JPS62225273A - Production of grooved substrate - Google Patents
Production of grooved substrateInfo
- Publication number
- JPS62225273A JPS62225273A JP61067437A JP6743786A JPS62225273A JP S62225273 A JPS62225273 A JP S62225273A JP 61067437 A JP61067437 A JP 61067437A JP 6743786 A JP6743786 A JP 6743786A JP S62225273 A JPS62225273 A JP S62225273A
- Authority
- JP
- Japan
- Prior art keywords
- coating film
- grooved substrate
- substrate
- grooved
- thickener
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 43
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000576 coating method Methods 0.000 claims abstract description 42
- 239000011248 coating agent Substances 0.000 claims abstract description 41
- 239000002562 thickening agent Substances 0.000 claims abstract description 9
- 238000012546 transfer Methods 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 15
- 239000002202 Polyethylene glycol Substances 0.000 claims description 10
- 229920001223 polyethylene glycol Polymers 0.000 claims description 10
- 150000002902 organometallic compounds Chemical class 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000006223 plastic coating Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 238000010304 firing Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 10
- 239000007788 liquid Substances 0.000 abstract description 2
- 239000004033 plastic Substances 0.000 abstract description 2
- 229920003023 plastic Polymers 0.000 abstract description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- -1 polyethylene Polymers 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920002582 Polyethylene Glycol 600 Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は溝つき基板の製造方法に関し、特に光デイスク
用溝つき基板および回折格子等に使用する溝つき基板の
製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a grooved substrate, and more particularly to a method of manufacturing a grooved substrate for use in optical disks, diffraction gratings, and the like.
従来、光デイスク基板等に用いる溝つき基板の製造方法
としては、ガラス等の基板上に７オトレジスト膜を塗布
した後、レーザー露光装置を用いてフォトレジスト膜を
レーザー光で選択的に露光し、現像、処理後ドライエン
チング等のエツチング処理を行なう方法が知られている
。Conventionally, as a method for manufacturing grooved substrates used for optical disk substrates, etc., a photoresist film is coated on a substrate such as glass, and then the photoresist film is selectively exposed to laser light using a laser exposure device. A method of performing an etching process such as dry etching after development and processing is known.
上記フォトレジスト法によればガラス等の基板上にミク
ロン間隔の溝を正確に作成できる利点を有するものの、
レーザー光を用いての選択露光にあたり７枚のディスク
状基板作成に数７０分もの露光操作時間がかかり生産性
が悪いという問題点があった。又レーザーを用いる高精
度の露光装置は極めて高価であるとともに精度の確保に
繁雑な操作が必要であるという問題点があった。Although the photoresist method described above has the advantage of being able to accurately create grooves at micron intervals on a substrate such as glass,
There was a problem in that selective exposure using laser light required several 70 minutes of exposure operation time to prepare seven disc-shaped substrates, resulting in poor productivity. Further, high-precision exposure apparatuses using lasers are extremely expensive and require complicated operations to ensure precision.
上記問題点の解決方法として、基板上に有機金属化合物
を含む溶液の可塑性塗布膜を形成した後プレス型を押し
あてて該塗布膜上にプレス型の峰形状に対応する尚形状
を転写し、その後該塗布膜を焼成して固化させる溝つき
基板の製造方法が考えられる。（特願昭６０−２１１１
／り３）このプレス型を用いた溝つき基板の製造方法に
よれば、光デイスク基板に用いる溝つき基板な簡単な操
作により作製できる利点を有するものの、プレス型を塗
布膜に押しつけるタイミングをつかむのが難かしいため
型くづれやはぐり等の不良品を発生しやすいという問題
点があった。As a solution to the above problem, after forming a plastic coating film of a solution containing an organometallic compound on a substrate, a press die is pressed against the coating film to transfer a shape corresponding to the peak shape of the press die onto the coating film. A method of manufacturing a grooved substrate may be considered in which the coating film is then baked and solidified. (Special application 1986-2111
3) This method of manufacturing a grooved substrate using a press die has the advantage of being able to manufacture grooved substrates used for optical disk substrates with simple operations, but it is difficult to grasp the timing of pressing the press die against the coating film. Since it is difficult to process, there is a problem in that it is easy to produce defective products such as deformed or peeled-off products.
上記従来の問題点を解決するために１本発明は基板上に
有機金属化合物を含む溶液の可塑性塗布膜を形成した後
プレス型を押しあてて該塗布膜上にプレス型の峰形状に
対応する溝形状を転写し、その後該塗布膜を焼成して固
化させる溝つき基板の製造方法において、有機金属化合
物を含む溶液に増粘剤を加えている。In order to solve the above conventional problems, the present invention forms a plastic coating film of a solution containing an organometallic compound on a substrate, and then presses a press die onto the coating film to correspond to the peak shape of the press die. In a method for manufacturing a grooved substrate in which a groove shape is transferred and the coated film is then baked and solidified, a thickener is added to a solution containing an organometallic compound.
本発明に用いる有機金属化合物は重縮合あるいは架橋反
応がおこることによって溶液の粘性を上昇させるような
化合物であれば使用できる。The organometallic compound used in the present invention can be any compound that increases the viscosity of the solution by polycondensation or crosslinking reaction.
例えば５ｉ（ＯＣＲ）４．５ｉ（ＯＣ２Ｈ５）４ 、Ｔ
ｉ（ＯＣ３Ｈ７）４゜Ｔｉ（ＯＣ４Ｈ９）４＋Ｚｒ（Ｏ
Ｃ３Ｈ７）４．Ｚｒ（ＯＣ４Ｈ９）４゜ＡＪ（ＯＣ３Ｈ
７）３＋ＡＪ（ＯＣ４Ｈｇ）３＋ＮａＯＣ２Ｈ５等のＭ
（ＯＲ）ｎ〔ＭはＳｉ、Ｔｉ、Ｚｒ、Ｃａ、ｌ、Ｎａ、
Ｐｂ、Ｂ、Ｓｎ、Ｇｅ 等の金属、Ｒはメチル、エチル
等のアルキル基、ｎは／〜グの整数〕で示される通常ゾ
ル−ゲル法と呼ばれる方法に用いられる金属アルコラー
ト、および−Ｃ１、−ＣＯＯＨ、−ＣＯＯＲ、−ＮＨ２
。For example, 5i(OCR)4.5i(OC2H5)4, T
i(OC3H7)4゜Ti(OC4H9)4+Zr(O
C3H7)4. Zr(OC4H9)4゜AJ(OC3H
7) M such as 3+AJ(OC4Hg)3+NaOC2H5
(OR)n [M is Si, Ti, Zr, Ca, l, Na,
metal alcoholates such as Pb, B, Sn, Ge, etc.; R is an alkyl group such as methyl or ethyl; n is an integer of /~g]; and -C1, -COOH, -COOR, -NH2
.
等の重縮合あるいは架橋反応を行なう一般的官能基を含
む有機金属化合物等が例示できる。内でも金属アルコラ
ートが好まれて使用される。Examples include organometallic compounds containing general functional groups that perform polycondensation or crosslinking reactions. Among them, metal alcoholates are preferably used.
本発明に使用する増粘剤は、上記有機金属化合物を含む
溶液の粘性を増加させる効果を有し、塗布膜の形成を容
易にする。該増粘剤としては例えば水溶性でありかつ有
機溶媒に可溶な高分子拐料が好まれて使用される。内で
もポリエチレングリコールは形成された塗布膜が長詩間
やわらかい状態（適度な粘性状態）を推持するので好ま
れて使用される。The thickener used in the present invention has the effect of increasing the viscosity of the solution containing the organometallic compound, thereby facilitating the formation of a coating film. As the thickener, for example, a polymeric additive which is water-soluble and soluble in an organic solvent is preferably used. Among them, polyethylene glycol is preferably used because the formed coating film maintains a soft state (appropriate viscosity state) for a long time.
該ポリエチレングリコールの分子量としては３００−１
ｒ００のものが均一な分散溶液が得られやすいので好ま
れる。又ポリエチレングリコールを増粘剤として使用す
る際は該塗布液により生成される酸化物重量の０．３〜
／、１程度度の重量添加することが、増粘効果および作
成される膜質の劣化防止などの点で好まれる。The molecular weight of the polyethylene glycol is 300-1
The one with r00 is preferred because it makes it easier to obtain a uniform dispersion solution. In addition, when polyethylene glycol is used as a thickener, the amount of oxide produced by the coating solution is 0.3 to
It is preferable to add about 1/20% by weight in terms of thickening effect and prevention of deterioration of the quality of the formed film.
基板に形成される塗布膜は、基板を溶液に浸漬した後引
き上げる方法（通称ディッピング法）。A coating film is formed on a substrate using a method in which the substrate is immersed in a solution and then pulled up (commonly known as the dipping method).
溶液を滴下した後回転させる方法（通称スピンコード法
）およびスプレー法等の通常用いられている被膜作成方
法により作成される。塗布膜の膜厚は均一なものが好ま
れ、膜厚すぎると最終的に得られる被膜にクラック、は
くり等が生じやすくなるため０．／〜ＩＯμｍ厚のもの
が好ましい。It is created by commonly used coating methods such as a method of dropping a solution and then rotating it (commonly known as a spin code method) and a spray method. It is preferable that the thickness of the coating film be uniform; if the film is too thick, cracks, peeling, etc. will easily occur in the final film, so the thickness of the coating film should be 0. A thickness of /~IO μm is preferable.
峰形状を有するプレス型の篩部の高さは、最終的に要求
される基板の溝の深さによって決められる。波長ｒ３０
ｎｍのレーザー光を用いた光ディスクとして要求される
溝の深さは約７０ｎｍであるので、焼成処理による塗布
膜の膜厚の収縮分を見こんだ深さである０、１〜０．３
μｍの峰高さが光デイスク用基板を作成する峰高さとし
て好まれる。又、回折格子用の基板を作成するには回折
格子とじて必要とされる溝の深さ約ｐｏｏｎｍを作成す
る。、ｔｒ〜／Ｊμｍの峰高さのものが好まれる。The height of the press-type sieve portion having a peak shape is determined by the ultimately required depth of the grooves in the substrate. Wavelength r30
The depth of the groove required for an optical disc using a nm laser beam is approximately 70 nm, so the depth is 0.1 to 0.3, taking into account the shrinkage of the coating film thickness due to the baking process.
A peak height of μm is preferred as a peak height for producing an optical disk substrate. Furthermore, in order to create a substrate for a diffraction grating, grooves with a depth of approximately poonm required for the diffraction grating are created. , tr~/Jμm peak height is preferred.
節形状を有するプレス型の峰のピッチも最終的に要求さ
れる基板の溝のピンチにより決められるが、本発明に用
いられる程度の膜厚では面方向の収縮がほとんど無視で
きるので光デイスク用基板を作成する峰のピッチとして
は最終的に要求されるピッチである約へ６〜２５０μｍ
間隔が、回折格子として使用するのであれば、７〜１０
０μｍピッチのものが好まれて使用される。The pitch of the ridges of the press mold having a knot shape is also determined by the pinch of the groove of the substrate that is ultimately required, but with the film thickness used in the present invention, shrinkage in the planar direction can be almost ignored. The pitch of the ridges to be created is approximately 6 to 250 μm, which is the final required pitch.
If the spacing is used as a diffraction grating, the spacing is 7 to 10.
Those with a pitch of 0 μm are preferably used.
上記プレス型は金属製であってもポリエチレン。Even though the press mold above is made of metal, it is made of polyethylene.
ポリプロピレン、７ノ素樹脂等のプラスチック製であっ
てもよい。内でも耐久性の点から金属性のものが好まし
いが、プレス回数の少ない場合には塗布膜と反応せず安
価な有機物のプレス型であるポリエチレンやポリプロピ
レン、フッ素樹脂等が使用できる。It may also be made of plastic such as polypropylene or 7-base resin. Of these, metallic materials are preferred from the viewpoint of durability, but when the number of times of pressing is small, organic pressing materials such as polyethylene, polypropylene, fluororesin, etc., which do not react with the coating film and are inexpensive, can be used.
上記プレス型は塗布膜が可塑性を有する間に塗布膜に押
しあてられるが、塗布膜の粘度は１０〜１０５ポイズで
あることが好まれる。ここで塗布膜の粘度が１０ポイズ
より小さいと、プレス型を押しあてて、けなした時に塗
布膜が流動して溝形状がくずれやすく、又塗布膜の粘度
が７０５ボイスより大きいとプレス型を押しあてても溝
形状が形成されなかったり塗布膜が基板からはがれ落ち
たりする欠点となりやすい。The press mold is pressed against the coating film while the coating film has plasticity, and the viscosity of the coating film is preferably 10 to 10 5 poise. If the viscosity of the coating film is less than 10 poise, the coating film will flow when the press die is pressed against it and the groove shape will be easily distorted, and if the viscosity of the coating film is greater than 705 poise, the press die will be pressed. Even if it is applied, the groove shape is not formed or the coating film tends to peel off from the substrate.
又１０ポイズより小さい粘度の塗布膜にプレス型をおし
あてて、そのおしあてた状態で塗布膜の加水分解等の固
化反応を進行させ、粘度が１０ホ゛イズ以上になった時
点でプレス型を剥離することによっても上記と同様の効
果を有するので好ましい。In addition, a press mold is applied to a coating film with a viscosity lower than 10 poise, and solidification reactions such as hydrolysis of the coating film are allowed to proceed in the pressed state, and when the viscosity reaches 10 poise or more, the press mold is pressed. It is also preferable to peel off the film because the same effect as above can be obtained.
上記操作によりプレス型の節形状に対応する溝が転写さ
れた塗布膜は焼成され固化されるが、２００℃以上の温
度で焼成することが塗布膜中の残留有機物等が揮発分解
するので好ましい。又塗布膜は上記焼成によりガラス質
類似の被膜となることが耐久性や光学的性質上好ましい
。Through the above operation, the coating film onto which the grooves corresponding to the nodal shapes of the press mold have been transferred is baked and solidified, but it is preferable to bake at a temperature of 200° C. or higher because residual organic substances in the coating film will be volatile and decomposed. Further, it is preferable for the coating film to become a glass-like film by the above-mentioned baking in terms of durability and optical properties.
実施例−／
Ｓｉ−テトラエトキサイドとβ−トリイソプロポキサイ
ドとを５１０２及びＢ２Ｏ３となった時のモル比として
ＩＯ：２０となるようにそれぞれ秤量し、このＳｉ−テ
トラエトキサイドにモル比で５倍のエタノールと６倍の
水（６ｗｔ％のＨＮＯ３を含む）を加え、約７０°Ｃで
１時間還流した後、β−トリイソプロポキサイドを滴加
し、さらに弘時間還流を行なう。この溶液に等量のエタ
ノールを加え希釈し、さらに分子■６００のポリエチレ
ングリコール（ＰＥＧ６００ ）を、最終生成物である
５ｉ０２とＢ２Ｏ３の混合された酸化物に対するモル比
で（ＰＥＧ６００） ／（酸化物）−０，／３の毒を加
え、均一に溶かしたものを塗布溶液とした。Example-/Si-tetraethoxide and β-triisopropoxide were each weighed so that the molar ratio when it became 5102 and B2O3 was IO:20, and the molar ratio of Si-tetraethoxide was added to the Si-tetraethoxide. After adding 5 times ethanol and 6 times water (containing 6 wt% HNO3) and refluxing at about 70°C for 1 hour, β-triisopropoxide was added dropwise and refluxing was continued for an additional hour. This solution was diluted by adding an equal amount of ethanol, and then polyethylene glycol (PEG600) with a molecular weight of 600 was added at a molar ratio of (PEG600) / (oxide) to the final product, a mixed oxide of 5i02 and B2O3. A coating solution was prepared by adding -0./3 poison and dissolving it uniformly.
この塗布溶液中へ、洗浄および乾燥を行なったガラス基
板／を浸漬した後ゆっくりと引きあげて、ガラス基板／
上に塗布膜を作成した。After dipping the washed and dried glass substrate/into this coating solution, the glass substrate/
A coating film was created on top.
この塗布膜は長時間空気中に保持しても粘性に変化がみ
られず、クリーム状で粘度としては１０２〜ｌＯ３ポイ
ズ程度であった。This coating film showed no change in viscosity even when kept in air for a long time, and was cream-like with a viscosity of about 102 to 103 poise.
峰巾２μｍ、峰間隔ｑμｍの多数の篩部な有する金５製
の型を押しあて５分間保持した後ゆっくりと引きはなし
た。その後前記プレス型の節形状に対応する溝形状の転
写された塗布膜つきガラス板をゆっくりと加熱して最終
的にダ５０″０２時間の焼成を行なった。この焼成操作
により塗布膜はエタノールおよび水分等が飛散してガラ
ス体類似の約０９７２μｍ厚の非晶質膜コとなっていた
。A mold made of gold 5 having a large number of sieves with a peak width of 2 μm and a peak interval of q μm was pressed against the mold, held for 5 minutes, and then slowly pulled out. Thereafter, the glass plate with the coated film on which the groove shape corresponding to the nodal shape of the press die was transferred was slowly heated and finally fired for 2 hours.This baking operation allowed the coated film to be coated with ethanol and Moisture etc. were scattered and an amorphous film with a thickness of approximately 0,972 μm similar to a glass body was formed.
上記操作により作成された溝つき基板３０表面を光学顕
微鏡により観察した断簡７図に示すような溝深さ約７２
ｎｍ、溝巾約２μｍ、溝間隔釣りμｍの良好な溝形状が
作成されていた。The groove depth is approximately 72 mm as shown in Figure 7, which is a fragment of the surface of the grooved substrate 30 created by the above operation observed with an optical microscope.
A good groove shape with a groove width of approximately 2 μm and a groove spacing of approximately μm was created.
実施例−２
Ｓｉ−テトラエトキサイドを７モル秤ｆｌｔＬ、これに
７３モルのエタノールと６モルの水を加えさらに、分子
１６００のポリエチレングリコール（ＰＥＧ６００）を
、最終生成物である５１０２に対するモル比で（ＰＥＧ
６００）／（Ｓｉ０２）−ｏ、／ｓの量を加え均一に溶
かしたものを塗布溶液とした。Example 2 Weigh 7 moles of Si-tetraethoxide (fltL), add 73 moles of ethanol and 6 moles of water, and add polyethylene glycol (PEG600) with a molecular weight of 1600 at a molar ratio of 5102 to the final product. (PEG
600)/(Si02)-o,/s was added and uniformly dissolved to prepare a coating solution.
によりガラス基板上に塗布膜を作成し、金属製の型を押
しあてプレスし、≠５０°Ｃ２時間の焼成を行なった。A coating film was created on a glass substrate, pressed with a metal mold, and baked at ≠50°C for 2 hours.
上記の操作により作成された溝つき基板の表面を光学顕
微鏡により観察した所、実施例／同様第１図に示すよう
な良好な溝形状が作成されていた。When the surface of the grooved substrate prepared by the above operation was observed using an optical microscope, it was found that a good groove shape as shown in FIG. 1 was formed as in the example.
本発明によれば、従来短かかった塗布膜がプレス作業に
適当な粘度を有する時間（プレス作業時間）が大巾に長
くなり作業性が向上している。そのため非常に安定した
生産を行なうことができる。According to the present invention, the time required for the coating film to have a viscosity suitable for press operation (press operation time), which conventionally took a short time, is greatly lengthened, and workability is improved. Therefore, very stable production can be achieved.
又塗布液自体の粘度（初期粘度）を従来よりも高くする
ことにより１回の塗布作業により形成される塗布膜の膜
厚を従来よりも厚くすることができる。これはプレス成
形に必要な塗布膜の膜厚（比較的厚い膜）を形成する作
業を従来法よりも簡略化することになる。Furthermore, by making the viscosity (initial viscosity) of the coating liquid itself higher than before, the thickness of the coating film formed by one coating operation can be made thicker than before. This simplifies the work of forming a coating film (relatively thick film) necessary for press molding compared to the conventional method.
第１図は、本発明実施例により作成した溝つき基板の概
略を示す断面図である。
第１図FIG. 1 is a cross-sectional view schematically showing a grooved substrate produced according to an embodiment of the present invention. Figure 1
Claims (7)
膜を形成した後プレス型を押しあてて該塗布膜上にプレ
ス型の峰形状に対応する溝形状を転写し、その後該塗布
膜を焼成して固化させる溝つき基板の製造方法において
、前記溶液にあらかじめ増粘剤を加えておくことを特徴
とする溝つき基板の製造方法。(1) After forming a plastic coating film of a solution containing an organometallic compound on a substrate, a press die is pressed against the coating film to transfer a groove shape corresponding to the peak shape of the press die, and then the coating film is A method for producing a grooved substrate comprising firing and solidifying a grooved substrate, the method comprising adding a thickener to the solution in advance.
子材料である特許請求の範囲第１項記載の溝つき基板の
製造方法。(2) The method for manufacturing a grooved substrate according to claim 1, wherein the thickener is a polymeric material that is water-soluble and soluble in an organic solvent.
請求の範囲第１項又は第２項記載の溝つき基板の製造方
法。(3) The method for manufacturing a grooved substrate according to claim 1 or 2, wherein the thickener is polyethylene glycol.
り生成される酸化物重量の０．５〜１．８倍の重量添加
する特許請求の範囲第３項記載の溝つき基板の製造方法
。(4) The method for producing a grooved substrate according to claim 3, wherein the polyethylene glycol is added to the solution in an amount of 0.5 to 1.8 times the weight of the oxide produced by the solution.
請求の範囲第１項ないし第４項記載の溝つき基板の製造
方法。(5) The method for producing a grooved substrate according to any one of claims 1 to 4, wherein the organometallic compound is a metal alcoholate.
囲第１項ないし第５項記載の溝つき基板の製造方法。(6) A method for manufacturing a grooved substrate according to any one of claims 1 to 5, wherein the coating film is baked at 200° C. or higher.
時にプレス型を押しあてる特許請求の範囲第１項ないし
第６項記載の溝つき基板の製造方法。(7) The method for producing a grooved substrate according to any one of claims 1 to 6, wherein the coating film has a viscosity of 10 to 10^5 poise and is pressed against the press mold.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61067437A JPS62225273A (en) | 1986-03-26 | 1986-03-26 | Production of grooved substrate |
| US07/030,892 US4810547A (en) | 1986-03-26 | 1987-03-26 | Substrate with fine grooves and method for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61067437A JPS62225273A (en) | 1986-03-26 | 1986-03-26 | Production of grooved substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62225273A true JPS62225273A (en) | 1987-10-03 |
| JPH0359752B2 JPH0359752B2 (en) | 1991-09-11 |
Family
ID=13344900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61067437A Granted JPS62225273A (en) | 1986-03-26 | 1986-03-26 | Production of grooved substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62225273A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03101701A (en) * | 1990-05-24 | 1991-04-26 | Nippon Sheet Glass Co Ltd | Manufacture of substrate with fine pattern |
| US6535680B1 (en) | 1999-09-16 | 2003-03-18 | Nippon Sheet Glass Co., Ltd. | Process for producing an article having a predetermined surface shape and optical waveguide element |
| US6721485B1 (en) | 1999-08-04 | 2004-04-13 | Nippon Sheet Glass Co., Ltd. | Echelon diffraction grating and optical waveguide element |
| US6849209B2 (en) | 2000-02-25 | 2005-02-01 | Nippon Sheet Glass Co., Ltd. | Article having predetermined surface shape and method for production thereof |
| US6849350B2 (en) | 2001-02-28 | 2005-02-01 | Nippon Sheet Glass Co., Ltd. | Article having a predetermined surface shape and method for preparation thereof |
| JP2010513006A (en) * | 2006-12-19 | 2010-04-30 | デグサ ノヴァラ テクノロジー ソチエタ ペル アツィオーニ | Sol-gel method for producing protective coatings for polymer substrates |
| JP2012099731A (en) * | 2010-11-04 | 2012-05-24 | Ulvac Japan Ltd | Method of manufacturing substrate |
| US8896923B2 (en) | 2006-05-10 | 2014-11-25 | Oji Holdings Corporation | Corrugated pattern forming sheet, and methods for manufacturing antireflector, retardation plate, original process sheet plate, and optical element |
-
1986
- 1986-03-26 JP JP61067437A patent/JPS62225273A/en active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03101701A (en) * | 1990-05-24 | 1991-04-26 | Nippon Sheet Glass Co Ltd | Manufacture of substrate with fine pattern |
| US6721485B1 (en) | 1999-08-04 | 2004-04-13 | Nippon Sheet Glass Co., Ltd. | Echelon diffraction grating and optical waveguide element |
| US6535680B1 (en) | 1999-09-16 | 2003-03-18 | Nippon Sheet Glass Co., Ltd. | Process for producing an article having a predetermined surface shape and optical waveguide element |
| US6849209B2 (en) | 2000-02-25 | 2005-02-01 | Nippon Sheet Glass Co., Ltd. | Article having predetermined surface shape and method for production thereof |
| US6849350B2 (en) | 2001-02-28 | 2005-02-01 | Nippon Sheet Glass Co., Ltd. | Article having a predetermined surface shape and method for preparation thereof |
| US8896923B2 (en) | 2006-05-10 | 2014-11-25 | Oji Holdings Corporation | Corrugated pattern forming sheet, and methods for manufacturing antireflector, retardation plate, original process sheet plate, and optical element |
| JP2010513006A (en) * | 2006-12-19 | 2010-04-30 | デグサ ノヴァラ テクノロジー ソチエタ ペル アツィオーニ | Sol-gel method for producing protective coatings for polymer substrates |
| JP2012099731A (en) * | 2010-11-04 | 2012-05-24 | Ulvac Japan Ltd | Method of manufacturing substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0359752B2 (en) | 1991-09-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3751778B2 (en) | Method for producing sol-gel molded product | |
| US4810547A (en) | Substrate with fine grooves and method for manufacturing the same | |
| CN101051184B (en) | Large area micro nano structure soft impression method | |
| Krug et al. | Fine patterning of thin sol-gel films | |
| JPS62225273A (en) | Production of grooved substrate | |
| JPH0411931B2 (en) | ||
| JPH06114334A (en) | Method for forming very fine recessed and projected pattern on base | |
| JPH02305612A (en) | Manufacture of board with fine pattern | |
| DE10217089A1 (en) | Transfer process for the production of microstructured substrates | |
| JP2516227B2 (en) | Grooved substrate manufacturing method | |
| JPH01131031A (en) | Production of glass transfer body | |
| JPH02283638A (en) | Production of substrate with very fine pattern | |
| CN108957624B (en) | Transfer printing method of micro-nano structure on end face of optical fiber | |
| JPH0349057A (en) | Stamper | |
| JP2004230471A (en) | Ceramic fine pattern forming method | |
| JPH0327002A (en) | Production of optical waveguide | |
| JPS62231901A (en) | Production of blazed diffraction grating | |
| JP2005053006A (en) | Method for manufacturing micro-molded product | |
| JPH04321953A (en) | Method and device for manufacturing substrate with minute pattern | |
| CN113759451B (en) | Curved surface grating processing device and preparation method | |
| JPS62203101A (en) | Manufacture of optical element with fine pattern on surface and die used therefor | |
| JPS6021215A (en) | Manufacture of fine pattern | |
| JPS63158168A (en) | Preparation of grooved substrate | |
| JPS63153746A (en) | Production of grooved substrate | |
| JPH01161302A (en) | Manufacture of holographic rating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |