JPS62189470A - Depiction device - Google Patents
Depiction deviceInfo
- Publication number
- JPS62189470A JPS62189470A JP61032225A JP3222586A JPS62189470A JP S62189470 A JPS62189470 A JP S62189470A JP 61032225 A JP61032225 A JP 61032225A JP 3222586 A JP3222586 A JP 3222586A JP S62189470 A JPS62189470 A JP S62189470A
- Authority
- JP
- Japan
- Prior art keywords
- drawn
- stage
- laser beam
- storage section
- storage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000002441 reversible effect Effects 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 6
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、例えばプリント基板等の被描画材に回路パタ
ーン等の所望の・ｆターンを描画する描画装置に関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a drawing device for drawing a desired f-turn, such as a circuit pattern, on a material to be drawn, such as a printed circuit board.
一般に、プリント基板に回路・９ターンを描画する装置
として、レーデビームを使用したレーデビーム描画装置
が知られている。Generally, a Lede beam drawing apparatus using a Lede beam is known as an apparatus for drawing nine circuit turns on a printed circuit board.
従来、この櫨のレーデビーム描画装置においては、プリ
ント基板の表裏両面に所望の回路・９ターンを描画する
場合、ステージ上に載置されたプリント基板（ワーク）
の片面にレーデビームによシ回路パターンを描画した後
、プリント基板を裏返しにしてその他面に再び回路・ザ
ターンを描画している。Conventionally, in this laser beam writing system, when drawing a desired circuit/9 turns on both the front and back sides of a printed circuit board, the printed circuit board (workpiece) placed on the stage was used.
After drawing a circuit pattern on one side of the board using a Lede beam, the printed circuit board is turned over and the circuit pattern is drawn again on the other side.
しかしながら、上記した従来の′４子ビーム描画装置に
あっては、レーデビームの使用によって、一枚のプリン
ト基板への描画時間がａｌＯ秒という単位で行なわれる
ようにスルーグツトを図っている反面、ワークの形状、
寸法がさまざまで、かつ薄くて大きいことから、ワーク
の取扱いに困難を来たしているため、ワーク交換に要す
る時間が長く、スルーグツトを向上させる上で大きな障
害になっているといった問題があった。However, in the above-mentioned conventional four-beam lithography system, the drawing time on one printed circuit board is made in units of aloseconds by using a radar beam, but on the other hand, the workpiece shape,
The various dimensions, thinness, and largeness of the workpieces make handling of the workpieces difficult, and the time required to change the workpieces is long, which is a major hindrance to improving throughput.
本発明は、上記の事情のもとになされたもので、その目
的とするところは、ワークの交侠時間を短縮することが
できるようにした描画装置を提供することにある。The present invention has been made under the above circumstances, and an object of the present invention is to provide a drawing device that can shorten the time required for moving workpieces.
上記した問題点を解決するために、本発明はステージ上
に載置された被描画材の片面に所望の・リーンを描画す
る描画装置において、被描画材を複数段に収納すると共
に反転可能に設けられ、かつ反転前と反転後の両状態に
て前記ステージとの間で前記被描画材の授受を可能にし
た収納部を具備させたものである。In order to solve the above-mentioned problems, the present invention provides a drawing device that draws a desired lean pattern on one side of a drawing material placed on a stage, in which the drawing material is stored in multiple stages and can be turned over. The drawing material is provided with a storage section that allows the material to be drawn to be delivered to and received from the stage both before and after the reversal.
すなわち、本発明は、上記の構成とすることによって、
反転前の状態にある収納部を用いて極数の被描画材の片
面に順次描画した後に収納部を反転させて被描画材の表
裏面を反転させた後、再びステージ上に被描画材を搬送
して裏面を順次描画することができるために、ワーク交
換時間を短縮することができ、スルーグツドを向上させ
ることが可能になる。That is, by having the above configuration, the present invention has the following features:
After sequentially drawing on one side of a number of poles of material to be drawn using the storage section in the state before inversion, the storage section is inverted to invert the front and back sides of the material to be drawn, and then the material to be drawn is placed on the stage again. Since the back side can be sequentially drawn while being transported, the workpiece exchange time can be shortened and throughput can be improved.
〔実施例〕
以下、本発明を図示の一実施例を参照しながら説明する
。[Example] The present invention will be described below with reference to an illustrated example.
第１図は本発明に係る描画装置の概略構成を示すもので
、ｘ−ｙ方向又は一方向に移動内部可能なテーブル１上
にステー−）２が設置され、このステージ２の上方には
レーデビームＬを走査するレーデビーム光学系３が配置
されている。FIG. 1 shows a schematic configuration of a drawing apparatus according to the present invention. A stay 2 is installed on a table 1 that can be moved in the x-y direction or in one direction, and a radar beam is placed above the stage 2. A radar beam optical system 3 for scanning L is arranged.
そして、前記ステージ２上には、後述する第１の収納部
から被描画材Ｐが搬送載置され、この被描画材Ｐの片側
表面に前記レーデビーム光学系３から照射されるレーデ
ビームＬによって所望のパターンが描画されるようにな
っている一方、描画後の被描画材Ｐは後述する第２の収
納部に収納されるようになっている。A drawing material P is transported and placed on the stage 2 from a first storage section to be described later, and one surface of the drawing material P is irradiated with a desired Lede beam L from the Lede beam optical system 3. While the pattern is being drawn, the material P to be drawn after being drawn is stored in a second storage section which will be described later.
すなわち、上記第１の収納部４は、複数枚の未描画状態
の被描画材Ｐ・・・全上下方向に段階的に収納する第１
の収納マガジン５と、この収納マガジン５１に昇降させ
る第１の昇降機構６とからなシ、この第１の昇降機＃Ｊ
Ｉ６は、前記第１の収納マガジン５′Ｊｋ支持する支持
体７にボールネソ８を螺合させて、このゲールネノ８を
図示しない駆動系によシ正逆回転させることによシ第１
の収納マがノン５を段階的に昇降させる一方、前記第１
の収納マがノン５に収納された各々の被描画材Ｐは前記
ステージ２の対応位置で図示しない送シ機構によってス
テージ２上に搬送されるようになっている。また、前記
第２の収納部９は、第１の収納部４と同様に、複数枚の
被描画材Ｐを上下方向に段階的に収納する第２の収納マ
ガジン１０と、この収納マがノン１ｏを昇降させる第２
の昇降機構１ノとからなり、この第１の昇降機構１１は
、前記第２の収納マガジン１０をベアリング１２を介し
て図示しない駆動系により鉛直方向に１８０°回転可能
に支持する支持体１３にぜ−ルネノ１４を螺合させて、
このゲールネソ１４を図示しない駆動系により正逆回転
させることにより＄２の収納マがノン１０全前記Ｉ４１
の収納マガジン５と相反する方向に段階的に昇降させる
ようになっている。そして、前記第２の収納部９には、
第１の収納部４からステージ２上に搬送されてレーデビ
ーム光学系３のレーデビームＬで片面描画された６各の
被描画材Ｐが図示しない送り部材によってｊ１次段階的
に収納されるもので、このように、片面描画された全被
描画材Ｐの収納後、第２図に示すように、前記第２の収
納マガジン１ｏを１８００回転させて全被描画材Ｐを反
転させ、６各の被描画材Ｐの表裏面を換えた後に再び図
示しない送り部材により前記ステージ２上に順次再搬送
し、未描画状態の被描画材Ｐの他面にレーザビーム光学
系３からのレーデビームＬの照射によって描画し得るよ
うになっている。さらに、このように両面が描画された
各々の被描画材Ｐは図示しない送シ部材によシ再び第１
の収納部４の第１の収納マが、ノン５に順次段階的に収
納されるものである。That is, the first storage section 4 stores a plurality of drawing materials P in an undrawn state in stages in the vertical direction.
This first elevator #J includes a storage magazine 5 and a first lifting mechanism 6 that lifts and lowers the storage magazine 51.
I6 is constructed by screwing the ball net 8 onto the support 7 that supports the first storage magazine 5'Jk, and rotating the ball net 8 in forward and reverse directions by a drive system (not shown).
While the storage machine raises and lowers the non-slip 5 in stages, the first
Each drawing material P stored in a tray 5 is conveyed onto the stage 2 by a feeding mechanism (not shown) at a corresponding position on the stage 2. Also, like the first storage section 4, the second storage section 9 includes a second storage magazine 10 that stores a plurality of drawing materials P in stages in the vertical direction, and a second storage magazine 10 that stores a plurality of drawing materials P in stages in the vertical direction. 2nd to raise and lower 1o
This first elevating mechanism 11 is connected to a support 13 that supports the second storage magazine 10 via a bearing 12 so as to be rotatable by 180 degrees in the vertical direction by a drive system (not shown). Let's screw together Luneno 14,
By rotating this Gale Neso 14 in forward and reverse directions using a drive system (not shown), the storage capacity of $2 can be reduced to non-10 and the above-mentioned I41.
The storage magazine 5 is raised and lowered in stages in a direction opposite to that of the storage magazine 5. And, in the second storage section 9,
Each of the six drawing materials P transported from the first storage section 4 onto the stage 2 and subjected to single-sided drawing with the Lede beam L of the Lede beam optical system 3 is stored in j1 step by step by a feeding member (not shown), After storing all the drawing materials P that have been drawn on one side, as shown in FIG. After changing the front and back sides of the drawing material P, it is sequentially conveyed again onto the stage 2 by a feeding member (not shown), and the other surface of the drawing material P in an undrawn state is irradiated with the Radhe beam L from the laser beam optical system 3. It is now possible to draw. Furthermore, each drawing material P whose both sides have been drawn in this way is transferred to the first feeding member (not shown) again.
The first storage unit of the storage unit 4 is stored in the door 5 in a step-by-step manner.
また、本説明では第１の収納部４と第２の収納部９とが
備えられている場合について説明したが、たとえば第１
図、第２図において４２の収納部９のみが好ましくは交
換可能に備えられており、この収納部９とステージ２と
の間でのみロード・アンロードし、かつ１８０°反転さ
せ表裏面を入れ換えるようにしてもよい。Further, in this description, a case has been described in which the first storage section 4 and the second storage section 9 are provided, but for example, the first storage section 4 and the second storage section 9 are provided.
In FIGS. 2 and 2, only 42 storage sections 9 are preferably provided so as to be replaceable, and loading and unloading is performed only between these storage sections 9 and the stage 2, and the front and back surfaces are swapped by 180° reversal. You can do it like this.
また本装置の他の利用法として、１枚づつ順番に、表裏
面に描画したいのであれば複数枚収納可能な収納部の全
枚数の一面描画後に１８０゜回転させ他面への描画をす
るのでなく１枚毎に１８０°回転させ表裏面に描画する
ことも可能である。Another way to use this device is to draw one page at a time, one by one, on the front and back sides. After drawing on one side of all the sheets in the storage compartment that can accommodate multiple sheets, rotate it 180 degrees and draw on the other side. It is also possible to rotate each sheet by 180 degrees and draw on the front and back sides.
なお、本発明は上記した実施例には限定されず、本発明
の要旨を変えない範囲で種々変形実施可能なことは勿論
である。It should be noted that the present invention is not limited to the embodiments described above, and it goes without saying that various modifications can be made without departing from the gist of the present invention.
以上の説明から明らかなように、本発明によれば、被描
画材を１回収納部へ収納するのみで連続して両面の描画
が可能になシ、これによってワーク交換時間を短縮でき
スルーグツトの向上を図ることができるとともに、商品
価値を高めることができるという優れた効果を有するも
のである。As is clear from the above description, according to the present invention, it is possible to continuously draw on both sides by simply storing the drawing material in the storage section once, thereby reducing the time for changing the workpiece and improving the throughput. This has the excellent effect of increasing the product value as well as improving the quality of the product.
第１図は本発明は係る描画装置の一実施例を示す概略的
説明図、第２図は同じく片面描画後の被描画材の他面へ
の描画状態を示す説明図である。
２・・・ステーゾ、４・・・第１の収納部、６・・・第
１の昇降機構、９・・・第２の収納部、１１・・・第２
の昇降機構、Ｐ・・・被描画材。FIG. 1 is a schematic explanatory diagram showing one embodiment of the drawing apparatus according to the present invention, and FIG. 2 is an explanatory diagram showing the state of drawing on the other side of the material to be drawn after drawing on one side. 2... Stazo, 4... First storage section, 6... First elevating mechanism, 9... Second storage section, 11... Second storage section
Lifting mechanism, P... material to be drawn.
Claims (1)
ーンを描画する描画装置において、被描画材を複数段に
収納すると共に反転可能に設けられ、かつ反転前と反転
後の両状態にて前記ステージとの間で前記被描画材の授
受を可能にした収納部を備えたことを特徴とする描画装
置。In a drawing device that draws a desired pattern on one side of a material to be drawn placed on a stage, the material to be drawn is stored in multiple stages and is provided so as to be reversible, and in both the state before and after reversal. A drawing apparatus characterized by comprising a storage section that allows the drawing material to be transferred to and from the stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61032225A JPS62189470A (en) | 1986-02-17 | 1986-02-17 | Depiction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61032225A JPS62189470A (en) | 1986-02-17 | 1986-02-17 | Depiction device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62189470A true JPS62189470A (en) | 1987-08-19 |
Family
ID=12353014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61032225A Pending JPS62189470A (en) | 1986-02-17 | 1986-02-17 | Depiction device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62189470A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012203265A (en) * | 2011-03-25 | 2012-10-22 | Hitachi Via Mechanics Ltd | Inverting device, exposure apparatus using the same, and exposure method |
-
1986
- 1986-02-17 JP JP61032225A patent/JPS62189470A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012203265A (en) * | 2011-03-25 | 2012-10-22 | Hitachi Via Mechanics Ltd | Inverting device, exposure apparatus using the same, and exposure method |
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