JPS62246476A - Manufacture of polishing tape - Google Patents

Manufacture of polishing tape

Info

Publication number
JPS62246476A
JPS62246476A JP61090540A JP9054086A JPS62246476A JP S62246476 A JPS62246476 A JP S62246476A JP 61090540 A JP61090540 A JP 61090540A JP 9054086 A JP9054086 A JP 9054086A JP S62246476 A JPS62246476 A JP S62246476A
Authority
JP
Japan
Prior art keywords
polishing
abrasive
tape
dispersion
kneading
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61090540A
Other languages
Japanese (ja)
Inventor
Nobutaka Yamaguchi
信隆 山口
Masaaki Fujiyama
正昭 藤山
Masami Suzuki
正美 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP61090540A priority Critical patent/JPS62246476A/en
Priority to US07/039,841 priority patent/US4767644A/en
Publication of JPS62246476A publication Critical patent/JPS62246476A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28Resins or natural or synthetic macromolecular compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/001Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as supporting member
    • B24D3/002Flexible supporting members, e.g. paper, woven, plastic materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Magnetic Heads (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To decrease the degranulation of a polishing material and at the same time improve the even smoothness of a polishing film by preparing liquidization by means of two different treatments called a kneading and attriter dispersion treatments. CONSTITUTION:The liquidization-preparation of a polishing material and a binding material is accomplished, and the polishing liquid generated from this preparation is spread on the flexible support of a polishing tape. This polishing liquid spread on is dried and the polishing tape is manufacture. On this occasion, this prepared liquid included at least some of the polishing material and at least some of the binding material which have undergone a kneading and attriter dispersion treatments. By this kneading treatment, the affinities of the polishing material and the binding material are improved and their bonding force is strengthened, so that the degranulation of the polishing material off a polishing layer can be prevented. Moreover, by the attriter dispersion treatment, the polishing material is minutely and uniformly dispersed in the binding material up to primary particles, so that the even smoothness of a polishing film can be improved, and the polishing finish of a magnetic head by the polishing tape is improved.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気ヘッドを研磨ザる研磨テープの製造方法に
関し、詳しくはこの研磨テープの可撓性支持体上に塗布
する研磨液の調液に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a polishing tape for polishing a magnetic head, and more specifically to a method for preparing a polishing liquid to be applied onto a flexible support of the polishing tape. It is related to.

(従来技術) 研磨剤と結合剤(以下バインダという)等を調液して研
磨液を生成し、この研磨液を長尺の可撓性支持体−ヒに
塗布し、この模この研磨液を乾燥して研磨テープを製造
する方法が知られている。
(Prior art) A polishing solution is prepared by preparing an abrasive and a binder (hereinafter referred to as a binder), etc., and this polishing solution is applied to a long flexible support. A method of producing an abrasive tape by drying is known.

このにうな研磨テープの製造方法においては、でき上っ
た研磨テープにおける研磨剤の脱粒を減少させることお
よび研W!塗模の平W1性を向上さびることが課題とさ
れている。
In this method of manufacturing an abrasive tape, it is possible to reduce shedding of the abrasive in the finished abrasive tape, and to reduce the polishing process. The challenge is to improve the flat W1 properties of the painted pattern and prevent it from rusting.

このような課題を解決するためには適切なoitllL
液を生成することが必要で、このためには調液を適切な
処理により行なうことが必要である。すなわち、研磨剤
の脱粒を防止するためには研磨剤とバインダの結合力を
高めておく必要があり、まIミ研磨塗膜の平滑性を向上
させるためには研磨剤を一次粒子の状態でバインダ中に
均一に分散させる必要があり、このような点を考慮して
上記課題を解決し得る処理を行なうべきである。
Appropriate oitllL to solve such problems
It is necessary to produce a liquid, and for this purpose it is necessary to prepare the liquid by appropriate processing. In other words, in order to prevent the abrasive from falling off, it is necessary to increase the bonding strength between the abrasive and the binder, and in order to improve the smoothness of the abrasive coating film, the abrasive must be kept in the form of primary particles. It is necessary to uniformly disperse the resin in the binder, and a process that can solve the above problem should be carried out in consideration of this point.

ところが、従来よく知られているボールミルを用いた調
液方法(特開昭55−1299274、クリーニングテ
ープ:日立マクセル)によっては短時聞のうちに研磨剤
とバインダの結合力を十分に向上さIることが困難であ
り、また、研磨剤を一次粒子まで十分に微分散させるこ
とも困難であって上記課題を解決したとはいえなかった
。また、やはり従来よく知られているロールミルを用い
た調液方法(特公昭53−44714号、研磨テープ:
独逸顔料工IA)によって6研磨剤とバインダの結合力
を十分に向上さ「ることが困難であり、また、研磨剤を
一次粒子まで微分散させることは極めて困難であって上
記課題を解決することができなかった。
However, the bonding strength between the abrasive and the binder can be sufficiently improved in a short period of time by a well-known solution preparation method using a ball mill (Japanese Patent Application Laid-Open No. 55-1299274, cleaning tape: Hitachi Maxell). It is also difficult to sufficiently finely disperse the abrasive down to the primary particles, and the above problems cannot be said to have been solved. In addition, a liquid preparation method using a roll mill, which is also well known in the past (Japanese Patent Publication No. 53-44714, Polishing Tape:
It is difficult to sufficiently improve the bonding force between the abrasive and the binder using Deutsche Pigment Kogyo IA), and it is extremely difficult to finely disperse the abrasive down to the primary particles. I couldn't do that.

(発明の目的) 本発明は上記事情に鑑みてなされたものであり、研磨剤
の脱粒を減少させ得るとともに研srsの平滑性を向上
さ1!得る研磨テープの製造方法を提供することを目的
とするものである。
(Object of the Invention) The present invention has been made in view of the above circumstances, and it is possible to reduce shedding of abrasive and improve the smoothness of the grinding srs. The object of the present invention is to provide a method for producing an abrasive tape.

(発明の構成) 本発明の研磨テープの製造方法は、少なくとも研磨剤の
一部とバインダの一部に対し、少なくとも混練処理とア
トライタ分散処理を含む調液を行なうことを特徴とする
ものである。
(Structure of the Invention) The method for manufacturing an abrasive tape of the present invention is characterized in that at least a part of the abrasive and a part of the binder are subjected to liquid preparation including at least a kneading process and an attritor dispersion process. .

ここで、?l11M剤の種類、形状J3よび大きさとし
てはその目的に応じて適当なものを選択すればよく、と
くに限定されるものではない。
here,? The type, shape J3, and size of the l11M agent may be selected appropriately depending on the purpose, and are not particularly limited.

また、バインダも研磨剤を支持体上に接着することがで
きるものであればその14類の如何は問わないが、極性
を有するものであって研磨剤の分散に寄与しIQるもの
であればより好ましい。とくにニトロセルロースや、水
All、カルボキシル基を有する塩化ビニル酢酸ビニル
系共重合体が好ましい。
In addition, the binder may be of type 14 as long as it can adhere the abrasive onto the support, but as long as it has polarity and contributes to the dispersion of the abrasive and improves the IQ. More preferred. Particularly preferred are nitrocellulose, water All, and a vinyl chloride-vinyl acetate copolymer having a carboxyl group.

次に、上記混線処理について説明する。ここで混線とは
、ねっか(捏和、 kneading)のことをいい、
混線を行なう手段としては加圧ニーダ−(加圧式双腕ニ
ーダ−)、オープンニーダ−(双腕ニーダ−)、三本ロ
ールミル等がある。この中でも、加圧ニーダーとオープ
ンニーダ−は研磨液を餅状で強く混線できる上作業性に
も優れている。なお、強く混線できる点ではオープンニ
ーダ−よりも加圧ニーダ−の方がより優れている。また
、上記混練は力強く練る必要があり、研磨液が餅状とな
っている状態で練るのが好ましく、少なくとも100ボ
イス以上の高粘度で練る必要がある。
Next, the above crosstalk processing will be explained. Here, crosstalk refers to kneading.
Examples of means for cross-talk include a pressure kneader (pressure double-arm kneader), an open kneader (double-arm kneader), and a three-roll mill. Among these, the pressure kneader and the open kneader are capable of strongly mixing the polishing liquid in a cake-like manner, and are also excellent in workability. Note that a pressure kneader is better than an open kneader in terms of strong crosstalk. Further, the above-mentioned kneading needs to be done vigorously, and it is preferable to knead the polishing liquid in a rice cake-like state, and it is necessary to knead it at a high viscosity of at least 100 voices or more.

次に、上記アトライタ分散処理について説明する。一般
にアトライタとは、ボールまたはペブルを分散メディア
とし、この分散メディアにより満たされる静止した円筒
状のタンクからなり、そして、この中ヘミルベース(顔
料+ビヒクルスラリ)を満たし、タンクの中心に配設さ
れた垂直回転軸と仁の軸に直角に取付けられた数本の腕
木を回転させ、この回転プる腕木により上記分散メディ
アに3!!続的なずり応力を与え、これによりミルベー
スのビヒクル中へ顔料分散を行なう分散装置である。そ
して上記アI・ライタ分散処理とはこのアトライタを用
いて行なう分数処理であって、研磨剤を一次粒子まで微
分散し得る処理をいう。分散時間は例えば2〜48時間
、好ましくは6〜24時間である。また、上述した分散
メディアの具体例としてはスチルビーズ、アルミナビー
ズ、ジルコニアビーズ、ガラスピーズ等がある。また、
アトライタのタンク中のみかけ上の分散メディアの容積
と全容積の比(みかけ上の分散メディア容MA/全容積
)、すなわち見掛容積比は例えば100/ 100〜1
00/・goo、好ましくは100/ TOO〜100
/ 500である。なお、上記みかけ上の分散メディア
の容積とは、タンク中に堆積せしめた分散メディア全体
の高さにタンクの底面積を乗じたものである。
Next, the above-mentioned attritor distribution processing will be explained. In general, an attritor consists of a stationary cylindrical tank filled with balls or pebbles as a dispersion medium, and a hemil base (pigment + vehicle slurry) filled in this tank and placed in the center of the tank. Several arms installed at right angles to the vertical rotation axis and the center axis are rotated, and these rotating arms are applied to the above dispersion media. ! A dispersion device that applies continuous shear stress to disperse pigments into a mill-based vehicle. The above-mentioned attritor dispersion process is a fractional process performed using this attritor, and is a process that can finely disperse the abrasive down to the primary particles. The dispersion time is, for example, 2 to 48 hours, preferably 6 to 24 hours. Furthermore, specific examples of the above-mentioned dispersion media include still beads, alumina beads, zirconia beads, glass beads, and the like. Also,
The ratio of the apparent dispersion media volume to the total volume in the attritor tank (apparent dispersion media volume MA/total volume), that is, the apparent volume ratio is, for example, 100/100 to 1.
00/・goo, preferably 100/ TOO ~ 100
/ 500. Note that the above-mentioned apparent volume of the dispersion media is the product of the total height of the dispersion media deposited in the tank by the bottom area of the tank.

またこのときの研磨液の液粘度は例えば10〜300ボ
イズ、好ましくは20〜200ボイズ、ざらに好ましく
は30〜150ボイズである。
The viscosity of the polishing liquid at this time is, for example, 10 to 300 voids, preferably 20 to 200 voids, and most preferably 30 to 150 voids.

また、混線処]!l! J3よびアトライタ分散処理は
必ずしも研磨剤およびバインダの全指に対して行なう必
要はなく各々の一部に対して行なうだけでもよい。研磨
剤の一部とは研磨剤全層の10%以上、好ましくは20
%以上をいう。また、バインダの一部とはバインダ全問
の10%以上、好ましくは20%以上、さらに好ましく
は30%以上をいう。
Also, the crosstalk area]! l! J3 and attritor dispersion processing do not necessarily need to be performed on all the fingers of the abrasive and binder, but may be performed on only a portion of each finger. Part of the abrasive is 10% or more of the total layer of the abrasive, preferably 20% or more of the total layer of the abrasive.
% or more. Further, a part of the binder refers to 10% or more of the total binder, preferably 20% or more, and more preferably 30% or more.

また、被調液祠料としては必ずしも研磨剤およびバイン
ダのみからなることを意味するものではなく、例えば分
散剤、潤滑剤等の添加剤を含んでいてもよい。
Further, the liquid abrasive material to be prepared does not necessarily mean that it consists only of an abrasive and a binder, but may also contain additives such as a dispersant and a lubricant.

また、上記調液は必ずしも混線処理およびアトライタ分
散処理のみからなることを意味するものではなく、その
他適当な種々の処理を含んでいてもよい。また、とくに
好ましくは混練はアトライタ分散の前に行なう。
Further, the above-mentioned liquid preparation does not necessarily mean that it consists only of crosstalk treatment and attritor dispersion treatment, but may also include various other appropriate treatments. Further, particularly preferably, the kneading is performed before the attritor dispersion.

なお、上述したアトライタ、加圧ニーダ−、オープンニ
ーダ−、ボールミル、三本ロールミルは以下に示ず文献
に詳細に記)ホされている。
The above-mentioned attritor, pressure kneader, open kneader, ball mill, and three-roll mill are not shown below but are described in detail in the literature.

「混合混練技術」 (矢野著2日刊工業新聞社。"Mixing and kneading technology" (by Yano, 2nd Nikkan Kogyo Shimbun).

昭和55年8120口発行)、  [paint  F
!owPigsent  Disqersion ](
T、 C,patton著、1nterscicnce
 Publishers 、  1968年10月発行
)、「分散技術入門」 (小石、鉤谷著2日刊工業新聞
社、昭和52年1月20ロ発行)、「混線技術」 (橋
本著、産業技術センタ、昭和53年10月5日発行)等
8,120 units issued in 1981), [paint F
! owPigsent Disqersion ](
by T. C. Patton, 1 interscence
Publishers, October 1968), "Introduction to Dispersion Technology" (written by Koishi and Tsukutani, 2 Nikkan Kogyo Shimbun, published January 20, 1972), "Cross-wire Technology" (written by Hashimoto, Industrial Technology Center, 1977) Published on October 5, 2017) etc.

なお、本発明において研磨テープというときはいわゆる
テープ形状のものの他、ディスク形状やシート形状のも
のも広く含むものとする。
In the present invention, the abrasive tape broadly includes not only so-called tape-shaped polishing tapes but also disc-shaped and sheet-shaped polishing tapes.

(R明の効果) 本発明の研磨テープの製造方法によれば、混練処理とア
トライタ分散処理という相異なる2つの −処理によっ
て調液を行ない、従来生じていた複数の問題点を各問題
点別に各々の処理により対処するとともに、画処理によ
りもたらされる相乗効果によってこれらの問題点に全体
として対応するようにしている。
(Effect of R-light) According to the method for manufacturing an abrasive tape of the present invention, liquid preparation is performed by two different processes: kneading treatment and attritor dispersion treatment, and multiple problems that have conventionally occurred can be solved for each problem. In addition to addressing these issues individually, the synergistic effects brought about by the image processing are used to address these issues as a whole.

すなわち、混練処理によりr111磨剤とバインダが高
粘度状態で混練され、この両者の親和力が向上して両者
の結合力が強化されるのでrtll磨層から研磨剤が脱
粒するのを防止することができる。これにより研磨塗膜
の耐久性を向上させることができる。
That is, the kneading process mixes the R111 abrasive and the binder in a high viscosity state, improving the affinity between the two and strengthening the bonding force between the two, thereby preventing the abrasive from falling off from the RTL polishing layer. can. This can improve the durability of the polishing coating.

また、アトライタ分散処理により研磨剤がバインダ中で
一次粒子まで均一に微分散され、研磨液中で研磨粒子が
凝集している部分がないので研磨塗膜の平滑性が向上し
、この研磨テープを用いて行なう磁気ヘッドの仕上研磨
性が向上する。すなわち磁気ヘッドの表面に傷がつくお
それが小さく、また、磁気ヘッドの表面平滑性を向上さ
せることができる。
In addition, the attritor dispersion process uniformly finely disperses the abrasive down to the primary particles in the binder, and since there are no areas where abrasive particles are aggregated in the abrasive solution, the smoothness of the abrasive film improves, making this abrasive tape The final polishing properties of the magnetic head using the magnetic head are improved. That is, there is less risk of scratches on the surface of the magnetic head, and the surface smoothness of the magnetic head can be improved.

また、研磨剤の脱粒防止という点においては、アトライ
タ分散処理により研磨剤が微分散され、rIII磨剤と
バインダの結合力が増加するので、混線処理を単独で行
なう場合よりもその防止効果をより確実なものとするこ
とができる。
In addition, in terms of preventing shedding of abrasives, the attritor dispersion process finely disperses the abrasives and increases the bonding force between the rIII abrasive and the binder, so the crosstalk treatment is more effective than when performed alone. It can be made certain.

さらに、研磨塗膜の平滑性を向上させるという点におい
て、混練処理の後にアトライタ分散処理を行むう場合に
(よ、混練41!1理によって研磨剤がある程度分散さ
れた後にアトライタ分散処理によって研磨剤の微分散を
行なうことができるのでアトライタ分散処理を単独で行
なう場合よりも短時間のうちに高い平滑表面のものを形
成することができる。
Furthermore, in terms of improving the smoothness of the abrasive coating film, when performing the attritor dispersion treatment after the kneading treatment (Yo, after the abrasive has been dispersed to some extent by the kneading process, the attritor dispersion treatment Since the fine dispersion of the attritor can be performed, a highly smooth surface can be formed in a shorter time than when the attritor dispersion process is performed alone.

(実  施  例) 以下本発明の実施例について説明する。(Example) Examples of the present invention will be described below.

・実施例1 以下に示す組成の研磨液へをオープンニーダ−を用いて
30分間混練し、餅状になった後さらに30分間混練し
た。その後、この混練したものにメヂルエチルケトン(
100部)を加えて、液状(60ボイズ)として研磨液
Bをつくった。次に、この研磨液Bをアトライタに入れ
、18時間に亘ってアトライタ分散処理して研磨液Cを
つくった。この研磨液Cは液の粘度が10ボイスであっ
た。アトライタの分散メディアとしてはスチールピーズ
(φ1/4インチ)を用い、 分散メディア容積(見1i)) 全容積 で表わされる見掛容積比は100/ 120とした。こ
の後研磨液Cを3μのフィルタで濾過し、12μ厚のポ
リエステルフィルム上に8μ厚(乾燥厚)で塗布し、乾
燥させて塗膜を形成した。その後この塗膜を形成したポ
リエステルフィルムを1部2インチ巾にm断し、It!
+磨テープ1をつくった。なお、1i411液への組成
材料および上記メチルエチルケトンの含在比率は固形分
組成であられ弯。また、バインダとしての二]−ロセル
[1−スは溶剤としてのメチルエチルケトンにあらかじ
め溶解さVておく。
- Example 1 A polishing liquid having the composition shown below was kneaded for 30 minutes using an open kneader, and after becoming cake-like, it was further kneaded for 30 minutes. Then, add medylethyl ketone (
100 parts) was added to prepare polishing liquid B as a liquid (60 voids). Next, this polishing liquid B was put into an attritor and subjected to an attritor dispersion treatment for 18 hours to produce a polishing liquid C. This polishing liquid C had a liquid viscosity of 10 voices. Steel peas (φ 1/4 inch) were used as the dispersion media of the attritor, and the apparent volume ratio expressed by the total volume of the dispersion media was set to 100/120. Thereafter, the polishing liquid C was filtered through a 3μ filter, applied to a 12μ thick polyester film to a thickness of 8μ (dry thickness), and dried to form a coating film. Thereafter, one portion of the polyester film with this coating formed thereon was cut into 2-inch width pieces, and it was cut into pieces with a width of 2 inches.
+Made polishing tape 1. In addition, the composition materials and the content ratio of the above-mentioned methyl ethyl ketone to the 1i411 liquid are based on the solid content composition. Further, 2]-rocell[1-su as a binder is dissolved in advance in methyl ethyl ketone as a solvent.

研磨液Aの組成 rIPl@剤(X  AL20s  (サイズφo、3
μ)・・・・・・ 300部 ニトロセルロース         ・・・・・・ 5
0部メチルエチルケトン        ・・・・・・
200部レシチン(分散剤)        ・・・・
・・1.5部・実施例2 以下に示J組成の研磨液りを加圧ニーダ−を用いて30
分間混練し、餅状になった後さらに1時間混練した。そ
の後、この混練したものに乾燥した空気を吹きつけなが
らさらに混練を加えることでに1径数σ程度の大きさに
砕かれるようにした。次にこの砕かれたものを以下に示
す組成の研磨液Eとともにアトライタに入れ、24時間
に亘ってアトライタ分散処理して研磨液Fをつくった。
Composition of polishing liquid A rIPl@ agent (X AL20s (size φo, 3
μ) 300 parts Nitrocellulose 5
0 parts methyl ethyl ketone ・・・・・・
200 parts lecithin (dispersing agent)
・・1.5 parts・Example 2 A polishing liquid having the J composition shown below was mixed with a pressure kneader for 30 minutes.
The mixture was kneaded for a minute, and after the mixture became cake-like, it was further kneaded for 1 hour. Thereafter, this kneaded material was further kneaded while blowing dry air, so that it was crushed into pieces with a diameter of about a few σ. Next, this crushed material was placed in an attritor together with a polishing liquid E having the composition shown below, and subjected to attritor dispersion treatment for 24 hours to produce a polishing liquid F.

rJl磨液Fは液の粘度が85ポイズであった。アトラ
イタの分散メディアとしてはスチールピーズ(φ1/4
インチ)を用い、 分散メディア容v1(見掛) 全容積 で表わされる見掛容積比は100/ 12Gとした。次
に研磨液Fを3μのフィルタでデ遇し濾過した後、以下
に示す組成の研磨液Gとともに攪拌機に投入し研磨液H
をつくった。研磨液ト1は液の粘度が80ボイスであっ
た。この後、?ilI磨allを3μのフィルタで濾過
して12μ厚のポリエステルフィルム上に8μ厚(乾燥
厚)で塗布し、乾燥させて塗膜を形成した。その後この
塗膜を形成したポリエステルフィルムを172インチt
pに裁断し、rtlJ ffiデーブ2をつくった。
rJl polishing fluid F had a viscosity of 85 poise. Steel peas (φ1/4
inch), and the apparent volume ratio expressed by the total volume of the dispersion media was 100/12G. Next, polishing liquid F was filtered through a 3μ filter, and then put into a stirrer together with polishing liquid G having the composition shown below.
I made it. Polishing liquid 1 had a liquid viscosity of 80 voices. After this,? The ilI polishing all was filtered through a 3μ filter, applied to a 12μ thick polyester film to a thickness of 8μ (dry thickness), and dried to form a coating film. After that, a 172 inch thick polyester film on which this coating was formed was
I cut it into p and made rtlJ ffi Dave 2.

研磨液りの組成 研磨剤γ−Fezo3 (サイズ1.0μ×0.1μ×0.1μ)・・・・・・
 200部塩化ビニル−l¥酸ビニル− ビニルアルコール共重合体  ・・・・・・ 80部ア
ミルステアレート        ・・・・・・2.0
部メチルエチルケトン        ・・・・・・1
00部酢@n−ブチル          ・・・・・
・320FB研磨液Eの組成 研磨剤Cr203(す゛イズφ 0,3μ)・・・・・
・ 150部カーボンブラック         ・・
・・・・ 30部メチルエチルケトン        
・・・・・・100iシクロヘキサノン       
  ・・・・・・3507!IAレイン酸 ・    
       ・・・・・・  3部シリコーンオイル
         ・・・・・・0.2部フッ素系オイ
ル          ・・・・・・ 1部流動パラフ
ィン          ・・・・・・ 1部ブチルス
テアレート        ・・・・・・  1部界面
活性剤            ・・・・・・ 2部研
磨液Gの組成 末端イソシアネートプレポリマ(硬化剤)・・・・・・
 35部 ・比較例1 実施例1で示した研磨液へをメチルエチルケトン(10
0部)とともにボールミルに入れ、96時間に亘って分
散処理した。分散メディアとしてはスチールピーズ(φ
3/4インチ)を用いた。
Composition of polishing liquid Abrasive agent γ-Fezo3 (Size 1.0μ×0.1μ×0.1μ)・・・・・・
200 parts Vinyl chloride-l vinyl acetate-vinyl alcohol copolymer 80 parts Amyl stearate 2.0
Part methyl ethyl ketone...1
00 parts vinegar @ n-butyl...
・Composition of 320FB polishing liquid E Polishing agent Cr203 (Size φ 0.3μ)...
・ 150 parts carbon black ・・
...30 parts methyl ethyl ketone
...100i cyclohexanone
...3507! IA leic acid ・
...3 parts silicone oil ...0.2 parts fluorine oil ...1 part liquid paraffin ...1 part butyl stearate ... 1 part surfactant 2 parts Composition of polishing liquid G Terminated isocyanate prepolymer (curing agent)...
35 parts Comparative Example 1 Methyl ethyl ketone (10 parts) was added to the polishing liquid shown in Example 1.
0 parts) in a ball mill and subjected to dispersion treatment for 96 hours. Steel peas (φ
3/4 inch) was used.

この分散処理した液を3μのフィルタで濾過し、12μ
厚のポリエステルフィルム上に8μ厚(乾燥厚)で塗布
し、乾燥させて塗膜を形成した。その後このtl!膜を
形成したポリエステルフィルムを1部2インチ巾に裁断
し、研磨テープ3をつくった。
This dispersion-treated liquid was filtered through a 3μ filter, and the 12μ
It was coated on a thick polyester film to a thickness of 8 μm (dry thickness) and dried to form a coating film. Then this tl! The polyester film on which the film was formed was cut into pieces each having a width of 2 inches to prepare polishing tape 3.

・比較例2 実施例1で示した研磨液へとメチルエチルケトン(10
0部以上)を三本ロールミルで混練し、低粘度(5ボイ
ズ)の研磨スラリを1gた。なお、混線中も粘度が同程
度となるように適宜添加溶剤量をw4整した。次にこの
研磨スラリを5μのフィルタでt遇しく3μのフィルタ
では濾過性悪し)、12μ厚のポリエステルフィルム上
に8μ厚(乾燥厚)で塗布し、乾燥させて塗膜を形成し
た。その後この[Qを形成したポリエステルフィルムを
1部2インチ+i]に裁断し、研磨テープ4をつくった
・Comparative Example 2 Methyl ethyl ketone (10
(0 parts or more) were kneaded in a three-roll mill to obtain 1 g of a low-viscosity (5 voids) polishing slurry. Note that the amount of added solvent was adjusted as appropriate so that the viscosity remained at the same level even during crosstalk. Next, this polishing slurry was applied to a 12μ thick polyester film to a thickness of 8μ (dry thickness) using a 5μ filter (unfortunately, a 3μ filter has poor filtration properties) and dried to form a coating film. Thereafter, this polyester film on which Q was formed was cut into pieces of 2 inches + i to prepare polishing tape 4.

実施例1.2および比較例1,2によりつくった研磨テ
ープ1〜4の脱落rIIIe粒子数および表面粗さくR
a )を測定し、下表にその結果を示す。
Number of fallen rIIIe particles and surface roughness R of polishing tapes 1 to 4 made in Example 1.2 and Comparative Examples 1 and 2
a) was measured and the results are shown in the table below.

なお、脱落rIll磨粒子数はフェライトヘッド研削侵
の研磨テープ表面を電子顕微鏡(5000倍)で観察し
、脱落した研磨粒子数をその凹みの数により計数し、相
対値で表わした。また、表面粗さくRa )は塗膜表面
の中心rA甲均粗さを測定したものである。カットオフ
値は0.8allll、触針半径は2μ、触童1スピー
ドは0.3fi/Secであった。
The number of dropped rIll abrasive particles was determined by observing the surface of the abrasive tape after grinding the ferrite head using an electron microscope (magnification: 5,000 times), counting the number of dropped abrasive particles by the number of dents, and expressing the result as a relative value. Furthermore, the surface roughness (Ra) is the average roughness measured at the center rA of the surface of the coating film. The cutoff value was 0.8allll, the stylus radius was 2μ, and the stylus 1 speed was 0.3fi/Sec.

上表から明らかなように、本実施例1,2によれば研磨
剤の脱落を防止することができるとともにテープの研磨
塗膜表面を平滑にすることができる。
As is clear from the above table, according to Examples 1 and 2, it is possible to prevent the abrasive from falling off and to make the surface of the abrasive coating film of the tape smooth.

なお、本発明の実施例としては上記のものに限られるも
のではなく、本発明の目的を達成し得る種々の実施例が
ある。
Note that the embodiments of the present invention are not limited to those described above, and there are various embodiments that can achieve the object of the present invention.

Claims (1)

【特許請求の範囲】 研磨剤と結合剤の調液を行ない、この調液により生成さ
れた研磨液を可撓性支持体上に塗布し、この塗布した研
磨液を乾燥させて研磨テープを製造する方法において、 前記調液には、少なくとも前記研磨剤の一部と少なくと
も前記結合剤の一部に対して行なう混練処理とアトライ
タ分散処理とが含まれていることを特徴とする研磨テー
プの製造方法。
[Claims] A polishing tape is produced by preparing a solution of an abrasive and a binder, applying the abrasive solution produced by this solution onto a flexible support, and drying the applied abrasive solution. In the method of manufacturing an abrasive tape, the liquid preparation includes a kneading treatment and an attritor dispersion treatment performed on at least a part of the abrasive and at least a part of the binder. Method.
JP61090540A 1986-04-18 1986-04-18 Manufacture of polishing tape Pending JPS62246476A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61090540A JPS62246476A (en) 1986-04-18 1986-04-18 Manufacture of polishing tape
US07/039,841 US4767644A (en) 1986-04-18 1987-04-20 Method of making abrasive tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61090540A JPS62246476A (en) 1986-04-18 1986-04-18 Manufacture of polishing tape

Publications (1)

Publication Number Publication Date
JPS62246476A true JPS62246476A (en) 1987-10-27

Family

ID=14001245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61090540A Pending JPS62246476A (en) 1986-04-18 1986-04-18 Manufacture of polishing tape

Country Status (2)

Country Link
US (1) US4767644A (en)
JP (1) JPS62246476A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3808426C2 (en) * 1988-03-14 1995-01-26 Hermes Schleifmittel Gmbh & Co Flexible grinding tool and process for its manufacture
JPH07102505B2 (en) * 1988-04-13 1995-11-08 富士写真フイルム株式会社 Polishing tape
US4925457B1 (en) * 1989-01-30 1995-09-26 Ultimate Abrasive Syst Inc Method for making an abrasive tool
US5061294A (en) * 1989-05-15 1991-10-29 Minnesota Mining And Manufacturing Company Abrasive article with conductive, doped, conjugated, polymer coat and method of making same
JP2542264B2 (en) * 1989-08-10 1996-10-09 富士写真フイルム株式会社 Polishing tape
JPH08112769A (en) * 1994-10-14 1996-05-07 Fuji Photo Film Co Ltd Abrasive tape
EP3046661A4 (en) 2014-11-25 2016-10-12 Deuchem Shanghai Chemical Co Ltd Urethane dispersants

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5377612A (en) * 1976-12-21 1978-07-10 Fuji Photo Film Co Ltd Cleaning tape for magnetic recorder
US4255164A (en) * 1979-04-30 1981-03-10 Minnesota Mining And Manufacturing Company Fining sheet and method of making and using the same
DE2918103C2 (en) * 1979-05-04 1985-12-05 Sia Schweizer Schmirgel- & Schleifindustrie Ag, Frauenfeld Method for applying a base binder and apparatus for carrying out the same
US4263003A (en) * 1979-05-08 1981-04-21 Graco, Inc. Method of mixing liquids in closed containers
US4623364A (en) * 1984-03-23 1986-11-18 Norton Company Abrasive material and method for preparing the same

Also Published As

Publication number Publication date
US4767644A (en) 1988-08-30

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