JPS62187310A - Production of diffraction grating type optical coupler - Google Patents
Production of diffraction grating type optical couplerInfo
- Publication number
- JPS62187310A JPS62187310A JP3002286A JP3002286A JPS62187310A JP S62187310 A JPS62187310 A JP S62187310A JP 3002286 A JP3002286 A JP 3002286A JP 3002286 A JP3002286 A JP 3002286A JP S62187310 A JPS62187310 A JP S62187310A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- waveguide
- type optical
- transparent electrode
- guided mode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 7
- 239000010703 silicon Substances 0.000 claims abstract description 7
- 230000008878 coupling Effects 0.000 claims description 11
- 238000010168 coupling process Methods 0.000 claims description 11
- 238000005859 coupling reaction Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 7
- 239000000382 optic material Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 229910003327 LiNbO3 Inorganic materials 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 229910012463 LiTaO3 Inorganic materials 0.000 description 1
- 229910012657 LiTiO3 Inorganic materials 0.000 description 1
- 235000006732 Torreya nucifera Nutrition 0.000 description 1
- 244000111306 Torreya nucifera Species 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は回折格子型光結合装置の製造方法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing a diffraction grating type optical coupling device.
従来の回折格子型光結合装置は、例えばガラス基板上に
ＬｉＴｉＯ３等の薄膜からなる光導波路を設け、この上
に回折格子を設けた構造となっており、この回折格子面
に一定の角度で光ビームを入射させ、所定のモードを光
導波路に誘起させていた。A conventional diffraction grating type optical coupling device has a structure in which an optical waveguide made of a thin film such as LiTiO3 is provided on a glass substrate, and a diffraction grating is provided on top of the optical waveguide. A beam was made incident and a predetermined mode was induced into the optical waveguide.
上述した従来の回折格子型光結合装置は原理的に受動装
置であり、導波モードの誘起を断続させる場合には回折
格子に入射する光を機械的に断続させるか、あるいは入
射角度を変化させて誘起を断続させるようにしていた。The conventional diffraction grating type optical coupling device described above is a passive device in principle, and in order to intermittent the induction of the guided mode, the light incident on the diffraction grating is mechanically interrupted or the incident angle is changed. The induction was made to be intermittent.
このため導波モードの断続が高速にできないという問題
があった。For this reason, there was a problem in that the waveguide mode could not be switched on and off at high speed.
本発明の目的は、導波モードの断続が高速にできる回折
格子型光結合装置の製造方法を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a diffraction grating type optical coupling device that enables high-speed switching of waveguide modes.
次に、本発明の実施例について図面を参照して説明する
。Next, embodiments of the present invention will be described with reference to the drawings.
第１図（ａ）〜（ｄ）は本発明の一実施例を説明する為
の工程順に示した回折格子型光結合装置の断面図である
。FIGS. 1(a) to 1(d) are cross-sectional views of a diffraction grating type optical coupling device shown in the order of steps for explaining one embodiment of the present invention.
まず、第１図（ａ）に示すように、シリコン基板１」二
に熱酸化法等により酸化シリコン膜２を形成した後、ホ
トリングラフィ法により酸化シリコン膜２をエツチング
し、酸化シリコン膜２からなる光導波路３及び回折格子
用の溝４を形成する。First, as shown in FIG. 1(a), a silicon oxide film 2 is formed on a silicon substrate 1'2 by a thermal oxidation method or the like, and then the silicon oxide film 2 is etched by a photolithography method. An optical waveguide 3 and a groove 4 for a diffraction grating are formed.
次に第１図（ｂ）に示すように、全面にボッゲルス定数
の大きな電気光学材料であるＩ、１Ｎｈ０３膜５を反応
性直流マグネトロンスパッタ法等により堆積させる。Next, as shown in FIG. 1(b), an I, 1Nh03 film 5, which is an electro-optical material having a large Boggels constant, is deposited on the entire surface by reactive direct current magnetron sputtering or the like.
次に第１図（Ｃ）に示すように、ドライエ・ソチング法
又はフッ酸系溶液を用いたウェッＩ−エツチング法によ
りＬｉＮｂＯ３膜５をエツチングし酸化シリコン膜２の
表面を露出させると共に、ＬｉＮｂ０３ｒＪＡからなる
回折格子５Ａを形成する。Next, as shown in FIG. 1(C), the LiNbO3 film 5 is etched by a dry etching method or a wet I-etching method using a hydrofluoric acid solution to expose the surface of the silicon oxide film 2, and the LiNb03rJA is etched. A diffraction grating 5A is formed.
次に第１図（ｄ）に示すように、全面にインジウムとへ
の酸化物からなる透明電極６をスパッタ法により形成し
て回折格子型光結合装置を完成させる。Next, as shown in FIG. 1(d), a transparent electrode 6 made of an oxide of indium is formed on the entire surface by sputtering to complete a diffraction grating type optical coupling device.
このように本発明は半導体装置の製造プロセスを応用す
る事ができる為、回折格子型光結合装置の製造は容易で
ある。As described above, since the present invention can apply the manufacturing process of semiconductor devices, it is easy to manufacture a diffraction grating type optical coupling device.
次にこのようにして製造された回折格子型光結合装置の
動作について説明する。Next, the operation of the diffraction grating type optical coupling device manufactured in this manner will be explained.
第１図（ｄ）に示された回折格子型完結き装置の回折格
子面に、適切な入射角で光ビーム１０を入射させると光
導波路２内へ導波モードを誘起することができる。そし
てこの状態からシリコン基板１と透明電極６間に電圧を
印加すると、回折格子５Ａを構成するＬｉＮｂＯ３膜の
屈折率が線形に変化する。これにより、回折格子間にお
ける光ビーム１０の回折が変化するので光導波路３内へ
導波モードを誘起できなくなる。従って透明電極６とシ
リコン基板１間に印加する電圧を断続すれば光導波路３
へ誘起さ−れる導波モードを任意に断続できる。ＬｉＮ
ｂ０．膜５の屈折率変化は電場で制御できるので導波モ
ードの高速な断続が可能となる。When the light beam 10 is made incident on the diffraction grating surface of the diffraction grating type complete device shown in FIG. 1(d) at an appropriate angle of incidence, a waveguide mode can be induced into the optical waveguide 2. When a voltage is applied between the silicon substrate 1 and the transparent electrode 6 from this state, the refractive index of the LiNbO3 film forming the diffraction grating 5A changes linearly. This changes the diffraction of the light beam 10 between the diffraction gratings, making it impossible to induce a waveguide mode into the optical waveguide 3. Therefore, if the voltage applied between the transparent electrode 6 and the silicon substrate 1 is interrupted, the optical waveguide 3
The waveguide mode induced in the waveguide can be arbitrarily interrupted. LiN
b0. Since the change in the refractive index of the film 5 can be controlled by an electric field, the waveguide mode can be switched on and off at high speed.
尚、上記実施例においては電気光学材料としてＬｉＮｂ
Ｏ３を用いた場合について説明したがＬｉＴａＯ３等池
の材料を用いてもよいことは勿論である。In addition, in the above embodiment, LiNb was used as the electro-optic material.
Although the case where O3 is used has been described, it goes without saying that other materials such as LiTaO3 may also be used.
以上説明したように本発明は、光導波路上に電気光学材
料からなる回折格子と、この回折格子上に透明電極を設
けることにより、導波モードの断続が高速にできる回折
格子型光結合装置が得られる効果がある。As explained above, the present invention provides a diffraction grating type optical coupling device that can rapidly interrupt the waveguide mode by providing a diffraction grating made of an electro-optic material on an optical waveguide and a transparent electrode on the diffraction grating. There are benefits to be gained.
第１図（ａ）〜（ｄ）は本発明の一実施例を説明する為
の工程順に示した回折格子型光結合装置の断面図である
。
１・・・シリコン基板、２・・・酸化シリコン膜、３・
・・光導波路、４・・・溝、５・・・ＬｉＮｂＯ３膜、
５Ａ・・・回折格子、６・・・透明電極、１０・・・光
ビーム。
茅 ／Ｉ！ｆFIGS. 1(a) to 1(d) are cross-sectional views of a diffraction grating type optical coupling device shown in the order of steps for explaining one embodiment of the present invention. 1... Silicon substrate, 2... Silicon oxide film, 3.
... Optical waveguide, 4... Groove, 5... LiNbO3 film,
5A... Diffraction grating, 6... Transparent electrode, 10... Light beam. Kaya /I! f
Claims (1)
リコン膜をエッチングし光導波路と回折格子用の溝を形
成する工程と、前記溝中に電気光学材料を埋込み回折格
子を形成する工程と、前記回折格子上に透明電極を形成
する工程とを含むことを特徴とする回折格子型光結合装
置の製造方法。a step of forming a silicon oxide film on a silicon substrate and then etching the silicon oxide film to form a groove for an optical waveguide and a diffraction grating; a step of embedding an electro-optic material in the groove to form a diffraction grating; 1. A method for manufacturing a diffraction grating type optical coupling device, comprising the step of forming a transparent electrode on a diffraction grating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3002286A JPS62187310A (en) | 1986-02-13 | 1986-02-13 | Production of diffraction grating type optical coupler |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3002286A JPS62187310A (en) | 1986-02-13 | 1986-02-13 | Production of diffraction grating type optical coupler |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62187310A true JPS62187310A (en) | 1987-08-15 |
Family
ID=12292207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3002286A Pending JPS62187310A (en) | 1986-02-13 | 1986-02-13 | Production of diffraction grating type optical coupler |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62187310A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08313743A (en) * | 1995-05-17 | 1996-11-29 | Nec Corp | Optical input/output coupler and its production |
| WO2012121859A3 (en) * | 2011-03-05 | 2012-11-08 | Alcatel Lucent | Radial optical coupler |
| US8682120B2 (en) | 2011-03-05 | 2014-03-25 | Alcatel Lucent | Polarization-independent grating optical coupler |
| US9140854B2 (en) | 2011-09-22 | 2015-09-22 | Alcatel Lucent | Spatial division multiplexing optical mode converter |
-
1986
- 1986-02-13 JP JP3002286A patent/JPS62187310A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08313743A (en) * | 1995-05-17 | 1996-11-29 | Nec Corp | Optical input/output coupler and its production |
| WO2012121859A3 (en) * | 2011-03-05 | 2012-11-08 | Alcatel Lucent | Radial optical coupler |
| US8682120B2 (en) | 2011-03-05 | 2014-03-25 | Alcatel Lucent | Polarization-independent grating optical coupler |
| US9162404B2 (en) | 2011-03-05 | 2015-10-20 | Alcatel Lucent | Radial optical coupler |
| US9140854B2 (en) | 2011-09-22 | 2015-09-22 | Alcatel Lucent | Spatial division multiplexing optical mode converter |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0763757A3 (en) | Wavelength-selective devices using silicon-on-insulator | |
| WO1995002205A1 (en) | Optical modulator | |
| JP2007212787A (en) | Optical control element, optical switching unit, and optical modulator | |
| JP2721030B2 (en) | Manufacturing method of integrated optical waveguide | |
| US5371812A (en) | Waveguide type optical directional coupler | |
| JPS62187310A (en) | Production of diffraction grating type optical coupler | |
| JPS5987B2 (en) | Electro-optical switches and modulators | |
| JP2739405B2 (en) | Electric field sensor | |
| US6268949B1 (en) | Optical intensity modulator and fabrication method using an optical waveguide having an arc shaped path | |
| JPS6396626A (en) | Waveguide type light control element | |
| KR100207599B1 (en) | Low electric power optical switch and the production method thereof | |
| JPH01201609A (en) | Optical device | |
| JPS61231522A (en) | Optical control type optical switch device | |
| JPS62194219A (en) | Programmable optical ic | |
| JPH03168705A (en) | Three-dimensional optical circuit | |
| JPH0447805B2 (en) | ||
| JPS62194220A (en) | Diffraction grating type optical coupling device | |
| JP2606525B2 (en) | Optical waveguide device and manufacturing method thereof | |
| JP2812320B2 (en) | Integrated optical circuit and manufacturing method thereof | |
| JPH0361932B2 (en) | ||
| JPH0310206A (en) | Optical waveguide of linbo3 and production thereof | |
| JPH0440694B2 (en) | ||
| JPH01201628A (en) | Optical switch | |
| JPS63221306A (en) | Light guide type optical control device | |
| JPS6167838A (en) | Waveguide type optical switch |