JPS62173459A - Silver halide photographic sensitive material - Google Patents

Abstract

PURPOSE:To obtain a photographic sensitive material which is subjected to prevention of electrostatic charge without giving ill effects to photographic characteristics such as desensitization by incorporating a specific nonionic surface active agent into said material. CONSTITUTION:This material is prepd. by incorporating the nonionic surface active agent expressed by the formula into the antistatic layer of the photographic sensitive material. In the formula, R is a hydrogen atom, etc., A is an oxyalkylene group, R1-R15 are hydrogen atoms, etc., p, q, r are respectively average polymn. degrees of the alkylene oxide and 2-50 number, m denotes 1-10 integer. The using amt. of the nonionic surface active agent expressed by the formula varies with the kind, form or coating system, etc. of the photographic sensitive material and is generally preferably 1-2,000mg per m<2> of the photographic sensitive material, more particularly preferably 5-500mg. The preferable antistatic effect is obtd. by making combination use of another antistatic agent.

Description

Detailed Description of the Invention (Industrial Application Field) The present invention relates to a silver halide photographic material (hereinafter referred to as a "photosensitive material"), and particularly to a photographic material with improved antistatic properties. It is something.

Photographic light-sensitive materials generally consist of a support and a photographic layer that have 1PL air-insulating properties. Electric charge often accumulates. This accumulated electrostatic charge causes many problems, but the most serious problem is that the photosensitive emulsion layer is sensitized by the discharge of the accumulated electrostatic charge before the processing of the photographic film. In some cases, dot-like spots or resin-like or feather-like marks are produced. These are so-called static marks, and they can significantly reduce the commercial value of the photographic film and, in some cases, cause complete loss. For example, It is easy to recognize that if this phenomenon appears on medical or industrial X-ray film, it will lead to extremely dangerous judgments.This phenomenon only becomes apparent after it is developed, and is extremely troublesome. These accumulated electrostatic charges can also cause secondary failures such as dust adhesion to the film surface and inability to apply uniformly.

In order to eliminate these problems caused by static electricity, it is preferable to add an antistatic agent to the photographic material. However, the antistatic agents that can be used in photographic light-sensitive materials cannot be the same as those commonly used in other fields, and are subject to various restrictions specific to photographic light-sensitive materials. That is, in addition to having excellent antistatic properties, antistatic agents that can be used in photographic light-sensitive materials must not have any adverse effect on photographic properties such as sensitivity, fog, graininess, sharpness, etc. of photographic light-sensitive materials; It must not have an adverse effect on the film strength of the photosensitive material (i.e., be easily damaged by friction or scratching), and it must not have an adverse effect on the adhesion resistance (i.e., the surface of the photographic material must not be easily damaged by friction or scratching). It requires performance such as not causing the surface to become easily scratched), not accelerating the fatigue of the processing solution of the photographic light-sensitive material, and not reducing the adhesive strength between the constituent layers of the photographic light-sensitive material. The application of agents is subject to numerous constraints.

One way to eliminate the interference caused by static electricity is to increase the electrical conductivity of the surface of the photosensitive material so that the static charge can be quickly dissipated before the accumulated charge is discharged.

Therefore, methods have been considered to increase the electrical conductivity of supports and various coated surface layers of photographic materials, and attempts have been made to use highly hygroscopic substances, bathable inorganic salts, certain surfactants, polymers, etc. I've been exposed to it.

However, these materials exhibit specificity depending on the type of film support and the composition of the 4-layer film, and while they may give good results for certain film supports, 4-layer emulsions, and other photographic elements, they may not work for others. Different film supports and film components may not be of any use in preventing static electricity, or may have excellent anti-FPL properties, but may affect sensitivity, cuffing, graininess, sharpness, etc. of the photographic emulsion. When these substances are applied to photographic light-sensitive materials, they may affect the quality of photographs, or even if they have good antistatic properties immediately after production, their antistatic properties deteriorate over time. This was extremely difficult.

It is known that nonionic surfactants and ethylene oxide addition polymers of phenol-formalin resins are used as antistatic agents in photographic light-sensitive materials, but these compounds are accompanied by a decrease in sensitivity and the antistatic properties deteriorate over time. When applied to X-ray film, contact with a phosphor screen may cause spot-like or mesh-like density unevenness on the sensitive material (this is called "screen contamination"), etc. It is also known that there are some drawbacks.

JP-A-6-0-Rorar discloses a technique for incorporating a nonionic surfactant having two or more polyoxyethylene chains in one molecule into an antistatic layer of a photographic light-sensitive material.

Although this technique can solve various problems (lowering of g, deterioration over time of band prevention, screen contamination), it causes a serious problem of contamination during the development process.

The staining caused by this development process is a phenomenon in which silver halide that has not been developed or fixed remains in the form of spots on the surface of the photosensitive material. The stains range from small specks of less than /mm to larger fingerprints of 1 crn or more, and in some cases these stains may occur continuously and form a straight line. Such stains disturb the image information on the photosensitive material and cause the photosensitive material to lose its commercial value.

A first object of the present invention is to provide a photographic light-sensitive material which is prevented from charging and which does not adversely affect photographic properties such as desensitization.

A second object of the present invention is to provide an antistatic photographic material that does not cause screen contamination.

A third object of the present invention is to provide an antistatic photographic material whose antistatic properties do not change over time after manufacture.

A primary object of the present invention is to provide an antistatic photographic material of stable quality whose antistatic performance is less likely to change depending on the manufacturing conditions of the antistatic agent.

A first object of the present invention is to provide a photographic material that is antistatic and does not cause stains during development.

As a result of our intensive research and development of an antistatic agent that satisfies these objectives and does not adversely affect the properties of photographic materials, we have developed a nonionic surfactant represented by the following general formula (I) for use in photographic photosensitive materials. Surprisingly, it has been discovered that when incorporated into the antistatic layer of a material, a photographic material can be obtained that has virtually no adverse effects that could not be avoided with conventional compounds.

General formula (I) R represents a hydrogen atom, an alkyl group, an aryl group, an alkylcarbonyl group, a carbonyl group, or a glycidyl group.

A is an oxyalkylene group, and +A+ in general formula (I). , (-A÷, or +A-)-, all A's do not become oxyethylene groups.

Also, R1, R2, R3, R4, R5, R6, RRR
13, R14, and R15 represent a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, an alkoxy group, an aryl group, an acyl group, an amide group, a sulfonamide group, a carbamoyl group, or a sulfamoyl group. R1 and R2, R5 and R6, rtt3 and R
14(I may be linked to each other to form a substituted or unsubstituted ring. Also, R and R8 may be linked to each other.

9. 10. 11. R12'ma・Water-based atom・R
RR represents substituted or unsubstituted alkyl +, %, aryl group or heteroaromatic ring, It9 and ■(,1, R1, and R
1° may form a ring of mutually ℃・:τ]I and 1j and 1α and 1α.

p, q, and r each represent the average degree of polymerization of alkylene oxide, and are numbers from λ to 0. I), qs r may be the same value (and may be different values).

m is an integer from 1 to IO.

Preferred examples of the present invention are shown below.

R is a hydrogen atom, an alkyl group having 4 carbon atoms (for example, methyl, ethyl, hydroxyethyl, cyanoethyl, etc.)
, represents an aryl group with a carbon number of ≠ to io (eg, evaphenyl group), an alkylcarbonyl group with a carbon number of ≠ to io (acetyl, chloroacetyl, carboxymethylcarbonyl, etc.), or a glycidyl group.

A preferably represents an oxyalkylene group having a carbon constant of r or less, and examples include oxyethylene, oxypropylene, oxy(hydroxy)propylene, and oxyphenylethylene.

R engineering, R2, R3, R4, R5, fL6, R7, R
8,1 (I3, R14, R15 are hydrogen atoms, halogen atoms, or methyl groups, ethyl groups, i-brobyl groups, t
-Butyl group, t-amyl group, t-hexyl group, t-octyl group, nonyl group, decyl group, dodecyl group, trichloromethyl group, tribromomethyl group, l-phenylethyl group, cophenyl-coprobil Group, etc., carbon number/-, 20
substituted or unsubstituted alkyl group, phenyl group, substituted or unsubstituted aryl group such as p-chlorophenyl group, -0R
16 (herein, nta represents a substituted or unsubstituted alkyl group or aryl group having 1 to 20 carbon atoms; the same applies hereinafter), -00R16
A substituted or unsubstituted acyl group represented by -NR17C
OR16 (here R17 is a hydrogen atom or the number of carbon atoms /
J represents a substituted or unsubstituted alkyl group or aryl group of O. The same applies hereinafter), a substituted or unsubstituted amide group represented by -NR17SO2R16, a substituted or unsubstituted sulfonamide group, -CON-R,7 (where R18 is a hydrogen atom or a carbon number/-20 substitution or It represents an unsubstituted alkyl group or aryl group (the same applies hereinafter), or a substituted or unsubstituted sulfamoyl group represented by -8ON-C□7, among which a hydrogen atom , a halogen atom or a substituted or unsubstituted alkyl group is preferable, and more preferably a hydrogen atom or
Tertiary alkyl groups such as t-butyl, t-amyl, and t-octyl are preferred.

R and R2, R5 and R6, R13 and R□4 may be linked to each other to form a substituted or unsubstituted ring, and examples of this ring include a substituted or unsubstituted benzene ring. Also, R□ and R8 may be connected to each other (,
In this case, the compound of general formula (I) becomes a macrocyclic compound.

RR%R, R1□ is a hydrogen atom, methyl group, ethyl group, n-propyl group, i-propyl group,
Substituted or unsubstituted alkyl groups such as n-heptyl group, l-ethylamyl group, n-undecyl group, trichloromethyl group, tribromomethyl group, phenyl group, naphthyl group, p-chlorophenyl group, p-methoxyphenyl group, m
- Substituted or unsubstituted aryl group such as nitrophenyl group, or α-furyl group, ≠-(/-methylco, 3-
A substituted or unsubstituted heteroaromatic ring such as a benzopyrrole group, and among these, a hydrogen atom, an alkyl group with carbon number/f, a substituted or unsubstituted phenyl group, and an α-furyl group are preferable. .

R, RR, and R1□ may be linked to each other to form a substituted or unsubstituted ring (for example, a cyclohexane ring can be mentioned as this ring).

ps q and r are each an average degree of polymerization of alkylene oxide, and are numbers from 2 to 0, preferably from 30 to 30. p
, q, and r may be the same value (and may be different values. m is an integer from 1 to 10, preferably from 1 to
3, more preferably 1 or 2.

The compounds of the present invention can be obtained by addition polymerizing alkylene oxide to the corresponding phenol derivative.

The synthesis was performed in Japanese Patent Application Publication No. 1989-10-? This method is similar to the method described in the or<< number.

Specific examples of the nonionic surfactant of the present invention are described below.

The amount of the nonionic surfactant of the present invention represented by general formula (I) varies depending on the type, form, coating method, etc. of the photographic material used, but generally the amount used is ? 2000 mg per F1 (particularly preferred is room 9).

A method for applying the nonionic surfactant of the present invention as represented by general formula (I) into a layer of a photographic light-sensitive material is to use water, an organic solvent such as methanol, ethanol, acetone, etc., or a mixed solvent of water and the organic solvent. After dissolving, it is incorporated into a photosensitive emulsion layer or non-photosensitive auxiliary layer (e.g., backing layer, antihalation layer, intermediate layer, protective layer, etc.) on the support, or sprayed or coated onto the surface of the support. Alternatively, it may be immersed in the solution and dried. At this time, two or more nonionic surfactants of the present invention may be mixed.

Further, it may be used together with a binder such as gelatin, polyvinyl alcohol, cellulose acetate, cellulose acetate phthalate, polyvinyl formal, or polyvinyl butyral to form an antistatic layer.

Another antistatic agent can also be used in the layer containing the nonionic surfactant represented by the general formula (I) of the present invention or other layers, and by doing so, a more preferable antistatic effect can be obtained. You can do it.

Such antistatic agents include, for example, U.S. Patent No. 2゜g♂
2. L Tough issue, same! ,ri72. Ta 3 Ta No. J, 01,
2.7'rt issue, 3,2/,2. '? No. 07, same 3.
Ta/Hiroshi, 2ri No. 7, 3,61 ri, 31, 3.7
Ta 3,7/l, issue, same 3. 31. Tatata, same a, 0
70. If? No., same g, /lA7゜rro, German Special Rod No. 2. ♂00. ≠ No. 6, JP Akihiro g-Thai, tt, 6
No., same ψg-ta≠, ≠33, same≠ta≠t, No. 733, same Ta O-ta Hiroshi.

A72, O-Tahiro, Oj3, same evening 2-/2,
No. 520, etc., such as those described in U.S. Patent No. 2. Rito 2. No. 6si, 3゜ψ2g, ≠5
6th issue, same 3+ ”j 7,07 Otsu issue, same 3 gu j ≠, 6
．． 2nd issue, 3rd issue. Tata 2. 7λ, P'j, At evening,
3r7 issue, Tokukai Sho! j -1r u No. 772, same Tahu/≠6 Hari, same Taro≠3t3, same Tata/
? No. 103≠, AO-767≠1, British Patent No. 12
Surfactants such as those described in Tata 3RIR, Tata 1≠/7'PIj, etc., for example, US Pat. No. 3,062,7
No. 00, 3.211! , No. 133, 3. ! 23-
．． 621, etc., so-called matting agents made of metal oxides, colloidal silica, etc., barium strontium sulfate, polymethyl methacrylate, methyl methacrylate-methacrylic acid copolymer, colloidal silica, powdered silica, etc. be able to.

Also, ethylene glycol, propylene krylo, n, -
1/ , / , / -) 1) )l f Roleprono ξ, etc., a polyol compound as shown in JP-A No. 2003-120003 is added to the nonionic interface represented by the general formula (I) of the present invention. It can be added to the layer containing the activator or to other layers, and by doing so also a more favorable antistatic effect can be obtained.

Additionally, organic and inorganic salts (for example, alkali metal salts, alkaline earth salts, heavy metal salts, ammonium salts, halogen salts, sulfates, phosphates, nitrates, perchlorates, rhodan salts, etc.) may be used in combination. can.

Examples of the layer containing the nonionic surfactant of the present invention include an emulsion layer, an undercoat layer on the same side as the emulsion layer, an intermediate layer, a surface protective layer, an overcoat layer, and a back layer on the opposite side to the emulsion layer. Among these, outermost layers such as a surface protective layer, an overcoat layer, and a back layer are particularly preferred.

The light-sensitive material according to the present invention includes a normal black-and-white silver halide light-sensitive material (for example, a black-and-white light-sensitive material for photography, a black-and-white light-sensitive material for X-ray, a black-and-white light-sensitive material for printing, etc.), a normal multilayer color light-sensitive material, (e.g. color reversal film, color negative film, color positive film, etc.)
A wide range of photosensitive materials can be mentioned. It is particularly effective for silver halide light-sensitive materials for high-temperature rapid processing and high-sensitivity silver halide light-sensitive materials.

The silver halide grains in the photographic emulsion used in the photographic light-sensitive material of the present invention are regular (regular) grains such as cubes and octahedrons.
It may have a spherical or irregular crystalline shape, or it may have an irregular shape such as a spherical or plate-like shape.
) or a composite of these crystal forms.

Further Hari Search Disclosure-22 Yumaki A22j
;311-1xoA-rr page (/?lr3./). It may also consist of a mixture of particles of various crystalline forms.

Furthermore, the emulsion used in the present invention is disclosed in US Pat. No. 11, No. 2,914
．． 312, 3.3! i'7,917, 31'yo
As described in r.try, a mixed emulsion of a photosensitive silver halide emulsion and an internally fogged silver halide emulsion or an emulsion used together in a separate layer may be used.

Here, it is preferable to further use the mercapto compound described in Japanese Patent Application No. 5, 1975, T70RLLVc, in order to suppress fogging and improve storage stability over time.

The photographic emulsion used in the present invention is B. gelafchides (
"Chimie et Physique Photography" by P. Glafkides)
sique Photographique)J (
Paul MontelPublished by Paul Monte1, 796
7 years), G az 7 m Dufy 7 (G, F,
Duf fin) [Photographic Emulsion Chemistry]
Emulsion Chemi-stry N (The
The Focal Press, / 944), V.L. Zerichman et al.
``Making and Coating Pho Emulsion'' by L. Zelikman et al.
It can be prepared using the method described in Tographic Emulsion) J (published by The Focal Press, /9t'A).

A dye may be used in the silver halide emulsion layer of the present invention, if necessary. For example, RESEARCHDISCL
O8URE / Volume 76 1tem/7 Otsu 4tj~I! 1
You can use the ones listed in the section. In addition, in order to improve the color tone of developed silver, 'JjfM ShowtO-/276
Any of the magenta dyes described in No. 63 may be used.

Below, the photographic layer of the silver halide photosensitive material according to the present invention will be briefly described.

Binders for the photographic layer include proteins such as gelatin and casein; cellulose compounds such as carboxymethyl cellulose and hydroxyethyl cellulose; sugar derivatives such as dextran agar, sodium alginate, and starch derivatives; synthetic hydrophilic colloids such as polyvinyl alcohol, poly-
N-vinylpyrrolidone, polyacrylic acid copolymer, polyacrylamide, or derivatives thereof, partial hydrolysates, etc. can also be used in combination.

Gelatin referred to herein refers to so-called lime-processed gelatin, acid-processed gelatin, and enzyme-processed gelatin.

Types of silver halide used in the silver halide emulsion layer, surface protective layer, etc. of the photographic light-sensitive material of the present invention, manufacturing method, chemical sensitization method, antifoggants, stabilizers, hardeners, antistatic agents,
There are no particular restrictions on plasticizers, lubricants, coating aids, matting agents, brighteners, spectral sensitizing dyes, dyes, color couplers, etc.
uct Lice-nsing) Octopus roll 107~//
Q page (1971/72) and Research Disclosure magazine (Re5earch D, closure)
) / Vol. 74, pp. 22-31 (December 1977)
The description on pages 2slr%4cp to 4c6 (lr≠year) can be referred to.

In particular, as an antifoggant and a stabilizer, Hiro-hydroxy-6-methyl-'! 313al 7-tetrazaindene-3-methyl-benzothiazole, l-phenyl!
- Mercaptotetrazole nitrone and its salts (e.g. salicylates, nitrates, etc.), many heterocyclic compounds, mercury-containing compounds, mercapto compounds, metal salts such as noradium chloride and its sodium salt, bromopalladium and its ammonium salt, etc. As a hardening agent, aldehyde compounds such as mucochloric acid, mucobromic acid, mucophenoxychloric acid, formaldehyde, dimethylol urea, glyoxal, lyoxal, glutaraldehyde; divinyl sulfone, methylene bismaleimide,! -acetyl/, 3-diacryloyl-hexahydro-5-triazine, t, 3. S-
) lyacryloyl-hexahydro-5-triazine,'
131j -) IJ Vinylsulfonyl-hexahydro-S-triazinebis(vinylsulfonylmethyl)ether, 1,3-bis(vinylsulfonylmethyl)prono-nor-co, active vinyl compounds such as bis(α-vinylsulfonylacetamido)ethane ;, 2. ≠-dichloro6-hydroxy-s-t') azine sodium salt, 2. Active halogen compounds such as ≠-dichloro6-medoxy S-triazine can be mentioned.

A known surfactant may be further added to the photographic constituent layer of the present invention. Examples of surfactants that can be used include natural surfactants such as saponin, nonionic surfactants such as glycerin and glycidol, higher alkylamines, and
Cationic surfactants such as ammonium salts, pyridine and other heterocycles, phosphonium or sulfonium; anionic surfactants containing acidic groups such as carbo/acids, sulfonic acids, phosphoric acids, sulfuric esters, phosphoric esters; Examples include amphoteric surfactants such as amino acids, aminosulfonic acids, and sulfuric acid or phosphoric acid esters of amino alcohols. Further, a fluorine-containing surfactant can also be used in combination.

Further, the photographic light-sensitive material of the present invention has U.S. Patent No. 3. μti, No. 77, 3. μ//.

It may contain alkyl acrylate-based latexes as described in Japanese Patent Application No. 12, Japanese Patent Application No. 1983/1983, Japanese Patent Application No. 1982/Sakota No. 3, and the like.

The present invention will be illustrated below with reference to Examples, but the present invention is not limited thereto.

Example (I) Preparation of sample: A silver halide emulsion layer with the following composition was coated on a polyethylene terephthalate film support with a thickness of 10 μm which was undercoated, and a protective layer with the following composition was further coated thereon. The mixture was dried to prepare a black and white silver halide photographic material. A nonionic surfactant of the present invention or a comparative nonionic surfactant was added to the protective layer.

(Emulsion layer) Thickness: Approx.! μ Composition and coverage Gelatin 2.597 m2 Iodobromide @ (silver iodide 1. mol %) Op 7 m2 1-Phenyl-termelcabutotetrazole 2 my/m 2 Natrilam salt of radium chloride 0. rm;)7m2 Nitron 5m97m2 (protective layer) Thickness: approx. lμ Composition and coating amount Gelatin t, 7p/m2/, 3-bis(vinylsulfonyl)-propanol-λ/, 29/1009 Pinder Sodium p-Octylphenoxyethoxyethylsulfonate 10mq/m2 Nonionic surfactant of the present invention or comparative nonionic surfactant 3rmq/m" (2) Method for determining antistatic ability: Antistatic ability is determined by surface resistivity and static The zero surface resistivity was determined by measuring the occurrence of marks.The zero surface resistivity was determined by sandwiching a test piece of the sample between 10 cm long brass electrodes (the part in contact with the test piece was made of stainless steel) with an electrode spacing of 0./4 tCm. Measure the value for 1 minute using a insulation meter TRf1. I found a method to generate static marks by peeling.

Each measurement condition is that the surface resistivity is measured at 0C and 2%RH for 2 nights, and the static mark generation test is conducted at λs 'C, 2%RH.
Perform at %RH. Note that the humidity of the sample test piece was adjusted under the above conditions all day and night.

In order to evaluate the degree of static mark generation, each sample was developed at 200 C for an evening using a developer having the following composition.

Developer composition N-methyl-p-amine phenol sulfate ψ9 Anhydrous sodium sulfate AO9 Hydroquinone
l0jp Soda carbonate (l water salt)
53g potassium bromide 2
The static mark evaluation of adding O9 water/J3 is as follows! The stage criteria were followed.

A: No static marks were observed.

B: Some static marks occur.

C: Static marks occur considerably.

D: Significant static marks occur.

E: Static marks appear all over the surface.

(3) Time-related deterioration test method: The above sample and white high-quality paper were tested at 2!0C and 170%RH.
After conditioning the humidity for a period of time, two sheets of high-quality paper were sandwiched between each sample so that the surface on the emulsion layer side was in contact with both surfaces of the high-quality paper, and the samples were placed in a polyethylene laminate bag and sealed. These samples were subjected to a load of r01 weight/C'In and aged for 1 week at 0C for 2 nights.

Thereafter, the ability to prevent RA was measured according to the above-mentioned method for determining antistatic ability, and compared with that before aging.

(4) Photographic property testing method: The sample was exposed to tungsten lamp light through a filter 5P-7≠ manufactured by Fuji Film Corporation, and then developed with a developer having the following composition (0C, 30 seconds), fixed, The photographic characteristics were examined after washing with water.

Developer composition Warm water 100ml Sodium tetrapolyphosphate 2.017 Anhydrous sodium sulfite j09 Hydroquinone
709 Sodium carbonate (l hydrate)
μoyl-phenyl-3-pyrazolidone 0.39 Potassium bromide 2.09 Add water and mix the entire 1000 m 100 O screen contamination level measurement sample piece and Dainippon Toyo Co., Ltd. screen LT-II 30
'C, humidity controlled for 7 days at 10% RH, and under the same conditions LT-
After passing 1000 sample pieces through a cassette using ■
Radiographs were taken to examine the appearance of density unevenness.

The screen contamination degree was evaluated according to the following μ-level criteria.

A: No density unevenness was observed.

B: A slight unevenness of 4 degrees occurs.

C: Quite a lot occurs.

D: Significant occurrence.

The test results for items (2) to (5) above are shown in Table 1.

(6) Treatment stain test method A sample coated with an emulsion layer and a surface protective layer was heated at 30°
λ, I cut it at the corner of your mouth. The optical density after development processing is t,
After uniform exposure so that
D-III, 3ta 0C1 fixing bath=Fuji Photo Film F
100 sheets were continuously developed using three baths: uji-F, 3s'C, and a water washing bath. After development, the presence or absence of defective desilvering spots in the form of spots on each film was evaluated at the next μ stage.

A: No occurrence of defective desilvering areas was observed.

B: Slightly acceptable.

C: Equivalent number D: An extremely large number of them.

Comparative compound A n-C12H250 (CH2Cf (20 → 1oH (British Patent No. r O /, /J≠) Comparative compound B Comparative compound C (U.S. Patent No. 3. Zari o, 6≠No. 1 compound l-3) 4ρ As is clear from Table 1, the surface resistivity of the photographic light-sensitive material containing the nonionic compound of the present invention is sufficiently low (no static marks are observed, there is almost no decrease in photographic sensitivity, and there is no screen staining Also, this good antistatic performance hardly changes over time.Furthermore, no stains were generated during processing and good image quality was obtained.

On the other hand, comparative compounds A and B having one polyoxyethylene molecule in the molecule showed good antistatic performance before aging, but this performance deteriorated over time, and
It is recognized that photographic sensitivity, screen staining, and staining during processing are worsened.

Comparative Compound C, which is an ethylene oxide addition polymer of phenol-formalin resin, also inevitably suffers from significant deterioration of antistatic performance over time, decrease in photographic sensitivity, screen staining, and worsening of stains during processing.

Historically, a comparative compound containing three polyoxyethylene chains in one molecule showed no deterioration in antistatic performance over time, a decrease in photographic sensitivity, or a worsening of screen staining properties, but staining occurred during processing. .

It can be seen that the compounds of the present invention exhibit good performance that cannot be achieved with conventional ethylene oxide addition polymers.

Claims (1)

[Scope of Claims] A silver halide photographic material characterized by containing a nonionic surfactant represented by the general formula (I). General formula (I) ▲ Numerical formulas, chemical formulas, tables, etc. are available▼ R represents a hydrogen atom, an alkyl group, an aryl group, an alkylcarbonyl group, an arylcarbonyl group, or a glycidyl group. A is an oxyalkylene group, and -(A)-_p, -(A)-_q or -(A)-_r in general formula (I)
Not all A's are oxyethylene groups. Also, R_1, R_2, R_3, R_4, R_5, R_6
, R_7, R_8, R_1_3, R_1_4, R_1_
5 represents a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, an alkoxy group, an aryl group, an acyl group, an amide group, a sulfonamide group, a carbamoyl group, or a sulfamoyl group. R_1 and R_2, R_5 and R
_6, R_1_3 and R_1_4 may be linked to each other to form a substituted or unsubstituted ring. Further, R_1 and R_8 may be connected to each other. R_9, R_1_0, R_1_1, R_1_2 represent a hydrogen atom, a substituted or unsubstituted alkyl group, an aryl group, or a heteroaromatic ring, and R_9, R_1_0, R_1
_1 and R_1_2 may be linked to each other to form a substituted or unsubstituted ring. p, q, and r each represent an average degree of polymerization of alkylene oxide, and are numbers from 2 to 50. p, q, and r may be the same value or may be different values. m represents an integer from 1 to 10.