JPS62182636A - Diaphragm type vacuum gauge - Google Patents

Diaphragm type vacuum gauge

Info

Publication number
JPS62182636A
JPS62182636A JP2448186A JP2448186A JPS62182636A JP S62182636 A JPS62182636 A JP S62182636A JP 2448186 A JP2448186 A JP 2448186A JP 2448186 A JP2448186 A JP 2448186A JP S62182636 A JPS62182636 A JP S62182636A
Authority
JP
Japan
Prior art keywords
vacuum
diaphragm
gauge
frame body
degree
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2448186A
Other languages
Japanese (ja)
Inventor
Wakao Watanabe
渡邉 若雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP2448186A priority Critical patent/JPS62182636A/en
Publication of JPS62182636A publication Critical patent/JPS62182636A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To extremely reduce a measuring error due to the change in the temp. of a diaphragm type vacuum gauge, by covering a gauge frame body with a shield frame body through a vacuum space. CONSTITUTION:A gauge frame body 1 is covered with a shield frame body 12 through a vacuum space 11. Because of this, even if the circumferential temp. changes, the vacuum space 11 functions as a heat insulating layer and, therefore, the change in he circumferential temp. is not almost exerted on the gauge frame body 1. As a result, a diaphragm 5 performs bending deformation corresponding only to the pressure change of a vacuum chamber 3 and, by this deformation, the vacuum degree of the vacuum chamber 3 can be measured accurately and inexpensively.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、ダイアフラム型真空計の* 3mの改良に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an improvement of *3m in a diaphragm type vacuum gauge.

(従来の技術) 真空室の真空度を測定する手段としてダイアフラム型真
空計は周知である。第2図にはこの種のダイアフラム型
真空計の構成が示されている。
(Prior Art) A diaphragm type vacuum gauge is well known as a means for measuring the degree of vacuum in a vacuum chamber. FIG. 2 shows the construction of this type of diaphragm type vacuum gauge.

図において、計器枠体1の一方壁面にはパイプ状の接続
部2が外方へ突設されており、該接続部2は真空室(真
空作業室)3に接続され、該真空室3と計器枠体1は測
定孔(接続部2のパイプ孔)4を通して連通している。
In the figure, a pipe-shaped connection part 2 is provided on one wall of an instrument frame 1 and protrudes outward, and the connection part 2 is connected to a vacuum chamber (vacuum work chamber) 3. The instrument frame 1 communicates through a measurement hole (pipe hole of the connection part 2) 4.

そして、計器枠木1内はダイアフラム5によって連通室
6と低真空室15に、また電極8によって低真空室15
と回路収容室7に気密隔絶されている。
The inside of the instrument frame 1 is connected to the communication chamber 6 and the low vacuum chamber 15 by the diaphragm 5, and the low vacuum chamber 15 is connected to the low vacuum chamber 15 by the electrode 8.
It is hermetically isolated from the circuit housing chamber 7.

回路収容室7内には真空度検出手段を構成する電極8と
電気回路9とが収容されている。
The circuit housing chamber 7 accommodates an electrode 8 and an electric circuit 9 that constitute vacuum degree detection means.

電f!8は絶縁部材10を介して計器枠体1の内壁面に
固定されており、その電極8の面は一定の間隙を介して
ダイアフラム5に対向させである。
Electric f! 8 is fixed to the inner wall surface of the instrument frame 1 via an insulating member 10, and the surface of the electrode 8 is opposed to the diaphragm 5 with a predetermined gap therebetween.

″C,極8には正の電圧が印加され、また、ダイアフラ
ム5はアース接続されている。そしてダイアフラム5と
電極8によってコンデンサが形成されている。つまり、
電極8は、真空室3内の圧力変化に対応して撓むダイア
フラム5の撓み量を静電容量の変化として検出するもの
である。
A positive voltage is applied to the electrode 8, and the diaphragm 5 is grounded.The diaphragm 5 and the electrode 8 form a capacitor.
The electrode 8 detects the amount of deflection of the diaphragm 5, which is deflected in response to a change in pressure within the vacuum chamber 3, as a change in capacitance.

そして、該電1f!8による容量変化の検出信号は電気
回路9j\加えられる。
And that electric 1f! A capacitance change detection signal by 8 is applied to an electric circuit 9j\.

該電気回路9は入力端子13から加えられる駆動電源に
よって動1ヤし、前記電険8から加えられた検出信号を
信号処理し、検出信号の静電容量に対応した値(例えば
電圧値)を有する真空度の測定信号を出力端子14から
図示されていない表示器等へ送るものである。
The electric circuit 9 is operated by a drive power applied from an input terminal 13, processes the detection signal applied from the electric wire 8, and generates a value (for example, a voltage value) corresponding to the capacitance of the detection signal. A measurement signal of the degree of vacuum is sent from the output terminal 14 to a display device (not shown) or the like.

したがって、この種のダイアフラム型真空計によれば、
真空室3の真空圧の変化に対応してダイアフラム5が撓
み、これに伴いダイアフラム5と電極8との間隙が変1
ヒするから、結局電極8の静電容量が変1ヒする。つま
り、真空室3内の真空圧が電極8の静電容量値として検
出される。
Therefore, according to this kind of diaphragm type vacuum gauge,
The diaphragm 5 bends in response to changes in the vacuum pressure in the vacuum chamber 3, and the gap between the diaphragm 5 and the electrode 8 changes accordingly1.
As a result, the capacitance of the electrode 8 changes. That is, the vacuum pressure within the vacuum chamber 3 is detected as the capacitance value of the electrode 8.

したがって、電気回路9によって処理された測定信号を
表示器へ送ることにより、該表示器の表示部に真空室3
内の真空度が表示されるのであるしかしながら、この種
のダイアフラム型真空計においては、計器枠体1の周囲
の温度が変1ヒすると該計器枠体1の寸法変化等に起因
してダイアフラム5が撓み、真空室3内の真空度が変化
しないらかかわらず、あなから真空度が変化したかのよ
うに電1函8の静電容量が変1ヒしてしまう。
Therefore, by sending the measurement signal processed by the electric circuit 9 to the display, the display section of the display shows the vacuum chamber 3.
However, in this type of diaphragm type vacuum gauge, when the temperature around the instrument frame 1 changes, the diaphragm 5 is bent, and even if the degree of vacuum inside the vacuum chamber 3 does not change, the capacitance of the electric box 8 changes as if the degree of vacuum had changed from inside.

そのため、真空室3内の真空度を正確に測定できないと
いう問題がある。このような問題を解消するために、通
常、ダイアフラム型真空計の所望位置にヒータと温度制
御装置とを設け、真空度測定中(ダイアフラム型真空計
の動1ヤ中)は、該ダイアフラム型真空計の温度を一定
に保つようにしている。
Therefore, there is a problem that the degree of vacuum inside the vacuum chamber 3 cannot be accurately measured. In order to solve such problems, a heater and a temperature control device are usually installed at desired positions of the diaphragm vacuum gauge, and during vacuum measurement (during the movement of the diaphragm vacuum gauge), the diaphragm vacuum gauge is The temperature of the meter is kept constant.

(発明が解決しようとする問題点) しかしながら、上記のように、電気回路系で温度制御を
行う場合、かなり激しく温度変1ヒする環境下にあって
は、ダイアフラム型真空計の温度(特にダイアフラム5
の近所の温度)を真空度測定中、常時、一定に保つのが
困難であり、信頼性の高い高精度の真空度測定が難しい
という問題があった。本発明は上記υC宋の問題点を解
決するためになされたものであり、その目的は、周囲の
温度変1ヒの悪影響を受けることなく信頼性の高い真空
度測定を行うことができるダイアフラム型真空計を提1
共することにある。
(Problem to be Solved by the Invention) However, as mentioned above, when temperature control is performed using an electric circuit system, the temperature of the diaphragm type vacuum gauge (especially the diaphragm 5
There was a problem in that it was difficult to keep the temperature in the vicinity of the vacuum constant at all times during the measurement of the degree of vacuum, and it was difficult to measure the degree of vacuum with high reliability and accuracy. The present invention was made in order to solve the problems of the above-mentioned υC song, and its purpose is to develop a diaphragm type that can perform highly reliable vacuum measurement without being adversely affected by changes in ambient temperature. Insert the vacuum gauge 1
It's about sharing.

(問題点を解決するための手段) 本発明は上記目的を達成するために、次のように構成さ
れている。即ち、本発明は真空室に連通ずる測定孔が設
けられた計器枠木と、この計器枠木内に配設され真空室
内の真空圧の変1ヒに対応して撓み変形するダイアフラ
ムと、このダイアフラムの変形量を検出し真空度の測定
信号を出力する真空度検出手段とを有するダイアフラム
型真空計において、前記計器枠木は真空空間を介し遮蔽
枠体によって覆われているダイアフラム型真空計である
(Means for Solving the Problems) In order to achieve the above object, the present invention is configured as follows. That is, the present invention provides an instrument frame provided with a measurement hole that communicates with a vacuum chamber, a diaphragm disposed within the instrument frame that bends and deforms in response to changes in vacuum pressure within the vacuum chamber, and this diaphragm. A diaphragm-type vacuum gauge has vacuum degree detection means for detecting the amount of deformation of the vacuum gauge and outputting a vacuum degree measurement signal, and the instrument frame is covered by a shielding frame body through a vacuum space. .

(作 用) 上記(1・1成からなる本発明において、真空室の真空
度測定はbt来例と同様な作用によって行われるただし
、本発明においては、真空室の真空度測定中に周囲の温
度変1ヒがあっても、計器枠体は真空室間を介して遮蔽
枠体によって覆われているので1.11器枠体、すなわ
ち、ダイアフラムは周囲の温度から断熱されており、こ
のため、周囲の温度変化によってダイアフラムが撓み変
形を行うことがほとんどない、このように、本発明によ
れば、周囲の温度変1ヒの悪影響を受けることのない正
確な、かつ、信頼性の高い真空度測定が可能となるもの
である。
(Function) In the present invention consisting of the above (1.1), the degree of vacuum in the vacuum chamber is measured by the same function as in the bt conventional example. Even if there is a temperature change, the instrument frame is covered by the shielding frame between the vacuum chambers.1.11 The instrument frame, that is, the diaphragm, is insulated from the surrounding temperature; The diaphragm hardly undergoes flexural deformation due to changes in ambient temperature.As described above, according to the present invention, an accurate and reliable vacuum that is not adversely affected by changes in ambient temperature can be achieved. This makes it possible to measure the temperature.

(実 施 例) 以下、本発明の一実施例を図面に基づいて説明する。な
お、本実施例の説明において、従来例と同一の構成部分
は同一符号を付してその説明を省略する。第1図には本
発明の一実施例の構成が示されている。本実施例におい
て特徴的なことは、計器枠体1が真空空間11を介して
遮蔽枠体12によって覆われていることである。このた
め、周囲の温度が変化しても真空空間11が断熱層とし
て機能するから、周囲の温度変化が計器枠木1におよぼ
すことはほとんどない。
(Example) Hereinafter, one example of the present invention will be described based on the drawings. In the description of this embodiment, the same components as those of the conventional example are given the same reference numerals, and the description thereof will be omitted. FIG. 1 shows the configuration of an embodiment of the present invention. A feature of this embodiment is that the instrument frame 1 is covered with a shielding frame 12 with a vacuum space 11 in between. Therefore, even if the ambient temperature changes, the vacuum space 11 functions as a heat insulating layer, so that ambient temperature changes hardly affect the instrument frame 1.

つまり、周囲の温度が激しく変1ヒしてもこれに影響さ
れることなく、計器枠体1の温度はほぼ同一温度に保た
れる。この結果、周囲の温度変化によってダイアフラム
5が撓み変形をおこすことがほとんどなく、したがって
、ダイアフラム5は真空室3の圧力変化にのみ対応して
撓み変形を行うこととなり、これにより、真空室3内の
真空度を正確かつ安定に測定することが可能となる。
In other words, even if the ambient temperature changes drastically, the temperature of the instrument frame 1 is maintained at approximately the same temperature without being affected by this. As a result, the diaphragm 5 hardly bends or deforms due to changes in ambient temperature, and therefore the diaphragm 5 bends only in response to pressure changes in the vacuum chamber 3. It becomes possible to measure the degree of vacuum accurately and stably.

(発明の効果) 本発明は以上説明したような構成と作用とを有している
ので、ダ、イアフラム型真空計の温度変1ヒによる測定
誤差を極めて少なくすることができ、これにより正確な
、かつ、信顆性の高い真空度測定と行うことが可能とな
る。
(Effects of the Invention) Since the present invention has the configuration and operation as explained above, it is possible to extremely reduce measurement errors due to temperature changes in the diaphragm type vacuum gauge, thereby ensuring accurate measurement. In addition, it becomes possible to measure the degree of vacuum with high reliability.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例の構成図、第2図は従来例の
構成図である。 1・・・・・・計器枠体、 2・・・・・・接続部、 
3・・・・・・真空室、 4・・・・・・測定孔、 5
・・・・・・ダイアフラム、6・・・・・・連通室、 
7・・・・・・回路収容室、8・・・・・・電極9・・
・・・・電気回路、 10・・・・・・絶縁部材、 1
1・・・・・・真空空間、 12・・・・・・遮蔽枠体
、 13・・・・・・入力端子、 14・・・・・・出
力端子、 15・・・・・・低真空室。 率7図 率 2 図
FIG. 1 is a block diagram of an embodiment of the present invention, and FIG. 2 is a block diagram of a conventional example. 1...Instrument frame body, 2...Connection part,
3... Vacuum chamber, 4... Measurement hole, 5
...Diaphragm, 6...Communication chamber,
7...Circuit accommodation chamber, 8...Electrode 9...
...Electric circuit, 10...Insulating member, 1
1... Vacuum space, 12... Shielding frame, 13... Input terminal, 14... Output terminal, 15... Low vacuum Room. Rate 7 Figure Rate 2 Figure

Claims (1)

【特許請求の範囲】[Claims] 真空室に連通する測定孔が設けられた計器枠体と、この
計器枠体内に配設され真空室内の真空圧の変化に対応し
て撓み変形するダイアフラムと、このダイアフラムの変
形量を検出し真空度の測定信号を出力する真空度検出手
段とを有するダイアフラム型真空計において、前記計器
枠体は真空空間を介し遮蔽枠体によって覆われているこ
とを特徴とするダイアフラム型真空計。
An instrument frame with a measurement hole communicating with the vacuum chamber, a diaphragm disposed inside the instrument frame that bends and deforms in response to changes in the vacuum pressure in the vacuum chamber, and detects the amount of deformation of the diaphragm and detects the vacuum. 1. A diaphragm type vacuum gauge comprising a degree of vacuum detection means for outputting a degree of vacuum measurement signal, wherein the instrument frame is covered with a shielding frame through a vacuum space.
JP2448186A 1986-02-06 1986-02-06 Diaphragm type vacuum gauge Pending JPS62182636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2448186A JPS62182636A (en) 1986-02-06 1986-02-06 Diaphragm type vacuum gauge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2448186A JPS62182636A (en) 1986-02-06 1986-02-06 Diaphragm type vacuum gauge

Publications (1)

Publication Number Publication Date
JPS62182636A true JPS62182636A (en) 1987-08-11

Family

ID=12139373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2448186A Pending JPS62182636A (en) 1986-02-06 1986-02-06 Diaphragm type vacuum gauge

Country Status (1)

Country Link
JP (1) JPS62182636A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0315732A (en) * 1988-12-19 1991-01-24 Ivac Corp Pressure measuring device
JP2000321161A (en) * 1999-05-14 2000-11-24 Anelva Corp Capacitance-type vacuum sensor
JP2007124814A (en) * 2005-10-28 2007-05-17 Shinko Electric Co Ltd Console table
KR100806960B1 (en) 2006-08-31 2008-02-22 한국표준과학연구원 Vacuum gauge using hot plate and cantilever

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827748B2 (en) * 1978-03-15 1983-06-11 松下電工株式会社 Coreless motor rotor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827748B2 (en) * 1978-03-15 1983-06-11 松下電工株式会社 Coreless motor rotor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0315732A (en) * 1988-12-19 1991-01-24 Ivac Corp Pressure measuring device
JP2000321161A (en) * 1999-05-14 2000-11-24 Anelva Corp Capacitance-type vacuum sensor
JP2007124814A (en) * 2005-10-28 2007-05-17 Shinko Electric Co Ltd Console table
KR100806960B1 (en) 2006-08-31 2008-02-22 한국표준과학연구원 Vacuum gauge using hot plate and cantilever

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