JPS62183505U - - Google Patents
Info
- Publication number
- JPS62183505U JPS62183505U JP7041686U JP7041686U JPS62183505U JP S62183505 U JPS62183505 U JP S62183505U JP 7041686 U JP7041686 U JP 7041686U JP 7041686 U JP7041686 U JP 7041686U JP S62183505 U JPS62183505 U JP S62183505U
- Authority
- JP
- Japan
- Prior art keywords
- filtration
- cylinder type
- space
- filtration cylinder
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986070416U JPH0323294Y2 (en, 2012) | 1986-05-09 | 1986-05-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986070416U JPH0323294Y2 (en, 2012) | 1986-05-09 | 1986-05-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62183505U true JPS62183505U (en, 2012) | 1987-11-21 |
| JPH0323294Y2 JPH0323294Y2 (en, 2012) | 1991-05-21 |
Family
ID=30912030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986070416U Expired JPH0323294Y2 (en, 2012) | 1986-05-09 | 1986-05-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0323294Y2 (en, 2012) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6620723B1 (en) | 2000-06-27 | 2003-09-16 | Applied Materials, Inc. | Formation of boride barrier layers using chemisorption techniques |
| US7405158B2 (en) | 2000-06-28 | 2008-07-29 | Applied Materials, Inc. | Methods for depositing tungsten layers employing atomic layer deposition techniques |
| US6551929B1 (en) | 2000-06-28 | 2003-04-22 | Applied Materials, Inc. | Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques |
| US6765178B2 (en) | 2000-12-29 | 2004-07-20 | Applied Materials, Inc. | Chamber for uniform substrate heating |
| US6951804B2 (en) | 2001-02-02 | 2005-10-04 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
| US6878206B2 (en) | 2001-07-16 | 2005-04-12 | Applied Materials, Inc. | Lid assembly for a processing system to facilitate sequential deposition techniques |
| US6734020B2 (en) | 2001-03-07 | 2004-05-11 | Applied Materials, Inc. | Valve control system for atomic layer deposition chamber |
| US7085616B2 (en) | 2001-07-27 | 2006-08-01 | Applied Materials, Inc. | Atomic layer deposition apparatus |
| US6936906B2 (en) | 2001-09-26 | 2005-08-30 | Applied Materials, Inc. | Integration of barrier layer and seed layer |
| US6916398B2 (en) | 2001-10-26 | 2005-07-12 | Applied Materials, Inc. | Gas delivery apparatus and method for atomic layer deposition |
| US6911391B2 (en) | 2002-01-26 | 2005-06-28 | Applied Materials, Inc. | Integration of titanium and titanium nitride layers |
| US6833161B2 (en) | 2002-02-26 | 2004-12-21 | Applied Materials, Inc. | Cyclical deposition of tungsten nitride for metal oxide gate electrode |
| US7439191B2 (en) | 2002-04-05 | 2008-10-21 | Applied Materials, Inc. | Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications |
| US7262133B2 (en) | 2003-01-07 | 2007-08-28 | Applied Materials, Inc. | Enhancement of copper line reliability using thin ALD tan film to cap the copper line |
| WO2004113585A2 (en) | 2003-06-18 | 2004-12-29 | Applied Materials, Inc. | Atomic layer deposition of barrier materials |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5966317A (ja) * | 1982-10-07 | 1984-04-14 | Toshiba Corp | ストレ−ナ自動洗浄装置 |
| JPS6135814A (ja) * | 1984-07-28 | 1986-02-20 | Sanshin Seisakusho:Kk | 上部集液式加圧ろ過機に於けるろ材の洗浄方法 |
-
1986
- 1986-05-09 JP JP1986070416U patent/JPH0323294Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5966317A (ja) * | 1982-10-07 | 1984-04-14 | Toshiba Corp | ストレ−ナ自動洗浄装置 |
| JPS6135814A (ja) * | 1984-07-28 | 1986-02-20 | Sanshin Seisakusho:Kk | 上部集液式加圧ろ過機に於けるろ材の洗浄方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0323294Y2 (en, 2012) | 1991-05-21 |