JPS62179748U - - Google Patents
Info
- Publication number
- JPS62179748U JPS62179748U JP1987061763U JP6176387U JPS62179748U JP S62179748 U JPS62179748 U JP S62179748U JP 1987061763 U JP1987061763 U JP 1987061763U JP 6176387 U JP6176387 U JP 6176387U JP S62179748 U JPS62179748 U JP S62179748U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- manufacturing
- mask substrate
- substrate
- transparent substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000000463 material Substances 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987061763U JPS638900Y2 (enrdf_load_stackoverflow) | 1987-04-23 | 1987-04-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987061763U JPS638900Y2 (enrdf_load_stackoverflow) | 1987-04-23 | 1987-04-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62179748U true JPS62179748U (enrdf_load_stackoverflow) | 1987-11-14 |
| JPS638900Y2 JPS638900Y2 (enrdf_load_stackoverflow) | 1988-03-16 |
Family
ID=30895393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987061763U Expired JPS638900Y2 (enrdf_load_stackoverflow) | 1987-04-23 | 1987-04-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS638900Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4339214B2 (ja) | 2004-09-13 | 2009-10-07 | Ｈｏｙａ株式会社 | マスクブランク用透明基板とその製造方法及びマスクブランクとその製造方法 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4330443Y1 (enrdf_load_stackoverflow) * | 1965-07-29 | 1968-12-12 | ||
| JPS5217815A (en) * | 1975-07-30 | 1977-02-10 | Fuji Photo Film Co Ltd | Substrate and material using the same |
| JPS5229063U (enrdf_load_stackoverflow) * | 1975-08-20 | 1977-03-01 | ||
| JPS52117553A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Circular mask |
| JPS5376774U (enrdf_load_stackoverflow) * | 1976-11-30 | 1978-06-27 | ||
| JPS53117384A (en) * | 1977-03-23 | 1978-10-13 | Nec Corp | Photoetching mask |
| JPS53128278A (en) * | 1977-04-14 | 1978-11-09 | Oki Electric Ind Co Ltd | Production of lsi mask |
| JPS5421275A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Photo mask for semiconductor wafer manufacture |
| JPS5562736A (en) * | 1978-11-01 | 1980-05-12 | Toshiba Corp | Mask material for preparation of semiconductor device |
-
1987
- 1987-04-23 JP JP1987061763U patent/JPS638900Y2/ja not_active Expired
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4330443Y1 (enrdf_load_stackoverflow) * | 1965-07-29 | 1968-12-12 | ||
| JPS5217815A (en) * | 1975-07-30 | 1977-02-10 | Fuji Photo Film Co Ltd | Substrate and material using the same |
| JPS5229063U (enrdf_load_stackoverflow) * | 1975-08-20 | 1977-03-01 | ||
| JPS52117553A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Circular mask |
| JPS5376774U (enrdf_load_stackoverflow) * | 1976-11-30 | 1978-06-27 | ||
| JPS53117384A (en) * | 1977-03-23 | 1978-10-13 | Nec Corp | Photoetching mask |
| JPS53128278A (en) * | 1977-04-14 | 1978-11-09 | Oki Electric Ind Co Ltd | Production of lsi mask |
| JPS5421275A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Photo mask for semiconductor wafer manufacture |
| JPS5562736A (en) * | 1978-11-01 | 1980-05-12 | Toshiba Corp | Mask material for preparation of semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS638900Y2 (enrdf_load_stackoverflow) | 1988-03-16 |