JPS62237427A - Light modulating element - Google Patents

Light modulating element

Info

Publication number
JPS62237427A
JPS62237427A JP61081395A JP8139586A JPS62237427A JP S62237427 A JPS62237427 A JP S62237427A JP 61081395 A JP61081395 A JP 61081395A JP 8139586 A JP8139586 A JP 8139586A JP S62237427 A JPS62237427 A JP S62237427A
Authority
JP
Japan
Prior art keywords
diffraction grating
refractive index
substrates
liquid crystal
modulation element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61081395A
Other languages
Japanese (ja)
Inventor
Chiori Mochizuki
千織 望月
Takayuki Ishii
隆之 石井
Tomoyuki Umezawa
梅沢 知幸
Kazuya Ishiwatari
和也 石渡
Yukitoshi Okubo
大久保 幸俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61081395A priority Critical patent/JPS62237427A/en
Publication of JPS62237427A publication Critical patent/JPS62237427A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate the need for a stage for forming an insulating film and to improve the adhesiveness to substrates by constituting a diffraction grating of a relief pattern of ruggedness and forming the recesses of the relief pattern of the same member as the member for the adjacent projecting parts so that the patterns are made continuous. CONSTITUTION:This light modulating element is so formed that the insulating film 3 does not exist on the substrate side having the diffraction grating 8. More specifically, the light modulating element is formed with transparent electrodes 2 on the opposed surfaces of a pair of the substrates 1 and is further formed with the diffraction grating 8 on one of the transparent electrodes 2. Said diffraction grating 8 consists of a prescribed optical member having an insulating characteristic and the relief patterns to constitute the diffraction grating 8 are formed continuously to cover the entire surface of the transparent electrode 2. One of the stages for forming the element is thereby omitted and since the adhesiveness of the diffraction grating to the substrate is high, the light modulating element having excellent durability and reliability is obtd.

Description

【発明の詳細な説明】 く技術分野〉 本発明は、光変調素子、特に回折格子と屈折率可変物質
とを組合わせて屈折率可変物質の屈折率を制御すること
により入射光に所望の回折現像を生じせしめる光変調素
子に関する。
Detailed Description of the Invention [Technical Field] The present invention provides desired diffraction to incident light by controlling the refractive index of the variable refractive index material by combining a light modulation element, particularly a diffraction grating, and a variable refractive index material. The present invention relates to a light modulation element that causes development.

〈従来技術〉 従来から良く知られている光変調素子としては、互いに
偏光方向が直交する様に配した一対の偏光板と、この一
対の偏光板間に配され一対の透明基板の相対する基板面
に互いに直交する配向処理を施して液晶を封入した素子
とから成り、この液晶の配向状態をねじれた状態と基板
面に垂直に向いた状態との間でスイッチングを行ない入
射光の変調をする所謂TN(ツウィストネマチック)型
の液晶表示素子がある。この種の表示素子は構成が簡便
で駆動が容易なことから多岐に亘り利用されているが、
2枚の偏光板を利用して光束の透過及び遮断を行なう為
に消色時、即ち光透過時の透過率が悪く光束利用効率の
面からは好ましい光変調素子とは言えなかった。
<Prior art> A conventionally well-known light modulation element consists of a pair of polarizing plates arranged so that the polarization directions are perpendicular to each other, and a pair of transparent substrates arranged between the pair of polarizing plates. It consists of an element in which a liquid crystal is sealed with its planes aligned perpendicularly to each other, and the alignment state of this liquid crystal is switched between a twisted state and a state perpendicular to the substrate surface to modulate incident light. There is a so-called TN (twisted nematic) type liquid crystal display element. This type of display element has a simple structure and is easy to drive, so it is used in a wide variety of ways.
Since two polarizing plates are used to transmit and block the light flux, the transmittance during decolorization, that is, the time when light is transmitted, is poor, and it cannot be said to be a desirable light modulation element from the viewpoint of luminous flux utilization efficiency.

又、液晶を利用した同種の表示素子として、液晶分子に
色素を混入させて用いる所謂ゲスト・ホストモードの液
晶表示素子があるが、この表示素子に於ても色素が介在
する為に消色時の透過率は良くても75%程度であった
In addition, as a similar type of display element that uses liquid crystal, there is a so-called guest-host mode liquid crystal display element that uses a dye mixed into the liquid crystal molecules, but since the dye is present in this display element as well, there is a problem when the color is erased. The transmittance was about 75% at best.

一方、特公昭53−3928号公報やUSP4.251
,137等に於て反射型や透過型の位相回折格子と液晶
とを組合わせた表示素子や色フィルター素子が開示され
ている。これらで開示されている素子は確かに光束利用
効率は優れているが、特公昭53−3928号公報に開
示されている素子は単なる装飾効果を示すのみであり、
文字や画像を表示する表示素子や光束の透過、遮断を行
なう光変調素子としては満足出来るものではなかった。
On the other hand, Japanese Patent Publication No. 53-3928 and USP 4.251
, 137, etc., disclose display elements and color filter elements in which a reflective or transmissive phase diffraction grating is combined with a liquid crystal. The elements disclosed in these publications certainly have excellent luminous flux utilization efficiency, but the element disclosed in Japanese Patent Publication No. 53-3928 merely exhibits a decorative effect.
This has not been satisfactory as a display element for displaying characters or images, or a light modulation element for transmitting or blocking light beams.

又、USP4.251.137に開示されている色フィ
ルター素子は一対の対向する基板面に互いに配列方向が
直交する様に回折格子を形成し、この基板間に液晶を充
填して液晶分子の配向状態を制御することにより屈折率
を変え1回折格子を成す物質と液晶との屈折率差を変え
ることで分光透過率性を可変にするものである。
In addition, the color filter element disclosed in USP 4.251.137 has a diffraction grating formed on the surfaces of a pair of opposing substrates so that the alignment directions are perpendicular to each other, and liquid crystal is filled between the substrates to align the liquid crystal molecules. By controlling the state, the refractive index is changed, and the difference in refractive index between the material forming one diffraction grating and the liquid crystal is changed, thereby making the spectral transmittance variable.

この種の光変調素子の構成例を第1図に示す。An example of the configuration of this type of light modulation element is shown in FIG.

1は基板、2は透明電極、3は絶縁膜、4は回折格子、
5は液晶である。
1 is a substrate, 2 is a transparent electrode, 3 is an insulating film, 4 is a diffraction grating,
5 is a liquid crystal.

基板1には一般にガラス板が用いられ、この上に透明電
極2が形成されている。絶縁膜3は透明電極2上に印刷
、スピンナー蒸着等により形成されており、更に回折格
子4は、フォトリソグラフィー、エツチング、リフトオ
フ、レプリカ、エンボス等の手法で絶縁膜3上に形成さ
れている。また、液晶5は前記一対基板1間に充填され
ている。
A glass plate is generally used as the substrate 1, on which a transparent electrode 2 is formed. The insulating film 3 is formed on the transparent electrode 2 by printing, spinner vapor deposition, etc., and the diffraction grating 4 is formed on the insulating film 3 by methods such as photolithography, etching, lift-off, replica, embossing, etc. Further, the liquid crystal 5 is filled between the pair of substrates 1.

次にこの光変調素子の原理について説明する。Next, the principle of this light modulation element will be explained.

6は入射光の内の回折格子4の溝と同方向の偏光成分、
7は出射光である。なお、屈折率可変物質である液晶5
の屈折率は電界によって制御するものとする。電界の印
加されていない静的条件では、入射光の偏光成分6は、
ホモジニアヌ配向、即ち回折格子4の溝方向に配向され
ている液晶5の異常屈折率neを感じ、また、電界を印
加することにより、ホメオトロピック配向、即ち基板1
に垂直に配向した液晶5の常屈折率n□を感じる。ここ
で1回折格子4の屈折率ngと液晶の屈折率との差をΔ
nとし、入射光の波長を入、回折格子の高さをTとすれ
ば、回折格子における零次透過回折光の回折率η0は近
似的に次の(1)式で表すことができる。
6 is a polarized component of the incident light in the same direction as the grooves of the diffraction grating 4;
7 is the emitted light. Note that the liquid crystal 5, which is a variable refractive index material,
The refractive index of is controlled by an electric field. Under static conditions with no electric field applied, the polarization component 6 of the incident light is
By sensing the homogeneous alignment, that is, the extraordinary refractive index ne of the liquid crystal 5 aligned in the groove direction of the diffraction grating 4, and applying an electric field, the homeotropic alignment, that is, the substrate 1
The ordinary refractive index n□ of the liquid crystal 5 aligned perpendicular to is felt. Here, the difference between the refractive index ng of the first diffraction grating 4 and the refractive index of the liquid crystal is Δ
If n is the wavelength of the incident light, and the height of the diffraction grating is T, then the diffraction index η0 of the zero-order transmitted diffracted light in the diffraction grating can be approximately expressed by the following equation (1).

即ち、Δnを電界により、制御することで入射光は(1
)式により変調される。但し、(1)式は第1図に示す
如き矩形状の回折格子に対してのみ有効な近似式である
That is, by controlling Δn using an electric field, the incident light becomes (1
) is modulated by the equation. However, equation (1) is an approximate equation that is effective only for a rectangular diffraction grating as shown in FIG.

上述の様に電界などのエネルギーにより液晶5等の屈折
率可変物質の屈折率を制御して、光の変調を行なう場合
、上下基板1間の導通及び透明電極2の電蝕等を防止す
るために、第1図の様に従来の素子では透明電極2上に
ポリイミド、S i02等の絶縁膜3や液晶5との界面
に保護膜を形成する程を付は加える必要があった。
When modulating light by controlling the refractive index of a variable refractive index material such as the liquid crystal 5 using energy such as an electric field as described above, to prevent conduction between the upper and lower substrates 1 and electrolytic corrosion of the transparent electrode 2, etc. In addition, as shown in FIG. 1, in the conventional element, it was necessary to form a protective film on the transparent electrode 2 at the interface with the insulating film 3 made of polyimide, Si02, etc. and the liquid crystal 5.

又、従来のこの種の素子は回折格子4を成すレリーフパ
ターンは不連続に所定のピッチで同一物質による凸部が
形成されているものであり、一般に上下基板との密着性
が弱い為に素子としての信頼性に欠けていた。
In addition, in conventional elements of this type, the relief pattern forming the diffraction grating 4 has convex portions made of the same material formed discontinuously at a predetermined pitch, and generally the adhesion between the upper and lower substrates is weak, so the element It lacked credibility.

;発明の概要〉 本発明の目的は、上記従来の問題点に鑑み。;Summary of the invention> The object of the present invention is to solve the above-mentioned conventional problems.

素子作成時に於る絶縁膜形成工程を省略出来ると共に、
基板に対して高い密着性を備えた回折格子を有する光変
調素子を提供することにある。
In addition to being able to omit the insulating film formation process during device fabrication,
An object of the present invention is to provide a light modulation element having a diffraction grating that has high adhesion to a substrate.

上記目的を達成する為に、本発明に係る光変調素子は、
一対の基板と該一対の基板の相対する面の少なくとも一
方に形成した回折格子と該一対の基板の相対する面間に
存す屈折率可変物質と該屈折率可変物質の屈折率を制御
する手段とを有する素子であって、#記回折格子が凹凸
のレリーフパターンから成り、該レリーフパターンの凹
部が隣接する凸部と同一部材で形成され、パターンが連
続していることを特徴としている。
In order to achieve the above object, the light modulation element according to the present invention includes:
A pair of substrates, a diffraction grating formed on at least one of opposing surfaces of the pair of substrates, a refractive index variable material existing between the opposing surfaces of the pair of substrates, and means for controlling the refractive index of the refractive index variable material. The element is characterized in that the diffraction grating consists of an uneven relief pattern, the concave portions of the relief pattern are formed of the same material as the adjacent convex portions, and the pattern is continuous.

尚、本発明の更なる特徴は以下に示す実施例より明らか
になるであろう。
Further features of the present invention will become clear from the Examples shown below.

尚、前記屈折率可変物質としては5例えば。Incidentally, the refractive index variable material is, for example, 5.

液晶、PLZT、LiNbO3、LiTaO3。Liquid crystal, PLZT, LiNbO3, LiTaO3.

TiO2、PMMA、CC1a、KDP、ADP、Zn
O,BaTiO3、B112Si02p。
TiO2, PMMA, CC1a, KDP, ADP, Zn
O, BaTiO3, B112Si02p.

B a 2 N a N b’ 5015 、 M n
 B i 、 E u O。
B a 2 N a N b' 5015, M n
B i , E u O.

CS2 、Gd2 (MOO4)3 、BaTiO01
2、CuC1,CaAs、ZnTe、As2Se3 、
Se 、AsGe5eS 、DKDP。
CS2, Gd2 (MOO4)3, BaTiO01
2, CuC1, CaAs, ZnTe, As2Se3,
Se, AsGe5eS, DKDP.

MNA 、mNA 、UREA 、7オトレジスト等が
挙げられる。特に、正及び負のネプチツク液晶や強誘電
性液晶等の液晶は安値で屈折率差Δn(異常屈折率と常
屈折率の差)が大きく。
Examples include MNA, mNA, UREA, and 7 otoresist. In particular, liquid crystals such as positive and negative neptic liquid crystals and ferroelectric liquid crystals have a large refractive index difference Δn (difference between extraordinary refractive index and ordinary refractive index) at low prices.

制御方法が簡便である為に好適である。又。This is suitable because the control method is simple. or.

前記グレーティングの作成方法には、フォトリソグラフ
ィーとドライエツチングを組み合わせた方法、熱硬化性
樹脂あるいは紫外線硬化性樹脂等を用いたレプリカ法、
ルーリングエンジンを用いた切削法あるいはエンボス法
等の各種方法が挙げられる。
The method for producing the grating includes a method combining photolithography and dry etching, a replica method using a thermosetting resin or an ultraviolet curable resin, etc.
Various methods such as a cutting method using a ruling engine or an embossing method may be used.

更に1本発明に於ては、前記回折格子の形状に限定はな
く、後述する実施例で示す矩形状回折格子の他、三角波
状、正弦波状、非対称形状等各種形状の回折格子が適用
される。
Furthermore, in the present invention, there is no limitation to the shape of the diffraction grating, and in addition to the rectangular diffraction grating shown in the examples described later, diffraction gratings of various shapes such as triangular wave, sine wave, and asymmetric shapes are applicable. .

〈実施例〉 7J42図は本発明に係る光変調素子の一例を示す概略
構成図で、第1図と同様の部材には同符番を符しである
。尚1図中、8は連続したレリーフパターンから成る回
折格子を示す。
<Example> Fig. 7J42 is a schematic configuration diagram showing an example of a light modulation element according to the present invention, and the same members as in Fig. 1 are denoted by the same reference numerals. In FIG. 1, numeral 8 indicates a diffraction grating consisting of a continuous relief pattern.

本実施例の光変調素子と第1図に示した光変調素子との
主たる違いは1回折格子8を有する基板側に第1図に於
る絶縁II! 3が存在しない点にある。第2図に示す
様に本光変調素子は一対の基板1の相対する面に透明電
極2を形成し。
The main difference between the optical modulation element of this embodiment and the optical modulation element shown in FIG. 1 is that the insulation II! shown in FIG. 3 does not exist. As shown in FIG. 2, this optical modulation element has transparent electrodes 2 formed on opposing surfaces of a pair of substrates 1.

更に一方の透明電極2上に回折格子8を形成しているが
、この回折格子8は絶縁性を有する所定の光学部材から
成り1回折格子8を成すレリーフパターンは連続して形
成され、透明電極2の全面をカバーしている。
Furthermore, a diffraction grating 8 is formed on one of the transparent electrodes 2, and this diffraction grating 8 is made of a predetermined optical member having insulating properties, and the relief pattern constituting one diffraction grating 8 is formed continuously. Covers all aspects of 2.

ここで、第2図に示す光変調素子の回折格子8を形成す
る手法には前述の如く種々の手法があるが、一実施例と
してフォトリソグラフィー法に関して第3図(A)、(
B)、(C)を用い説明する。
Here, as described above, there are various methods for forming the diffraction grating 8 of the light modulation element shown in FIG.
This will be explained using B) and (C).

第3図(A)、(B)、(C)は本光変調素子の回折格
子の形成法の一例を示す図で、図中、第2図と同様の部
材には同符番を符してあり、9はフォトレジスト、10
は露光用マスクを示す。
Figures 3 (A), (B), and (C) are diagrams showing an example of the method of forming the diffraction grating of the present optical modulation element. In the figures, the same members as in Figure 2 are designated by the same numbers. 9 is photoresist, 10 is
indicates an exposure mask.

最初に第2図(A)に示す様に、フォトレジスト9を基
板lにスピンコード、ロールコーティング、ディッピン
グ等によりfifiLm程度の厚みで塗布する。次に第
3図(B)に示す様に回折格子パターンを有するマスク
10を介し露光して現像することにより、第3図(C)
に示す様な回折格子8が得られる。この時、露光条件ま
たは現像条件等を調節して1回折格子8の凸部と凸部と
の間の凹部にレジストの残渣を残すことにより、本発明
に係る回折格子形状が得られる。
First, as shown in FIG. 2(A), a photoresist 9 is applied to a substrate 1 to a thickness of about fifiLm by spin cord, roll coating, dipping, or the like. Next, as shown in FIG. 3(B), by exposing and developing through a mask 10 having a diffraction grating pattern, as shown in FIG. 3(C).
A diffraction grating 8 as shown in is obtained. At this time, the diffraction grating shape according to the present invention can be obtained by adjusting the exposure conditions, development conditions, etc., and leaving resist residue in the concave portions between the convex portions of the first diffraction grating 8.

また、酸化絶縁膜を基板上に、蒸着、スパッター、CV
D等の方法により数gm程度の厚さで成膜した後、ドラ
イエツチングの条件を調節することにより上述の様な回
折格子形状を得ることもできる。
In addition, an oxide insulating film is deposited on the substrate by vapor deposition, sputtering, CV
A diffraction grating shape as described above can also be obtained by forming a film to a thickness of about several gm by a method such as D, and then adjusting the dry etching conditions.

又、凹部の厚さとしては、ピンホールの発生及び実効電
圧を考慮すると500〜5000人の厚さが望ましく、
更に2000人程度0厚さが素子構成1作成上の面を加
味すると好ましい。
In addition, the thickness of the recess is preferably 500 to 5000 mm, considering the occurrence of pinholes and the effective voltage.
Furthermore, it is preferable to have a zero thickness of about 2000, taking into consideration the aspects of manufacturing the element structure 1.

と述の回折格子形状により、少なくとも1回折格子構造
を有する基板における絶縁膜形成工程が省略され、製造
工程が簡略化される。また。
With the above-mentioned diffraction grating shape, the step of forming an insulating film on a substrate having at least one diffraction grating structure is omitted, and the manufacturing process is simplified. Also.

回折格子が基板と区着する面積が増大するため。This is because the area where the diffraction grating separates from the substrate increases.

液晶の充填時、つまり、真空注入時等の回折格子のはが
れ、破損を防止することができる。
It is possible to prevent the diffraction grating from peeling off or being damaged during liquid crystal filling, that is, during vacuum injection.

即ち1回折格子と基板との密着性が大きく向上し、素子
としての耐久性、安定性を増すことが出来る。
That is, the adhesion between the first diffraction grating and the substrate is greatly improved, and the durability and stability of the element can be increased.

又、上記実施例では片側にのみ回折格子を有する素子を
示しているが、基板の両対向面に回折格子を形成する場
合でも当然本発明は適用出来る。
Further, although the above embodiment shows an element having a diffraction grating on only one side, the present invention can of course be applied to a case where a diffraction grating is formed on both opposing surfaces of the substrate.

尚1本実施例に於ては、透過型の光変調素子を示してい
るが、例えば一方の基板に光反射膜を施して反射型の素
子とすることも可能である。
In this embodiment, a transmission type light modulation element is shown, but it is also possible to form a reflection type element by applying a light reflection film to one of the substrates, for example.

但し1反射型の場合、素子内に於る回折光の挙動が複雑
となる為、設計や実際の表示素子等の応用面を考慮すれ
ば、本発明では透過型の光変調素子とするのが望ましい
However, in the case of a 1-reflection type, the behavior of diffracted light within the element becomes complicated, so in consideration of the design and application of actual display elements, it is preferable to use a transmission type light modulation element in the present invention. desirable.

この場合は、当然の事ながら、回折格子、屈折率可変物
質、及び基板等は使用波長に対して透過性を有する部材
を用いる。
In this case, as a matter of course, the diffraction grating, the refractive index variable material, the substrate, etc. are made of members that are transparent to the wavelength used.

〈発明の効果〉 以上1本発明に係る光変調素子は、素子作成・時の一工
程を省略出来、基板に対する回折格子の密着性が高いこ
とから耐久性、信頼性に優れた光変調素子となっている
<Effects of the Invention> The light modulation device according to the present invention can omit one step of device fabrication, and the adhesion of the diffraction grating to the substrate is high, making it a highly durable and reliable light modulation device. It has become.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の回折格子を有する光変調素子を示す図。 第2図は本発明に係る光変調素子の一例を示す概略構成
図。 第3図(A)、(B)、(C)は本発明の回折格子、構
造を得る為の製造方法を示す図。 1−−−−−−−−−−一基板
FIG. 1 is a diagram showing a conventional light modulation element having a diffraction grating. FIG. 2 is a schematic configuration diagram showing an example of a light modulation element according to the present invention. FIGS. 3A, 3B, and 3C are diagrams showing a manufacturing method for obtaining the diffraction grating and structure of the present invention. 1---------One board

Claims (5)

【特許請求の範囲】[Claims] (1)一対の基板と該一対の基板の相対する面の少なく
とも一方に形成した回折格子と該一対の基板の相対する
面間に存する屈折率可変物質と該屈折可変物質の屈折率
を制御する手段とを有する素子であって、前記回折格子
は凹凸のレリーフパターンから成り、該レリーフパター
ン凹部が隣接する凸部と同一部材で形成され、パターン
が連続している光変調素子。
(1) A pair of substrates, a diffraction grating formed on at least one of opposing surfaces of the pair of substrates, a refractive index variable material existing between the opposing surfaces of the pair of substrates, and controlling the refractive index of the refractive index variable material. said diffraction grating is comprised of an uneven relief pattern, said relief pattern depressions are formed of the same material as adjacent projections, and the pattern is continuous.
(2)前記屈折率可変物質が液晶である特許請求の範囲
第(1)項記載の光変調素子。
(2) The light modulation element according to claim (1), wherein the refractive index variable material is a liquid crystal.
(3)前記凹部の厚みT_0が500Å≦T_0≦50
00Åである特許請求の範囲第(1)項記載の光変調素
子。
(3) The thickness T_0 of the recess is 500 Å≦T_0≦50
00 Å.
(4)前記基板と前記屈折率可変物質が使用波長に対し
て透明である特許請求の範囲第(1)項記載の光変調素
子。
(4) The light modulation element according to claim (1), wherein the substrate and the variable refractive index material are transparent to the wavelength used.
(5)前記液晶の配向方向を電界により変化せしめる特
許請求の範囲第(2)項記載の光変調素子。
(5) The light modulation element according to claim (2), wherein the orientation direction of the liquid crystal is changed by an electric field.
JP61081395A 1986-04-08 1986-04-08 Light modulating element Pending JPS62237427A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61081395A JPS62237427A (en) 1986-04-08 1986-04-08 Light modulating element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61081395A JPS62237427A (en) 1986-04-08 1986-04-08 Light modulating element

Publications (1)

Publication Number Publication Date
JPS62237427A true JPS62237427A (en) 1987-10-17

Family

ID=13745113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61081395A Pending JPS62237427A (en) 1986-04-08 1986-04-08 Light modulating element

Country Status (1)

Country Link
JP (1) JPS62237427A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6714571B2 (en) * 2000-03-29 2004-03-30 Pioneer Corporation Ridge type semiconductor laser of distributed feedback

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6714571B2 (en) * 2000-03-29 2004-03-30 Pioneer Corporation Ridge type semiconductor laser of distributed feedback

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