JPS62178928A - Manufacture of liquid crystal display body - Google Patents

Manufacture of liquid crystal display body

Info

Publication number
JPS62178928A
JPS62178928A JP61021389A JP2138986A JPS62178928A JP S62178928 A JPS62178928 A JP S62178928A JP 61021389 A JP61021389 A JP 61021389A JP 2138986 A JP2138986 A JP 2138986A JP S62178928 A JPS62178928 A JP S62178928A
Authority
JP
Japan
Prior art keywords
liquid crystal
electrode pattern
mim
laser beam
crystal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61021389A
Other languages
Japanese (ja)
Inventor
Seiki Koide
清貴 小出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP61021389A priority Critical patent/JPS62178928A/en
Publication of JPS62178928A publication Critical patent/JPS62178928A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make up the yield by converting all to a black defect which is unattractive as a vision, by converting a white defect to the black defect by using a negative display of a color and a laser beam. CONSTITUTION:An electrode pattern 5 containing an element 3 is formed on an insulating substrate 1, an electrode pattern 4 and a color filter 7 are formed on the other insulating substrate 1 and an orientation film for orienting horizontally a TN liquid crystal is formed on two pieces of substrates. Subsequently, two pieces of substrates are formed as one body through a joining material with its electrode pattern surface inside and at a prescribed interval by which each electrode pattern holds a prescribed position and also goes to a liquid crystal layer, the TN liquid crystal is enclosed in a liquid crystal layer and polarizing plates 9, 10 are stuck to a parallel nicol by placing a cell between them. A liquid crystal display body which is competed in such a way is lighted and a white defect and a black defect whose total number is about several pieces are selected, and a wiring for connecting an MIM element of a part which is a white defect, and a picture element, or each picture element being in a prescribed position and a terminal, and the MIM element are disconnected by a laser beam. Also, as for a part which has gone to the white defect due to a residual film, the laser beam is irradiated to the residual film.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はMIM液晶表示体の製造方法に閃する〔発明の
概要〕 本発明はMIM液晶表示体の製造方法において、MIM
素子により制御されるフルカラー画像表若しくは膜残り
により、表示上周囲よりコントラストが白く勧察される
欠陥、即ち白欠陥をレーザービームにより電気的に断線
せしめ、黒欠陥へと転換させることで欠陥の存在を視覚
的に見立ちに<<シ、製造上の歩留りを補填するもので
ある。
Detailed Description of the Invention [Industrial Field of Application] The present invention relates to a method for manufacturing an MIM liquid crystal display [Summary of the Invention] The present invention provides a method for manufacturing an MIM liquid crystal display,
The presence of defects is detected by electrically disconnecting white defects using a laser beam and converting them into black defects, which are defects that are recommended to have a whiter contrast than the surrounding area on the display using a full-color image surface or film residue controlled by the device. This is intended to visually enhance the production yield.

〔従来の技術〕[Conventional technology]

従来のMIM液晶表示体の製造方法は、「Sより   
工 NT  E RNAT  工 0NAL    S
YM’PO8工 UM    D  工 GEST  
  OF    TE(!HN  工 OAI、  P
APKR3/VOLUMK  XV/IE3SN  0
097−966x」のP、307  Fig、9の写真
より推測されるように、ポジ表示でレーザービーム等に
より欠陥転換する工程をもたなかった。
The conventional manufacturing method for MIM liquid crystal displays is
Engineering NT E RNAT Engineering 0NAL S
YM'PO8 Engineering UM D Engineering GEST
OF TE(!HN ENG OAI, P
APKR3/VOLUMK XV/IE3SN 0
097-966x", P, 307, Fig. 9, there was no process of converting defects using a laser beam or the like in positive display.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし従来技術では製造上何らかの理由で発生する欠陥
を転換できず、黒欠陥と白欠陥が混在し製造上の歩留り
を低下させるという問題点を有する。そこで本発明はカ
ラーのネガ表示とレーザービームを用いて白欠陥を黒欠
陥へと転換することで、総て視覚上見立ちにくい黒欠陥
にして製造上の歩留りを補填しMIM液晶表示体の量産
を可能にすることを目的とする。
However, the conventional technology has a problem in that defects that occur for some reason during manufacturing cannot be replaced, and black defects and white defects coexist, reducing manufacturing yield. Therefore, the present invention converts white defects into black defects using a color negative display and a laser beam, thereby making all the black defects visually inconspicuous and compensating for production yields, thereby mass producing MIM liquid crystal displays. The purpose is to make it possible.

〔問題を解決するための手段〕[Means to solve the problem]

本発明の液晶表示体製造方法は、基体内部にMIM素子
を有し、該素子の非線形性を用いて液晶層の印加電圧を
制御する機構をもつ液晶表示体の製造方法に於て、 α) 絶縁基板上に該素子を含む電極パターンを形成す
る工程と、 b) もう一方の絶縁基板上に電極パターン及びカラー
フィルターを形成する工程と、C) 上記2枚の基板に
TN液晶を水平配向させる配向膜を形成する工程と、 d) 上記2枚の基板を電極パターン面を内側にして各
電極パターンが所定の位置を保ち且つ液晶層となる所定
の間隔をもって接合材を介して一体化する工程と、 6) 前記液晶層にTN液晶を封入する工程とf) 偏
光板を平行ニコルに該セルを挾んで接着する工程と、 !I)  MIM素子を構成する絶縁膜の破壊により非
線形性を失なった該素子若しくはフォトリソグラフィー
で所定のパターン以外にMIM及び画素を構成する金属
の膜残りにより該素子の動作特性が所定の特性から逸脱
した場合の該膜残りに対してレーザービームを選択的に
照射し、熱により照射部分の金属を昇華させることによ
り電気的に断線させる工程とを具備することを特徴とす
る。
The method for manufacturing a liquid crystal display of the present invention includes the steps of α) a step of forming an electrode pattern including the element on an insulating substrate; b) a step of forming an electrode pattern and a color filter on the other insulating substrate; and C) horizontally aligning TN liquid crystal on the two substrates. a step of forming an alignment film, and d) a step of integrating the two substrates with the electrode pattern surfaces inside, each electrode pattern maintaining a predetermined position, and a predetermined interval to form a liquid crystal layer via a bonding material. and 6) a step of enclosing a TN liquid crystal in the liquid crystal layer; f) a step of sandwiching and bonding the cell with a polarizing plate in parallel Nicols; I) The element has lost its non-linearity due to destruction of the insulating film constituting the MIM element, or the operating characteristics of the element have changed from the predetermined characteristics due to the remaining metal film constituting the MIM and pixels in addition to the predetermined pattern formed by photolithography. The present invention is characterized by comprising a step of selectively irradiating the remaining film with a laser beam when the film deviates, and electrically breaking the wire by sublimating the metal in the irradiated portion with heat.

〔作用〕[Effect]

本発明の上記構成によれば、ネガ表示は液晶層に電圧が
印加されると黒から白へコントラストが変化するから、
MIM素子と画累若しくは所定の位置にある各画素と端
子とを接続する配線とMIM累子をレーザービームによ
る熱で断線させることで総て黒欠陥へと転換できる。一
方、視覚上の目立ち易さの点で白欠陥と黒欠陥を比較し
た場合カラー表示はパネル後部のバックライトの光を液
晶層を透過させて観察することになるから、白欠陥はい
わばバックライトの光の洩れに当たり、黒欠陥より認識
し易いという差が生ずる。以上より致命欠陥となる白欠
陥の発生したパネルを黒欠陥へ転換し歩留りを補填させ
ることができる。
According to the above configuration of the present invention, in a negative display, the contrast changes from black to white when a voltage is applied to the liquid crystal layer.
All defects can be converted into black defects by disconnecting the MIM element and the wiring connecting each pixel and the terminal at a predetermined position and the MIM element using heat from a laser beam. On the other hand, when comparing white defects and black defects in terms of visual conspicuousness, in color displays, the light from the backlight at the rear of the panel is transmitted through the liquid crystal layer, so white defects are The difference is that it is easier to recognize than a black defect due to light leakage. As described above, a panel in which a white defect, which is a fatal defect, has occurred can be converted to a black defect to compensate for the yield.

〔実施例〕〔Example〕

以下に本発明に基づ〈実施例を詳細に述べる。 Examples based on the present invention will be described in detail below.

絶縁基板にガラス基板を用い、MIMX子はガラス基板
上にタンタルを5000X以下の膜厚でスパッタ法によ
り形成し、フォトリソグラフィーにより所定のパターン
を形成した後、クエン酸溶液による陽極酸化法にて該タ
ンタル表面に10001以下の膜厚で五酸化タンタルを
形成させた二しかる後にクロムを蒸着法若しくはスパッ
タ法にて3000X以下の膜厚で前記基板表面に形成し
、フォトリソグラフィーにより所定のパターンを形成し
MIM素子を得た。次に工TOをスパッタ法若しくは蒸
着法を用いて2000X以下の膜厚で成膜しフォトリソ
グラフィーにより画素11L極を形成した。このときの
基板断面図を第1図に示す。
Using a glass substrate as an insulating substrate, the MIMX element is made by forming tantalum on the glass substrate with a film thickness of 5000X or less by sputtering, forming a predetermined pattern by photolithography, and then anodizing with a citric acid solution. Tantalum pentoxide is formed on the surface of the tantalum to a thickness of 1000x or less, and then chromium is formed on the surface of the substrate to a thickness of 3000x or less by vapor deposition or sputtering, and a predetermined pattern is formed by photolithography. An MIM device was obtained. Next, TO was formed into a film with a thickness of 2000X or less using a sputtering method or a vapor deposition method, and a pixel 11L pole was formed by photolithography. A cross-sectional view of the substrate at this time is shown in FIG.

さて、もう一方の絶縁基板だが、やはりガラス基板を用
い、CVD法による酸化錫若しくはスバッタ法による工
TOを双方共に2000λ以下で成膜しフォトリソグラ
フィーにより電極パターンを形成した。然る後に加色法
による色の三要素である赤、緑、青から成るカラーフイ
“ルターを該電極パターン上に2μm以下の膜厚で形成
した。このときの基板断面図を第2図に示す。
Now, regarding the other insulating substrate, a glass substrate was also used, and a film of tin oxide by the CVD method or TO by the sputtering method was formed with a thickness of 2000λ or less, and an electrode pattern was formed by photolithography. Thereafter, a color filter consisting of red, green, and blue, which are the three color elements, was formed on the electrode pattern with a film thickness of 2 μm or less using an additive coloring method. A cross-sectional view of the substrate at this time is shown in Figure 2. .

この様にして製造した2枚の基板にアミノシラン処理を
した後、ざリイミド膜を2000X以下の膜厚で形成し
、ラビング法により水平配向させた配向膜を形成した。
After the two substrates produced in this manner were treated with aminosilane, a zariimide film was formed to a thickness of 2000× or less, and an alignment film with horizontal alignment was formed by a rubbing method.

次にミクロパール(積木ファインケミカルの登録商標)
を用いて液晶層となる所定の間隔を保ちながら、熱硬化
若しくは紫外線硬化型の接合材を介して2枚の基板上に
形成された[極パターンが所定の位置関係になるように
接合材を用いて一体化した。
Next, Micropearl (registered trademark of Building Blocks Fine Chemicals)
The liquid crystal layer is formed on two substrates using a thermosetting or ultraviolet curable bonding material while maintaining a predetermined distance between them. It was integrated using

さらにこうして製造されたセルに、真空中で液晶封入口
に液晶を所定量滴下させて封入した後、エポキシ系若し
くは紫外線硬化型アクリル系の接着剤を用いて液晶封入
口を塞いだ。
Further, a predetermined amount of liquid crystal was dropped into the liquid crystal filling port in a vacuum to seal the cell thus manufactured, and then the liquid crystal filling port was sealed using an epoxy-based or ultraviolet-curable acrylic adhesive.

次に前記液晶セルの両面に、偏光板を平行ニコルに接着
して液晶表示体を完成した。このときの基板の断面図を
第3図に示す。
Next, polarizing plates were adhered to both sides of the liquid crystal cell in a parallel Nicol pattern to complete a liquid crystal display. A cross-sectional view of the substrate at this time is shown in FIG.

さて、こうして完成した液晶表示体を点灯させて白欠陥
及び黒欠陥の総数が数個程度のものを選別し、フォトマ
スク修正用のレーザリペアという装置に選別した液晶表
面体を設置し、前記点灯検査に於いて白欠陥だった箇所
のMIM素子と画素若しくは所定の位置にある各画素と
端子とを接続する配線とMIM素子をレーザービームに
より断線させ、黒欠陥に転換した。膜残りにより白欠陥
となっている箇所は、該膜残りにレーザービームを照射
し同様に黒欠陥へと転換させたが、膜残りの程度が微小
なものは、正常な累子へと回復したものもいくつか見ら
れた。
Now, the liquid crystal display thus completed is turned on to select those with a total number of white defects and black defects, and the selected liquid crystal surface is placed in a device called laser repair for photomask repair, and the liquid crystal display is turned on. A laser beam was used to disconnect the MIM element and the wiring connecting the MIM element and the pixel or each pixel at a predetermined position and the terminal at a location that was a white defect in the inspection, and the defect was converted to a black defect. Areas where the film remained as white defects were converted to black defects by irradiating the film with a laser beam, but those with a small amount of film remaining recovered to normal defects. I saw some things.

以上述べた様に、製造上の欠陥を目立ちにくく転換させ
、歩留を補填させることができた。
As described above, we were able to make manufacturing defects less noticeable and compensate for the yield.

〔発明の効果〕〔Effect of the invention〕

以上述べた様に本発明によれば、ネガ表示を用いるので
画素間隙が遮光され、余分な光洩れがなくなるので表示
画像が鮮明に見え、一方製造上で画素数万個当り数個の
欠陥発生は不可避であり、レーザービームによる欠陥転
換により実用上問題ない欠陥状態に改善される為、MI
M素子を用いた液晶表示体の製造上の歩留りを補填し量
産実現を可能にするものである。
As described above, according to the present invention, since a negative display is used, the pixel gap is shielded from light, and unnecessary light leakage is eliminated, so that the displayed image can be seen clearly. MI
This compensates for the manufacturing yield of liquid crystal displays using M elements and enables mass production.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はMIM素子側基板の断面図。 1・・・・・・MIM素子 2・・・・・・工TO画素電極 3・・・・・・ガラス基板 4・・・・・・配線電極 第2図はカラーフィルター側基板の断面図。 1・・・・・・カラーフィルタ一層 2・・・・・・工TO走査電極 3・・・・・・ガラス基板 第5図は該液晶表示体の断面図。 1・・・・・・ガラス基板 2・・・・・・スペーサー 3・・・・・・MIM累子 4・・・・・・工To走査電極 5・・・・・・工TO画素電極 6・・・・・・配線電極 7・・・・・・カラーフィルタ一層 8・・・・・・液晶層 9・・・・・・上偏光板 10・・・下偏光板 以  上 出願人 セイコーエプソン株式会社 第2図 Q−ハ クフイ1 海鳥表示41fT而口 第う図 FIG. 1 is a cross-sectional view of the MIM element side substrate. 1...MIM element 2...Eng TO pixel electrode 3...Glass substrate 4... Wiring electrode FIG. 2 is a sectional view of the color filter side substrate. 1...One layer of color filters 2......TO scanning electrode 3...Glass substrate FIG. 5 is a sectional view of the liquid crystal display. 1...Glass substrate 2...Spacer 3...MIM Yuiko 4......To scan electrode 5......TO pixel electrode 6... Wiring electrode 7... Color filter layer 8...Liquid crystal layer 9... Upper polarizing plate 10...Lower polarizing plate that's all Applicant: Seiko Epson Corporation Figure 2 Q-Ha Kufui 1 Seabird display 41fT Fig.

Claims (1)

【特許請求の範囲】 基体内部にMIM素子を有し、該素子の非線形性を用い
て液晶層の印加電圧を制御する機構をもつ液晶表示体の
製造方法に於て、 a)絶縁基板上に該素子を含む電極パターンを形成する
工程と、 b)もう一方の絶縁基板上に電極パターン及びカラーフ
ィルターを形成する工程と、 c)上記2枚の基板にTN液晶を水平配向させる配向膜
を形成する工程と、 d)上記2枚の基板を電極パターン面を内側にして各電
極パターンが所定の位置を保ち且つ液晶層となる所定の
間隔をもって接合材を介して一体化する工程と、 e)前記液晶層にTN液晶を封入する工程とf)偏光板
を平行ニコルに該セルを挾んで接着する工程と、 g)MIM素子を構成する絶縁膜の破壊により非線形を
失なった該素子若しくはフォトリソグラフィーで所定の
パターン以外にMIM及び画素を構成する金属の膜残り
により該素子の動作特性が所定の特性から逸脱した場合
の該膜残りに対してレーザービームを選択的に照射し、
熱により照射部分の金属を昇華させることにより電気的
に断線させる工程とを具備することを特徴とする液晶表
示体製造方法。
[Claims] A method for manufacturing a liquid crystal display having an MIM element inside a base body and having a mechanism for controlling applied voltage to a liquid crystal layer using the nonlinearity of the element, which includes: a) an MIM element on an insulating substrate; a step of forming an electrode pattern including the element; b) a step of forming an electrode pattern and a color filter on the other insulating substrate; c) forming an alignment film for horizontally aligning the TN liquid crystal on the two substrates. d) A step of integrating the two substrates with the electrode patterns facing inside at a predetermined interval with each electrode pattern in a predetermined position and forming a liquid crystal layer via a bonding material; and e) a step of sealing a TN liquid crystal in the liquid crystal layer; f) a step of sandwiching and bonding a polarizing plate to the cell in parallel Nicols; and g) a step of sealing the MIM device or photodiode which has lost its nonlinearity due to destruction of the insulating film constituting the device. Selectively irradiating the remaining film with a laser beam when the operating characteristics of the element deviate from the predetermined characteristics due to the remaining metal film constituting the MIM and the pixel in addition to the predetermined pattern in lithography;
1. A method for manufacturing a liquid crystal display, comprising the step of sublimating metal in the irradiated portion with heat to electrically disconnect the wire.
JP61021389A 1986-02-03 1986-02-03 Manufacture of liquid crystal display body Pending JPS62178928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61021389A JPS62178928A (en) 1986-02-03 1986-02-03 Manufacture of liquid crystal display body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61021389A JPS62178928A (en) 1986-02-03 1986-02-03 Manufacture of liquid crystal display body

Publications (1)

Publication Number Publication Date
JPS62178928A true JPS62178928A (en) 1987-08-06

Family

ID=12053713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61021389A Pending JPS62178928A (en) 1986-02-03 1986-02-03 Manufacture of liquid crystal display body

Country Status (1)

Country Link
JP (1) JPS62178928A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63153519A (en) * 1986-08-19 1988-06-25 Matsushita Electric Ind Co Ltd Method for trimming liquid crystal display device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197591A (en) * 1981-05-29 1982-12-03 Suwa Seikosha Kk Liquid crystal display unit
JPS5823017A (en) * 1981-08-04 1983-02-10 Seiko Instr & Electronics Ltd Correcting method for fault of liquid-crystal panel

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197591A (en) * 1981-05-29 1982-12-03 Suwa Seikosha Kk Liquid crystal display unit
JPS5823017A (en) * 1981-08-04 1983-02-10 Seiko Instr & Electronics Ltd Correcting method for fault of liquid-crystal panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63153519A (en) * 1986-08-19 1988-06-25 Matsushita Electric Ind Co Ltd Method for trimming liquid crystal display device

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