JPS62199796A - Parts for electronic and electrical appliances - Google Patents
Parts for electronic and electrical appliancesInfo
- Publication number
- JPS62199796A JPS62199796A JP4030086A JP4030086A JPS62199796A JP S62199796 A JPS62199796 A JP S62199796A JP 4030086 A JP4030086 A JP 4030086A JP 4030086 A JP4030086 A JP 4030086A JP S62199796 A JPS62199796 A JP S62199796A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- gold
- silver
- layer
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 claims abstract description 73
- 229910052737 gold Inorganic materials 0.000 claims abstract description 28
- 229910052709 silver Inorganic materials 0.000 claims abstract description 25
- 229910001316 Ag alloy Inorganic materials 0.000 claims abstract description 4
- 229910001020 Au alloy Inorganic materials 0.000 claims abstract description 3
- 239000010931 gold Substances 0.000 claims description 26
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 23
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 20
- 239000004332 silver Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000003353 gold alloy Substances 0.000 claims description 2
- 229910000510 noble metal Inorganic materials 0.000 abstract description 7
- 229910000881 Cu alloy Inorganic materials 0.000 abstract description 4
- 229910000640 Fe alloy Inorganic materials 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 239000010970 precious metal Substances 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000009736 wetting Methods 0.000 description 4
- 229910000906 Bronze Inorganic materials 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000010974 bronze Substances 0.000 description 3
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- XTFKWYDMKGAZKK-UHFFFAOYSA-N potassium;gold(1+);dicyanide Chemical compound [K+].[Au+].N#[C-].N#[C-] XTFKWYDMKGAZKK-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 1
- 229940098221 silver cyanide Drugs 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
Description
【発明の詳細な説明】
(目 的)
本発明は、金属板上にAu、Ag等の貴金属めっきを施
したリードフレー11あるいは端子コネクター等の電子
・電気機器用部品に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Objective) The present invention relates to parts for electronic and electrical equipment, such as a lead fly 11 or a terminal connector, in which a metal plate is plated with a noble metal such as Au or Ag.
(従来技術)
Au、Ag等の貴金属は化学的及び物理的性質に優れて
いるので、各種の電子・電気部品に広く利用されている
が、非常に高価であるためできるだけめっき層を薄くす
ることが望まれている。一方、電子・電気部品としての
真金属めっき材は数百度の熱を受ける場合があるが、こ
のような高温環境下における下地金属の酸化あるいは貴
金属表面層への下地金属の拡散等により半田付性、ボン
ディング性等が著しく劣化したり変色してしまうという
欠点があった。(Prior art) Precious metals such as Au and Ag have excellent chemical and physical properties and are widely used in various electronic and electrical parts, but they are very expensive, so it is important to make the plating layer as thin as possible. is desired. On the other hand, true metal plating materials used as electronic and electrical components may be exposed to heat of several hundred degrees, and solderability may deteriorate due to oxidation of the underlying metal or diffusion of the underlying metal into the precious metal surface layer in such high-temperature environments. However, there were disadvantages in that the bonding properties and the like were significantly deteriorated and the color changed.
このため上記のような高温環境下における品タデの低下
を防ぐ目的のために、貴金属めっきを施す前の下地めっ
きとして、5n−Ni、5n−Go。Therefore, in order to prevent the deterioration of quality under the above-mentioned high-temperature environment, 5n-Ni and 5n-Go are used as the base plating before noble metal plating.
Pb−Ni及びNi等を施すことが試みられているが、
これらの下地めっきを施したものでも450℃の大気中
に3分間保持すると、貴金属めっき層が例えば、Au0
.1μあるいはA g 0.5μ程度の薄いめっき厚で
は十分な半田付性及びボンディング性を示す材料は得ら
れておらず、上記特性を満たすためには貴金属めつき層
を数μ程度の厚いめっきを施さなければならないという
欠点があった。このように従来の下地めっきをしたもの
では貴金属を大量に消費し、著しい経済的損失を受けて
いた。Attempts have been made to apply Pb-Ni, Ni, etc.
Even with these base platings, if kept in the atmosphere at 450°C for 3 minutes, the noble metal plating layer will change to, for example, Au0.
.. A material that exhibits sufficient solderability and bonding properties cannot be obtained with a plating thickness as thin as 1μ or A g 0.5μ, and in order to satisfy the above characteristics, the precious metal plating layer must be plated as thick as several μ. The disadvantage was that it had to be done. As described above, conventional underplating products consume large amounts of precious metals, resulting in significant economic losses.
(構 成)
本発明はかかる現状に鑑み鋭意研究を行った結果成され
たものであり、貴金属めっき層がAu001μあるいは
Ag0.5μ程度の薄いめっき厚において、450℃の
大気中に3分間保持した後でも十分な半田付性及びボン
ディング性を示す貴金属めっき材を提供するものである
。すなわち本発明は金属板上に、金又は銀の下地めっき
層と、さらにその上に下地めっき層が金めつきの場合は
銀又は銀合金めっきを、下地めっき層が銀めっきの場合
は金又は金合金めっき層を備えた電子・電気機器用部品
並びに下地めっき層が金又は銀のストライクめっき層で
ある前記電子・電気機器用部品に関するものである。(Structure) The present invention was achieved as a result of intensive research in view of the current situation, and the precious metal plating layer was kept in the atmosphere at 450°C for 3 minutes at a thin plating thickness of about 001 μm of Au or 0.5 μm of Ag. The object of the present invention is to provide a precious metal plating material that exhibits sufficient solderability and bonding properties even after soldering. That is, the present invention provides a gold or silver base plating layer on a metal plate, and a silver or silver alloy plating on the base plating layer when the base plating layer is gold plating, and gold or gold when the base plating layer is silver plating. The present invention relates to parts for electronic and electrical equipment having an alloy plating layer, and parts for electronic and electrical equipment in which the base plating layer is a gold or silver strike plating layer.
尚、下地としての金めつき層あるいは銀めっき層は0.
01μ以上の厚さがあれば加熱された後でも良好な半田
付性及びボンディング性を維持するいわゆる耐熱性向上
の効果は十分である。したがって、このような0.01
μ〜0.1μ程度の薄いめっき層を施すにはストライク
めっき浴を利用すると緻密で均一な皮膜が得られて好ま
しい。主地となる上記銀ストライクめっき液は、銅・銅
合金及び鉄合金等に使用することができ、通常特に濃度
の低い銀めっき液を用いてストライクめっきを行う。こ
れは、濃度の高い銀めっき浴に浸漬すると銀のセメンチ
ージョンが瞬時に起こり、その上に金めつきをしても密
着性の良い皮膜が得られないためである。又、下地とな
る金ストライク液も同様に銅・銅合金及び鉄合金等に使
用することができる。そして通常濃度の低い金めつき液
を用いてストライクめっきを行う。このようにストライ
クめっき液を用いることによって均一性に富み緻密で密
着性の良い皮膜を形成し、続いて所定の上層めっきを行
うと、本発明の半田付性及びボンディング性の良好な電
子・電気機器用部品が得られる。In addition, the gold plating layer or silver plating layer as the base is 0.
If the thickness is 0.01 μm or more, the effect of improving so-called heat resistance, which maintains good solderability and bonding properties even after heating, is sufficient. Therefore, 0.01 like this
In order to apply a thin plating layer of about .mu. to 0.1 .mu.m, it is preferable to use a strike plating bath because a dense and uniform film can be obtained. The main silver strike plating solution can be used for copper, copper alloys, iron alloys, etc., and strike plating is usually performed using a particularly low concentration silver plating solution. This is because silver cementation occurs instantaneously when immersed in a highly concentrated silver plating bath, and even if gold plating is applied on top of that, a film with good adhesion cannot be obtained. Further, the underlying gold strike liquid can be similarly used for copper, copper alloys, iron alloys, etc. Strike plating is then typically performed using a gold plating solution with a low concentration. By using the strike plating solution as described above, a highly uniform, dense, and highly adhesive film is formed, and then a predetermined upper layer plating is performed. Equipment parts can be obtained.
このような金あるいは銀めっき材の高温環境下において
劣化する機構については、必ずしも理論的な解明がなさ
れている分ではないが、一般には次のように考えられる
。すなわち、金めつき材の場合には、高温環境下におい
て母材金属あるいは従来の下地めっき中のCu、Fe、
Ni、Co等が金めつきの表面に拡散してきてそこで大
気に触れ、酸化物を形成し、半田付性あるいはボンディ
ング性の劣化の原因となる。又、銀めっき材の場合は同
様に高温環境下において、酸素を容易に透過させてしま
うので、母材金属あるいは従来の下地めっきと酸素が結
合し、同様に酸化膜の形成につながり半田付性あるいは
ボンディング性を悪化させる原因となる。Although the mechanism by which such gold or silver plated materials deteriorate in high-temperature environments has not necessarily been theoretically elucidated, it is generally thought to be as follows. In other words, in the case of gold-plated materials, Cu, Fe,
Ni, Co, etc. diffuse onto the gold-plated surface and come into contact with the atmosphere, forming oxides and causing deterioration of solderability or bonding properties. In addition, in the case of silver-plated materials, oxygen easily permeates under high-temperature environments, so oxygen combines with the base metal or the conventional base plating, which similarly leads to the formation of an oxide film and reduces solderability. Alternatively, it may cause deterioration of bonding properties.
したがって1本発明においては金又は金合金めっき材の
下地めっきとして異種金属である銀めっきを施すことに
より金めっ前向での前記のような酸化物の形成を妨げ、
又、銀又は銀合金めっき材の下地めっきとして金めつき
を施すことにより下地の酸化を防止しようとするもので
ある。Therefore, in the present invention, by applying silver plating, which is a dissimilar metal, as the base plating for gold or gold alloy plating material, the formation of the above-mentioned oxides in front of the gold plating is prevented,
Furthermore, gold plating is applied as a base plating for silver or silver alloy plated materials to prevent oxidation of the base.
母材の金属としては、Fe、Fe合金、Cu、Cu合金
及びセラミックのメタライズ材等に適用できる。As the base metal, Fe, Fe alloy, Cu, Cu alloy, ceramic metallized material, etc. can be used.
尚1本発明においては本発明の下地めっきの前にさらに
他の下地めっきを施すことはもちろん可能であって、本
発明はこれらを当然包含するものである。Note that in the present invention, it is of course possible to further apply another base plating before the base plating of the present invention, and the present invention naturally includes these.
次に、本発明を実施例に基づき説明する。Next, the present invention will be explained based on examples.
(実施例)
ステンレス(SUS430.Cl 11+m+t)及び
りん青銅(0,20nmt)を公知の方法で脱脂、酸洗
処理を施した後、以下の工程に基づいて貴金属めっきを
施した6めっきした後、450°Cの大気中で加熱処理
(3分間)を施し、半田付性及びボンディング性を評価
した。(Example) Stainless steel (SUS430.Cl 11+m+t) and phosphor bronze (0.20 nmt) were degreased and pickled using a known method, and then plated with a precious metal based on the following steps. A heat treatment (3 minutes) was performed in the air at 450°C, and the solderability and bonding properties were evaluated.
本発明例
(1)ニッケルストライクめっき 0.02μ→金スト
ライクめっき0.02μ→銀めっき0.5μ比較例
(3)ニッケルストライクめっき 0.02μ→ニッケ
ルコバルト合金 0.5μ →金めっき061μ→銀め
っき0.5μ
(5)金ストライクめっき 0.02μ →金めっき0
.1μ(母材 りん青銅)
(6)銀ストライクめっき 0.02μ →銀めっき0
.5μ(母材 りん青銅)
評価結果を第1表に示す6又、めっき条件及び評価方法
については以下に示す。Example of the present invention (1) Nickel strike plating 0.02μ → gold strike plating 0.02μ → silver plating 0.5μ Comparative example (3) Nickel strike plating 0.02μ → nickel-cobalt alloy 0.5μ → gold plating 061μ → silver plating 0.5μ (5) Gold strike plating 0.02μ → Gold plating 0
.. 1μ (Base material: phosphor bronze) (6) Silver strike plating 0.02μ → Silver plating 0
.. 5μ (base material phosphor bronze) The evaluation results are shown in Table 1. The plating conditions and evaluation method are shown below.
・ニッケルストライクめっき
浴組成 塩化ニッケル 250 g / Q塩
酸 100 g / Q温 度
20℃
電流密度 5A/dm”
・ニッケルーコバルト合金めっき
(Ni 3(ht%、 Co 70wt%)浴組成
硫酸ニッケル 135 g / Q硫酸コバルト
115g/[
は う 酸 25gIQ塩化カ
リ 15g/Q
温 度 406C
電流密度 LA/dm”
・ニッケルーす 合金めっき
(Ni 33wt%、 Co 67wt%)浴組成 塩
化第1すず 50 g / Q塩化ニッケル 300
g / Q
フッ化ナトリウム 28 g / Q酸性フッ化アン
モニウム35g/Q
温 度 65°C
電流密度 0.5A/dm”
・金ストライクめっき
浴組成 シアン化金カリウム 2g/Qり エ
ン 酸 20gIQクエン酸ソーダ too
g / Q
常 温
・ ストライクめっき
浴組成 シアン化銀 2g/Q
シアン化カリウム 100 g / Q常 温
・金 め つ き
国中貴金属製 テンペレックス701(商品名)温
度 50℃
・L犯
田中貴会Jifc製 5ILVLEX JS−1(商
品名)温 度 20°C
・半田付性試験方法
サンプルを25%ロジンメタノールに5秒浸漬後235
±5℃に保持された60/40 (Sn/Pb)半田浴
中に5秒間浸漬し、その時の外観状況及び濡れ曲線より
得られたT、(浮力が0になるまでの時間:短い程濡れ
性良好)をもって半田付性を評価−た。・Nickel strike plating bath composition Nickel chloride 250 g / Q salt
Acid 100g/Q temperature
20℃ Current density 5A/dm” Nickel-cobalt alloy plating (Ni 3 (ht%, Co 70wt%) Bath composition
Nickel sulfate 135 g / Q cobalt sulfate
115g/[Hallic acid 25gIQ Potassium chloride 15g/Q Temperature 406C Current density LA/dm” Nickel alloy plating (Ni 33wt%, Co 67wt%) Bath composition Stannous chloride 50g / QNickel chloride 300
g/Q Sodium fluoride 28 g/Q acidic ammonium fluoride 35 g/Q Temperature 65°C Current density 0.5 A/dm" Gold strike plating bath composition Potassium gold cyanide 2 g/Q
Acid 20gIQ Sodium citrate too
g/Q Room temperature/Strike plating bath composition Silver cyanide 2g/Q Potassium cyanide 100g/Q Room temperature/Gold plated Temperex 701 (product name) made by Kuninaka Precious Metals Temperature
Temperature: 50°C ・5ILVLEX JS-1 (product name) manufactured by Jifc, sold by L-Handanaka Takakai Temperature: 20°C ・Solderability test method After immersing the sample in 25% rosin methanol for 5 seconds, 235
Immersed in a 60/40 (Sn/Pb) solder bath held at ±5°C for 5 seconds, T obtained from the appearance and wetting curve (time until buoyancy becomes 0: the shorter the wetting) The solderability was evaluated based on the results (good solderability).
・ボンディング性試験−J法
サンプル上に25μφの金線を1mmの間隔でボール−
ウェッジボンドを施し、その引張り強度によりボンディ
ング性を評価した。・Bonding property test - Gold wire of 25 μΦ is placed on the J method sample with a ball at 1 mm intervals.
Wedge bonding was performed, and the bonding properties were evaluated based on the tensile strength.
以下余白 第1表 半田付性及びボンディング性 ×半田付性 T2: −全く濡れを示さない。Margin below Table 1 Solderability and bonding properties x Solderability T2: - No wetting at all.
外観状況二 096%以上の襦れを示した。Appearance condition: 2096% or more of curvature.
X 40%未満の濡れを示した。X: Showed less than 40% wetting.
※ボンディング性 二 −ボンディングできない。*Bonding property 2 - Bonding is not possible.
第1表に示すように本発明例では比較例に比べ450℃
、3分間の加熱処理後の半田付は性及びボンディング性
に優れていることが分かる。As shown in Table 1, the inventive example had a temperature of 450°C compared to the comparative example.
It can be seen that soldering after 3 minutes of heat treatment has excellent soldering properties and bonding properties.
(効 果)
このように本発明の電子・電気機器用部品は、熱による
劣化が少なく (耐熱性がすぐれ)、又、貴金属めっき
の薄肉化が可能であり、工業上価れた効果を奏するもの
である。(Effects) As described above, the parts for electronic/electrical equipment of the present invention are less likely to deteriorate due to heat (excellent heat resistance), and the noble metal plating can be made thinner, resulting in industrially valuable effects. It is something.
Claims (2)
の上に下地めっき層が金めっきの場合は銀又は銀合金め
っきを、下地めっき層が銀めっきの場合は金又は金合金
めっき層を備えた電子・電気機器用部品。(1) Gold or silver base plating layer on the metal plate, and if the base plating layer is gold plating, then silver or silver alloy plating, and if the base plating layer is silver plating, gold or gold alloy plating. Components for electronic and electrical equipment with layers.
ある特許請求の範囲第1項記載の電子・電気機器用部品
。(2) The electronic/electric device component according to claim 1, wherein the base plating layer is a gold or silver strike plating layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4030086A JPS62199796A (en) | 1986-02-27 | 1986-02-27 | Parts for electronic and electrical appliances |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4030086A JPS62199796A (en) | 1986-02-27 | 1986-02-27 | Parts for electronic and electrical appliances |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62199796A true JPS62199796A (en) | 1987-09-03 |
Family
ID=12576761
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4030086A Pending JPS62199796A (en) | 1986-02-27 | 1986-02-27 | Parts for electronic and electrical appliances |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62199796A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010040679A (en) * | 2008-08-01 | 2010-02-18 | Kyushu Hitachi Maxell Ltd | Semiconductor device and its production process |
JP2015048512A (en) * | 2013-09-02 | 2015-03-16 | オリエンタル鍍金株式会社 | Method for producing plated material and plated material |
JP2016143731A (en) * | 2015-01-30 | 2016-08-08 | Shマテリアル株式会社 | Lead frame and method of manufacturing the same |
JP2019151871A (en) * | 2018-03-01 | 2019-09-12 | Dowaメタルテック株式会社 | Plated material |
-
1986
- 1986-02-27 JP JP4030086A patent/JPS62199796A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010040679A (en) * | 2008-08-01 | 2010-02-18 | Kyushu Hitachi Maxell Ltd | Semiconductor device and its production process |
JP2015048512A (en) * | 2013-09-02 | 2015-03-16 | オリエンタル鍍金株式会社 | Method for producing plated material and plated material |
JP2016143731A (en) * | 2015-01-30 | 2016-08-08 | Shマテリアル株式会社 | Lead frame and method of manufacturing the same |
JP2019151871A (en) * | 2018-03-01 | 2019-09-12 | Dowaメタルテック株式会社 | Plated material |
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