JPS62182538U - - Google Patents
Info
- Publication number
- JPS62182538U JPS62182538U JP7107086U JP7107086U JPS62182538U JP S62182538 U JPS62182538 U JP S62182538U JP 7107086 U JP7107086 U JP 7107086U JP 7107086 U JP7107086 U JP 7107086U JP S62182538 U JPS62182538 U JP S62182538U
- Authority
- JP
- Japan
- Prior art keywords
- cvd apparatus
- plasma cvd
- insulating
- insulating coating
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 239000011810 insulating material Substances 0.000 claims 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
Description
第１図はこの考案の実施例の一部縦断面図、第
２図は第１図中―線における断面図、第３図
はこの考案の他の実施例の一部縦断面図、第４図
は従来のプラズマＣＶＤ装置の一部縦断面図、第
５図は同じく電極部分の拡大縦断面図、第６図は
同じく電極部分の平面図である。
１……プラズマチヤンバー、２……平行平板型
電極、４……電極支持棒、５……平板電極、６…
…ウエハー、１０……溶射絶縁材層、１１……絶
縁管。
Fig. 1 is a partial longitudinal sectional view of an embodiment of this invention, Fig. 2 is a sectional view taken along the line - - in Fig. 1, Fig. 3 is a partial longitudinal sectional view of another embodiment of this invention, and Fig. 4 is a partial longitudinal sectional view of an embodiment of this invention. The figure is a partial vertical cross-sectional view of a conventional plasma CVD apparatus, FIG. 5 is an enlarged vertical cross-sectional view of the electrode portion, and FIG. 6 is a plan view of the electrode portion. DESCRIPTION OF SYMBOLS 1... Plasma chamber, 2... Parallel plate type electrode, 4... Electrode support rod, 5... Flat plate electrode, 6...
... wafer, 10 ... sprayed insulation material layer, 11 ... insulation tube.
Claims (1)
る為の電極を複数枚、対向設置して成るプラズマ
ＣＶＤ装置において、前記電極の対向間隙に露出
する電極支持部材の外側に絶縁被覆を固着してあ
ることを特徴とするプラズマＣＶＤ装置。 ２ 絶縁被覆は、溶射絶縁材層で構成した実用新
案登録請求の範囲第１項記載のプラズマＣＶＤ装
置。 ３ 絶縁被覆は、電極支持部材に嵌装した絶縁管
で構成し、該絶縁管と電極が溶接してある実用新
案登録請求の範囲第１項記載のプラズマＣＶＤ装
置。[Claims for Utility Model Registration] 1. In a plasma CVD apparatus in which a plurality of electrodes for supporting a wafer are disposed facing each other in a plasma chamber, the outside of the electrode support member exposed in the gap between the electrodes facing each other. A plasma CVD apparatus characterized in that an insulating coating is fixed. 2. The plasma CVD apparatus according to claim 1, wherein the insulating coating is a sprayed insulating material layer. 3. The plasma CVD apparatus according to claim 1, wherein the insulating coating is constituted by an insulating tube fitted into the electrode support member, and the insulating tube and the electrode are welded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7107086U JPS62182538U (en) | 1986-05-12 | 1986-05-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7107086U JPS62182538U (en) | 1986-05-12 | 1986-05-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62182538U true JPS62182538U (en) | 1987-11-19 |
Family
ID=30913297
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7107086U Pending JPS62182538U (en) | 1986-05-12 | 1986-05-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62182538U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0226018A (en) * | 1988-07-15 | 1990-01-29 | Tokyo Electron Ltd | Plasma treatment apparatus |
-
1986
- 1986-05-12 JP JP7107086U patent/JPS62182538U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0226018A (en) * | 1988-07-15 | 1990-01-29 | Tokyo Electron Ltd | Plasma treatment apparatus |