薬、半導体製造
工業に適用して好適な超純水製造装置に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION (Field of Commercial Use) The present invention relates to an ultrapure water production apparatus, and particularly to an ultrapure water production apparatus suitable for application to the pharmaceutical and semiconductor manufacturing industries.
医薬を製造する製薬工業や、半導体を製造する電子工業
では極めて純度の高い水を必要としている。例えば、集
積回路（ＩＣ）や大規模集積回路（ＬＳＩ）等の精密な
半導体の製造にはその洗浄水の純度が直接製品の歩留り
に関与することになり、水の高純度化が重要な問題とな
っている。The pharmaceutical industry, which manufactures medicines, and the electronic industry, which manufactures semiconductors, require water of extremely high purity. For example, in the manufacture of precision semiconductors such as integrated circuits (ICs) and large-scale integrated circuits (LSIs), the purity of the cleaning water directly affects the product yield, and high purity water is an important issue. It becomes.
従来この種の装置としては＃願昭５９−１８０６１０に
ｉ己載のものが知られている。Conventionally, as this type of device, the one published in #Gan Sho 59-180610 is known.
第３図において、原水は原水供給ライン１企経て一旦、
中間タンク４に貯えらｎる。この原水は高圧ポンプ２に
よって逆浸透ＰＡ３に浸透圧以上の加圧下で供給さ扛、
水中の塩類が除去さｎる。次に逆浸透膜３により脱塩さ
扛た透過水は、透過水ライン７を経て自由液面を有する
中間タンク５に貯水される。一方、逆浸透膜３によって
生成さｎた濃縮水は漠縮ライン８を通って排水される。In Figure 3, raw water passes through one raw water supply line, and then
It is stored in the intermediate tank 4. This raw water is supplied to the reverse osmosis PA 3 by a high-pressure pump 2 under pressure higher than the osmotic pressure.
Salts in the water are removed. Next, the permeated water that has been desalinated by the reverse osmosis membrane 3 passes through a permeated water line 7 and is stored in an intermediate tank 5 having a free liquid level. On the other hand, the concentrated water produced by the reverse osmosis membrane 3 is drained through the drainage line 8.
中間タンク５内の透過水、すなわち処理水は循環ポンプ
６によって処理水に含まｎる微粒子、電解質などを除去
するボリノシャ、９ａ、９ｃ紫外線殺菌器９ｈ、限外濾
過膜９ｄなどから構成される超、純水化構成機器９によ
り最終的に処理さｎた後ユースポイントライ／１０′ｆ
：経てユースポイント１１に送られ洗浄用水に供される
。また、ユースポイン１−１１で使用さｎなかった超純
水（処理水）は循環ライン１２を経て中間タンク５に戻
される。The permeated water in the intermediate tank 5, that is, the treated water, is passed through a circulation pump 6 that removes fine particles, electrolytes, etc. contained in the treated water. , after being finally processed by the water purification component 9, the use point dry/10'f
: The water is then sent to use point 11 and used as cleaning water. Further, ultrapure water (treated water) that is not used at the use point 1-11 is returned to the intermediate tank 5 via the circulation line 12.
このように未使用の超純水は、中間夕／り５−循環ポン
プ６−透過水ライン７′−超純水化７’；成機器９−ユ
ースボイ／トラインｌ〇−循環うｆン１２の如く常に循
環して水質の劣化を防止するように構成されている。In this way, the unused ultrapure water is transferred to the intermediate pump 5 - circulation pump 6 - permeated water line 7' - ultrapure water production 7'; The system is designed to constantly circulate water to prevent deterioration of water quality.
〔発明尋来が解決しようとする問題点〕上記超純水製造
装置においては、常時循環運転されており、各種機器に
は高純度を維持するために負荷刃物ｌわジ、消耗が促進
ざｎ定期的にメンテナンスが要求さｎる。[Problem that the inventor seeks to solve] In the ultrapure water production equipment mentioned above, circulation is constantly operated, and in order to maintain high purity, various equipment is loaded with cutting tools, which accelerates wear and tear. Regular maintenance is required.
ところで、前記循環運転においては、ユースポイント１
１での使用水量が少ない場合にも未使用の超純水は超純
水量ヒ構成機器９を通水するようになっている。このた
め、逆浸透膜や逆浸透膜３からの透過水をさらに脱塩処
理する。イオン交換樹脂などを備えたボリツシャ９ａに
は常時、高負荷が加わるため、イオン交換樹脂の構成な
どメンテナンス回数が増加して超純水の製造コストヲ増
大させる。By the way, in the above circulation operation, use point 1
Even when the amount of water used in step 1 is small, unused ultrapure water is passed through the ultrapure water amount component device 9. For this reason, the permeated water from the reverse osmosis membrane or the reverse osmosis membrane 3 is further subjected to desalination treatment. Since a high load is constantly applied to the borisha 9a equipped with an ion exchange resin, etc., the frequency of maintenance of the configuration of the ion exchange resin increases, which increases the cost of producing ultrapure water.
本発明の目的は、製造コストの低減を図るようにした超
純水使用量ｒＩＬを提供することにある。An object of the present invention is to provide an ultrapure water usage amount rIL that is designed to reduce manufacturing costs.
〔問題点を解決するための手段」
上記目的は、超純水化構成機器人口側の透過水ラインと
循環ラインとにバイパスラインを接続し、このバイパス
ラインに、超純水化構成機器に通水さｎる透過水量を調
節するための流鼠調節弁を設けることにより達成さｎる
。[Means for solving the problem] The above purpose is to connect a bypass line to the permeate line and circulation line on the population side of the ultrapure water component, and to connect this bypass line to the ultrapure water component. This is achieved by providing a flow control valve for regulating the amount of permeated water.
本発明は、ユースポイント送水ラインの圧力がユースポ
イントでの超純水使用量に対応して変化する点に層目し
、バイパスラインに設けた流！調節弁を動作させて、超
純水化構成機器への透過水の通水量を制御するように構
成する。この構成により、ユースポイントでの使用水量
が減少した場合、ユースポイント送水ラインの圧力上昇
を検出して流ｊ１節升を開く方向に動作させ、超純水化
構成機器への透過水の通水量を減少させると共にバイパ
スラインへの透過水量を増加させる。そ往によって、超
純水化構成機器への負荷低減が図ｎるため、超純水の製
造コストが増大することはない。The present invention focuses on the point that the pressure of the water supply line at the point of use changes in response to the amount of ultrapure water used at the point of use, and the flow provided in the bypass line! The control valve is configured to operate to control the amount of permeated water flowing to the ultrapure water component. With this configuration, when the amount of water used at the point of use decreases, the increase in pressure in the point of use water supply line is detected and the flow is operated in the direction of increasing the flow rate, reducing the amount of permeated water flowing to the ultrapure water component equipment. and increase the amount of permeated water to the bypass line. As a result, the load on the ultrapure water component equipment is reduced, so the cost of producing ultrapure water does not increase.
以下本発明装置の一実施例を図面によシ説明する。 An embodiment of the apparatus of the present invention will be explained below with reference to the drawings.
第１図および第２図に訃いて、第３図と同一符号のもの
は同一部分を示すっ
第１図において、１３は逆浸透膜３から透過さ扛る透過
水を透過水ライン７から分岐して循環ライン１２に戻す
すなわち透過水を前記超純水化構成機器９の入口側から
循環ライン１２を介して高圧ポンプ２の吸込側に戻すバ
イパスラインで、このバイパスライン１３は透過水ライ
ン７と循環ライン１２とに接続さｎている。１４はバイ
パスライン１３の途中に設けた流量６Ａ整弁の例えば′
電磁弁で、この′電磁弁１４ｖ′ｉユースポイントライ
ンｌＯの圧力に応じて動作し、透過水ライン７の透過水
？高圧ポンプ２の吸込側に戻すようにして超純水化構成
機器９への透過水の通水量を制限する。1 and 2, the same reference numerals as in FIG. 3 indicate the same parts. In FIG. This bypass line 13 is a bypass line that returns the permeated water to the circulation line 12 from the inlet side of the ultrapure water component 9 to the suction side of the high pressure pump 2 via the circulation line 12. and the circulation line 12. 14 is a flow rate 6A regulating valve provided in the middle of the bypass line 13, for example '
The solenoid valve operates according to the pressure of this solenoid valve 14v'i use point line lO, and the permeated water in the permeated water line 7? The amount of permeated water flowing to the ultrapure water component 9 is limited by returning it to the suction side of the high pressure pump 2.
１５はユースポイントライン１０の圧力を検出する圧力
検出器の例えば圧力スイッチ、１６は前記圧力スイッチ
１５からの検出信号にもとづいて′１磁弁への動作信号
に変換する制０１１Ｉ装置。１７は循環ライン１２と高
圧ポンプ２の吸込側の原水供給ライン１の間に設けたチ
ェック弁で、このチエソり弁１７は原水が循環ライン１
２に流入するのを防止する。Reference numeral 15 denotes a pressure sensor, such as a pressure switch, for detecting the pressure of the use point line 10, and reference numeral 16 denotes a control device that converts a detection signal from the pressure switch 15 into an operation signal for the magnetic valve '1. 17 is a check valve installed between the circulation line 12 and the raw water supply line 1 on the suction side of the high-pressure pump 2;
2. Preventing water from flowing into 2.
次に上記構成による動作について説明する原水は原子供
給ライン１と通って高圧ポンプ２に導かｎる高圧ポンプ
２は原水を逆授透ＢＡ３に浸透圧以上に加圧して供給す
る１、逆浸透膜３で脱塩さｎた透過水は超純水化構成機
器９に透過水ライン７を介して供給さｎる、そして純水
化構成機器９を経た超純水（処理水）はユースポイント
１ｌＩＣ送られ洗浄水に供さｎ、＊りは循環ライン１２
を経て高圧ポンプ２の吸込側に戻さｎる。ユースポイン
ト１１において超純水を使用しない場合にも高圧ポンプ
２は連続運転される。Next, we will explain the operation of the above configuration. Raw water passes through the atomic supply line 1 and is guided to the high pressure pump 2. The high pressure pump 2 supplies the raw water to the reverse osmosis BA3 under pressure above the osmotic pressure 1, and the reverse osmosis membrane. The permeated water desalinated in step 3 is supplied to the ultrapure water component 9 via the permeate line 7, and the ultrapure water (treated water) that has passed through the water purification component 9 is used at the use point 1IC. The sent cleaning water is supplied to the circulation line 12.
is returned to the suction side of the high-pressure pump 2. Even when ultrapure water is not used at the use point 11, the high pressure pump 2 is continuously operated.
上記の動作状態において、ユースポイントｌｌでの超純
水使用水量が減少すると、ユースポイント送水ライン１
０の圧力は上昇する。Under the above operating conditions, when the amount of ultrapure water used at use point 1 decreases, use point water supply line 1
0 pressure increases.
本発明においては、この圧力上昇を圧力スイッチ１５に
より検出すると共にこの検出信号は制御］［１６に人力
される。この制御装［１１１６は検出信号に応じて電磁
弁１４を動作させる。この１磁弁１４の動作によ！ｌｌ
透過水はバイパスライン１３を経て高圧タンク２の吸込
側に戻さｎるため、超純水化構成機器９への通水量が制
限さｎ、超純水化構成機器９への透過水量が減少する、
このため。In the present invention, this pressure increase is detected by the pressure switch 15, and this detection signal is manually input to the control][16. This control device [1116] operates the solenoid valve 14 according to the detection signal. Due to the operation of this single magnetic valve 14! ll
Since the permeated water is returned to the suction side of the high-pressure tank 2 via the bypass line 13, the amount of water flowing to the ultrapure water component 9 is limited, and the amount of permeated water to the ultrapure water component 9 is reduced. ,
For this reason.
超純水化構成機器９０時にボリツシャ９ａなどへの負荷
が減少するため、ボリツシャに備えらｎるイオン９．換
樹脂の構成などのメンテナンス回数が減少する。Since the load on the ultrapure water component equipment 90, such as the borisha 9a, is reduced, the ions 9. The frequency of maintenance such as changing resin composition is reduced.
また、ユースポイント１１での便用水源が増大した場合
には、ユースポイント送水ラインの圧力が減少するため
、バイパスライン１３から高圧ポンプ２の吸込側への透
過水量も減少する。Moreover, when the toilet water source at the use point 11 increases, the pressure of the use point water supply line decreases, and the amount of permeated water from the bypass line 13 to the suction side of the high-pressure pump 2 also decreases.
上述した如く本発明においては、ユースポイントでの超
純水使用量に対応した装置運転が可能であり、ボリツ７
ヤなど超純水化構成機器に〃ｕわる負荷を最小限に抑え
ることができるため、超純水の開運コストが低減さｎる
。すなわち、ユースポイントでの使用量が減少した場合
には、バイパスラインにより透過水の戻り水ｔｈｔを増
大するようにして超純水化構成機器への通水量を減少さ
せる、２図において、？Ｊ、ｘ図と相違する点は中間タ
ンクを備えた点にある。As mentioned above, in the present invention, it is possible to operate the equipment according to the amount of ultrapure water used at the point of use, and the
Since the load on ultrapure water component equipment such as the water heater can be minimized, the cost of starting ultrapure water operations is reduced. In other words, when the amount used at the point of use decreases, the return water tht of permeated water is increased through the bypass line to reduce the amount of water flowing to the ultrapure water component equipment. The difference from the figures J and x is that it is equipped with an intermediate tank.
前記バイパスライン１３は、超純水化構成機器９の人口
側の透過水ライン７′と循環ライン１２とに接続されて
おり、循環ライン１２は中間タンク５に接続さｎている
。The bypass line 13 is connected to the permeate line 7' on the artificial side of the ultrapure water component 9 and the circulation line 12, and the circulation line 12 is connected to the intermediate tank 5.
上記の構成においても、超純水使用水量が減少した場合
、圧力スイッチ１５からの検出信号にもとづいて゛４磁
弁を動作させと共に透過水をバイパスライン１３から循
環ライ／１２に戻すことにより、超純水化構成機器９へ
の負荷を低減でさる。Even in the above configuration, when the amount of ultrapure water used decreases, the 4-magnetic valve is operated based on the detection signal from the pressure switch 15, and the permeated water is returned from the bypass line 13 to the circulation line/12. The load on the water purification component 9 is reduced.
なお、本発明の実施例においては、流量調節弁？動作さ
せるための検出手段としてユースポイント送水ラインの
圧力を検出するスイッチなどの圧力検出器を使用してい
るが、勿論圧力検出器に限定さ【るべきものではなく、
超純水の流量を検出しても同様の効果を奏する。In addition, in the embodiment of the present invention, the flow rate control valve? A pressure detector such as a switch that detects the pressure of the water supply line at the point of use is used as a detection means for operation, but of course it is not limited to pressure detectors.
A similar effect can be obtained by detecting the flow rate of ultrapure water.
また１本発明においてはユースポイント送水ラインの圧
力を検出し、この検出信号を制御装置により流量Ａ節弁
の動作信号に変換しているが、透過水ライン又はバイパ
スラインの圧力により、設定圧が設定さｎているリリー
フ弁などを直接作動させるようにしてもよい。In addition, in the present invention, the pressure of the point-of-use water supply line is detected, and this detection signal is converted by the control device into an operation signal for the flow rate A regulating valve. A set relief valve or the like may be directly operated.
〔元１男の効果〕
本発明の超純水製造装置によ八ば、ユースポイントでの
超純水便用量に対応した運転がｃｉＴ能であジ、超純水
化構成機器などへの負荷が減少゛ｒるため、超純水の１
１！コスト低減が図ｎる。[Effect of the former first son] The ultrapure water production apparatus of the present invention has a ciT ability to operate in response to the amount of ultrapure water at the point of use, and there is no load on the ultrapure water component equipment, etc. Because ultrapure water decreases,
1! Cost reduction is expected.
第１図は本発明の超純水製造装置の一実施例を下す系統
図、第２図は本発明装置の他の″Ａ施例を示す系統図、
第３図は従来の超純水製造装置の系統図である。
１・・・原水供給ライン、２・・・高圧ポンプ、３・・
・逆浸透膜、４，５・・・中間タンク、７，７′・・・
透過水ライン、１１・・・ユースポイント、１２・・・
循環ラ−１ｙ、１３・・・バイパスライン、１４・・・
流量調節升、１ｂ・・・圧力検出器。FIG. 1 is a system diagram showing one embodiment of the ultrapure water production device of the present invention, and FIG. 2 is a system diagram showing another embodiment of the device of the present invention.
FIG. 3 is a system diagram of a conventional ultrapure water production apparatus. 1...Raw water supply line, 2...High pressure pump, 3...
・Reverse osmosis membrane, 4, 5... intermediate tank, 7, 7'...
Permeated water line, 11...Use point, 12...
Circulation line 1y, 13... Bypass line, 14...
Flow rate adjustment box, 1b...pressure detector.
Claims (1)
純水を得ると共に未使用の超純水を循環ラインを介して
循環するようにした超純水製造装置において、前記超純
水化構成機器入口側の透過水ラインと前記循環ラインと
にバイパスラインを接続し、このバイパスラインに、超
純水化構成機器に通水される透過水量を調節するための
流量調節弁を設けたことを特徴とする超純水製造装置。 ２、前記流量調製弁は、超純水化構成機器出口側のユー
スポイント送水ラインの圧力を検出した信号により動作
するようにしたことを特徴とする特許請求の範囲第１項
記載の超純水製造装置。 ３、前記循環ラインは、原水を逆浸透膜に浸透圧以上に
加圧して供給する高圧ポンプの吸込側ラインに接続した
ことを特徴とする特許請求の範囲第１項記載の超純水製
造装置。 ４、前記循環ラインは、前記逆浸透膜からの透過水を一
時的に貯える中間タンクに接続するようにしたことを特
徴とする特許請求の範囲第１項記載の超純水製造装置。[Claims] 1. Ultrapure water obtained by obtaining ultrapure water from raw water using a reverse osmosis membrane, ultrapure water component equipment, etc., and circulating unused ultrapure water through a circulation line. In the production equipment, a bypass line is connected to the permeated water line on the inlet side of the ultrapure water component and the circulation line, and the amount of permeated water flowing to the ultrapure water component is adjusted to this bypass line. An ultrapure water production device characterized by being equipped with a flow rate control valve. 2. The ultrapure water according to claim 1, wherein the flow rate adjustment valve is operated by a signal that detects the pressure of a use point water supply line on the outlet side of the ultrapure water component. Manufacturing equipment. 3. The ultrapure water production apparatus according to claim 1, wherein the circulation line is connected to a suction side line of a high-pressure pump that supplies raw water to the reverse osmosis membrane after pressurizing it to a level higher than the osmotic pressure. . 4. The ultrapure water production apparatus according to claim 1, wherein the circulation line is connected to an intermediate tank that temporarily stores permeated water from the reverse osmosis membrane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9210186A JPS62250988A (en) | 1986-04-23 | 1986-04-23 | Apparatus for making ultrapure water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9210186A JPS62250988A (en) | 1986-04-23 | 1986-04-23 | Apparatus for making ultrapure water |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62250988A true JPS62250988A (en) | 1987-10-31 |
Family
ID=14045054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9210186A Pending JPS62250988A (en) | 1986-04-23 | 1986-04-23 | Apparatus for making ultrapure water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62250988A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0599281A2 (en) * | 1992-11-27 | 1994-06-01 | WAT WASSER- UND UMWELTTECHNIK GmbH | Process and apparatus for treating liquids by reverse osmosis |
| JP2012196678A (en) * | 2012-07-25 | 2012-10-18 | Miura Co Ltd | Operation method for membrane filtration system, and membrane filtration system |
| JP2020508212A (en) * | 2017-02-24 | 2020-03-19 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ | Water purification and distribution system and method |
-
1986
- 1986-04-23 JP JP9210186A patent/JPS62250988A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0599281A2 (en) * | 1992-11-27 | 1994-06-01 | WAT WASSER- UND UMWELTTECHNIK GmbH | Process and apparatus for treating liquids by reverse osmosis |
| EP0599281A3 (en) * | 1992-11-27 | 1994-06-15 | Wat Wasser Und Umwelttechnik G | Process and apparatus for treating liquids by reverse osmosis. |
| JP2012196678A (en) * | 2012-07-25 | 2012-10-18 | Miura Co Ltd | Operation method for membrane filtration system, and membrane filtration system |
| JP2020508212A (en) * | 2017-02-24 | 2020-03-19 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ | Water purification and distribution system and method |
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