JPS62172700A - Magnetic field generator for plasma confinement - Google Patents

Magnetic field generator for plasma confinement

Info

Publication number
JPS62172700A
JPS62172700A JP61013288A JP1328886A JPS62172700A JP S62172700 A JPS62172700 A JP S62172700A JP 61013288 A JP61013288 A JP 61013288A JP 1328886 A JP1328886 A JP 1328886A JP S62172700 A JPS62172700 A JP S62172700A
Authority
JP
Japan
Prior art keywords
magnetic
end surface
magnetic field
outer end
plasma confinement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61013288A
Other languages
Japanese (ja)
Inventor
丹波 護武
雄一 坂本
小栗山 正美
須山 正行
相馬 里留
浩 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
RIKEN Institute of Physical and Chemical Research
Original Assignee
TDK Corp
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp, RIKEN Institute of Physical and Chemical Research filed Critical TDK Corp
Priority to JP61013288A priority Critical patent/JPS62172700A/en
Publication of JPS62172700A publication Critical patent/JPS62172700A/en
Pending legal-status Critical Current

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  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はプラズマを安定して閉じ込めることのできる磁
場発生装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic field generator capable of stably confining plasma.

(従来の技術) プラズマを発生して、このプラズマ中のイオンまたは電
子を利用することが今日種々の分野で広く行われている
(Prior Art) Generating plasma and utilizing ions or electrons in the plasma is now widely practiced in various fields.

(発明が解決しようとする問題点) しかしながら、高安定にプラズマを保持することができ
小型化に適したプラズマ閉込用磁場発生装置は従来提案
されていなかった。本発明の目的は高安定にプラズマを
保持することができ小型化に適したプラズマ閉込用磁場
発生装置を提供することにある。
(Problems to be Solved by the Invention) However, a magnetic field generator for plasma confinement that is capable of retaining plasma in a highly stable manner and is suitable for miniaturization has not been proposed in the past. An object of the present invention is to provide a magnetic field generator for plasma confinement that can maintain plasma in a highly stable manner and is suitable for downsizing.

(問題点を解決するための手段) 上記目的は、周方向に異なる磁極が交互に現れる外側端
面と、この外側端面の各磁極と位置が整合し、かつ極性
が反対の磁極が交互に出現する内側端面とを有し、永久
磁石から構成される一対の磁力線発生手段からなり、こ
の一対の磁力線発生手段のそれぞれの外側端1面と内側
ff::i mとが互いに対向しており、これら対向し
た外側端面および内側端面の各部分同士の磁極が同極で
あるプラズマ閉込用磁場発生装置により、達成される。
(Means for solving the problem) The above purpose is to create an outer end surface in which different magnetic poles alternately appear in the circumferential direction, and magnetic poles that are aligned in position with each magnetic pole on this outer end surface and whose polarity is opposite to each other alternately appear. It consists of a pair of magnetic force line generation means made of permanent magnets, and the outer end 1 surface and the inner side ff::i m of each of the pair of magnetic force line generation means are opposite to each other. This is achieved by a plasma confinement magnetic field generating device in which the magnetic poles of each portion of the opposing outer end face and inner end face are the same.

本発明によると、磁力線発生手段の対向空間にマルチカ
スプ磁場が形成され、プラズマが高安定に閉じ込められ
る。
According to the present invention, a multi-cusp magnetic field is formed in the space facing the magnetic field line generating means, and plasma is confined in a highly stable manner.

本発明を、電子サイクロトロン共鳴によりプラズマを発
生するプラズマ発生装置として使用すると特に有効であ
る。
The present invention is particularly effective when used as a plasma generator that generates plasma by electron cyclotron resonance.

(発明の効果) 本発明によると、比較的小型の装置により、大容量の強
いカスプ型プラズマ閉じ込め用磁場空間を作ることがで
きる。プラズマはこの磁場空間内に安定に閉じ込められ
、高温・高密度プラズマを得ることができる。
(Effects of the Invention) According to the present invention, a large-capacity, strong cusp-shaped plasma confinement magnetic field space can be created using a relatively small-sized device. Plasma is stably confined within this magnetic field space, making it possible to obtain high-temperature, high-density plasma.

(実施例) 以下、本発明の実施例を図面を参照しつつ詳細に説明す
る。第1図は本発明の第1実施例の断面斜視図である。
(Example) Hereinafter, an example of the present invention will be described in detail with reference to the drawings. FIG. 1 is a cross-sectional perspective view of a first embodiment of the present invention.

この第1実施例は電子サイクロトロン共鳴型プラズマ発
生装置として用いることができる。周方向に異なる磁極
が交互に現れる外側端面1.1′ と、この外側端面の
各磁極と位置が整合し、かつ極性が反対の磁極が交互に
出現する内側01M面2.2′ とを有し、永久磁石か
ら構成される一対の磁力線発生手段4.4′からなり、
この一対の磁力線発生手段4.4′のそれぞれの外側端
面1、ビおよび内側端面2.2′ とが互いに垂直方向
で対向しており、これら対向した外側端面および内側端
面の各部分同士の磁極が同極である。本実施例において
は、磁力線発生手段4.4′ の外側端1.1′ と内
側端面2.2′ とは中心を軸5−5′  と一致させ
た円環状の形状を有しているので、これにともなって磁
力線6.6′ は軸5−5′  に対して対称な円環状
に形成されている。また磁力線発生手段4.4′の各々
の外側端面1、ビ と各々の内側端面2.2′ との間
には空隙が設けられており、これによって形成された磁
力線発生手段4.4′の対向空間13がプラズマ閉込用
およびプラズマ発生用の空間として使用される。内側端
面2.2′ の中央部には外部に通じる開口8.9が設
けられており、開口9には電磁波人力用の窓10とアン
テナ11が挿入されており、開口8にはイオンビーム引
出し用の電極12が挿入されている。電磁波人力用の絶
縁体の窓10の周囲には磁力線がヨーク3によって遮蔽
されており、エネルギーを伝送の途中で損失することな
く、対向空間13の所望位置に電磁波を伝送することが
できる。この様に構成された)7置内が所定圧所望元素
の雰囲気によって満たされた状態で、外部からアンテナ
11を介して対向空間13内に電磁波が導入されると、
電子サイクロトoン共鳴現象によってプラズマが発生す
る。このようにして発生されたプラズマはイオン引出し
電極12によって外部に引き出される。なお、1磁石4
.4′の間に設けられた磁石15′  は、゛装置の内
壁周辺部分の磁場の強度を高める補極である。本実施例
においては、真空容器が対向空間13内に設けられてお
り、この内部が高真空状態にされるようになっているが
、磁力線発生手段4.4′が真空容器を兼ねるようにさ
れていてもよいことは言うまでもない。いずれの場合に
おいても、外部から伝播搬入された電磁波が空洞共振す
るように設計されていると、電磁波エネルギーが有効利
用されて好ましい。
This first embodiment can be used as an electron cyclotron resonance type plasma generator. It has an outer end surface 1.1' in which different magnetic poles alternately appear in the circumferential direction, and an inner 01M surface 2.2' in which magnetic poles aligned in position with the magnetic poles on this outer end surface and opposite in polarity alternately appear. and consists of a pair of magnetic force line generating means 4.4' composed of permanent magnets,
The outer end surfaces 1, B and inner end surfaces 2.2' of the pair of magnetic force line generating means 4.4' are perpendicularly opposed to each other, and the magnetic poles between each portion of these opposing outer and inner end surfaces are are the same polarity. In this embodiment, the outer end 1.1' and the inner end surface 2.2' of the magnetic field line generating means 4.4' have an annular shape with the center coincident with the axis 5-5'. Accordingly, the lines of magnetic force 6.6' are formed in the shape of a ring symmetrical about the axis 5-5'. Furthermore, an air gap is provided between each of the outer end surfaces 1 and 2.2' of each of the magnetic force line generation means 4.4', and the magnetic force line generation means 4.4' formed thereby The opposing space 13 is used as a space for plasma confinement and plasma generation. An opening 8.9 leading to the outside is provided in the center of the inner end surface 2.2'.A window 10 and an antenna 11 for electromagnetic waves are inserted into the opening 9, and an ion beam extractor is inserted into the opening 8. An electrode 12 for use is inserted. The lines of magnetic force are shielded by the yoke 3 around the insulating window 10 for electromagnetic wave input, and the electromagnetic waves can be transmitted to a desired position in the facing space 13 without losing energy during transmission. When electromagnetic waves are introduced from the outside into the opposing space 13 via the antenna 11 while the space (7) configured in this way is filled with an atmosphere of the desired element at a predetermined pressure,
Plasma is generated by an electron cycloton resonance phenomenon. The plasma thus generated is extracted to the outside by the ion extraction electrode 12. In addition, 1 magnet 4
.. The magnet 15' provided between the magnets 15' and 4' is a interpole that increases the strength of the magnetic field around the inner wall of the device. In this embodiment, a vacuum container is provided in the opposing space 13, and the inside thereof is kept in a high vacuum state, but the magnetic force line generating means 4.4' also serves as the vacuum container. Needless to say, you can leave it alone. In either case, it is preferable that the cavity be designed so that the electromagnetic waves propagated in from the outside resonate in the cavity, so that the electromagnetic wave energy can be used effectively.

第2図は、本発明の第2実施例の断面斜視図である。本
実施例においては、内側端面2.2′が、外側端面1.
1′ よりも後退しており、内側端面2.2′のそれぞ
れ内側に、内側端面2.2′の各磁極と位置が整合し、
かつ各磁極と反対の磁極が出現する中央端面21.21
′が更に設けられている。磁力線発生手段4.4′ の
各々の外側端面1.1′、内側端面2.2′ と中央端
面21.21′  との間には空隙が設けられており、
対向空間13がプラズマ閉込用およびプラズマ発生用の
空間として使用される。外側端面1、ビの対向空間中間
部には半径方向に外部に通じる開口22.23が設けら
れており開口22には電磁波人力用の窓10とアンテナ
11が挿入されており、開口23にはイオンビーム引き
出し用の電極12が挿入されている。電磁波人力用の絶
縁体の窓10の周囲には磁力線がヨーク3によって遮4
1にされており、エネルギーを伝送の途中で損失するこ
となく、対向空間13の所望位置に電磁波を伝送するこ
とができる。24は真空容器であり、15は、装置の内
壁周辺品分の磁場強度を高める補極である。
FIG. 2 is a cross-sectional perspective view of a second embodiment of the invention. In this embodiment, the inner end face 2.2' is the outer end face 1.2'.
1', and the position is aligned with each magnetic pole of the inner end surface 2.2' inside each of the inner end surfaces 2.2',
and a central end surface 21.21 where a magnetic pole opposite to each magnetic pole appears.
' is further provided. A gap is provided between the outer end surface 1.1', the inner end surface 2.2' and the central end surface 21.21' of each of the magnetic field line generating means 4.4'.
The opposing space 13 is used as a space for plasma confinement and plasma generation. Openings 22 and 23 that communicate with the outside in the radial direction are provided in the middle part of the opposing space between the outer end surface 1 and the opening 22, and a window 10 and an antenna 11 for electromagnetic wave operation are inserted into the opening 22. An electrode 12 for extracting the ion beam is inserted. Magnetic lines of force are blocked by the yoke 3 around the insulator window 10 for electromagnetic waves.
1, and the electromagnetic waves can be transmitted to a desired position in the facing space 13 without losing energy during transmission. 24 is a vacuum container, and 15 is a interpole that increases the magnetic field strength of the parts around the inner wall of the device.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の第1実施例の断面斜視図、第2図は本
発明の第2実施例の断面斜視図。 図中1.1′・・・・・外側端面、 2.2′・・・・・・内側端面、  3・・・・・・ヨ
ーク、4.4′・・・・・・磁力線発生装置、5.5′
・・・・・・軸、 6.6’ 、7’ ・・・・・・磁
力線、8.9・・・・・・開口、  10・・・・・・
電磁波人力用の窓、11・・・・・・アンテナ、12・
・・・・・電極、13・・・・・・対向空間、15・・
・・・・補極、21.21′ ・・・・・・中央端面、
23.23・・・・・・開口、24・・・・・・真空容
器。
FIG. 1 is a cross-sectional perspective view of a first embodiment of the present invention, and FIG. 2 is a cross-sectional perspective view of a second embodiment of the present invention. In the figure, 1.1'...outer end face, 2.2'...inner end face, 3...yoke, 4.4'...magnetic field line generator, 5.5'
...Axis, 6.6', 7'...Magnetic field lines, 8.9...Aperture, 10...
Window for electromagnetic waves, 11... Antenna, 12.
... Electrode, 13 ... Opposing space, 15 ...
...Commuting pole, 21.21' ...Central end surface,
23.23...opening, 24...vacuum container.

Claims (8)

【特許請求の範囲】[Claims] (1)周方向に異なる磁極が交互に現れる外側端面と、
この外側端面の各磁極と位置が整合し、かつ極性が反対
の磁極が交互に出現する内側端面とを有し、永久磁石か
ら構成される一対の磁力線発生手段からなり、この一対
の磁力線発生手段のそれぞれの外側端面と内側端面とが
互いに対向しており、これら対向した外側端面および内
側端面の各部分同士の磁極が同極であるプラズマ閉込用
磁場発生装置。
(1) An outer end surface where different magnetic poles appear alternately in the circumferential direction,
It has an inner end surface in which the positions of the magnetic poles of the outer end surface are aligned with each other, and magnetic poles of opposite polarity appear alternately, and the pair of magnetic force line generating means is composed of a permanent magnet. A magnetic field generating device for plasma confinement, wherein the outer end surface and the inner end surface of each of the opposing outer end surfaces and the inner end surface are opposite to each other, and the magnetic poles of each portion of the opposing outer end surface and inner end surface are the same.
(2)前記外側端面が、前記内側端面よりも後退してい
る特許請求の範囲第(1)項記載のプラズマ閉込用磁場
発生装置。
(2) The magnetic field generating device for plasma confinement according to claim 1, wherein the outer end face is set back from the inner end face.
(3)前記内側端面が、前記外側端面よりも後退してい
る特許請求の範囲第(1)項記載のプラズマ閉込用磁場
発生装置。
(3) The magnetic field generating device for plasma confinement according to claim (1), wherein the inner end surface is set back from the outer end surface.
(4)前記外側端面の磁位が、前記内側端面の磁位より
も低い特許請求の範囲第(1)項記載のプラズマ閉込用
磁場発生装置。
(4) The magnetic field generator for plasma confinement according to claim (1), wherein the magnetic potential of the outer end surface is lower than the magnetic potential of the inner end surface.
(5)前記内側端面の磁力が、前記外側端面の磁力より
も低い特許請求の範囲第(1)項記載のプラズマ閉込用
磁場発生装置。
(5) The magnetic field generator for plasma confinement according to claim (1), wherein the magnetic force of the inner end face is lower than the magnetic force of the outer end face.
(6)前記内側端面のそれぞれの内側に、前記内側端面
の各磁極と位置が整合し、かつ前記各磁極の極性と反対
の磁極が出現する端面が更に前記磁力線発生手段に設け
られている特許請求の範囲第(2)項または第(4)項
記載のプラズマ閉込用磁場発生装置。
(6) A patent in which the line of magnetic force generating means is further provided with an end face on the inside of each of the inner end faces, the position of which aligns with each magnetic pole of the inner end face, and where a magnetic pole opposite to the polarity of each of the magnetic poles appears. A magnetic field generator for plasma confinement according to claim (2) or (4).
(7)前記外側端面のそれぞれの外側に、前記外側端面
の各磁極と位置が整合し、かつ前記各磁極の極性と反対
の磁極が出現する端面が更に前記磁力線発生手段に設け
られている特許請求の範囲第(3)項または第(5)項
記載のプラズマ閉込用磁場発生装置。
(7) A patent in which the line of magnetic force generating means is further provided with an end surface on the outside of each of the outer end surfaces that is aligned in position with each magnetic pole of the outer end surface and has a magnetic pole opposite in polarity to each of the magnetic poles. A magnetic field generator for plasma confinement according to claim (3) or (5).
(8)前記磁力線発生手段の各端面の間に、空隙が設け
られている特許請求の範囲第(1)項から第(7)項い
ずれか1項記載のプラズマ閉込用磁場発生装置。
(8) A magnetic field generating device for plasma confinement according to any one of claims (1) to (7), wherein a gap is provided between each end face of the magnetic field line generating means.
JP61013288A 1986-01-24 1986-01-24 Magnetic field generator for plasma confinement Pending JPS62172700A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61013288A JPS62172700A (en) 1986-01-24 1986-01-24 Magnetic field generator for plasma confinement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61013288A JPS62172700A (en) 1986-01-24 1986-01-24 Magnetic field generator for plasma confinement

Publications (1)

Publication Number Publication Date
JPS62172700A true JPS62172700A (en) 1987-07-29

Family

ID=11829012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61013288A Pending JPS62172700A (en) 1986-01-24 1986-01-24 Magnetic field generator for plasma confinement

Country Status (1)

Country Link
JP (1) JPS62172700A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6351098A (en) * 1986-08-20 1988-03-04 理化学研究所 Plasma generator
JPH02132737A (en) * 1988-11-10 1990-05-22 Nissin Electric Co Ltd Plasma generation device and ion source using it

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113539A (en) * 1980-12-24 1982-07-15 Ibm High temperature multipole plasma ion beam source
JPS59143330A (en) * 1983-01-31 1984-08-16 ユニバ−シテイ オブ シンシナテイ Plasma etching device
JPS60246599A (en) * 1983-06-15 1985-12-06 セントル・ナシヨナル・ドウ・ラ・ルシエルシユ・サイエンテイフイツク(セ・エン・エ−ル・エス) Method and device for generating homogeneous large capacity plasma of high density and low electron temperature

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113539A (en) * 1980-12-24 1982-07-15 Ibm High temperature multipole plasma ion beam source
JPS59143330A (en) * 1983-01-31 1984-08-16 ユニバ−シテイ オブ シンシナテイ Plasma etching device
JPS60246599A (en) * 1983-06-15 1985-12-06 セントル・ナシヨナル・ドウ・ラ・ルシエルシユ・サイエンテイフイツク(セ・エン・エ−ル・エス) Method and device for generating homogeneous large capacity plasma of high density and low electron temperature

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6351098A (en) * 1986-08-20 1988-03-04 理化学研究所 Plasma generator
JPH02132737A (en) * 1988-11-10 1990-05-22 Nissin Electric Co Ltd Plasma generation device and ion source using it

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