JPS62183505U - - Google Patents

Info

Publication number
JPS62183505U
JPS62183505U JP7041686U JP7041686U JPS62183505U JP S62183505 U JPS62183505 U JP S62183505U JP 7041686 U JP7041686 U JP 7041686U JP 7041686 U JP7041686 U JP 7041686U JP S62183505 U JPS62183505 U JP S62183505U
Authority
JP
Japan
Prior art keywords
filtration
cylinder type
space
filtration cylinder
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7041686U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0323294Y2 (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986070416U priority Critical patent/JPH0323294Y2/ja
Publication of JPS62183505U publication Critical patent/JPS62183505U/ja
Application granted granted Critical
Publication of JPH0323294Y2 publication Critical patent/JPH0323294Y2/ja
Expired legal-status Critical Current

Links

JP1986070416U 1986-05-09 1986-05-09 Expired JPH0323294Y2 (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986070416U JPH0323294Y2 (enrdf_load_html_response) 1986-05-09 1986-05-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986070416U JPH0323294Y2 (enrdf_load_html_response) 1986-05-09 1986-05-09

Publications (2)

Publication Number Publication Date
JPS62183505U true JPS62183505U (enrdf_load_html_response) 1987-11-21
JPH0323294Y2 JPH0323294Y2 (enrdf_load_html_response) 1991-05-21

Family

ID=30912030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986070416U Expired JPH0323294Y2 (enrdf_load_html_response) 1986-05-09 1986-05-09

Country Status (1)

Country Link
JP (1) JPH0323294Y2 (enrdf_load_html_response)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6620723B1 (en) 2000-06-27 2003-09-16 Applied Materials, Inc. Formation of boride barrier layers using chemisorption techniques
US6551929B1 (en) 2000-06-28 2003-04-22 Applied Materials, Inc. Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
US7405158B2 (en) 2000-06-28 2008-07-29 Applied Materials, Inc. Methods for depositing tungsten layers employing atomic layer deposition techniques
US6765178B2 (en) 2000-12-29 2004-07-20 Applied Materials, Inc. Chamber for uniform substrate heating
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6734020B2 (en) 2001-03-07 2004-05-11 Applied Materials, Inc. Valve control system for atomic layer deposition chamber
US7085616B2 (en) 2001-07-27 2006-08-01 Applied Materials, Inc. Atomic layer deposition apparatus
US6936906B2 (en) 2001-09-26 2005-08-30 Applied Materials, Inc. Integration of barrier layer and seed layer
US6916398B2 (en) 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition
US6911391B2 (en) 2002-01-26 2005-06-28 Applied Materials, Inc. Integration of titanium and titanium nitride layers
US6833161B2 (en) 2002-02-26 2004-12-21 Applied Materials, Inc. Cyclical deposition of tungsten nitride for metal oxide gate electrode
US7439191B2 (en) 2002-04-05 2008-10-21 Applied Materials, Inc. Deposition of silicon layers for active matrix liquid crystal display (AMLCD) applications
US7262133B2 (en) 2003-01-07 2007-08-28 Applied Materials, Inc. Enhancement of copper line reliability using thin ALD tan film to cap the copper line
US7211508B2 (en) 2003-06-18 2007-05-01 Applied Materials, Inc. Atomic layer deposition of tantalum based barrier materials

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5966317A (ja) * 1982-10-07 1984-04-14 Toshiba Corp ストレ−ナ自動洗浄装置
JPS6135814A (ja) * 1984-07-28 1986-02-20 Sanshin Seisakusho:Kk 上部集液式加圧ろ過機に於けるろ材の洗浄方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5966317A (ja) * 1982-10-07 1984-04-14 Toshiba Corp ストレ−ナ自動洗浄装置
JPS6135814A (ja) * 1984-07-28 1986-02-20 Sanshin Seisakusho:Kk 上部集液式加圧ろ過機に於けるろ材の洗浄方法

Also Published As

Publication number Publication date
JPH0323294Y2 (enrdf_load_html_response) 1991-05-21

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