JPS62209888A - Insulating board - Google Patents

Insulating board

Info

Publication number
JPS62209888A
JPS62209888A JP5292586A JP5292586A JPS62209888A JP S62209888 A JPS62209888 A JP S62209888A JP 5292586 A JP5292586 A JP 5292586A JP 5292586 A JP5292586 A JP 5292586A JP S62209888 A JPS62209888 A JP S62209888A
Authority
JP
Japan
Prior art keywords
insulating
layer
heat dissipation
al2o3
mgo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5292586A
Other languages
Japanese (ja)
Inventor
吉雄 難波
一男 吉川
佐藤 義智
小川 陸郎
前川 信治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP5292586A priority Critical patent/JPS62209888A/en
Publication of JPS62209888A publication Critical patent/JPS62209888A/en
Pending legal-status Critical Current

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  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はICや電源トランジスタ等に使用される金属ベ
ースの絶縁板に関し、詳細には熱放散性及び耐電圧性に
優れ、且つ高い靭性及び耐剥離性を有する絶縁板に関す
るものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a metal-based insulating plate used for ICs, power transistors, etc. The present invention relates to an insulating plate having peeling resistance.

[従来の技術] 電子部品を装着する為の基板としては従来エポキシ系樹
脂板やアルミナセラミックス板等が広く浦田六柄で1A
f−1、ks X lご7わ^の−妬紺剋し÷元々熱放
散性が悪いものであるからIC等を長時間使用している
とIC等から発生した熱量が蓄積して基体温度が上昇し
IC等の機能を損う恐れがある。そしてこの問題は、I
C部品の一層の高集積化に伴ない増々重大な問題となっ
てきており、基板材料に対しては熱放散性の改善が急務
となっている。こうした状況の中で熱放散性の優れた基
板の開発が行なわれており、熱伝導性の優れた金属板上
に薄い絶縁膜を積層し、その上に銅箔を接着し、更に銅
箔をエツチングして回路パターンを形成した所謂金属ベ
ース基板が提案され、その実用化が進められている。
[Conventional technology] Conventionally, epoxy resin plates, alumina ceramic plates, etc. have been widely used as substrates for mounting electronic components.
f-1, ks There is a risk that the temperature will rise and damage the functions of ICs, etc. And this problem is I
This problem is becoming increasingly serious as C components become more highly integrated, and there is an urgent need to improve the heat dissipation properties of substrate materials. Under these circumstances, substrates with excellent heat dissipation properties are being developed, and are made by laminating a thin insulating film on a metal plate with excellent thermal conductivity, bonding copper foil on top of it, and then bonding copper foil on top of it. A so-called metal base substrate on which a circuit pattern is formed by etching has been proposed, and its practical use is progressing.

ところで上記金属ベース基板における絶縁膜としてはガ
ラスやエポキシ系樹脂あるいはポリイミド系樹脂が一般
的であるが、これらの絶縁物質は耐電圧性に優れている
ものの熱伝導率が低く、せっかくの金属ベースでありな
がら熱放散性はまだまだ低い。即ち絶縁層の厚みを、要
求される耐電圧特性を保証し得る最低限の厚さまで薄く
してもその熱放散性は満足できるレベルに達していない
のが現状である。
By the way, glass, epoxy resin, or polyimide resin is generally used as the insulating film for the above-mentioned metal base substrate, but although these insulating materials have excellent voltage resistance, they have low thermal conductivity. However, the heat dissipation performance is still low. That is, at present, even if the thickness of the insulating layer is reduced to the minimum thickness that can guarantee the required withstand voltage characteristics, its heat dissipation performance has not yet reached a satisfactory level.

そこで金属ベース基板における熱放散性をさらに改善す
る為に絶縁層をアルミナセラミックス(Al1.03)
の溶射層によって形成する試みがなされている。このA
l2O3溶射層は耐電圧性が良好であると共に熱放散性
が優れており、発熱量の大きい電源トランジスタ等の部
品用としても使用することができるものである。
Therefore, in order to further improve the heat dissipation properties of the metal base substrate, the insulating layer was made of alumina ceramics (Al1.03).
Attempts have been made to form a thermally sprayed layer. This A
The 12O3 sprayed layer has good voltage resistance and excellent heat dissipation, and can be used for parts such as power transistors that generate a large amount of heat.

[発明が解決しようとする問題点] しかるに溶射により形成したAl2O3絶縁層は靭性が
低く基板をわずかに変形させただけでも割れが発生する
ことがある。又絶縁層としてAl2O3溶射層を適用し
た金属ベース基板にワイヤ等をハンダ付けする際には基
板は250〜350℃まで加熱されるが、こうしたハン
ダ付けが変型なることにより基板は加熱・冷却の熱サイ
クルを受け、これによってAl2O3溶射層に割れが発
生したりあるいは金属板からAl2O3溶射層が剥離す
るといった事態が発生する。
[Problems to be Solved by the Invention] However, the Al2O3 insulating layer formed by thermal spraying has low toughness and may crack even if the substrate is slightly deformed. Furthermore, when soldering wires, etc. to a metal base substrate with an Al2O3 sprayed layer applied as an insulating layer, the substrate is heated to 250 to 350°C, but due to the deformation of such soldering, the substrate is exposed to the heat of heating and cooling. This causes cracks in the Al2O3 sprayed layer or peeling of the Al2O3 sprayed layer from the metal plate.

また回路パターンの形成方法には、Al2O3溶射層上
に接着した銅箔をエツチングする方法の他に、Al2O
3溶射層の上に導体ペーストをスクリーン印刷し、それ
を焼成することにより回路パターンを形成する方法があ
る。この時の焼成温度は最高900〜1000℃にも達
し、At20.溶射層の場合すべてが剥離してしまう。
In addition to the method of forming the circuit pattern by etching the copper foil adhered onto the Al2O3 sprayed layer, there are also methods for forming the circuit pattern.
3. There is a method of forming a circuit pattern by screen printing a conductive paste on the sprayed layer and baking it. The firing temperature at this time reaches a maximum of 900 to 1000°C, and At20. In the case of a thermally sprayed layer, everything will peel off.

この様に絶縁層としてAl2O3溶射層を使用した金属
ベース基板においては溶射層の割れや剥離という問題が
あり、満足し得る金属ベース基板殊に電子部品構成用絶
縁板を提供するに至っていない。
As described above, metal base substrates using an Al2O3 sprayed layer as an insulating layer have problems such as cracking and peeling of the sprayed layer, and a satisfactory metal base substrate, particularly an insulating plate for configuring electronic components, has not yet been provided.

本発明はこうした事情に着目してなされたものであって
、熱放散性及び耐電圧性が優れ、且つ高い靭性及び耐剥
離性を有する絶縁板を提供することを目的とするもので
ある。
The present invention has been made in view of these circumstances, and it is an object of the present invention to provide an insulating board that has excellent heat dissipation properties and voltage resistance, as well as high toughness and peeling resistance.

[問題点を解決する為の手段] しかして上記目的を達成した本発明の絶縁板は、金属基
板上に絶縁層としてMgOの薄膜を形成したものである
点に要旨を有するものである。
[Means for Solving the Problems] The insulating plate of the present invention that achieves the above object has a gist in that a thin MgO film is formed as an insulating layer on a metal substrate.

[作用] 耐電圧性と共に高い熱放散性を確保することが電子部品
用絶縁板にとって不可欠の条件である。
[Function] Ensuring high heat dissipation as well as voltage resistance are essential conditions for an insulating board for electronic components.

即ち最近の高集積化の傾向は加速度的に強まっており、
こうした傾向に対処するには集積化を高めても熱の蓄積
を起こさないことが必要である。その為高度の熱放散性
を確保する上で絶縁板のベース板としては熱伝導性の高
い金属板を使用する必要がある。かかる金属板としては
その種類が特に制限される訳ではなく種々の金属板及び
合金板を適用することができるが、代表的なものとして
は軟鋼板やAI板等を挙げることができる。
In other words, the recent trend toward higher integration is accelerating.
To combat this trend, it is necessary to increase integration without causing heat buildup. Therefore, in order to ensure a high degree of heat dissipation, it is necessary to use a metal plate with high thermal conductivity as the base plate of the insulating plate. The type of such metal plate is not particularly limited, and various metal plates and alloy plates can be used, but typical examples include mild steel plates and AI plates.

次に上記金属板上に一体的に形成する絶縁層としては、
金属板が導電体であることから印刷回路パターンとの間
で電気的遮断状態を構成する必要があり、又該遮断状態
は相当の電圧差にも耐え得る様に確保されなければなら
ない。即ち絶縁層は相当の耐電圧性を有し、しかも印刷
回路部からの発生熱を金属板側へ速やかに伝導して熱放
散し得るものでなければならない。本発明者等はこうし
た特性を有する物質を種々探求し、その中から前記Al
2O3溶射層に比較して更に高靭性であり、しかも熱サ
イクルなよる耐剥離性にも優れた物質としてMgO薄膜
を見出すに至った。そして該MgO薄膜は耐電圧特性及
び熱放散性においてもAl2O3溶射層より優れた特性
を有することが分かった。
Next, as an insulating layer integrally formed on the metal plate,
Since the metal plate is a conductor, it is necessary to create an electrically disconnected state between the metal plate and the printed circuit pattern, and the electrically disconnected state must be ensured to withstand a considerable voltage difference. That is, the insulating layer must have considerable voltage resistance and must be able to quickly conduct heat generated from the printed circuit portion to the metal plate side and dissipate the heat. The present inventors have searched for various substances having such characteristics, and selected the above-mentioned Al.
An MgO thin film has been discovered as a material that has higher toughness than a 2O3 sprayed layer and also has excellent peeling resistance due to thermal cycles. It was also found that the MgO thin film has superior voltage resistance properties and heat dissipation properties over the Al2O3 sprayed layer.

かかるMgO薄膜としては形成方法によって数種のもの
が挙げられるが、代表的なものとしては溶射膜や蒸着膜
が例示される。尚溶射膜の中では、減圧プラズマ溶射に
より形成された膜が、膜内の気孔率が小さく熱伝導性即
ち熱放散性が優れており、しかも靭性や耐剥離性も高い
ことからより好ましいものということができる。本発明
においてはMgO薄膜の厚みについても特に制限はない
が、要求特性を満足させる上で50〜500μm厚とす
ることが推奨される。即ち膜厚50μm未満の場合には
薄すぎる為に耐電圧特性が所定の値以下になる恐れがあ
り、一方膜厚が500μmを超えると伝熱抵抗が大きく
なり熱放散性が悪化すると共に、加工抵抗が高まって割
れや剥離が起こり易くなる。
There are several types of MgO thin films depending on the formation method, and typical examples include thermal sprayed films and vapor deposited films. Among thermal sprayed films, films formed by low-pressure plasma spraying are more preferable because they have a small porosity within the film and are excellent in thermal conductivity, that is, heat dissipation, as well as high toughness and peeling resistance. be able to. In the present invention, there is no particular restriction on the thickness of the MgO thin film, but a thickness of 50 to 500 μm is recommended in order to satisfy the required characteristics. In other words, if the film thickness is less than 50 μm, the withstand voltage characteristics may fall below the specified value because it is too thin. On the other hand, if the film thickness exceeds 500 μm, heat transfer resistance will increase, heat dissipation will deteriorate, and processing will be difficult. Resistance increases, making cracking and peeling more likely.

本発明の絶縁板は上記の如く金属板上にMgO薄膜を形
成してなり、これに回路パターンを印刷することにより
、ICや電源トランジスタ等の電子部品を形成する為の
金属ベース基板を得ることができる。
The insulating plate of the present invention is formed by forming a MgO thin film on a metal plate as described above, and by printing a circuit pattern on this, a metal base substrate for forming electronic components such as ICs and power transistors can be obtained. I can do it.

[実施例コ 実施例1 軟鋼基板の上に粒径44μmのAl2O3粉末及びMg
O粉末をプラズマ溶射しそれぞれ200μm厚みの絶縁
層を形成した。これらの三点曲げ試験を行なった結果を
第1表に示す。
[Example Example 1 Al2O3 powder with a particle size of 44 μm and Mg were placed on a mild steel substrate.
Insulating layers each having a thickness of 200 μm were formed by plasma spraying O powder. Table 1 shows the results of these three-point bending tests.

また、上記で得られたAl2O3層及びMgO層の表面
に1 cm2の金属片を接着し基板を固定した状態で金
属片に引張力を加え各層の剥離強度を測定した。その結
果を第2表に示す。
Further, a 1 cm2 metal piece was adhered to the surface of the Al2O3 layer and MgO layer obtained above, and with the substrate fixed, a tensile force was applied to the metal piece to measure the peel strength of each layer. The results are shown in Table 2.

第1表、第2表よりMgO溶射層の靭性及び耐剥離性が
優れていることが分かった。
From Tables 1 and 2, it was found that the MgO sprayed layer had excellent toughness and peeling resistance.

第   1   表 第   2   表 実施例2 AI基板の上に粒径44μmのAl2O3粉末及びMg
O粉末を150ミリバールの減圧下でプラズマ溶射し、
Al2O3層及びMgO層をそれぞれ200μm厚に形
成し、さらに35μm厚の電解銅箔を接着し、エツチン
グにより回路パターンを形成した後特性試験を行なった
Table 1 Table 2 Example 2 Al2O3 powder with a particle size of 44 μm and Mg on an AI substrate
Plasma spray O powder under reduced pressure of 150 mbar,
An Al2O3 layer and a MgO layer were each formed to a thickness of 200 μm, and a 35 μm thick electrolytic copper foil was further bonded and a circuit pattern was formed by etching, and then a characteristic test was conducted.

それぞれの耐電圧を第3表に示す。また、基板上にチッ
プ抵抗を半田付けし、供給した電力とチップ抵抗の温度
を測定した結果を第1図に示す。
Table 3 shows the respective withstand voltages. Furthermore, a chip resistor was soldered onto the substrate, and the supplied power and the temperature of the chip resistor were measured. The results are shown in FIG.

これらの結果から耐電圧、熱放散性ともにMgO層が優
れていることが分かった。
From these results, it was found that the MgO layer is excellent in both withstand voltage and heat dissipation properties.

第   3   表 [発明の効果] 本発明は以上の様に構成されており、耐電圧特性、熱放
散性、靭性及び耐剥離性の各特性に優れた絶縁板を提供
することができる。かくして高度集積化に対応できる高
性能のICや電源トランジスタ等の電子部品を得ること
ができる。
Table 3 [Effects of the Invention] The present invention is configured as described above, and can provide an insulating board that is excellent in voltage resistance, heat dissipation, toughness, and peeling resistance. In this way, it is possible to obtain electronic components such as high-performance ICs and power transistors that are compatible with high-level integration.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はMgQ溶射膜とAl2O3溶射膜の熱放散性能
を比較した結果を示すグラフである。
FIG. 1 is a graph showing the results of comparing the heat dissipation performance of the MgQ sprayed film and the Al2O3 sprayed film.

Claims (3)

【特許請求の範囲】[Claims] (1)金属基板上に絶縁層としてMgOの薄膜を形成し
たものであることを特徴とする絶縁板。
(1) An insulating plate characterized in that a thin MgO film is formed as an insulating layer on a metal substrate.
(2)MgO薄膜が溶射法によって形成されたものであ
る特許請求の範囲第1項記載の絶縁板。
(2) The insulating plate according to claim 1, wherein the MgO thin film is formed by a thermal spraying method.
(3)溶射方式が減圧プラズマ溶射である特許請求の範
囲第2項記載の絶縁板。
(3) The insulating plate according to claim 2, wherein the thermal spraying method is low pressure plasma spraying.
JP5292586A 1986-03-10 1986-03-10 Insulating board Pending JPS62209888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5292586A JPS62209888A (en) 1986-03-10 1986-03-10 Insulating board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5292586A JPS62209888A (en) 1986-03-10 1986-03-10 Insulating board

Publications (1)

Publication Number Publication Date
JPS62209888A true JPS62209888A (en) 1987-09-16

Family

ID=12928410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5292586A Pending JPS62209888A (en) 1986-03-10 1986-03-10 Insulating board

Country Status (1)

Country Link
JP (1) JPS62209888A (en)

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