JPS62225839A - Machinery installed within clean room - Google Patents
Machinery installed within clean roomInfo
- Publication number
- JPS62225839A JPS62225839A JP61067486A JP6748686A JPS62225839A JP S62225839 A JPS62225839 A JP S62225839A JP 61067486 A JP61067486 A JP 61067486A JP 6748686 A JP6748686 A JP 6748686A JP S62225839 A JPS62225839 A JP S62225839A
- Authority
- JP
- Japan
- Prior art keywords
- clean room
- plate
- substantially parallel
- clean
- airflow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 abstract description 3
- 239000004925 Acrylic resin Substances 0.000 abstract description 2
- 229920000178 Acrylic resin Polymers 0.000 abstract description 2
- 238000009499 grossing Methods 0.000 abstract 4
- 239000000428 dust Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000779 smoke Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/163—Clean air work stations, i.e. selected areas within a space which filtered air is passed
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、クリーンルームと称され半導体装置の製造プ
ロセス等において用いられる室の中に設置される機器に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to equipment installed in a room called a clean room and used in the manufacturing process of semiconductor devices.
本発明は、上記の様な機器において、クリーンルーム内
の気流に対して略平行な面に上記気流に対する整流板を
設けることによって、機器が常に清浄な状態に保持され
得る様にしたものである。According to the present invention, in the above-mentioned equipment, a rectifying plate for the airflow is provided on a plane substantially parallel to the airflow in the clean room, so that the equipment can be maintained in a clean state at all times.
クリーンルームでは、室内の浮遊塵埃濃度を低減させる
ために、フィルタで濾過した清浄気体を室内へ導き、室
内から排出させた気体を濾過後、再度循環させている。In a clean room, in order to reduce the concentration of suspended dust in the room, clean gas that has been filtered is introduced into the room, and the gas exhausted from the room is filtered and circulated again.
このために、クリーンルームには気流発生手段が設けら
れている。For this purpose, the clean room is provided with airflow generating means.
クリーンルーム内の気流方式には°、垂直層流方式や水
平層流方式等がある。例えば垂直層流方式では、第７図
及び第８図に矢印で示す様に、クリーンルーム内を上方
から下方へ気体が流れる。Airflow methods in clean rooms include vertical laminar flow and horizontal laminar flow. For example, in the vertical laminar flow system, gas flows from the top to the bottom in the clean room, as shown by arrows in FIGS. 7 and 8.
ところが、第７図及び第８図の矢印から明らかな様に、
クリーンルーム内に設置されている機器１１．１２のう
ちで気流に対して略平行な面の近傍には、機器１１．１
２の角部のために乱流が生じる。However, as is clear from the arrows in Figures 7 and 8,
Among the devices 11.12 installed in the clean room, there are some devices 11.1 near the plane that is approximately parallel to the airflow.
Turbulence occurs due to the corners of 2.
そ゛してこの様な乱流があると、風下に滞留している浮
遊塵埃が、巻き上げられたり或いは乱流の渦中にとり込
まれたりする。この結果、機器１１．１２が清浄な状態
には保持され得す、これらの機器１１．１２を用いて製
造や検査等の過程にある半導体装置等も汚染されてしま
う。When there is such turbulence, floating dust staying on the downwind side is kicked up or taken into the swirl of the turbulent flow. As a result, even though the devices 11, 12 can be maintained in a clean state, semiconductor devices and the like that are being manufactured or tested using these devices 11, 12 are also contaminated.
なお、機器１１．１２の角部に丸味や斜面を形成する面
取りを行っても、上述の様な乱流の発生を防止すること
はできない。Note that even if the corners of the devices 11 and 12 are rounded or chamfered to form slopes, the occurrence of turbulence as described above cannot be prevented.
本発明による機器２１．２６では、クリーンルーム内の
気流に対して略平行な面２１ａ、２６ａに上記気流に対
する整流板２２〜２４が設けられている。In the equipment 21, 26 according to the present invention, rectifier plates 22 to 24 for the airflow are provided on surfaces 21a and 26a that are substantially parallel to the airflow in the clean room.
本発明によるｎ、器２１．２６では、クリーンルーム内
の気流に対して略平行な面２１ａ、２６ａに上記気流に
対する整流板２２〜２４が設けられているので、風下に
滞留している浮遊塵埃が巻き上げられたり或いは乱流の
渦中に取り込まれるということがない。In the container 21, 26 according to the present invention, the rectifying plates 22 to 24 for the air flow are provided on the surfaces 21a and 26a that are substantially parallel to the air flow in the clean room, so that floating dust accumulated in the leeward direction can be removed. There is no chance of being rolled up or caught in the vortex of turbulence.
以下、本発明の第１及び第２実施例を第１図〜第６図を
参照しながら説明する。Hereinafter, first and second embodiments of the present invention will be described with reference to FIGS. 1 to 6.
第１図〜第５図が、第１実施例を示している。1 to 5 show a first embodiment.
第１図に示す様に、この第１実施例による機器２１は、
第７図に示した第１従来例の機器１１のうちで気流に対
して略平行な一つの面２１ａ側の上方の角部に整流板２
２が取り付けられているものである。As shown in FIG. 1, the device 21 according to the first embodiment includes:
In the first conventional device 11 shown in FIG.
2 is attached.
この様な整流板２２が取り付けられていると、第１図に
矢印で示す様に、少な（とも面２１ａ側ではこの面２１
ａに沿って気体がスムーズに流れ、第７図に示した様に
面２１ａの近傍で乱流が生じることはない。When such a rectifying plate 22 is attached, as shown by the arrow in FIG.
The gas flows smoothly along the direction a, and no turbulence occurs near the surface 21a as shown in FIG.
従って、機器２１のうちで面２１ａで作業を行えば、製
造や検査過程にある半導体装置等が汚染されることはな
い。言い変えれば、機器２１のうちで作業面側の上方の
角部に整流板２２を取り付ければよい。Therefore, if work is performed on the surface 21a of the equipment 21, semiconductor devices and the like that are in the manufacturing or testing process will not be contaminated. In other words, the current plate 22 may be attached to the upper corner of the device 21 on the work surface side.
整流板としては、第１図及び第２図に示す整流板２２の
他に、第３図や第４図に夫々示す整流板２３や２４を用
いてもよい。As the current plate, in addition to the current plate 22 shown in FIGS. 1 and 2, current plates 23 and 24 shown in FIGS. 3 and 4, respectively, may be used.
第２図〜第４図において、整流板２２〜２４の寸法及び
取付状態をＬ＝１５０鶴、ｔ＝３龍、５＝３０龍、θ＝
１５°として機器２１の紙製の模型（大きさは５００Ｘ
５００Ｘ５００鶴）に取り付けると共に、風速＝２０〜
３０ｃｍ／秒の気流と線香の煙とを用いて実験を行い、
模型の表面上約１０龍の煙の流れを目視したところ、煙
の下方への流速Ｖは整流板２４の場合に最も早く整流板
２２の場合に最も遅かった。In Figures 2 to 4, the dimensions and mounting conditions of the rectifying plates 22 to 24 are L = 150 Tsuru, t = 3 Dragon, 5 = 30 Dragon, θ =
A paper model of equipment 21 (size is 500X
500X500 Tsuru) and wind speed = 20~
An experiment was conducted using an airflow of 30 cm/sec and incense smoke.
When the smoke flow of about 10 degrees on the surface of the model was visually observed, the downward flow velocity V of smoke was fastest in the case of the rectifier plate 24 and slowest in the case of the rectifier plate 22.
なお整流板２２〜２４は、金属板やアクリル樹脂等から
成るプラスチック板等であってもよく、第５図に示す様
な取付金具２５等を用いて機器２１に容易に取り付けら
れ得る。Note that the rectifying plates 22 to 24 may be metal plates, plastic plates made of acrylic resin, or the like, and can be easily attached to the device 21 using mounting fittings 25 as shown in FIG. 5.
第６図は、第２実施例を示している。この第２実施例に
よる機器２６は、第８図に示した第２従来例の機器１２
に第３図に示した整流板２３が取り付けられているもの
であり、面２６ａ、２６ｂを作業面としている。FIG. 6 shows a second embodiment. The device 26 according to the second embodiment is similar to the device 12 of the second conventional example shown in FIG.
The rectifying plate 23 shown in FIG. 3 is attached to the rectifying plate 23, and the surfaces 26a and 26b are used as working surfaces.
この様な機器２６でも、少なくとも面２６ａ、２６ｂつ
まり作業面の近傍では気体がスムーズに流れて乱流が生
じることがなく、作業面が常に清浄な状態に保持され得
る。Even in such a device 26, the gas flows smoothly at least in the vicinity of the surfaces 26a and 26b, that is, the work surface, and no turbulence occurs, so that the work surface can always be maintained in a clean state.
なお、以上の記載におけるクリーンルームとは、クリー
ンベンチをも含む広義のもの゛である。Note that the clean room in the above description is in a broad sense, including a clean bench.
本発明による機器では、風下に滞留している浮ａｍ埃が
巻き上げられたり或いは乱流の渦中に取り込まれるとい
うことがないので、機器が常に清浄な状態に保持され得
る。In the equipment according to the present invention, the equipment can be maintained in a clean state at all times, since the airborne dust staying downwind is not kicked up or taken into the vortex of turbulence.
第１図は本発明の第１実施例を示す側面図、第２図〜第
４図は各種の整流板を示す側面図、第５図は第４図に示
した整流板とその取付金具とを示す斜視図、第６図は第
２実施例を示す側面図である。
第７図及び第８図は本発明の夫々第１及び第２従来例を
示す側面図である。
なお図面に用いた符号において、
２１．２６・・−一−−−・−・・−・・・−・・機器
２１ａ、２６ａ・−・・・−・・・面
２２〜２４−・・−・−−一−−・−・・整流板である
。Fig. 1 is a side view showing the first embodiment of the present invention, Figs. 2 to 4 are side views showing various rectifying plates, and Fig. 5 shows the rectifying plate and its mounting bracket shown in Fig. 4. FIG. 6 is a side view showing the second embodiment. FIGS. 7 and 8 are side views showing first and second conventional examples of the present invention, respectively. In addition, in the codes used in the drawings, 21.26...-1---...-...-... Equipment 21a, 26a...-... Surfaces 22-24-...-・−−1−−・−・・It is a rectifier plate.
Claims (1)
への気流を前記クリーンルーム内に発生させる手段が前
記クリーンルームに設けられている機器において、 前記気流に対して略平行な面に前記気流に対する整流板
が設けられていることを特徴とするクリーンルーム内に
設置される機器。[Scope of Claims] A device installed in a clean room, in which means for generating an air flow in a predetermined direction in the clean room is provided in the clean room, the device being installed in a plane substantially parallel to the air flow. A device installed in a clean room, characterized in that a rectifier plate for the airflow is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61067486A JPS62225839A (en) | 1986-03-26 | 1986-03-26 | Machinery installed within clean room |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61067486A JPS62225839A (en) | 1986-03-26 | 1986-03-26 | Machinery installed within clean room |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62225839A true JPS62225839A (en) | 1987-10-03 |
Family
ID=13346356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61067486A Pending JPS62225839A (en) | 1986-03-26 | 1986-03-26 | Machinery installed within clean room |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62225839A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0271033A (en) * | 1988-09-05 | 1990-03-09 | Hitachi Ltd | Clean room |
| JPH0972587A (en) * | 1995-09-08 | 1997-03-18 | Shin Nippon Kucho Kk | Air stream control structure in clean room |
| US6543981B1 (en) * | 2001-03-30 | 2003-04-08 | Lam Research Corp. | Apparatus and method for creating an ultra-clean mini-environment through localized air flow augmentation |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5926525B2 (en) * | 1975-06-23 | 1984-06-28 | 川崎製鉄株式会社 | Canopy forming and mounting device for rectangular parallelepiped packages |
-
1986
- 1986-03-26 JP JP61067486A patent/JPS62225839A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5926525B2 (en) * | 1975-06-23 | 1984-06-28 | 川崎製鉄株式会社 | Canopy forming and mounting device for rectangular parallelepiped packages |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0271033A (en) * | 1988-09-05 | 1990-03-09 | Hitachi Ltd | Clean room |
| JPH0972587A (en) * | 1995-09-08 | 1997-03-18 | Shin Nippon Kucho Kk | Air stream control structure in clean room |
| US6543981B1 (en) * | 2001-03-30 | 2003-04-08 | Lam Research Corp. | Apparatus and method for creating an ultra-clean mini-environment through localized air flow augmentation |
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