JPS62202767U - - Google Patents
Info
- Publication number
- JPS62202767U JPS62202767U JP9209586U JP9209586U JPS62202767U JP S62202767 U JPS62202767 U JP S62202767U JP 9209586 U JP9209586 U JP 9209586U JP 9209586 U JP9209586 U JP 9209586U JP S62202767 U JPS62202767 U JP S62202767U
- Authority
- JP
- Japan
- Prior art keywords
- vertical
- horizontal
- display device
- output
- power supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005468 ion implantation Methods 0.000 claims 2
- 230000001360 synchronised effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 7
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
Description
第１図はこの考案の実施例を示す回路図、第２
図は第１図の表示装置によつて画かれる波形図、
第３図はこの考案の別の実施例を示す部分回路図
、第４図は第３図の表示装置によつて画かれる波
形図、第５図は従来例の回路図、第６図は第５図
の表示装置によつて画かれる波形図である。
１……イオン注入装置、２……垂直偏向電極、
３……水平偏向電極、４……マスク、５……ター
ゲツト、６……垂直走査電源、７……水平走査電
源、９……表示装置、１１，１４……信号切替回
路、１２……切替信号発生回路、１３……反転回
路、１５……加算器。
Figure 1 is a circuit diagram showing an embodiment of this invention, Figure 2 is a circuit diagram showing an embodiment of this invention.
The figure is a waveform diagram drawn by the display device of Figure 1,
FIG. 3 is a partial circuit diagram showing another embodiment of this invention, FIG. 4 is a waveform diagram drawn by the display device of FIG. 3, FIG. 5 is a circuit diagram of a conventional example, and FIG. 6 is a waveform diagram drawn by the display device of FIG. 5; FIG. 1... Ion implanter, 2... Vertical deflection electrode,
3... Horizontal deflection electrode, 4... Mask, 5... Target, 6... Vertical scanning power supply, 7... Horizontal scanning power supply, 9... Display device, 11, 14... Signal switching circuit, 12... Switching Signal generation circuit, 13...inverting circuit, 15... adder.
Claims (1)
とにそれぞれ走査信号を与える垂直走査電源およ
び水平走査電源と、前記各電源からの各垂直、水
平走査信号を、水平偏向入力として周期的に切り
替えてモニタ用の表示装置に与える信号切替回路
と、前記イオン注入装置のターゲツトから得られ
るビーム電流に対応する出力と、その出力を反転
またはバイアスを加えて得た出力とを、前記両水
平偏向信号と同期して交互に前記表示装置に垂直
偏向入力として与える回路とからなるイオン注入
装置用ビームモニタ。 A vertical scanning power supply and a horizontal scanning power supply that respectively provide scanning signals to the vertical deflection electrode and horizontal deflection electrode of the ion implantation device, and the vertical and horizontal scanning signals from each of the power supplies are periodically switched and monitored as horizontal deflection inputs. A signal switching circuit to be applied to a display device for the ion implantation device, an output corresponding to the beam current obtained from the target of the ion implanter, and an output obtained by inverting or applying a bias to the output are synchronized with the horizontal deflection signals. A beam monitor for an ion implanter, comprising a circuit for alternately providing vertical deflection input to the display device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9209586U JPH0722852Y2 (en) | 1986-06-16 | 1986-06-16 | Beam monitor for ion implanter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9209586U JPH0722852Y2 (en) | 1986-06-16 | 1986-06-16 | Beam monitor for ion implanter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62202767U true JPS62202767U (en) | 1987-12-24 |
| JPH0722852Y2 JPH0722852Y2 (en) | 1995-05-24 |
Family
ID=30953482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9209586U Expired - Lifetime JPH0722852Y2 (en) | 1986-06-16 | 1986-06-16 | Beam monitor for ion implanter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0722852Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6388747A (en) * | 1986-09-24 | 1988-04-19 | イートン コーポレーシヨン | Method and apparatus for ion beam injection display |
| JPH01176650A (en) * | 1987-12-29 | 1989-07-13 | Mitsubishi Electric Corp | Ion beam adjustment status confirmation device for ion implantation device |
-
1986
- 1986-06-16 JP JP9209586U patent/JPH0722852Y2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6388747A (en) * | 1986-09-24 | 1988-04-19 | イートン コーポレーシヨン | Method and apparatus for ion beam injection display |
| JPH01176650A (en) * | 1987-12-29 | 1989-07-13 | Mitsubishi Electric Corp | Ion beam adjustment status confirmation device for ion implantation device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0722852Y2 (en) | 1995-05-24 |