JPH02223922A - Formation of spacer for liquid crystal gap - Google Patents

Abstract

PURPOSE:To easily form a spacer for liquid crystal gap without lowering the quality of display by using an insulating film on a part which is not irradiated with light as the spacer for liquid crystal gap. CONSTITUTION:After forming a TFT part 21 including an opaque scanning electrode and an opaque scanning electrode or an opaque signal electrode 22 on a glass substrate 20, an orientation film 23 is deposited and polyimide 24 and resist 25 are successively deposited after a rubbing process, which is irradiated with the light from the glass substrate side. Thereafter, an etching process is performed to the polyimide 24 and the polyimide 24 on the part which is not irradiated with the light is used as the spacer for the liquid crystal gap. Since the spacer for the liquid crystal gap is necessarily formed on the scanning electrode and the signal electrode, the unevenness of the liquid crystal gap in the case of sealing the liquid crystal does not occur. The spacer is not positioned on an effective image part, so that the quality of display is not lowered.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to active matrix liquid crystal displays, and more particularly to a method of forming a spacer for a liquid crystal gap in a large area liquid crystal display.

[Conventional technology]

The structure of an active matrix liquid crystal display is described, for example, in Nikkei Microdevice, November 1985 issue, page 51. Here, the structural acid shown in FIG. 2 is shown. In FIG. 2, 1 is a polarizing filter, 2 is a glass substrate, 3 is a color filter, 4 is an ITO55 TFT section, 6 is an alignment film, and 7 is a polarizing filter.
is a liquid crystal. By the way, in the above structure, conventionally, in order to maintain the liquid crystal gap, fibers or beads were dispersed in the alignment film 2, and the alignment film itself was used as a spacer for the liquid crystal gap.

[Problem R that the invention attempts to solve]

When the above conventional technology is applied to a large area liquid crystal display, 1) If the fibers or beads are not uniformly distributed over a large area, the in-plane liquid crystal gap force becomes non-uniform, resulting in a decrease in display quality. 2) If the fibers or beads are dispersed over a valid image area, this may be considered a display defect.

An object of the present invention is to easily form a spacer for a liquid crystal gap in a large-area liquid crystal display without deteriorating display quality.

[Means to solve the problem]

The above purpose is to provide a T
After sequentially depositing an insulating film and a resist on the glass substrate on which the FT is formed, light is irradiated from the glass substrate side, then an etching process is performed on the insulating film, and the parts of the insulating film that are not irradiated with light are used for the liquid crystal gap. This is achieved by using it as a spacer.

[Effect]

In the above method, since the liquid crystal gap spacer is always formed on the scanning electrode and the signal electrode, there is no non-uniformity in the liquid crystal gap when the liquid crystal is sealed. Furthermore, with the above method, the spacer will not be located on the effective image area. Therefore, display quality does not deteriorate.

〔Example〕

An embodiment of the present invention will be described below with reference to FIG.

FIG. 1 is a plan view of a glass substrate on which a TFT according to an embodiment of the present invention is formed. In the figure.

10 is PT silicide, 1 is Cr, and 12 is ITo.

13 is an intrinsic polycrystalline silicon film. Further, polyimide 24 is deposited in the shaded area as a spacer for a liquid crystal gap. In the configuration shown in Figure 1, polyimide 24 is always Cr1.
Since it is formed on the l and pt silicide 10, there is no non-uniformity in the liquid crystal gap when the liquid crystal is sealed.In addition, in the configuration shown in FIG.
It is never located above 2. Therefore, display quality does not deteriorate.

FIG. 3 shows one process procedure of the present invention.

That is, a) after forming a TFT section 21 including an opaque scanning electrode, an opaque scanning electrode or an opaque signal electrode 22 on a glass substrate 20, an alignment film 23 is deposited, and after a rubbing process, a polyimide 24, Resist 25 is sequentially deposited,
After that, light is irradiated from the glass substrate side. b) Thereafter, an etching process is performed on the polyimide 24, and the portion of the polyimide 24 that is not irradiated with light is used as a spacer for a liquid crystal gap.

FIG. 4 is a plan view of a glass substrate on which a TFT according to an embodiment of the present invention is formed. In FIG. 4, 10 is PT silicide, 11 is Cr, and 12 is ITo.

13 is an intrinsic polycrystalline silicon film. Further, polyimide 24 is deposited in the shaded area as a spacer for a liquid crystal gap. In the configuration shown in Figure 3, polyimide 24 is always Cr1.
Since it is formed on the l and pt silicide 10, there is no non-uniformity in the liquid crystal gap when liquid crystal is sealed. Furthermore, since the Pt silicide 11, which becomes the signal electrode, is bonded with ITO 12, the polyimide 24 is not deposited on the ITO 12. This reduces obstacles during the liquid crystal filling process, making liquid crystal filling easier.

〔Effect of the invention〕

According to the present invention, a spacer for a liquid crystal gap in a large-area active matrix liquid crystal display can be easily formed without deteriorating display quality.
It has advantages such as lower cost, 2) higher throughput, and 3) higher display quality.

[BRIEF DESCRIPTION OF THE DRAWINGS] FIGS. 1 and 4 are plan views of a substrate on which a TFT according to an embodiment of the present invention is formed, FIG. 2 is a cross-sectional view of an active matrix liquid crystal display, and FIG. FIG. 3 is a diagram showing a process procedure of an embodiment of the invention. 1... Polarizing filter, 2... Glass substrate, 3...
Color filter, 4...ITO15...TFT section,
6... Orientation crotch, 7... Liquid crystal, 10... PL silicide, 1]... Cr, 1-2... ITO1] 3...
Intrinsic polycrystalline silicon film, 20... glass substrate, 2]・
...TFT section containing opaque scanning electrodes, 22.
...opaque scanning electrode or opaque signal electrode, 23...
・Alignment film, 24... polyimide, 25... resist 1
fart. Agent Patent Attorney Katsuo Ogawa-°N, Fig. 1 House Fig. 3 (CL) Fig. 4 Fig. 2 <e,> No. 2λ Zλ

Claims (1)

[Claims] 1. In a method for forming a spacer for a liquid crystal gap in an active matrix liquid crystal display in which scanning electrodes and signal electrodes are opaque electrodes, an insulating film and a resist are sequentially deposited on a glass substrate on which a TFT is formed. After that, light is irradiated from the glass substrate side, and then an etching process is performed on the insulating film, and the part of the insulating film that is not irradiated with light is used as a spacer for a liquid crystal gap. 2. In a method for forming a spacer for a liquid crystal gap in an active matrix liquid crystal display in which at least a portion of the scanning electrode and the signal electrode are transparent electrodes, after sequentially depositing an insulating film and a resist on a glass substrate on which a TFT is formed, A method for forming a spacer for a liquid crystal gap, which comprises irradiating light from the glass substrate side, then performing an etching process on the insulating film, and using the portion of the insulating film that is not irradiated with light as a spacer for the liquid crystal gap. 3. A method for forming a spacer for a liquid crystal gap, wherein the insulating film according to claim 1 or 2 is made of polyimide or resist.