JPS62219452A - High frequency induction coupling plasma mass spectrograph - Google Patents
High frequency induction coupling plasma mass spectrographInfo
- Publication number
- JPS62219452A JPS62219452A JP61062591A JP6259186A JPS62219452A JP S62219452 A JPS62219452 A JP S62219452A JP 61062591 A JP61062591 A JP 61062591A JP 6259186 A JP6259186 A JP 6259186A JP S62219452 A JPS62219452 A JP S62219452A
- Authority
- JP
- Japan
- Prior art keywords
- high frequency
- plasma
- inductively coupled
- coupled plasma
- mass spectrometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000006698 induction Effects 0.000 title claims abstract description 19
- 230000008878 coupling Effects 0.000 title 1
- 238000010168 coupling process Methods 0.000 title 1
- 238000005859 coupling reaction Methods 0.000 title 1
- 150000002500 ions Chemical class 0.000 claims abstract description 30
- 238000009616 inductively coupled plasma Methods 0.000 claims description 18
- 239000003990 capacitor Substances 0.000 claims description 3
- 239000012491 analyte Substances 0.000 claims 1
- 239000004020 conductor Substances 0.000 abstract description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052802 copper Inorganic materials 0.000 abstract description 6
- 239000010949 copper Substances 0.000 abstract description 6
- 238000004458 analytical method Methods 0.000 abstract description 5
- 239000000919 ceramic Substances 0.000 abstract description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000012212 insulator Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 3
- 239000000443 aerosol Substances 0.000 description 2
- 239000006199 nebulizer Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
Landscapes
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、高周波誘導結合プラズマと質量分析計を結合
させてなる高周波誘導結合プラズマ・質量分析計（Ｉｎ
ｄｕｃｔｉｖｅｌｙ Ｃｏｕｐｌｅｄ Ｐｌａｓｍａ−
ＭａｓｓＳｐｅｃｔｒｏｍｅｔｅｒ、以下ｒｌｃＰ−Ｍ
ＳＪと略す）に関する。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a high frequency inductively coupled plasma/mass spectrometer (Industrial Application Field) which combines a high frequency inductively coupled plasma and a mass spectrometer.
ductively coupled plasma-
Mass Spectrometer, hereinafter rlcP-M
(abbreviated as SJ).
〈従来の技術〉
ＩＣＰ−ＭＳは、高周波誘導結合プラズマを用いて試料
を励起させ、生じたイオンを、例えばノズルやスキマー
からなるインターフェイスを介して質量分析計に導いて
、特定質量のイオンを電気的に検出し、該イオン量を精
密に測定することによって、上記試料中の被測定元素等
を分析するように構成されている。第４図はこのような
ＩＣＰ−ＭＳの従来例要部構成説明図であり、図中、ｌ
は例えば、最外室１ａ、外室１ｂ、および内室１ｃを有
する三重管構造のプラズマトーチ、２は該トーチ１に巻
回された高周波誘導コイル、３は該コイル２にコンデン
サＣ，，Ｃ，を介して高周波電流を供給する高周波電源
、４は高周波誘導結合プラズマ５はノズル、６はスキマ
ーである。この図において、コイル２の中に上記高周波
電流が流されると該コイル２の周囲に高周波磁界（図示
せず）が形成される。この高周波磁界の近傍で上記プラ
ズマトーチｌ内のアルゴンガス中に電子かイオンが植え
付けられると、該高周波磁界の作用で瞬時にプラズマ４
が生じると共に、該プラズマが一定の高周波電位を有す
るようになる。一方、ノズル５やスキマー６は、通常、
アース接続されて接地電位を有している。このため、ノ
ズル５やスキマー６の先端とプラズマ４との間に放電が
生ずるようになる。<Prior art> ICP-MS uses high-frequency inductively coupled plasma to excite a sample, guides the generated ions to a mass spectrometer through an interface consisting of a nozzle or a skimmer, and electrolyzes ions with a specific mass. The device is configured to analyze the element to be measured in the sample by detecting the ions and precisely measuring the amount of the ions. FIG. 4 is an explanatory diagram of the main part configuration of a conventional example of such an ICP-MS, and in the figure, l
For example, numeral 2 is a plasma torch with a triple tube structure having an outermost chamber 1a, an outer chamber 1b, and an inner chamber 1c, numeral 2 is a high-frequency induction coil wound around the torch 1, and numeral 3 is a high-frequency induction coil wound around the torch 1. , 4 is a high frequency inductively coupled plasma 5 is a nozzle, and 6 is a skimmer. In this figure, when the high frequency current is passed through the coil 2, a high frequency magnetic field (not shown) is formed around the coil 2. When electrons or ions are planted in the argon gas in the plasma torch l near this high-frequency magnetic field, the plasma instantly forms due to the action of the high-frequency magnetic field.
occurs, and the plasma comes to have a constant high frequency potential. On the other hand, the nozzle 5 and skimmer 6 usually
It is connected to earth and has a ground potential. Therefore, discharge occurs between the tip of the nozzle 5 or the skimmer 6 and the plasma 4.
また、スキマー６の先端近辺の電位勾配は急となり、プ
ラズマ４からスキマー６内に引き出されるイオンは、ス
キマー６の先端近辺で加速されるようになる。従って、
スキマー６内に引き出されるイオンはプラズマ４内のイ
オンと種類もエネルギーも異なるものとなる。このよう
な理由でスキマー６内に引き出されたイオンは、上記プ
ラズマ４内で得られるイオンの良い特性が失われたもの
となり、イオンの分析に大きな誤差を与え究極的にＩＰ
Ｃ−ＭＳの精度を低下させるようになる。第５図は上述
の放電発生現象を更に詳しく説明するための第４図の等
価回路であり、図中、第４図と同一記号は同一意味をも
たせて使用する。また、Ｃ工、Ｃ１，ｌ、およびＣ６は
高周波誘導コイル２と高周波誘導結合プラズマ４（ｄは
該プラズマ４の中心であり、詐は該プラズマ４の等価抵
抗）との間の等価容量であり、ＣよおよびＲ１は夫々高
周波誘導結合プラズマ４と上記ノズル５との間の等価容
量および等価抵抗である。この第５図からも明らかなよ
うに、高岡″ａｉＩｉ導結合プラズマ４の中心ｄは、等
価容ｆａｃｔ、 ｃＭ、 ｃ、、 Ｃｘと等価抵抗Ｒ，
，Ｒ，で容量結合された高周波電位になっている。この
ため、上記中心ｄはアースに対して一定の高周波電位を
有しており、該電位が高い場合には、等価容量らを通じ
て前述のような放電を生ずるようになる。Further, the potential gradient near the tip of the skimmer 6 becomes steep, and ions drawn into the skimmer 6 from the plasma 4 are accelerated near the tip of the skimmer 6. Therefore,
The ions drawn into the skimmer 6 are different in type and energy from the ions in the plasma 4. For this reason, the ions drawn into the skimmer 6 lose the good characteristics of the ions obtained in the plasma 4, causing large errors in ion analysis and ultimately leading to IP
This will reduce the accuracy of C-MS. FIG. 5 is an equivalent circuit of FIG. 4 for explaining the above-mentioned discharge generation phenomenon in more detail, and in the figure, the same symbols as in FIG. 4 are used with the same meanings. Further, C, C1, l, and C6 are equivalent capacitances between the high frequency induction coil 2 and the high frequency inductively coupled plasma 4 (d is the center of the plasma 4, and d is the equivalent resistance of the plasma 4). , C, and R1 are the equivalent capacitance and equivalent resistance between the high frequency inductively coupled plasma 4 and the nozzle 5, respectively. As is clear from FIG. 5, the center d of Takaoka'aiIi conductively coupled plasma 4 has an equivalent capacity fact, cM, c, , Cx and an equivalent resistance R,
, R, and is capacitively coupled to a high frequency potential. Therefore, the center d has a constant high frequency potential with respect to the ground, and when this potential is high, the above-mentioned discharge occurs through the equivalent capacitance.
〈発明が解決しようとする問題点〉
本発明はかかる状況に鑑みてなされたものであり、その
目的は、上述のような放電を防止し高周波誘導結合プラ
ズマ内のイオンをそのまま質量分析計に導いて正確なイ
オン分析を行なうことができるようなＩＣＰ−ＭＳを提
供することにある。<Problems to be Solved by the Invention> The present invention was made in view of the above situation, and its purpose is to prevent the above-mentioned discharge and to guide ions in high-frequency inductively coupled plasma directly to a mass spectrometer. The object of the present invention is to provide an ICP-MS that can perform accurate ion analysis.
く問題点を解決するための手段〉
上述のような問題点を解決する本発明の特徴は、Ｉ Ｃ
Ｐ−ＭＳにおいて、高周波誘導コイルの中央部分の電位
とインターフェイスのイオン導入孔部分の電位とを略同
一に保つようにしたことにある。Means for Solving the Problems> The feature of the present invention for solving the above problems is that
In P-MS, the potential of the central portion of the high-frequency induction coil and the potential of the ion introduction hole portion of the interface are kept approximately the same.
〈実施例〉
以下、本発明について図を用いて詳しく説明する。第１
図は本発明実施例の要部構成説明図であり、図中、第４
図と同一記号は同一意味をもたせて使用しここでの重複
説明は省略する。また、５ａは例えば銅のような金属で
なる先端部、５ｂは例えばセラミクスでなる絶縁物、５
ｃは例えば銅のような金属でなるボディ、５″は先端部
５ａ、絶縁物５ｂ、およびボディ５ｃが一体的に結合さ
れてなるノズル、７は高周波誘導コイル２の中央部分と
上記先端部５ａを接続する導体である。第２図は第１図
の等価回路であり、図中、第１図、第４図、および第５
図における記号と同一記号は同一意味をもたせて使用し
、ここでの重複説明は省略する。また、ａはノズル５の
先端部５ａのうち導体７が接続される点、ｂは高周波誘
導コイル２の中央部分のうち導体７が接続される点、ｃ
ｏおよびＲ８はノズル５のボディ５Ｃと上記先端部５ａ
の間の等価容量および等価抵抗である。尚、等価容量Ｃ
６はアースに対して十分少さな値となるよう選ばれてい
る。また、ｂ点はコイル２の中央部分であればどこでも
よく、ノズル５ｃの先端部５ａ（厳密にはａ点）とプラ
ズマ４の中心ｄとの間の高周波電位が小さくなるよう選
ばれている。このような要部構成からなる本発明の実施
例において、高周波誘導コイル２の中央部分（例えばｂ
点）とノズル５の先ｍｆｉＢ５ａ（例えばａ点）うく導
体７で接続されているため、該先端部５ａとコイル２の
中央部分は略同一電位となっている。このため、高周波
誘導結合プラズマ４と上記先＠部３ａの間（即ち、第２
図の等価容量ＣＩ部分）で、前記従来例でみられたよう
な放電は発生しない。尚、本発明は、第１図や第２図の
実施例に限定されることなく種々の変形が可能であり、
例えば、次の（イ）若しくは（ロ）のような構成にして
もよいものとする。（イ）高周波誘導コイル２の端子に
外部回路（例えば共通端子ｅを介して互いに直列接続さ
れた２個のコンデンサを高周波誘導コイルに並列接続す
る回路等）を接続し、該回路の一部（例えば上記共通端
子ｅ）を、前記ノズル５゛の先端部５ａに導体７を介し
て接続させる。<Example> Hereinafter, the present invention will be explained in detail using the drawings. 1st
The figure is an explanatory diagram of the main part configuration of the embodiment of the present invention, and in the figure, the fourth
The same symbols as in the figures are used with the same meaning, and redundant explanation will be omitted here. Further, 5a is a tip made of metal such as copper, 5b is an insulator made of ceramics, and 5
c is a body made of metal such as copper, 5'' is a nozzle formed by integrally combining a tip 5a, an insulator 5b, and a body 5c, and 7 is a central portion of the high-frequency induction coil 2 and the tip 5a. Fig. 2 is an equivalent circuit of Fig. 1, and in the figure, Fig. 1, Fig. 4, and Fig. 5
Symbols that are the same as those in the figures are used with the same meaning, and redundant explanation here will be omitted. In addition, a is a point on the tip 5a of the nozzle 5 where the conductor 7 is connected, b is a point on the central portion of the high frequency induction coil 2 where the conductor 7 is connected, and c
o and R8 are the body 5C of the nozzle 5 and the tip 5a.
are the equivalent capacitance and equivalent resistance between . In addition, the equivalent capacitance C
6 is chosen to be a sufficiently small value with respect to ground. Further, point b may be anywhere in the center of the coil 2, and is selected so that the high frequency potential between the tip 5a of the nozzle 5c (strictly speaking, point a) and the center d of the plasma 4 is small. In the embodiment of the present invention having such a configuration of main parts, the central part of the high frequency induction coil 2 (for example, b
Since the tip mfiB5a (for example, point a) of the nozzle 5 is connected by the conductor 7, the tip 5a and the center portion of the coil 2 are at substantially the same potential. Therefore, between the high-frequency inductively coupled plasma 4 and the tip @ part 3a (i.e., the second
In the equivalent capacitance CI portion of the figure), discharge as seen in the conventional example does not occur. Note that the present invention is not limited to the embodiments shown in FIGS. 1 and 2, and can be modified in various ways.
For example, the following configuration (a) or (b) may be used. (a) Connect an external circuit (for example, a circuit that connects two capacitors connected in series to each other in parallel to the high-frequency induction coil via the common terminal e) to the terminals of the high-frequency induction coil 2, and connect a part of the circuit ( For example, the common terminal e) is connected to the tip 5a of the nozzle 5' via the conductor 7.
（ロ）第１図のスキマー６もノズル５°と同一構造のス
キマー６゛ （即ち、例えば銅のような金属でなる先端
部６ａ、例えばセラミックでなる絶縁物６ｂ、および例
えば銅のような金属でなるボディ６ｃでスキマー６°を
構成する）とし、ノズル５°の先端部５ａとスキマー６
゛の先端部６ａを電気的に接続する。この場合、ノズル
５°の先端部５ａのみならずスキマー６′の先端部６ａ
も高周波誘導コイル２の中央部分と略同一電位に保たれ
るため、スキマー６′で放電が発生するわずかの可能性
もなくなる。尚、ノズル５（５°）で上述のような放電
が発生する可能性がない場合には、スキマー６゛の先端
部６ａと高周波誘導コイル２の中央部分を導体７で接続
すればよい、また、上記（イ）の変形実施例における共
通端子ｅをスキマ６′の先端部６ａに導体７で接続させ
たり、該端子。をノズル５・の先端部５ａおよびスキマ
ー６゛の先端部６ａと電気的に接続させてもよいものと
する。(b) The skimmer 6 in FIG. 1 has the same structure as the nozzle 5° (that is, the tip 6a is made of metal such as copper, the insulator 6b is made of ceramic, and the skimmer 6 is made of metal such as copper). The body 6c constitutes a skimmer 6°), and the tip 5a of the nozzle 5° and the skimmer 6
The tip portion 6a of ゛ is electrically connected. In this case, not only the tip 5a of the nozzle 5° but also the tip 6a of the skimmer 6'
Since the center portion of the high-frequency induction coil 2 is maintained at substantially the same potential as the central portion of the high-frequency induction coil 2, there is no possibility that electric discharge will occur in the skimmer 6'. In addition, if there is no possibility of the above-mentioned discharge occurring at the nozzle 5 (5°), the tip 6a of the skimmer 6' and the center part of the high frequency induction coil 2 may be connected with the conductor 7, or , the common terminal e in the modified embodiment of (a) above is connected to the tip 6a of the gap 6' by the conductor 7; may be electrically connected to the tip 5a of the nozzle 5 and the tip 6a of the skimmer 6'.
第３図は本発明実施例の全体的な構成説明図であり、図
中、第１図や第２図と同一記号は同一意味をもたせて使
用しここでの重複説明は省略する。FIG. 3 is an explanatory diagram of the overall configuration of an embodiment of the present invention. In the figure, the same symbols as in FIGS. 1 and 2 are used with the same meanings, and redundant explanation will be omitted here.
また、９はアルゴンガス供給源、１０はガス調節器、１
１は試料を貯留する槽、１２は試料を霧化してエアロゾ
ル試料にするネプライザ、１３は第１図や第２図で説明
した駆動部（高周波電源３を含む駆動回路部分）、１４
はプラズマトーチｌを収納する筐体、１５はフォアチャ
ンバー１６内を例えばＩ ｔｏｒｒ、まで吸引して排気
する真空ポンプ、１７はセンターチャンバー１８内を例
えば１０−’ｔｏｒｒ、まで吸引して排気する真空ポン
プ、１９は例えば四重極マスフィルタでなる質量分析計
検出器、２０はリアチャンバー２１内を吸引して排気す
る真空ポンプ、２２は二次電子増倍管、２３は演算処理
部（例えばマイクロコンピュータ）である。このような
構成からなる本発明の実施例において、プラズマトーチ
１の最外室１ａおよび外室１ｂには、ガス調整器１０を
介してガス供給源９からアルゴンガスが供給される。ま
た、内室１ｃにはネプライザ１０からアルゴンガス（上
記ガス調整器１０を介して供給されるもの）によってエ
アロゾル試料が搬入される。一方、高周波誘導コイル２
には駆動部１３内の高周波電ｉ１３によって高周波エネ
ルギーが供給され、該コイルの周囲に高周波磁界（図示
せず）が形成されている。このため、上記高周波磁界の
作用で高周波誘導結合プラズマ４が生ずる。このプラズ
マ４内のイオンはノズル５を介してスキマー６内に引き
出され、その後、質量分析計検出器１９によって特定質
量のイオンが検出される。該検出信号は二次電子増倍管
２２で増幅されてのち演算処理部２３に送出され、最終
的に試料中の被測定元素分析値等を与えるようになる。Further, 9 is an argon gas supply source, 10 is a gas regulator, 1
1 is a tank for storing the sample, 12 is a nebulizer that atomizes the sample to form an aerosol sample, 13 is the drive section (drive circuit section including the high-frequency power source 3) explained in FIGS. 1 and 2, and 14
15 is a vacuum pump that suctions and evacuates the inside of the forechamber 16 to, for example, I torr; and 17 represents a vacuum that suctions and evacuates the inside of the center chamber 18 to, for example, 10 torr. A pump 19 is a mass spectrometer detector consisting of, for example, a quadrupole mass filter, 20 is a vacuum pump that suctions and exhausts the inside of the rear chamber 21, 22 is a secondary electron multiplier, and 23 is an arithmetic processing unit (for example, a micro computer). In the embodiment of the present invention having such a configuration, argon gas is supplied from the gas supply source 9 to the outermost chamber 1a and the outer chamber 1b of the plasma torch 1 via the gas regulator 10. Further, an aerosol sample is carried into the inner chamber 1c from the nebulizer 10 using argon gas (supplied via the gas regulator 10). On the other hand, high frequency induction coil 2
High frequency energy is supplied to the coil by a high frequency electric i13 in the drive unit 13, and a high frequency magnetic field (not shown) is formed around the coil. Therefore, high frequency inductively coupled plasma 4 is generated by the action of the high frequency magnetic field. The ions in this plasma 4 are drawn out through the nozzle 5 into the skimmer 6, after which ions of a specific mass are detected by the mass spectrometer detector 19. The detection signal is amplified by the secondary electron multiplier tube 22 and then sent to the arithmetic processing section 23, which finally provides an analysis value of the element to be measured in the sample.
〈発明の効果〉
以上詳しく説明したような本発明によれば、高周波誘導
コイル２の中央部分とノズル５′の先端部５ａを略同一
電位に保つような構成であるため、前記従来例にみられ
たようなプラズマ４からノズル５等への放電は発生しな
い。このため、プラズマ４内のイオンをノズル５゛を介
してスキマー６内にそのまま引き出すことができ、該イ
オンを第３図の検出器１９で正確に検出できるようにな
る。<Effects of the Invention> According to the present invention as described in detail above, the central portion of the high-frequency induction coil 2 and the tip portion 5a of the nozzle 5' are kept at substantially the same potential. The discharge from the plasma 4 to the nozzle 5 etc. does not occur. Therefore, the ions in the plasma 4 can be extracted directly into the skimmer 6 through the nozzle 5', and the ions can be accurately detected by the detector 19 in FIG. 3.
第１図は本発明実施例の要部構成説明図、第２図は第１
図の等何回路、第３図は本発明実施例の全体的な構成説
明図、第４図は従来例の要部構成説明図、第５図は第４
図の等何回路である。
１・・・プラズマトーチ、２・・・高周波誘導コイル、
３・・・高周波電源、４・・・高周波誘導結合プラズマ
、５・・・ノズル、６・・・スキマー、７・・・導体、
５ａ・・・先端部、５ｂ・・・絶縁物、５ｃ・・・ボデ
ィ。
第１図
第２図Figure 1 is an explanatory diagram of the main part configuration of the embodiment of the present invention, and Figure 2 is the first
3 is an explanatory diagram of the overall configuration of the embodiment of the present invention, FIG. 4 is an explanatory diagram of the main part configuration of the conventional example, and FIG.
What is the circuit shown in the figure? 1... Plasma torch, 2... High frequency induction coil,
3... High frequency power supply, 4... High frequency inductively coupled plasma, 5... Nozzle, 6... Skimmer, 7... Conductor,
5a... Tip, 5b... Insulator, 5c... Body. Figure 1 Figure 2
Claims (7)
周波磁界を形成して高周波誘導結合プラズマを生じさせ
、該プラズマを用いて試料を励起してイオンを生じせ、
該イオンをインターフェイスを介して質量分析計に導い
て検出し、前記試料中の被測定元素を分析する分析計に
おいて、前記インターフェイスのイオン導入孔部分の電
位と前記コイルの中央部分の電位とを略同一に保つこと
を特徴とする高周波誘導結合プラズマ・質量分析計。(1) Supplying high frequency energy to a high frequency induction coil to form a high frequency magnetic field to generate high frequency inductively coupled plasma, and using the plasma to excite the sample to generate ions,
In an analyzer that introduces the ions to a mass spectrometer via an interface and detects them to analyze the analyte element in the sample, the potential of the ion introduction hole portion of the interface and the potential of the center portion of the coil are approximately A high-frequency inductively coupled plasma/mass spectrometer that is characterized by maintaining the same frequency.
を電気的に接続して前記略同一の電位を得る特許請求範
囲第（１）項記載の高周波誘導結合プラズマ・質量分析
計。(2) The high frequency inductively coupled plasma/mass spectrometer according to claim 1, wherein the ion introduction hole portion and the center portion of the coil are electrically connected to obtain the substantially same potential.
一部を、前記イオン導入孔部分と接続することにより、
前記略同一の電位を得る特許請求範囲第（１）項記載の
高周波誘導結合プラズマ・質量分析計。(3) By connecting an external circuit to the terminal of the coil and connecting a part of the circuit to the iontophoresis hole,
The high frequency inductively coupled plasma mass spectrometer according to claim (1), which obtains substantially the same potential.
のコンデンサを含み、これらコンデンサを互いに直列接
続する共通端子が、前記イオン導入孔部分と接続されて
なる特許請求範囲第（３）項記載の高周波誘導結合プラ
ズマ・質量分析計。(4) The external circuit includes two capacitors connected in parallel to the coil, and a common terminal connecting these capacitors in series is connected to the ion introduction hole portion. high-frequency inductively coupled plasma mass spectrometer.
囲第（１）項〜第（４）項のいずれかに記載の高周波誘
導結合プラズマ・質量分析計。(5) The high frequency inductively coupled plasma mass spectrometer according to any one of claims (1) to (4), wherein the ion introduction hole portion is a nozzle.
範囲第（１）項〜第（４）項のいずれかに記載の高周波
誘導結合プラズマ・質量分析計。(6) The high frequency inductively coupled plasma mass spectrometer according to any one of claims (1) to (4), wherein the ion introduction hole portion is a skimmer.
されたノズルおよびスキマーからなる特許請求範囲第（
１）項〜第（４）項のいずれかに記載の高周波誘導結合
プラズマ・質量分析計。(7) The ion introduction hole portion consists of a nozzle and a skimmer that are electrically connected to each other.
The high frequency inductively coupled plasma mass spectrometer according to any one of items 1) to 4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61062591A JPS62219452A (en) | 1986-03-20 | 1986-03-20 | High frequency induction coupling plasma mass spectrograph |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61062591A JPS62219452A (en) | 1986-03-20 | 1986-03-20 | High frequency induction coupling plasma mass spectrograph |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62219452A true JPS62219452A (en) | 1987-09-26 |
Family
ID=13204718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61062591A Pending JPS62219452A (en) | 1986-03-20 | 1986-03-20 | High frequency induction coupling plasma mass spectrograph |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62219452A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61248348A (en) * | 1985-04-24 | 1986-11-05 | エムディーエス ヘルス グループ リミッテッド | Method of sampling and extracting plasma into vacuum chamberand apparatus having rf bias therefor |
-
1986
- 1986-03-20 JP JP61062591A patent/JPS62219452A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61248348A (en) * | 1985-04-24 | 1986-11-05 | エムディーエス ヘルス グループ リミッテッド | Method of sampling and extracting plasma into vacuum chamberand apparatus having rf bias therefor |
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