JPS62172543A - Optical recording element - Google Patents
Optical recording elementInfo
- Publication number
- JPS62172543A JPS62172543A JP61013263A JP1326386A JPS62172543A JP S62172543 A JPS62172543 A JP S62172543A JP 61013263 A JP61013263 A JP 61013263A JP 1326386 A JP1326386 A JP 1326386A JP S62172543 A JPS62172543 A JP S62172543A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- reflective layer
- substrate
- optical recording
- recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 150000002894 organic compounds Chemical class 0.000 claims description 4
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 229920000642 polymer Polymers 0.000 abstract description 5
- 238000010030 laminating Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 42
- 239000010408 film Substances 0.000 description 15
- 238000000034 method Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 8
- 229920006254 polymer film Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001786 chalcogen compounds Chemical class 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光ビームにより情報の香き込みおよび読み取り
を行うための光記録素子に関し、さらに詳しくは薄膜の
積層体からなる素子の構成材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical recording device for imprinting and reading information using a light beam, and more particularly to a constituent material of the device consisting of a laminate of thin films. .
光記録素子を用いた記録方式は2種類に大別され、その
1つは第1図に示す様に穴形成による記録法であり、他
の1つは第2図に示す様に相転移、結晶形遷移による記
録法である。前者は、第1図に示すように基板1の上に
反射層2を設けその上に記録層6を設けたものが多い。Recording methods using optical recording elements are roughly divided into two types, one of which is a recording method by hole formation, as shown in Figure 1, and the other is a recording method using phase transition, as shown in Figure 2. This is a recording method based on crystal form transition. In the former case, as shown in FIG. 1, a reflective layer 2 is provided on a substrate 1, and a recording layer 6 is provided thereon.
基板としては金属基板、ガラス板、あるいはPMMAな
との硬質プラスチックなどが用いられる。反射層として
はkl、Ag、Au、Crなどの金属蒸着膜が用いられ
る。一般に反射層と基板の密着が悪いため、基板上にあ
らかじめ下引き層を設けたもの、シランあるいはチタン
カップリング剤で基板処理を施したものに反射層を蒸着
している。記録層としては低酸化カルコゲナイド、低沸
点ポリマー、あるいはこれらのものに、用いる光に分光
感度を示す色素を混入したものなどが用いられている。As the substrate, a metal substrate, a glass plate, or a hard plastic such as PMMA is used. As the reflective layer, a metal vapor deposition film such as Kl, Ag, Au, Cr, etc. is used. Generally, the adhesion between the reflective layer and the substrate is poor, so the reflective layer is deposited on a substrate on which an undercoat layer has been provided in advance, or on a substrate that has been treated with a silane or titanium coupling agent. As the recording layer, a low oxidation chalcogenide, a low boiling point polymer, or a mixture of these with a dye exhibiting spectral sensitivity to the light used is used.
この記録法は記録層に光を照射し、その照射熱により記
録層が部分的に蒸発、あるいは熱運動による変形が起こ
り反射層が露出するというものである。In this recording method, the recording layer is irradiated with light, and the irradiated heat causes the recording layer to partially evaporate or deform due to thermal movement, exposing the reflective layer.
後者の記録法は第2図に示すように基板1の上に中間層
21を介して記録層6を設け、光照射熱により記録部が
非晶質から結晶質へ、あるいは結晶質から非晶質へと相
変化するものである。この種の記録層としては、’l’
e3eQe非晶質膜、’l’eQx。In the latter recording method, a recording layer 6 is provided on a substrate 1 via an intermediate layer 21 as shown in FIG. It undergoes a phase change into quality. This kind of recording layer is 'l'
e3eQe amorphous film, 'l'eQx.
TeOxGe、TeOxSn、5b2Se、薄膜などが
用イラれる。この様な光記録素子も基板と記録層の密着
が悪(、下引き層を設けたり、カップリング剤などによ
る前処理が施される。いずれの記録法においても光記録
素子の記録層の上に保護層を設けたものが多い。これは
記録層を物理的(キズなと)、化学的(酸化)劣化から
保護するためのみならず、穴形成による記録法では反射
層を物理的、化学的劣化から保護するためでもある。い
ずれの記録方式でも、記録された信号は再生用の光に対
する記録部61と非記録部620反射率の差による読み
取りが行われる。TeOxGe, TeOxSn, 5b2Se, thin film, etc. can be used. Such optical recording elements also have poor adhesion between the substrate and the recording layer (an undercoat layer is provided, or a pretreatment with a coupling agent, etc. This is not only to protect the recording layer from physical (scratch) and chemical (oxidation) deterioration, but also to protect the reflective layer from physical and chemical deterioration in the hole-forming recording method. In either recording method, the recorded signal is read based on the difference in the reflectance of the recorded portion 61 and the non-recorded portion 620 with respect to the reproduction light.
上記の従来の光記録素子の問題点としては、まず、基板
、反射層、記録層の密着性があげられる。Problems with the above-mentioned conventional optical recording element include, first, the adhesion between the substrate, the reflective layer, and the recording layer.
基板としてガラス、あるいはポリマーを用いた場合の基
板と金属反射層との密着は特に悪い。さらに金属反射層
と記録層、基板と記録層との密着性も問題となる。次に
、穴形成による光記録法においては記録層の機械的、化
学的強度もさることながら反射層の機械的、化学的強度
も問題となる。When glass or polymer is used as the substrate, the adhesion between the substrate and the metal reflective layer is particularly poor. Furthermore, the adhesion between the metal reflective layer and the recording layer, and between the substrate and the recording layer also becomes a problem. Next, in the optical recording method using hole formation, not only the mechanical and chemical strength of the recording layer but also the mechanical and chemical strength of the reflective layer become a problem.
従来、反射層として用いられているのはAA、Ag、A
u、Crなどの蒸着膜であるが、これらはいずれも機械
的強度に劣る。kl、Ag、Auなどはビッカース硬度
で20〜50と非常に柔らかい金属である。Crはこれ
らに比べ硬いが1.ビッカース硬度でせいぜい170〜
190程度である。光記録素子の反射層がキズついた場
合は、再生時に誤った読み出しをする可能性が大きい。Conventionally, AA, Ag, and A are used as reflective layers.
These are vapor-deposited films of u, Cr, etc., but these are all inferior in mechanical strength. KL, Ag, Au, etc. are very soft metals with a Vickers hardness of 20 to 50. Cr is harder than these, but 1. Vickers hardness is at most 170~
It is about 190. If the reflective layer of the optical recording element is scratched, there is a high possibility that erroneous reading will occur during reproduction.
一方、光記録素子は保存性に優れていることが必要であ
る。Al、Agは耐酸化性、耐硫化性に乏しい。Crも
長期間保存した場合、表面が曇るなど化学的強度が問題
となる。化学的劣化は反射層の長期保存による反射率の
低下を引き起こし、読み出し時の感度を悪くする。現在
はこれらの問題を解決すべく、中間層あるいは表面保護
層を用いているが、満足するものは得られていない。本
発明の目的は、保存性、密着性に優れた反射層あるいは
中間層を有する光記録素子を提供するものである。On the other hand, optical recording elements need to have excellent storage stability. Al and Ag have poor oxidation resistance and sulfidation resistance. When Cr is stored for a long period of time, its chemical strength becomes a problem, such as the surface becoming cloudy. Chemical deterioration causes a decrease in reflectance due to long-term storage of the reflective layer, resulting in poor sensitivity during readout. Currently, intermediate layers or surface protective layers are used to solve these problems, but nothing satisfactory has been achieved. An object of the present invention is to provide an optical recording element having a reflective layer or an intermediate layer with excellent storage stability and adhesion.
本発明は従来の光記録素子の問題を解決するため、反射
層あるいは密着層としてプラズマ重合処理により得られ
る低分子有機化合物の硬質薄膜を用いて密着性、機械的
・化学的強度に優れ、さらに長期保存した場合も、これ
らの特性に変化が見られない光記録素子を提供するもの
である。用いる基板としては、klなどの金属板、ガラ
ス板、セラミックス、あるいはPMMA、ポリカーボネ
ート、ポリ酢酸セルロース、PET、ポリイミドなどの
高分子などがあげられる。記録層としては、ポリスチレ
ン、ポリエチレン、ニトロセルロースなどの熱可塑性フ
ィルム、Te、Bi、 seなどの半金属、S e−T
e −A S、 Te−As、 Zn−8,As−8
e。In order to solve the problems of conventional optical recording elements, the present invention uses a hard thin film of a low-molecular organic compound obtained by plasma polymerization as a reflective layer or adhesion layer, which has excellent adhesion, mechanical and chemical strength, and It is an object of the present invention to provide an optical recording element whose characteristics do not change even when stored for a long period of time. Examples of the substrate used include metal plates such as KL, glass plates, ceramics, and polymers such as PMMA, polycarbonate, polycellulose acetate, PET, and polyimide. As the recording layer, thermoplastic films such as polystyrene, polyethylene, and nitrocellulose, metalloids such as Te, Bi, and se, Se-T
e-AS, Te-As, Zn-8, As-8
e.
Ge−8−P、 Ge −3−Cu 、 Ge −8−
N a 、 As −8−I 、G e−8eなどのカ
ルコゲン系化合物膜、あるいはこれらの物質に増感剤を
添加した膜などがあげられる。さらに記録層を保護する
ための保護層を設けても良い。本発明のプラズマ重合膜
は、第1図の反射層2、あるいは第2図の中間層21と
して用いる。Ge-8-P, Ge-3-Cu, Ge-8-
Examples include films of chalcogen compounds such as Na, As-8-I, and Ge-8e, and films containing these substances with a sensitizer added. Furthermore, a protective layer may be provided to protect the recording layer. The plasma polymerized film of the present invention is used as the reflective layer 2 in FIG. 1 or the intermediate layer 21 in FIG. 2.
プラズマ重合膜に用いられる低分子有機化合物としては
、アルカン、アルケン、アルキン、ビニルモノマー、芳
香族炭化水素などがあげられる。これらは無置換のもの
でも、ハロゲンなどに置換されたものでも良い。さらに
これらは気体、液体、固体のどの状態でも用いることが
できる。プラズマ重合処理により得られた有機化合物薄
膜は非常に硬質であり、ピンホールが少なく、金属的光
沢を持つものである。本発明者らは、さらにこれらの膜
が金属、ポリマーに対して密着性に優れていることをみ
い出した。Examples of low-molecular organic compounds used in plasma polymerized membranes include alkanes, alkenes, alkynes, vinyl monomers, and aromatic hydrocarbons. These may be unsubstituted or substituted with halogen or the like. Furthermore, these can be used in any state: gas, liquid, or solid. The organic compound thin film obtained by plasma polymerization is very hard, has few pinholes, and has a metallic luster. The present inventors further discovered that these films have excellent adhesion to metals and polymers.
平滑で洗浄されたアクリル板上に、メタンガスを用いて
プラズマ重合膜を形成した。膜厚は1000入であった
。A plasma polymerized film was formed using methane gas on a smooth and cleaned acrylic plate. The film thickness was 1000 pieces.
一方、比較例として同様のアクリル板上にAlを真空蒸
着し、膜厚1oooAのものを得た。On the other hand, as a comparative example, Al was vacuum-deposited on a similar acrylic plate to obtain a film having a thickness of 100A.
密着性を調べるため、基盤の目試験法により剥離試験を
したところ、重合膜は充分な密着性を示したが、Al膜
はほとんどが剥離してしまった。In order to examine the adhesion, a peel test was conducted using the substrate eye test method, and the polymer film showed sufficient adhesion, but most of the Al film peeled off.
次にビッカース硬度計で硬度を調べたところ、重合膜は
4000、Al膜は20であった。Next, the hardness was checked using a Vickers hardness meter, and the hardness was 4000 for the polymer film and 20 for the Al film.
蒸着後の反射率は重合膜は52%、Al膜は84%であ
った。(波長850nrn)次に保存試験を行った。7
0℃、90%相対湿度の条件下に2週間放置し、反射率
を調べたところ、重合膜は52%、A11!膜は6%で
あった。The reflectance after vapor deposition was 52% for the polymer film and 84% for the Al film. (Wavelength 850nrn) Next, a storage test was conducted. 7
When the polymer film was left under conditions of 0°C and 90% relative humidity for two weeks and its reflectance was examined, it was 52%, A11! The film was 6%.
以上の説明で明らかな様に、本発明によれば、密着性に
優れ、反射率、保存性の高い光記録素子を得ることがで
きる。As is clear from the above description, according to the present invention, it is possible to obtain an optical recording element with excellent adhesion, high reflectance, and high storage stability.
図面はいずれも本発明および従来技術に共通の一般的な
光記録素子の要部断面図である。、−一声
1・・・・・・基板、2・・・・・・反射層、21・・
・・・・中間層、6・・・・・・記録層、61・・・・
・・記録部、第1図
第2図
手続補正書(方式)
%式%
1、事件の表示
昭和61年特許願第13263号
2、発明の名称
光記録素子
3、補正をする者
事件との関係 特許出願人
住所 東京都新宿区西新宿2丁目1番1号電話 (03
)342−1231
、、(1’、 1
4、補正命令の日付
昭和61年3月25日 (発送日)
5、補正の対象
明細書の「図面の簡単な説明」の欄
6、補正の内容
「図面の簡単な説明」の欄を下記のとおり補正する。
41図面の簡単な説明
図面はいずれも本発明および従来技術に共通の一般的な
光記録素子の要部断面図であり、第1図は記録層に穴を
形成して情報記録する方式における光記録素子を示し、
第2図は記録層を変質させて情報記録する方式における
光記録素子を示す。」 。The drawings are all sectional views of essential parts of a general optical recording element common to the present invention and the prior art. , - One voice 1...Substrate, 2...Reflection layer, 21...
...Intermediate layer, 6...Recording layer, 61...
... Recording Department, Figure 1 Figure 2 Procedural Amendment (Method) % Formula % 1. Indication of the case 1985 Patent Application No. 13263 2. Name of the invention Optical recording element 3. Person making the amendment Related Patent Applicant Address 2-1-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo Telephone (03)
) 342-1231,, (1', 1 4. Date of amendment order: March 25, 1985 (shipping date) 5. Column 6, "Brief explanation of drawings" of the specification subject to amendment. 6. Contents of amendment. The column "Brief explanation of the drawings" is corrected as follows: 41 Brief explanation of the drawings All of the drawings are cross-sectional views of main parts of a general optical recording element common to the present invention and the prior art, and the first The figure shows an optical recording element that records information by forming holes in the recording layer.
FIG. 2 shows an optical recording element in which information is recorded by changing the quality of the recording layer. ”.
Claims (1)
した光記録素子において、反射層あるいは中間層がプラ
ズマ重合処理により得られる低分子有機化合物膜からな
ることを特徴とする光記録素子。1. An optical recording element in which a recording layer is laminated on the surface of a substrate via a reflective layer or an intermediate layer, wherein the reflective layer or the intermediate layer is made of a low-molecular organic compound film obtained by plasma polymerization.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61013263A JPS62172543A (en) | 1986-01-24 | 1986-01-24 | Optical recording element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61013263A JPS62172543A (en) | 1986-01-24 | 1986-01-24 | Optical recording element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62172543A true JPS62172543A (en) | 1987-07-29 |
Family
ID=11828328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61013263A Pending JPS62172543A (en) | 1986-01-24 | 1986-01-24 | Optical recording element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62172543A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01235046A (en) * | 1988-03-15 | 1989-09-20 | Nec Corp | Optical disk medium |
JPH01235045A (en) * | 1988-03-15 | 1989-09-20 | Nec Corp | Optical disk medium |
JPH0242659A (en) * | 1988-08-01 | 1990-02-13 | Pioneer Electron Corp | Optical disk for information recording |
JPH0349055A (en) * | 1989-07-18 | 1991-03-01 | Nec Corp | Optical storage medium |
JPWO2017209281A1 (en) * | 2016-06-02 | 2019-04-18 | 田中貴金属工業株式会社 | Gold sputtering target |
-
1986
- 1986-01-24 JP JP61013263A patent/JPS62172543A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01235046A (en) * | 1988-03-15 | 1989-09-20 | Nec Corp | Optical disk medium |
JPH01235045A (en) * | 1988-03-15 | 1989-09-20 | Nec Corp | Optical disk medium |
JPH0242659A (en) * | 1988-08-01 | 1990-02-13 | Pioneer Electron Corp | Optical disk for information recording |
JPH0349055A (en) * | 1989-07-18 | 1991-03-01 | Nec Corp | Optical storage medium |
JPWO2017209281A1 (en) * | 2016-06-02 | 2019-04-18 | 田中貴金属工業株式会社 | Gold sputtering target |
JP2022048244A (en) * | 2016-06-02 | 2022-03-25 | 田中貴金属工業株式会社 | FORMATION METHOD OF Au FILM |
US11569074B2 (en) | 2016-06-02 | 2023-01-31 | Tanaka Kikinzoku Kogyo K.K. | Gold sputtering target |
US11817299B2 (en) | 2016-06-02 | 2023-11-14 | Tanaka Kikinzoku Kogyo K.K. | Gold sputtering target |
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