JPS62207900A - Production of substrate for magnetic recording medium - Google Patents

Production of substrate for magnetic recording medium

Info

Publication number
JPS62207900A
JPS62207900A JP5054486A JP5054486A JPS62207900A JP S62207900 A JPS62207900 A JP S62207900A JP 5054486 A JP5054486 A JP 5054486A JP 5054486 A JP5054486 A JP 5054486A JP S62207900 A JPS62207900 A JP S62207900A
Authority
JP
Japan
Prior art keywords
magnetic recording
substrate
recording medium
film
alumite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5054486A
Other languages
Japanese (ja)
Inventor
Masafumi Sato
政文 佐藤
Masahiko Kato
加藤 征彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP5054486A priority Critical patent/JPS62207900A/en
Publication of JPS62207900A publication Critical patent/JPS62207900A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To produce an alumite substrate for a magnetic recording medium suitable for high density magnetic recording by anodically oxidizing the surface of an Al or Al alloy plate as a substrate for a magnetic recording medium under specified conditions. CONSTITUTION:When a substrate for a high density magnetic recording medium is produced with Al or an Al alloy, an Al or Al alloy plate is immersed in a treating soln. having 1.5-3% concn. of CrO3 at 15-30 deg.C and 60-75V voltage is applied to anodically oxidize the surface of the Al or Al alloy plate. Thus, a smooth alumite substrate for a magnetic recording medium suitable for high density magnetic recording is obtd. The alumite substrate has <120Angstrom average surface roughness Ra and >350kg/mm<2> Vickers hardness Hv.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気記録媒体用基板の製造方法に係り、とりわ
け、アルミニウムまたはアルミニウム合金材に表面が平
滑でかつ硬いアルマイト皮膜を形成する電解処理方法に
関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a substrate for a magnetic recording medium, and in particular to an electrolytic treatment method for forming a hard alumite film with a smooth surface on an aluminum or aluminum alloy material. Regarding.

〔従来の技術〕[Conventional technology]

磁気記録の高密度化に伴ない記録媒体が薄膜化し、基板
に平滑度および強度が要求され、アルミニウム合金基板
の表面にアルマイト皮膜を形成することが提案された(
特開昭51−48303号公報)。
As magnetic recording density increases, recording media become thinner, and substrates are required to have smoothness and strength, so it was proposed to form an alumite film on the surface of an aluminum alloy substrate (
JP-A No. 51-48303).

この陽極酸化処理は10%硫酸浴を用いて20℃、10
〜l 5 V、  l A/dm”で行なわれる。
This anodizing treatment was carried out at 20℃ using a 10% sulfuric acid bath.
~l 5 V, l A/dm".

また、平滑度、耐熱性、強度により優れたアルマイト皮
膜を提供するとして、クロム酸浴を用いた処理が、特開
昭59−85895号公報や同60−164927号公
報に提案されている。前者は6価のクロムイオンを含む
浴を用°い、5mg/d+w” (約0.117m)以
上の膜厚の皮膜を得るものであり、後者はクロム酸濃度
1.5〜15%の浴を使用し、温度35〜50℃、電圧
60〜100vで処理して10.um以上の膜厚の皮膜
とする方法である。
In addition, in order to provide an alumite film with superior smoothness, heat resistance, and strength, a treatment using a chromic acid bath has been proposed in Japanese Patent Laid-Open Nos. 59-85895 and 60-164927. The former uses a bath containing hexavalent chromium ions to obtain a film with a thickness of 5 mg/d+w" (approximately 0.117 m) or more, and the latter uses a bath with a chromic acid concentration of 1.5 to 15%. This is a method in which the film is treated at a temperature of 35 to 50° C. and a voltage of 60 to 100 V to form a film with a thickness of 10 μm or more.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

磁気ディスクなどの磁気記録媒体用基板に使用されるア
ルマイト下地皮膜としては、■)ディスクの起動、停止
時の磁気ヘッドとの接触に耐え得る(C3S耐性)ため
に、表面の硬度、強度が良好であること、2)ヘッドク
ラッシュを起こさないために表面が平滑であること(こ
れは研摩工程により達成されるが、研摩前の平滑度が良
い程仕上りが良い)、3)クランクは磁気ヘッドのスム
ーズな浮上を阻害し、記録欠落を生ずるので、300〜
400℃での磁性材の熱処理でクランクを生じないこと
、等が要求される。
As an alumite base film used for substrates for magnetic recording media such as magnetic disks, ■) It has good surface hardness and strength because it can withstand contact with the magnetic head when starting and stopping the disk (C3S resistance). 2) The surface must be smooth to prevent head crashes (this is achieved through a polishing process, but the smoother it is before polishing, the better the finish); 3) The crank must be smooth on the magnetic head. 300~ to prevent smooth ascent and cause missing records.
It is required that no cranking occurs during heat treatment of magnetic materials at 400°C.

前記特開昭51−48303号公報に記載された方法で
は、磁性材の熱処理温度である350℃でクラックを発
生させないためには膜厚を3μm以下にする必要がある
が、膜厚が2〜3μmではC8S耐性等の皮膜強度が実
用上不十分である。
In the method described in JP-A-51-48303, the film thickness must be 3 μm or less in order to prevent cracks from occurring at 350° C., which is the heat treatment temperature for magnetic materials. At 3 μm, the film strength such as C8S resistance is insufficient for practical use.

前記特開昭59−85895号公報および同60−16
4927号公報に記載されたクロム酸浴処理によれば、
耐熱性が改良され、より厚い膜厚でも熱処理時にクラン
クが発生しなくなり、皮膜強度を高めることが可能であ
るが、それでも十分に平滑で(平均表面粗さRa < 
100人)かつ硬い(ヴイッカース硬度Hv > 32
0kg/mm” )皮膜は得られない。
JP-A-59-85895 and JP-A-60-16
According to the chromic acid bath treatment described in Publication No. 4927,
The heat resistance has been improved, and even with a thicker film thickness, no cranking occurs during heat treatment, making it possible to increase the film strength, but it is still sufficiently smooth (average surface roughness Ra <
100 people) and hard (Vickers hardness Hv > 32
0kg/mm”) No film was obtained.

〔問題点を解決するための手段および作用〕本発明者ら
は、上記問題点を解決し、平均表面粗さRa S 12
0人、好ましくはRa < IQQ人、そしてヴイッカ
ース硬度Hv > 350kg/mm2を示す表面が平
滑でかつ硬い皮膜を得る方法を開発すべく鋭意努力を重
ねた結果、低温のクロム酸浴でアルマイト形成陽極酸化
処理を行なうことによってそれが達成されることを見い
出し、本発明を完成した。
[Means and effects for solving the problems] The present inventors solved the above problems and achieved an average surface roughness of Ra S 12
As a result of our intensive efforts to develop a method to obtain a hard film with a smooth surface that exhibits Ra < IQQ and Vickers hardness Hv > 350 kg/mm2, we have developed an alumite-formed anode in a low-temperature chromic acid bath. They discovered that this can be achieved by performing oxidation treatment, and completed the present invention.

すなわち、本発明は、アルミニウムまたはアルミニウム
合金材をクロム酸濃度1.5〜3%の浴中にて温度15
〜30℃、電圧60〜75Vで陽極酸化処理して基板表
面にアルマイト皮膜を形成する磁気記録媒体用基板の製
造方法にある。
That is, in the present invention, aluminum or aluminum alloy material is heated at a temperature of 15% in a bath with a chromic acid concentration of 1.5% to 3%.
A method of manufacturing a substrate for a magnetic recording medium includes forming an alumite film on the surface of the substrate by anodizing the substrate at a temperature of 30° C. and a voltage of 60 to 75 V.

浴温を低くし、また電圧を高めると、皮膜の硬さが向上
するが表面が粗くなる。本発明では15〜30℃の浴温
を利用する。浴温か30℃より高いと皮膜の硬度向上の
効果がみられず、15℃未満では生成速度が遅く実用的
でない。電圧は60〜75Vが適当であり、60V未満
では皮膜の強度が不足し、75Vを越えると皮膜がポー
ラスとなり好、ましくない。
Lowering the bath temperature and increasing the voltage improves the hardness of the film, but the surface becomes rougher. In the present invention, a bath temperature of 15 to 30°C is utilized. If the bath temperature is higher than 30°C, no effect of improving the hardness of the film will be observed, and if it is lower than 15°C, the formation rate will be too slow to be practical. A suitable voltage is 60 to 75V; if it is less than 60V, the strength of the film will be insufficient, and if it exceeds 75V, the film will become porous, which is undesirable or undesirable.

膜厚は、限定するわけではないが、強固な付着力、耐摩
耗性、靭性を有するには10μm以上20μm以下が好
ましい。膜厚は処理時間を選択して調整することができ
る。この皮膜はクロム酸浴処理の故に、前記のように、
10μm以上の膜厚でも300〜400℃での磁性材の
熱処理によってクラックを発生しない。クロム酸濃度が
1.5%未満では表面にむらが生じ、3%超では硬い皮
膜が得られない。
Although the film thickness is not limited, it is preferably 10 μm or more and 20 μm or less in order to have strong adhesion, wear resistance, and toughness. The film thickness can be adjusted by selecting the processing time. Because this film is treated in a chromic acid bath, as mentioned above,
Even with a film thickness of 10 μm or more, no cracks occur when the magnetic material is heat-treated at 300 to 400°C. When the chromic acid concentration is less than 1.5%, the surface becomes uneven, and when it exceeds 3%, a hard film cannot be obtained.

こうして、本発明の方法により処理して得られるアルマ
イト陽極酸化皮膜はHv > 350kg/+u+”の
高い硬度とRa < 120人の平滑さを有し、かつ3
50℃以上の熱処理でもクランクを発生しない優れた特
性を有している。
Thus, the alumite anodic oxide film obtained by processing according to the method of the present invention has a high hardness of Hv > 350 kg/+u+'', a smoothness of Ra < 120, and a hardness of 3.
It has an excellent property of not generating cranks even when heat treated at 50°C or higher.

皮膜の表面粗さがRa < 100人のものは研摩なし
でそのまま実用に供することが可能であり、Ra> 1
00人の場合でも表面を軽く研摩すればさらに平滑度は
向上する。例えば、慣用の如く、テープ研摩(平均粒径
5μmアルミナ粉末を塗布したテープでこする)すれば
よく、その研摩の程度は従来より少なくてよい。また、
表面を研摩すれば表面硬度が向上する効果があり、その
意味で研摩は好ましい。これは、アルマイト皮膜形成反
応ではアルミナ生成反応とアルミナの溶解反応とが競合
しているため形成される皮膜の表面はやや軟かいので、
その表面を研摩除去することにより、一層硬くかつ平滑
な皮膜を得ることができるのである。
If the surface roughness of the film is Ra < 100, it can be used for practical use as is without polishing, and Ra > 1.
Even in the case of 00 people, the smoothness can be further improved by lightly polishing the surface. For example, conventional tape polishing (rubbing with a tape coated with alumina powder having an average particle size of 5 μm) may be used, and the degree of polishing may be less than that of the conventional method. Also,
Polishing the surface has the effect of improving surface hardness, and in that sense polishing is preferable. This is because in the alumite film forming reaction, the alumina production reaction and alumina dissolution reaction compete, so the surface of the film formed is somewhat soft.
By polishing the surface, a harder and smoother coating can be obtained.

〔実施例〕〔Example〕

基板として直径95mm、厚さ1.3 +n+wのJI
S 5058アルミニウム合金板を使用した。アルミニ
ウム合金板は精密旋削とパフ研摩により最大表面粗さR
max−0,10μm以下の表面粗さに仕上げ、洗浄し
て鏡面としたものを使用した。
JI with a diameter of 95 mm and a thickness of 1.3 +n+w as a substrate
S 5058 aluminum alloy plate was used. The aluminum alloy plate has a maximum surface roughness R by precision turning and puff polishing.
The surface was finished to a surface roughness of max-0.10 μm or less and was washed to a mirror surface.

この基板をクロム酸濃度1.7%のクロム酸浴を使用し
て表1に示す如く、浴温、電圧、処理時間を変えている
いろの条件下で陽極酸化処理を行なった。得られた皮膜
の厚さはlO〜16μであった。得られた皮膜の硬さと
表面粗さを測定した。
This substrate was anodized using a chromic acid bath with a chromic acid concentration of 1.7% under various conditions as shown in Table 1, varying the bath temperature, voltage, and treatment time. The thickness of the resulting film was lO~16μ. The hardness and surface roughness of the resulting film were measured.

硬さはJIS B7725に依るビッカース硬さである
The hardness is Vickers hardness according to JIS B7725.

表面粗さはJIS 80601により測定した。The surface roughness was measured according to JIS 80601.

試料隘5、隘6、隘8については得られた皮膜の表面粗
さがRa>100人だったのでテープ研摩装置により表
面を約0.1AIm研摩し、研摩前後の硬さと表面粗さ
を測定した。これらの結果を表1に合わせて記す。
For samples No. 5, No. 6, and No. 8, the surface roughness of the obtained film was Ra > 100, so the surface was polished by approximately 0.1 AIm using a tape polishing device, and the hardness and surface roughness before and after polishing were measured. did. These results are also shown in Table 1.

以下 表  1 ≦ 表1の結果から本発明による場合は表面がきわめて滑ら
かで硬い陽掻酸化皮膜が得られることが判かる。
From the results shown in Table 1 below, it can be seen that in the case of the present invention, a positive scratched oxide film with an extremely smooth surface and a hard surface can be obtained.

(発明の効果〕 本発明によれば、Ra < 120人、好ましいものは
Ra < 100人の平滑さとHv > 350kg/
m+w”の硬度を有し、かつ磁性材の熱処理温度である
300〜400℃でもクランクを発生しない、高密度磁
気記録に適した磁気記録媒体用アルマイト基板が提供さ
れる。また、Ra > 100人の場合でも軽く研摩す
るだけで平滑度が向上し、しかも研摩によって硬度もさ
らに向上する効果がある。
(Effect of the invention) According to the present invention, Ra < 120 people, preferably Ra < 100 people smoothness and Hv > 350 kg/
Provided is an alumite substrate for a magnetic recording medium suitable for high-density magnetic recording, which has a hardness of "m+w" and does not generate cranking even at 300 to 400° C., which is the heat treatment temperature for magnetic materials. Even in this case, the smoothness can be improved simply by light polishing, and the hardness can also be further improved by polishing.

Claims (1)

【特許請求の範囲】[Claims] 1、アルミニウムまたはアルミニウム合金材をクロム酸
濃度1.5〜3%の浴中にて温度15〜30℃、電圧6
0〜75Vで陽極酸化処理して基板表面にアルマイト皮
膜を形成することを特徴とする磁気記録媒体用基板の製
造方法。
1. Aluminum or aluminum alloy material is heated in a bath with a chromic acid concentration of 1.5 to 3% at a temperature of 15 to 30°C and a voltage of 6.
1. A method of manufacturing a substrate for a magnetic recording medium, comprising forming an alumite film on the surface of the substrate by anodizing the substrate at 0 to 75V.
JP5054486A 1986-03-10 1986-03-10 Production of substrate for magnetic recording medium Pending JPS62207900A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5054486A JPS62207900A (en) 1986-03-10 1986-03-10 Production of substrate for magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5054486A JPS62207900A (en) 1986-03-10 1986-03-10 Production of substrate for magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS62207900A true JPS62207900A (en) 1987-09-12

Family

ID=12861950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5054486A Pending JPS62207900A (en) 1986-03-10 1986-03-10 Production of substrate for magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS62207900A (en)

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