JPS62218554A - Device for vacuum vapor deposition - Google Patents

Abstract

PURPOSE:To obtain a device for vacuum vapor deposition capable of applying to a large-sized material to be treated having a curved surface by providing a sealing part consisting of a sealing attachment capable of exchange to a portable-type vacuum chamber which is provided with an electron gun, a crucible and a vacuum pipeline, etc., to the inside thereof. CONSTITUTION:A sealing attachment 12 provided with a seal 5 is exchangeably fitted to a flange 13 of a portable-type vacuum chamber 2 of a device for vacuum vapor deposition and a material 1 to be treated forming one part of the vacuum vessel is put thereon. Then the space 10 in the vacuum chamber 2 is vacuumed and exhausted via a vacuum pipeline 4. Thereafter a coating material 7 incorporated in a crucible 6 is heated and evaporated by an electron gun 3. Vapor 9 generated thereby is vapor-deposited on the treatment surface 11 of the material 1 to be treated. Thereafter the above-mentioned vacuum chamber 2 is transferred to a required position of the material 1 to be treated and the sealing attachment 12 is exchanged in accordance with curvature of the other treatment surface 11. Then vacuum vapor deposition is performed on the other treatment surface 11 of the large-sized material 1 to be treated by means of the above-mentioned similar operation.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a vacuum deposition apparatus for imparting corrosion resistance and wear resistance to the surface of steel materials and the like.

[Conventional technology]

Conventional vacuum evaporation equipment is of a fixed type, and the means for vacuum evaporating the surface of the object to be processed using this conventional equipment is as follows:
Conventionally, the object to be processed is set in a fixed vacuum evaporation apparatus (vacuum container) to perform evaporation.

[Problem that the invention seeks to solve]

As described above, in the conventional vacuum evaporation means, the object to be processed is placed in a vacuum container and the vacuum evaporation process is performed. Therefore, there are limitations on the size of the object to be processed, and there are disadvantages in that vacuum deposition cannot be performed on large objects to be processed, such as chemical reaction vessels.

〔the purpose〕

The present invention is intended to eliminate the above-mentioned conventional drawbacks, and in particular, it is an object of the present invention to provide a novel vacuum evaporation apparatus that can be applied to large objects to be processed, such as chemical reaction vessels having curved surfaces.

[Means for solving problems]

According to the present invention, as a means for achieving the above object, the object to be processed is a part of a vacuum container, and an electron gun, a crucible, and a vacuum pipe are arranged in a portable vacuum chamber having a sealing part. The vacuum evaporation apparatus is characterized in that the seal portion comprises a seal attachment that can be replaced depending on the curvature of the surface of the object to be processed.

[Effect]

The operation of the vacuum evaporation apparatus of the present invention will be explained below. In the present invention, the object to be processed is a part of a vacuum container, and a space is formed between the object to be processed and the vacuum chamber through a seal part. let

In this case, the seal part consists of a seal attachment that can be replaced according to the curvature of the surface of the object to be processed. Specifically, this seal attachment is attached to the vacuum chamber by a 7-lunge, and thereby the surface of the object to be processed is Depending on the curvature of the seal can be made perfect.

Next, the space is evacuated by a vacuum pump through vacuum piping, and then an electron beam (which is configured to be bent by a magnetic field) is emitted by an electron gun.
The coating material inside the melt is heated to evaporate and deposited on the surface of the object to be treated. When the vapor deposition is completed, the vacuum chamber is moved to the target position of the next object to be processed.

As described above, the present invention makes it possible to ultimately treat the entire surface of a large object by vacuum evaporating the surface of the object one part at a time. Since the seals can be matched according to the curvature of the processing surface of the object to be processed, the range of objects that can be processed is greatly expanded.

〔Example〕

The present invention will be explained in detail based on FIG. 1. FIG. 1 is a diagram showing a vacuum evaporation apparatus which is an embodiment of the present invention. Press the chamber 2 to set it (the setting jig is not shown),
A space 10 is formed. The vacuum chamber 2 is provided with, for example, a labyrinth seal 5 as shown, and a vacuum pump (not shown) maintains the space 10 at a vacuum (eg, 10-''Forr) via a vacuum pipe IW4.

An electron beam 8 is emitted by the electron gun 3, and the shim beam 8 is bent by a magnetic field (not shown) to heat and evaporate the coating material 7 (for example, Ti) in the crucible 6. The vapor 9 of the coating material 7 reaches the object 1 to be treated, and
evaporate the surface of When the vapor deposition process is completed, the vacuum chamber 2 is moved to the next target location and the same process is performed. Thus, the entire surface of the object to be processed 1 can be vacuum-deposited.

By the way, if the processing surface 11 is not a flat surface but a curved surface, "
If the curvature of the sealing surface of the seal 5 of the X-empty chamber 2 is not matched to the curvature of the processing surface 110 of the object to be processed 1, the sealing performance will be poor and the predetermined degree of vacuum cannot be maintained. Therefore, in the present invention, a seal attachment 12 is employed, and the curvature of the provided seal 5 is adjusted to the curvature of the processing surface 11. This seal attachment 12 is attached to the main body of the vacuum chamber 2 by means of seven flange 13.

〔effect〕

Since the zero-fire BA has the configuration described in detail above, the portable vacuum chamber of the present invention can be pressed against the object to be processed, regardless of whether the object is large or has two curved surfaces. Since K is an element forming a vacuum space,
The effect of enabling vacuum evaporation treatment, which was previously impossible, is produced, and the effect of significantly improving the corrosion resistance, abrasion resistance, etc. of the surface of a large object to be processed is produced.

[Brief explanation of drawings]

FIG. 1 is a diagram showing a vacuum evaporation apparatus according to an embodiment of the present invention. Sub-Agents 1) Meifuku Agent Ryo Hagiwara − Sub-Agent Atsuo Anzai BI

Claims (1)

[Claims] An electron gun is placed inside a portable vacuum chamber with a sealed part.
1. A vacuum evaporation apparatus characterized in that a crucible and vacuum piping are provided, and the seal portion is comprised of a seal attachment that can be replaced depending on the curvature of the surface of the object to be processed.