JPS62202043A - Sliding contact point material for vacuum device - Google Patents
Sliding contact point material for vacuum deviceInfo
- Publication number
- JPS62202043A JPS62202043A JP61044104A JP4410486A JPS62202043A JP S62202043 A JPS62202043 A JP S62202043A JP 61044104 A JP61044104 A JP 61044104A JP 4410486 A JP4410486 A JP 4410486A JP S62202043 A JPS62202043 A JP S62202043A
- Authority
- JP
- Japan
- Prior art keywords
- sliding contact
- bias voltage
- contact point
- sliding
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 24
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 14
- 229910052709 silver Inorganic materials 0.000 claims abstract description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 12
- 239000010937 tungsten Substances 0.000 claims description 12
- 239000004332 silver Substances 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 11
- 239000010409 thin film Substances 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 5
- 229910001316 Ag alloy Inorganic materials 0.000 abstract description 2
- 238000005245 sintering Methods 0.000 abstract description 2
- 238000007733 ion plating Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910001080 W alloy Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005422 blasting Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- ITZSSQVGDYUHQM-UHFFFAOYSA-N [Ag].[W] Chemical compound [Ag].[W] ITZSSQVGDYUHQM-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Landscapes
- Contacts (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、スパッタリング、イオンブレーティング等に
より真空中で薄膜を形成する真空装置において、バイア
ス電圧を供給するための摺動接点として使用される材料
に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention is used as a sliding contact for supplying a bias voltage in a vacuum apparatus that forms a thin film in vacuum by sputtering, ion blating, etc. Regarding materials.
スパッタリング、イオンブレーティング等により真空中
で薄膜を形成する真空装置は、第３図に示すような構造
を持っている。すなわち、真空槽１内に配置されている
スパッタ電極２にターゲット３を載置し、シャッター４
を介して該ターゲット３に被処理物Ｗを対峙させる。そ
して、被処理物Ｗの近傍には、加熱用ヒータ５が配置さ
れている。スパッタリング、イオンブレーティング等に
よって被処理物Ｗの外周に薄膜を形成させるため、駆動
用モータ６からチェーン７及び回転軸８を介して伝達さ
れる駆動力により被処理物Ｗを回転するように、被処理
物Ｗが回転軸８の一端に取り付けられている。また、被
処理物Ｗに電圧を印加するため、電圧導入端子９から接
点保持台１０．固定側接点１１．摺動側接点１２及び回
転軸８を経て被処理物Ｗに至る回路が形成されている。A vacuum apparatus for forming a thin film in vacuum by sputtering, ion blasting, etc. has a structure as shown in FIG. That is, the target 3 is placed on the sputtering electrode 2 placed in the vacuum chamber 1, and the shutter 4 is
The object W to be processed is made to face the target 3 via the target 3. A heater 5 is arranged near the object W to be processed. In order to form a thin film on the outer periphery of the workpiece W by sputtering, ion blasting, etc., the workpiece W is rotated by a driving force transmitted from the drive motor 6 via the chain 7 and the rotating shaft 8. A workpiece W is attached to one end of the rotating shaft 8. In addition, in order to apply a voltage to the object W to be processed, the voltage introduction terminal 9 is connected to the contact holder 10. Fixed side contact 11. A circuit is formed that leads to the workpiece W via the sliding contact 12 and the rotating shaft 8.
このような回転以外に被処理物が移動する場合にも、そ
の被処理物に対する電気的導通を摺動接触的に行う必要
がある。このための摺動接点として、従来はステンレス
調や電気抵抗の小さい銀、 ｗ４等の純金属が使用され
ている。Even when the object to be processed moves in addition to such rotation, it is necessary to provide electrical continuity to the object through sliding contact. Conventionally, sliding contacts for this purpose have been made of stainless steel or pure metals with low electrical resistance, such as silver or W4.
しかしながら、真空装置内に配置されている摺動接点は
、その表面に厚くて強固な酸化被膜が生成しにくいため
、摩！１１抵抗が大きい。その結果、摺動接点に焼付き
が起こり、接触抵抗が増加し易い、そこで、この摺動接
点として硬度が大きく電気抵抗の小さい材料を使用する
必要がある。However, sliding contacts placed in vacuum equipment are difficult to form a thick and strong oxide film on their surfaces, so they are prone to wear and tear. 11 The resistance is large. As a result, the sliding contact tends to seize and the contact resistance increases.Therefore, it is necessary to use a material with high hardness and low electrical resistance for the sliding contact.
ところが、従来から使用されている摺動接点材料は、硬
度は大きいが電気抵抗も大きく、或いは電気抵抗は小さ
いが硬度も小さいものであった。However, conventionally used sliding contact materials have either high hardness but high electrical resistance, or low electrical resistance but low hardness.
したがって、従来から使用されている摺動接点材料では
、短時間に摺動部の電気抵抗が増加し、被処理物にバイ
アス電圧を印加することが不可能となる。このような摺
動接点材料を使用するとき、長時間の処理を行う必要が
ある厚い被膜の形成、処理面積の大きな被処理物に対す
る処理等に際して、目的とする被膜を形成することがで
きなかった。たとえば、外径８０龍程度の円板の外周部
に厚さ１０戸のＳｓ −Ｃｏ薄膜を形成する場合、約６
時間にわたってスパッタリングが継続される。この処理
工程の中途で、摺動接点の接触抵抗が増加し、バイアス
電圧の供給が不安定になる。このため、処理の途中でス
パッタリングを中断し、真空を破って摺動接点を交換し
、再度電圧を印加することを余儀無くされていた。その
ため、目的とする被膜を完成させるために必要とする時
間が更に長くなっていた。Therefore, with conventionally used sliding contact materials, the electrical resistance of the sliding portion increases in a short period of time, making it impossible to apply a bias voltage to the object to be processed. When using such sliding contact materials, it has been impossible to form the desired film when forming thick films that require long-term processing, or when processing objects with large processing areas. . For example, when forming a 10-thick Ss-Co thin film on the outer periphery of a disk with an outer diameter of about 80 mm, approximately 6 mm
Sputtering continues over time. In the middle of this process, the contact resistance of the sliding contacts increases and the supply of bias voltage becomes unstable. For this reason, it has been necessary to interrupt sputtering in the middle of the process, break the vacuum, replace the sliding contact, and apply voltage again. Therefore, the time required to complete the desired coating has become even longer.
そこで、本発明は、従来の摺動接点材料におけるこのよ
うな問題を解消すべく案出されたものであり、長時間に
わたって電気抵抗の増加を招くことなくバイアス電圧を
安定して印加することが可能な摺動接点材料を提供する
ことを目的とする。Therefore, the present invention was devised to solve these problems with conventional sliding contact materials, and makes it possible to stably apply a bias voltage over a long period of time without causing an increase in electrical resistance. The purpose is to provide a possible sliding contact material.
本発明の真空装置用摺動接点材料は、その目的を達成す
べく、タングステン４０〜７０％。銀残部からなること
を特徴とする。In order to achieve the purpose, the sliding contact material for vacuum equipment of the present invention contains 40 to 70% tungsten. It is characterized by consisting of a silver remainder.
なおここでいう該摺動接点材料とは、第３図に示した固
定側接点、ｔｗ動側接点の片方或いは双方に対して使用
される材料をい・う。Note that the sliding contact material herein refers to a material used for one or both of the fixed side contact and the twin moving side contact shown in FIG.
本発明の真空装置用摺動接点材料の中で、タングステン
の含有量が４０％未満或いは８０％を越えるとき、その
材料の接触抵抗が大きくなり、従来の材料と同様に長時
間にわたって安定してバイアス電圧を印加することがで
きない。すなわち、タングステン含有量が少ないときは
、恨の溶着が生じ易く、接点部の表面が凹凸になり、接
触抵抗を増加させる。このタングステン含有量の増加に
伴い、真空中で摺動接点材料を使用するときに、タング
ステン上に薄い酸化被膜が生成され、この被膜が潤滑作
用を呈する。したがって、前記溶着が防がれる。しかし
、タングステン含有量が８０％を越えるとき、接点部の
表面全体が酸化物で覆われ、接触抵抗の増加を招く。In the sliding contact material for vacuum equipment of the present invention, when the content of tungsten is less than 40% or more than 80%, the contact resistance of the material becomes large and it is stable over a long period of time like conventional materials. Unable to apply bias voltage. That is, when the tungsten content is low, welding tends to occur, and the surface of the contact portion becomes uneven, increasing contact resistance. With this increase in tungsten content, a thin oxide film is formed on the tungsten, which exhibits a lubricating effect when the sliding contact material is used in vacuum. Therefore, said welding is prevented. However, when the tungsten content exceeds 80%, the entire surface of the contact portion is covered with oxide, leading to an increase in contact resistance.
本実施例における摺動接点は、焼結法により製造したタ
ングステン３０〜８０％を含むタングステン−銀合金で
ある。このうち、タングステン５０％及び銀５０％から
なる合金を摺動接点部に用いた真空装置用給電機構の構
成例を第１図に示す。The sliding contact in this example is a tungsten-silver alloy containing 30-80% tungsten manufactured by a sintering method. FIG. 1 shows a configuration example of a power supply mechanism for a vacuum device using an alloy consisting of 50% tungsten and 50% silver for the sliding contact portion.
該給電機構は、ベース１３１回転軸８及び駆動用歯車１
４を備えている。ベース１３に取り付けられている接点
保持台１０に配置された固定側接点１１に対して摺動接
触する摺動側接点１２を、固着ネジ１５によって回転軸
８に固定している。該回転軸８は、軸受１６を介してベ
ース１３上で回転可能に配置されており、その一端には
被処理物Ｗが嵌合されている。また、回転軸８と駆動用
歯車１４及び軸受１６との間、並びにベース１３と接点
保持台１０との間には絶縁物１７が介在されており、回
転軸８．固定側接点１１及び摺動側接点１２から構成さ
れる摺動接点部並びに被処理物Ｗをアースから電気的に
浮かせた状態に維持している。この構成によるとき、回
転軸８及び被処理物Ｗの合計重量が、接触圧力として前
記摺動接点部に印加される。なお、符番１８は電圧端子
取付は用ネジである。The power feeding mechanism includes a base 131, a rotating shaft 8, and a driving gear 1.
It is equipped with 4. A sliding contact 12 that comes into sliding contact with a fixed contact 11 disposed on a contact holder 10 attached to a base 13 is fixed to the rotating shaft 8 by a fixing screw 15. The rotary shaft 8 is rotatably disposed on the base 13 via a bearing 16, and a workpiece W is fitted into one end of the rotary shaft 8. Further, an insulator 17 is interposed between the rotating shaft 8 and the driving gear 14 and the bearing 16, and between the base 13 and the contact holder 10. The sliding contact section composed of the fixed side contact 11 and the sliding side contact 12 and the object W to be processed are maintained electrically suspended from the ground. With this configuration, the total weight of the rotating shaft 8 and the workpiece W is applied to the sliding contact portion as contact pressure. Note that the reference numeral 18 is a screw for attaching the voltage terminal.
固定側接点１１を固定している接点保持台１０に電圧を
印加すると、電流は、固定側接点１１を介して摺動側接
点１２に流れ、回転軸８を経て被処理物Ｗに供給される
。これにより、駆動用歯車１４を介して伝達された駆動
力により回転軸８と共に回転している被処理物Ｗにバイ
アス電圧が印加される。When a voltage is applied to the contact holder 10 that fixes the fixed contact 11, the current flows through the fixed contact 11 to the sliding contact 12, and is supplied to the workpiece W via the rotating shaft 8. . As a result, a bias voltage is applied to the workpiece W rotating together with the rotating shaft 8 due to the driving force transmitted through the driving gear 14 .
このような摺動接点部を有する装置をスパッタリング用
の真空装置に組み込み、真空槽内を１×１０−’ｔｏｒ
ｒ以下に排気した後、アルゴンガスを注入して槽内を０
．０２ｔｏｒｒに維持してスパッタリングを行い、バイ
アス電圧が安定して印加されている時間を調べた。この
際、接触圧力として荷重２００ｇを摺動接点部に加え、
被処理物Ｗを毎分１回転の速度で回転させ、６０Ｖの直
流電圧を印加した。その結果を表■に示す。A device having such a sliding contact part is incorporated into a vacuum device for sputtering, and the inside of the vacuum chamber is heated to 1×10-'tor.
After evacuation to below r, argon gas is injected to bring the inside of the tank to zero.
．． Sputtering was performed while maintaining the bias voltage at 0.02 torr, and the time during which the bias voltage was stably applied was examined. At this time, a load of 200 g was applied to the sliding contact part as contact pressure,
The object W to be processed was rotated at a speed of 1 revolution per minute, and a DC voltage of 60 V was applied. The results are shown in Table ■.
表 ■
表■から明らかなように、タングステン４０〜７０％含
存するＡｇ−Ｗ合金を摺動接点材料として用いた場合、
バイアス電圧を安定して印加できる時間が７時間以上と
なった。他方、従来の摺動接点材料として最も優れたも
のである銀を用いた場合にあっても、バイアス電圧を安
定して印加できる時間は、１．５時間程度に過ぎなかっ
た。すなわち、本実施例あ摺動接点材料は、従来の材料
に比較して５倍以上の寿命を有する。その結果、円板状
の被処理物Ｗり（周に５ＩＩｌ−ｃｏ薄膜を形成する場
合、従来の摺動接点材料によるとき、真空槽の真空を破
り摺動接点部の交換を行い、再度真空槽内を真空状態に
してスパッタリングを再開する必要があったため、製膜
に長時間を要していた。これに対し、本実施例の摺動接
点材料によるとき、−回の処理で目的とする厚さの薄膜
を形成できるので、処理時間の大幅な短縮を行うことが
可能となった。Table ■ As is clear from Table ■, when an Ag-W alloy containing 40 to 70% tungsten is used as a sliding contact material,
The time during which the bias voltage could be stably applied was 7 hours or more. On the other hand, even when silver, which is the most excellent conventional sliding contact material, is used, the time during which a bias voltage can be stably applied is only about 1.5 hours. In other words, the sliding contact material of this embodiment has a lifespan five times longer than that of conventional materials. As a result, when forming a 5IIl-co thin film on the circumference of a disk-shaped workpiece W, when using conventional sliding contact materials, the vacuum in the vacuum chamber must be broken, the sliding contact section must be replaced, and the vacuum must be re-vacuumed. It took a long time to form a film because it was necessary to put the inside of the tank into a vacuum state and restart sputtering.In contrast, when using the sliding contact material of this example, the target could be achieved in - times of processing. Since a thin film can be formed, it has become possible to significantly shorten processing time.
なお、本実施例においては摺動接点部として第１図に示
すような形状の固定側接点１１及び円筒状の摺動側接点
１２を使用したが、タングステン含有量が４０〜７０％
であるＡｇ−Ｗ合金を使用する限り、その摺動接点部は
どのような形状であっても良い。In this example, a fixed contact 11 shaped as shown in FIG. 1 and a cylindrical sliding contact 12 were used as sliding contacts, but the tungsten content was 40 to 70%.
As long as the Ag-W alloy is used, the sliding contact portion may have any shape.
たとえば、第２図に示したように先端に固定側接点１１
を取り付けた板バネ１９により摺動側接点１２を押圧す
る構造のものでも良い、また、このような摺動接点部の
設置個数は、単数或いは複数のいずれであっても良い。For example, as shown in FIG.
The structure may be such that the sliding contact 12 is pressed by a plate spring 19 attached thereto, and the number of such sliding contacts may be one or more.
以上に説明したように、本発明においては、真空槽内の
摺動接点部にタングステンを４０〜７０％含存するへｇ
−合金を用いているので、焼付きに起因する接触抵抗の
増加が生じず、長時間にわたり安定してバイアス電圧を
摺動接点部に印加することが可能となる。そのため、ス
パッタリング等の処理の途中で摺動接点部の取替えを必
要とすることなく、回転している被処理物に目的とする
厚さの薄膜を形成することができる。As explained above, in the present invention, the sliding contact portion in the vacuum chamber contains 40 to 70% tungsten.
- Since the alloy is used, there is no increase in contact resistance due to seizure, and it is possible to stably apply bias voltage to the sliding contact portion over a long period of time. Therefore, a thin film of a desired thickness can be formed on a rotating workpiece without requiring replacement of the sliding contact part during a process such as sputtering.
【図面の簡単な説明】
第１図は本発明実施例の摺動接点材料を使用するのに適
した真空装置の給電機構を示し、第２図は他の例を示す
、また、第３図は、前記真空装置の全体構成を示す。[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 shows a power supply mechanism of a vacuum device suitable for using the sliding contact material of the embodiment of the present invention, FIG. 2 shows another example, and FIG. shows the overall configuration of the vacuum device.
Claims (1)
特徴とする真空装置用摺動接点材料。1. A sliding contact material for vacuum equipment, characterized by comprising 40 to 70% tungsten and the remainder silver.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61044104A JPS62202043A (en) | 1986-03-03 | 1986-03-03 | Sliding contact point material for vacuum device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61044104A JPS62202043A (en) | 1986-03-03 | 1986-03-03 | Sliding contact point material for vacuum device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62202043A true JPS62202043A (en) | 1987-09-05 |
| JPH0225420B2 JPH0225420B2 (en) | 1990-06-04 |
Family
ID=12682304
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61044104A Granted JPS62202043A (en) | 1986-03-03 | 1986-03-03 | Sliding contact point material for vacuum device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62202043A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5940214A (en) * | 1982-08-31 | 1984-03-05 | Teraoka Seiko Co Ltd | Automatic span adjusting method in combination measuring apparatus |
-
1986
- 1986-03-03 JP JP61044104A patent/JPS62202043A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5940214A (en) * | 1982-08-31 | 1984-03-05 | Teraoka Seiko Co Ltd | Automatic span adjusting method in combination measuring apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0225420B2 (en) | 1990-06-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |